• Journal of the Korean Vacuum Society
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• v.20 no.2
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• pp.135-140
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• 2011

By investigating photoluminescence (PL) spectra (20 K) of undoped and Be-doped p-type GaSb/GaAs epilayers, the origin has been analyzed by the change due to doping density. We have observed that the PL peak shifts to higher energy and the full-width half-maximum (FWHM) decreases with increasing the doping density below ${\sim}10^{17}cm^{-3}$, contrasted to shift to low energy and increasing FWHM above the density of ${\sim}10^{17}cm^{-3}$. From the variation of the integrated PL intensities of three peaks dissolved by Gaussian fit, it has been analyzed that, as the density increases, the $Be[Be_{Ga}]$ acceptor level (0.794 eV) reduces, whereas the intrinsic defect of $A[Ga_{Sb}]$ (0.778 eV) enhances together with a new $Be^*$ level (0.787 eV) locating between A and Be. We have discussed that it is due to coexistence of the Be acceptor level (${\Delta}E=16meV$) and the complex level (${\Delta}E=23meV$), $Be^*[Ga_{Sb}-Be_{Ga}]$combined by Be and A, in Be-doped p-GaSb, and that the level density of $Be[Be_{Ga}]$ may be reduced above ${\sim}10^{17}cm^{-3}$.

• The Transactions of the Korean Institute of Electrical Engineers D
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• v.53 no.7
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• pp.531-535
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• 2004

A new method is presented to construct a classifier. This was accomplished by combining a generalized regression neural network (GRNN) and a genetic algorithm (GA). The classifier constructed in this way is referred to as a GA-GRNN. The GA played a role of controlling training factors simultaneously. The GA-GRNN was applied to classify 4 different Promoter sequences. The training and test data were composed of 115 and 58 sequence patterns, respectively. The classifier performance was investigated in terms of the classification sensitivity and prediction accuracy. Compared to conventional GRNN, GA-GRNN significantly improved the total classification sensitivity as well as the total prediction accuracy. As a result, the proposed GA-GRNN demonstrated improved classification sensitivity and prediction accuracy over the convention GRNN.

• Proceedings of the Optical Society of Korea Conference
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• 2009.02a
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• pp.525-526
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• 2009

we investigated the effect of rapid thermal annealing (RTA) temperature on photoluminescence (PL) of 635 nm InGaP/InGaAlP multiple quantum well structure. RTA is performed with the quantum well structure with 5.5 nm of well width. The highest PL peak intensity is shown at 1 min. of RTA at $720^{\circ}C$ sample as 3 times higher as compared to the as-grown sample. The effect may be assigned to an expected reduction in number of nonradiative recombination centers in the quantum well.

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.213-216
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• 2001

The use of a thin film of indium between the ITO and the $n^{+}$-InP contact layers for InP/InGaAs HPTs was studied without degrading its excellent optical transmittance properties. ITO/$n^{+}$-InP ohmic contact was successfully achieved by the deposition of Indium and thermal annealing. The specific contact resistance of about 6.6$\times$$10^{-4}$$\Omega\textrm{cm}^2$ was measured by use of the transmission line method (TLM). However, as the thermal annealing was just performed to ITO/$n^{+}$-InP contact without the deposition of Indium between ITO and $n^{+}$-InP, it exhibited schottky characteristics. In the applications, the DC characteristics of InP/InGaAs HPTs with ITO emitter contacts was compared with that of InP/InGaAs HBTs with the opaque emitter contacts.

• Korean Journal of Optics and Photonics
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• v.12 no.1
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• pp.40-47
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• 2001

The structural dependence of the performance of an 1.55 $1.55{\mu}m$ InGaAsPIInGaAsP MQW electro-absorption modulator for highspeed digital fiber communication was systematically investigated. The effects of n-doped SCH region length $t_n$ as well as the general structure parameters including quantum well number $N_w$, well-thickness $t_w$, detuning wavelength $\Delta\lambda$, and device length L were thoroughly analyzed. Thereby, a high-pelfoIDlance electro-absorption modulator with device length L of $100{\mu}m$ was successfully designed. The designed structure showed excellent characteristics that have residual loss less than -1.5 dB, operational voltage from 0 V to -2V, and extinction ratios of -2.92 dB at $V_{\alpha}$=-1 V and -10 dB at $V_{\alpha}$=-2V.X>=-2V.

• Journal of agriculture & life science
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• v.43 no.2
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• pp.23-30
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• 2009

The object of this study was to evaluate the effect of the gibberellin treatment on fruit enlargement and ripening promotion in 'Niitaka' pear(Pyms pynfolia). Fruit weight was similar between $GA_{4+7}$ treatments and the gibberellin-paste control, but fairly increased of fruit weight compared to non-treatment Most effective time for $GA_{4+7}$ treatment to increase diameter and length was on 35 and 40 days after full bloom, respectively. Shape index was similar in all treatments. Fruit enlargement at the period of early growth, $GA_{4+7}$ 2.4% treatment was remarkably effective than $GA_{3}+GA_{4+7}$ 2.7% treatment or non-treatment However at the period of maturity, $GA_{4+7}$ 2.4% treatment and $GA_{3}+GA_{4+7}$ 2.7% treatment showed little differences in fruit enlargement and coloring. In maturing promotion effect, young fruit treated with $GA_{3}+GA_{4+7}$ showed similar fruit coloring to ethephon treatment on 35 days after full bloom, and both of those treatments promoted fruit coloring than non- treatment about 6 days. $GA_{3}+GA_{4+7}$ treatments resulted higher solid content and decreased acidity than non-treatment However, there was no differences in fruit hardness comparing to non-treatment As a result, gibberellin was most effective in fruit enlargement, so as all $GA_{3}+GA_{4+7}$ treatments were more effective on fruit enlargement than ethephon treatment or non-treatment Specifically, when $GA_{3}+GA_{4+7}$ was treated 35days after full bloom of flower, the diameter, the length and the shape of fruit index were best, and fruit coloring was good as well.

• Journal of the Korean Ceramic Society
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• v.40 no.11
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• pp.1058-1061
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• 2003

Gallium Nitride (GaN) powders were synthesized by calcining a gallium(III) sulfate salt in flowing ammonia in the temperature range 500-1100$^{\circ}C$. The process of conversion of the salt to GaN was monitored by X-Ray Diffraction (XRD). The salt decomposed to ${\gamma}$-Ga$_2$O$_3$ and then converted to GaN without ${\gamma}$-${\beta}$Ga$_2$O$_3$ phase transition. Variations in XRD patterns and weight loss of samples with temperature indicate that the conversion of ${\gamma}$-Ga$_2$O$_3$ to GaN does not proceed through Ga$_2$O but stepwise via amorphous gallium oxynitride (GaO$\_$x/N$\_$y/) as intermediates. Room-temperature photoluminescence spectra of GaN powders obtained showed the emission peak at 363 nm and no yellow band.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.12S
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• pp.1187-1194
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• 2003

A BCl$_3$/Ne plasma chemistry was used to etch Ga-based (GaAs, AIGaAs, GaSb) and In-based (InGaP, InP, InAs and InGaAsP) compound semiconductors in a Planar Inductively Coupled Plasma (ICP) reactor. The addition of the Ne instead of Ar can minimize electrical and optical damage during dry etching of III-V semiconductors due to its light mass compared to that of Ar All of the materials exhibited a maximum etch rate at BCl$_3$ to Ne ratios of 0.25-0.5. Under all conditions, the Ga-based materials etched at significantly higher rates than the In-based materials, due to relatively high volatilities of their trichloride etch products (boiling point CaCl$_3$ : 201 $^{\circ}C$, AsCl$_3$ : 130 $^{\circ}C$, PCl$_3$: 76 $^{\circ}C$) compared to InCl$_3$ (boiling point : 600 $^{\circ}C$). We obtained low root-mean-square(RMS) roughness of the etched sulfate of both AIGaAs and GaAs, which is quite comparable to the unetched control samples. Excellent etch anisotropy ( > 85$^{\circ}$) of the GaAs and AIGaAs in our PICP BCl$_3$/Ne etching relies on some degree of sidewall passivation by redeposition of etch products and photoresist from the mask. However, the surfaces of In-based materials are somewhat degraded during the BCl$_3$/Ne etching due to the low volatility of InCl$_{x}$./.

• Proceedings of the IEEK Conference
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• 2003.07b
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• pp.1073-1076
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• 2003

This paper shows the performance as a photodetector of InP/InGaAs HPT operated with a base bias and forntside optical injection through the emitter. InP/InGaAs HPT produced the high optical gain of about 16.2 where HPT is biased at Vc=1V, I$_{B}$=20$\mu$A with an input optical power of 2.4$\mu$W. And we examined that the optical gain of HPTs becomes larger when operating in 3-terminal configuration rather than 2-terminal with the floating base. The optical performance of InP/InGaAs HPT is an attractive to the PIN Photodetector for use in long wavelength optical receivers.s.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.12 no.4
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• pp.196-201
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• 2002

The $AgInS_{2}$ epilayers with a chalcopyrite structure grown using a hot-wall epitaxy method have been confirmed to be a high quality crystal. From the optical absorption measurements, a temperature dependence of the energy band gap on $AgInS_{2}/GaAs$ was found to be $Eg(T)=2.1365eV-(9.89{\times}10^{-3}eV)T^{2}/(2930+T)$. After the as-grown $AgInS_{2}/GaAs$ was annealed in Ag-, S-, and In-atmospheres, the origin of point defects of $AgInS_{2}/GaAs$ has been investigated by using photoluminescence measurements at 10 K. The native defects of $V_{Ag},\;V_{S},\;Ag_{int}$ and $S_{int}$ obtained from photoluminescence measurements were classified as donors or accepters. It was concluded that the heat-treatment in the S-atmosphere converted $AgInS_{2}/GaAs$ to an optical p-type. Also, it was confirmed that In in $AgInS_{2}/GaAs$ did not form the native defects because In in $AgInS_{2}$ did exist in the stable form.