• Journal of Welding and Joining
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• 제12권2호
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• pp.87-96
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• 1994

Correlation between microstructural features and segregation of elements (Si, Mn, P and S) near the mid of thickness in the base metal and the synthetic HAZ was investigated. Furthermore, the relationship between the degree of center segregation and weld cold cracking susceptibility in the thickness direction was also conducted by evaluating the effect of P concentration on the critical applied stress. The results obtained are as follows: 1) Pearlite band, containing the MnS type inclusion and a locally transformed structure with a higher hardness, was observed in the center segregation region. 2) By the weld thermal cycle, center segregation region was transformed to the white band which had a higher hardness than that of base metal due to a greater hardenability of concentrated Mn, P etc.. 3) Weld cold cracking susceptibility in the thickness direction was mainly dependent on the concentration of impurity elements rather than on the number of the segregated particles near the mid of thickness. 4) During welding, the higher concentrated region was easily changed into white band. Therefore, it could be predicted that the initiation and propagation of a cold crack would be promoted by increasing the restraint stress and hydrogen content.

• 대한전자공학회논문지
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• 제22권6호
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• pp.58-62
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• 1985

이온 주입된 소형 MOSFET소자에 대한 해석적 문턱 전압 모델이 유도되었다. 일정한 도우핑 농도를 갖는 MOSFET에 적용되는 Yau 모델을 implanted channel구조와 bird's beat구조의 MOSFET에 대하여 적합한 형태로 수정하여 short channel 현상과 narrow width 현상을 정량적으로 설명하였다. Channel영역의 불순물 분포를 SUPREM 결과에서 2-step profile로 근사시켜 문턱 전압의 short channel model을 제안하였다. Weighting factor를 사용하여 bird's beat 영역의 불순물 분포를 고려함으로써 narrow width 현상을 성공적으로 설명하였다.

• 한국표면공학회지
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• 제57권2호
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• pp.92-97
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• 2024

The LiBr aqueous solution, which is the absorption liquid of absorption refrigerator, must be replaced periodically because the concentration of impurities such as Cu²⁺, Fe²⁺, Ca²⁺, etc., increases due to corrosion of the tubes as the period of use increases, and the refrigeration efficiency decreases significantly. In order to reuse the waste absorption liquid, flocculation-precipitation method is mainly applied to precipitate the impurities, which requires hundreds of times the concentration of impurities and generates additional waste. In this study, a process for removing Cu ion impurities from cyclone electrolyzer by electrolytic reduction is presented in a small-scale facility without additional waste. It was confirmed that Cu ion impurities can be removed down to 1 ppm by electrolytic reduction process, and to further improve the removal rate, the mass transfer rate was increased by using a cyclone electrolyzer. The removal rate of Cu ions increased with the increase of flow rate and current density, and it was confirmed that Cu was removed at a rate of 1.48 ppm/h under the condition of 330 mL/sec and 2.5 mA/cm².

• Transactions on Electrical and Electronic Materials
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• 제9권6호
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• pp.231-236
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• 2008

B, P, and Cs ions were implanted with various parameters into silicon nitride layers prepared by LPCVD. In order to get the maximum impurity concentration at the silicon nitride surface, a high temperature oxide (HTO) buffer layers was deposited prior to the implantation. Alkali ion and pH sensing properties of the layers were investigated with an electrolyte-insulator-silicon (EIS) structure using high frequency capacitance-voltage (HF-CV) measurements. The ion sensing properties of implanted silicon nitrides were compared to those of as-deposited silicon nitride. Band Cs co-implanted silicon nitrides showed a pronounced difference in pH and alkali ion sensing properties compared to those of as-deposited silicon nitride. B or P implanted silicon nitrides in contrast showed similar ion sensitivities like those of as-deposited silicon nitride.

• 한국수소및신에너지학회논문집
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• 제16권3호
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• pp.290-295
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• 2005

For the application of fuel cell, the content and concentration of impurities in hydrogen stream must be classified. The purpose of this study is to provide analysis tool for the determination of impurities in hydrogen with ultra high purity. To produce UHT hydrogen, we purified hydrogen gas by both getter-based catridge and liquid-nitrogen soaked catridge. We compare two methods and propose new method to know about what is in hydrogen stream.

• ETRI Journal
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• 제24권6호
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• pp.455-461
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• 2002

This paper reports on estimating the Schottky barrier height of small contacts using a thermionic-field emission model. Our results indicate that the logarithmic plot of the current as a function of bias voltage across the Schottky diode gives a linear relationship, while the plot as a function of the total applied voltage across a metal-silicon contact gives a parabolic relationship. The Schottky barrier height is extracted from the slope of the linear line resulting from the logarithmic plot of current versus bias voltage across the Schottky diode. The result reveals that the barrier height decreases from 0.6 eV to 0.49 eV when the thickness of the barrier metal is increased from 500 ${\AA}$ to 900 ${\AA}$. The extracted impurity concentration at the contact interface changes slightly with different Ti thicknesses with its maximum value at about $2.9{\times}10^{20}\;cm^{-3}$, which agrees well with the results from secondary ion mass spectroscopy (SIMS) measurements.

• 대한전자공학회논문지
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• 제21권3호
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• pp.60-65
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• 1984

본 논문은 광통신용 광원의 가장 중요한 설계변수인 주파수응답의 최적화를 위하여 대칭 CaAs/(Ca, Al)As DH-LED를 모델로 채택하여 다이오드의 설계변수들인 활성층의 불순물농도, 활성층폭, 소수캐리어수명, 금지대폭, 굴절률, 공간전하용량, 주입전류밀도 등의 물리적 제인자들의 백호관계를 체계적으로 정립하여 컴퓨터 시뮬레이션에 의한 최적설계변수치들을 설정하는데 그 목적이 있다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1991년도 하계학술대회 논문집
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• pp.162-165
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• 1991

Oxygen behaviors in CZ-silicon wafer, grown by the Lucky Advanced Materials Inc. that is a pioneer of silicon material industries in Korea, were investigated to simulate effects on the device performance of oxygen, neglecting the effect of other impurity content, defects and thermal history. Silicon wafers were annealed through simulated 16K SRAM thermal cycle. As initial oxygen concentration increased up to 16.7ppma the amount of oxygen precipitation increased up to 10.6ppma and the bulk microdefect density increased up to $10.3{\times}10^3/mm^2$, but the depth of the denuded zone decreased to $5.0{\mu}m$

• 대한전자공학회논문지
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• 제18권1호
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• pp.7-19
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• 1981

실리콘 양극산화방법으로 실리콘에서의 불순물 분포를 측정하였다. 전해액으로 Ethylene Glycol-KNO3(0.04N)을 사용하였고, 200V의 전압을 가했을 때 한번의 양극산화에 의하여 삭감되는 실리콘 두께는 웨이퍼 타이프에 관계없이 460±40A이다. Predeposition후의 보론과 아세닉의 분포를 구하였고 이 분포에 의하여 불순물 농도에 따른 확산계수를 계산하였다. 또한 npn트란지스터 구조에서 아세닉 에미터와 브론 베이스간의 상호작용에 의한 베이스 pull-in 현상을 관찰하였다.

• 동력기계공학회지
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• 제4권4호
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• pp.99-107
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• 2000

In this study several P type and N type ceramic semiconductors were prepared by atomic valence control and their electric resistivities were investigated with various concentrations of additive impurities. N-P junctions were made by thin film printing method and their varistor-like characteristics were investigated and their availability was discussed. The results are followings, 1) Some N type semiconductors with a proper concentration of additive impurity have minimum resistivities. 2) The N-P junction samples with ZnO as a constituent material of N type semiconductor have linearity in voltage-current characteristics, but the other N-P junction samples have the non-linearity, 3) Some N-P junction samples showed the good varistor-like characteristics.