• 마이크로전자및패키징학회지
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• 제25권3호
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• pp.37-41
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• 2018

본 논문에서는 UV 임프린트 기반의 평면 광 회로층을 이용한 산소농도 검출용 집적형 형광 프로브 모듈을 제안하였다. 제안된 형광 프로부 모듈은 광원과 형광 신호를 고효율로 전송할 수 있게 동일 광 경로를 가지는 비대칭 $1{\times}2$ 빔 분배기 형태로 설계되었으며, 이를 UV 임프린트 공정을 통해 제작하였다. 제작된 광 회로층의 끝단에 최적의 형광 염료 농도로 센서막을 코팅하여 산소 농도 검출용 광학 프로브 모듈을 구현하였다. 제작된 형광 프로부 모듈을 이용한 산소 농도 측정용 센서 시스템은 0%에서 20%의 가스 농도 범위에서 약 0.3%의 분해능까지 산소 농도를 검출 할 수 있었다. 이러한, 평면 광회로 기반의 형광 프로브 모듈은 저가의 집적형 산소 센서 검출 시스템을 가능하게 하여, 화학분야, 바이오 분야, 그리고 대기 및 수질 환경을 모니터링 하는 분야에 적용될 수 있을 것으로 기대된다.

• 한국생산제조학회지
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• 제18권3호
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• pp.307-314
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• 2009

Large area micro pattern replication has promising application potential in many areas. Rolling imprint process has been demonstrated as one of the most competitive processes for such micro pattern replication, because it has advantages in low cost, high throughput and high efficiency. In this paper, we developed a prototype of roll-to-flat(R2F) thermal imprint system for large area micro pattern replication process, which is one of the key processes in the fabrication of flexible displays. Experimental tests were conducted to evaluate the feasibility of system and the parameters' effect on the process, such as flat mold temperature, loading pressure and rolling speed. 100mm $\times$ 100mm stainless steel flat mold and commercially available polycarbonate sheets were used for the tests. The experimental results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern over large area.

• 한국정밀공학회지
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• 제24권4호
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• pp.153-158
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• 2007

Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권5호
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• pp.223-230
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• 2006

The reliability of imprint patterns molded by stamps for industrial application of nanoimprint lithography (NIL), is an important issue. Usually, defects can be produced by incomplete filling of negative patterns and the shrinkage phenomenon of polymers in conventional NIL. In this paper, the patterns that undergo a varied temperature or varied pressure period during the thermal NIL process have been investigated, with the goal of resolving the shrinkage and defective filling problems of polymers. The effects on the formation of polymer patterns in several profiles of imprint processes are also studied. Consequently, it is observed that more precise patterns are formed by the varied temperature (VT-NIL) or varied pressure (VP-NIL). The NIL (VT-NIL or VP-NIL) process has a free space compensation effect on the polymers in stamp cavities. From the results of the experiments, the polymer's filling capability can be improved. The VT-NIL is merged with the VP-NIL for the better filling property. The patterns that have been imprinted in the merged NIL are compared with the results of conventional NIL. In this study, the improvement in the reliability for results of thermal NIL has been achieved.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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• pp.103.2-103.2
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• 2011

비정질 실리콘 태양전지의 효율을 증가하기 위하여 많이 사용되는 방법 중 하나는 입사되는 빛의 산란을 증가하여 태양전지의 광흡수를 증가시키는 방법이다. 이를 위하여 양극전극으로 사용되는 TCO층의 일정한 패턴 처리를 통하여 광산란을 증가시키는 방법이 사용되고 있다. 본 연구에서는 나노 임프린트 리소그래피방법을 사용하여 Ag 나노로드를 증착한 기판을 제조하고 이를 비정질 실리콘 태양전지에 적용하였다. 실험결과, 그림과 같이 높이와 너비가 300nm 정도로 일정한 패턴의 Ag 나노로드를 제조하였다. 또한, 그 위에 증착된 Si 박막의 경우, 나노로드 전체를 감싸는 돔 형태로 성장하였다. 이와 같은 나노로드 위에 substrate n-i-p 구조의 비정질 박막 태양전지를 증착하고 그 특성변화를 분석하고자 하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1539-1543
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• 2006

We have developed self-aligned imprint lithography (SAIL) technology, an innovative method for roll-to-roll (R2R) fabrication of electronic devices on flexible plastic substrates. In this paper, we present the first R2R-produced ${\alpha}$-Si TFTs built on a polyimide substrate using the SAIL process, and prove the feasibility of this technology to enable R2R fabrication of flexible display active matrix (AM) backplanes with high precision and throughput.

• 한국정밀공학회지
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• 제25권11호
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• pp.100-106
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• 2008

We have studied the characteristic changes of optical device using imprint lithography. An imprinted structure is inherently involved in residual stress due to the temperature and the pressure cycle during fabrication process. A structure with residual stress undergoes stress relaxation, which leads io dimensional change. Therefore, annealing processes was performed to reduce the residual stress of imprinted polymer channel. Reduction of residual stress was confirmed through dimensional change, birefringence, and the mechanical properties. We have fabricated an optical device, and it saw the optical intensity changes within 0.1% for 1 month.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.569-570
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• 2010

• JSTS:Journal of Semiconductor Technology and Science
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• 제1권3호
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• pp.141-157
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• 2001

Highly reliable packaged 64kbit ferroelectric memories with $0.8{\;}\mu\textrm{m}$ CMOS ensuring ten-year retention and imprint at 125^{\circ}C$ have been successfully developed. These superior reliabilities have resulted from steady integration schemes free from the degradation, due to layer stress and attacks of process impurities. The resent results of research and development for ferroelectric memories at Hynix Semiconductor Inc. are summarized in this invited paper.

• 대한기계학회논문집A
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• 제29권9호
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• pp.1169-1174
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. In particular, ultraviolet-nanoimprint lithography (UV-NIL) is applicable to large area imprint easily. We have proposed a new UV-NIL process using an elementwise patterned stamp (EPS), which consists of a number of elements, each of which is separated by channel. Experiments on UV-NIL are performed on an EVG620-NIL using the EPS with 3mm channel width. The replication of uniform sub 70 nm lines using the EPS is demonstrated. We investigate the nonuniformity of residual layer caused by wafer deformation in experiment with varying wafer thickness. Severely deformed wafer works as an obstacle in spreading of dropped resin, which causes nonuniformity of thickness of residual layer. Numerical simulations are conducted to analyze aforementioned phenomenon. Wafer deformation in the process is simulated by using a simplified model, which is a good agreement with experiments.