• Title/Summary/Keyword: ITO pattern

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Outcoupling Enhancement of OLED using Microlens Array and Diffractive Grating (마이크로 렌즈 어레이와 회절격자 레지스트 패턴을 이용한 유기광원(OLED)의 광 추출 효율 향상)

  • Jang, Ji-Hyang;Kim, Kyung-Jo;Kim, Jin-Hun;Oh, Min-Cheol
    • Korean Journal of Optics and Photonics
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    • v.18 no.6
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    • pp.441-446
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    • 2007
  • Outcoupling efficiency of the OLED device is improved by incorporating both a microlens array and a diffractive grating pattern. The microlens array improves the light transmission at the interface of glass and air, and the diffractive grating outcouples the guided mode propagating at the waveguide, which consists of ITO and organic layers. By using the PDMS soft mold imprinting method, the microlens array is fabricated on the glass substrate. The diffractive grating pattern is directly fabricated on the ITO surface by using laser interferometry. A microlens array with a diameter of $10{\mu}m$ improves the light coupling efficiency by 22%. The diffractive grating made of TSMR photoresist enhances the luminance power efficiency by 41% at a current density of $20mA/cm^2$.

Liquid Crystal Driving of Transparent Electrode-Alignment Layer Multifunctional Thin Film by Nano-Wrinkle Imprinting of PEDOT:PSS/MWNT Nanocomposite (PEDOT:PSS/MWNT 나노복합체의 나노주름 임프린팅을 통한 투명전극-배향막 복합 기능 박막의 액정 구동)

  • Jong In Jang;Hae-Chang Jeong
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.16 no.1
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    • pp.8-17
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    • 2023
  • In conventional liquid crystal display(LCD) manufacturing process, Indium Tin Oxide(ITO) as transparent electrode and rubbing process of polyimide as alignment layer are essential process to apply electric field and align liquid crystal molecules. However, there are some limits that deposition of ITO requires high vacuum state, and rubbing process might damage the device with tribolectric discharge. In this paper, we made nanocomposite with PEDOT:PSS and MWNT to replace ITO and constructed alignment layer by nano imprint lithography with nano wrinkle pattern, to replace rubbing process. These replacement made that only one PEDOT:PSS/MWNT film can function as two layers of ITO and polyimide alignment layer, which means simplification of process. Transferred nano wrinkle patterns functioned well as alignment layer, and we found out lowered threshold voltage and shortened response time as MWNT content increase, which is related to increment of electric conductivity of the film. Through this study, it may able to contribute to process simplification, reducing process cost, and suggesting a solution to disadvantage of rubbing process.

Morphology Control of ZnO Nanorods on ITO Substrates in Solution Processes (습식공정 기반 ITO 기판 위 산화아연 나노로드 모폴로지 제어)

  • Shin, Kyung-Sik;Lee, Sam-Dong;Jeong, Soon-Wook;Lee, Sang-Woo;Kim, Sang-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.11
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    • pp.987-991
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    • 2009
  • We report growth of vertically well-aligned zinc oxide (ZnO) nanorods on indium-tin oxide (ITO)/glass substrates using a simple aqueous solution method at low temperature via control of the ZnO seed layer morphology. ZnO nanoparticles acting as seeds are pre-coated on ITO-coated glass substrates. by spin coating to control distribution and density of the ZnO seed nanoparticles. ZnO nanorods were synthesized on the seed-coated substrates in a dipping process into a main growth solution. It was found that the alignment of ZnO nanorods can be effectively manipulated by the spin-coating speed of the seed layer. A grazing incidence X-ray diffraction pattern shows that the ZnO seed layer prepared using the higher spin-coating speed is of uniform seed distribution and a flat surface, resulting in the vertical growth of ZnO nanorods aligned toward the [0001] direction in the main growth process.

ITO Patterning of an In-line Wet Etch/Cleaning System by using a Reverse Moving Control System (반송제어모드를 이용한 인라인 식각/세정장치의 ITO 전극형성기술)

  • Hong, Sung-Jae;Im, Seoung-Hyeok;Han, Hyung-Seok;Kwon, Sang-Jik;Cho, Eou-Sik
    • Journal of Institute of Control, Robotics and Systems
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    • v.14 no.4
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    • pp.327-331
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process as a formation of electrode such as metal or transparent conductive oxide layer. A reverse moving system was equipped in the in-line wet etch/cleaning system for the alternating motion of glass substrate in a wet etch bath of the system. Therefore, it was possible for the glass substrate to be moved back and forth and it was possible to reduce the size of the system by using the reversing moving system. For the effect of the alternating motion of substrate on the etch rate in the in-line wet etch bath, indium tin oxide(ITO) patterns were obtained through wet etch process in the in-line system in which the substrate was moved back and forth. From the CD(critical dimension) skews resulted from the ADI CD and ACI CD of the ITO patterns, it was concluded that the alternating motion of glass substrate are possible to be applied to the mass production of wet etch process.

A Study on Inspection Technology of PDP ITO Defect (PDP ITO 결함 검출기술에 관한 연구)

  • 송준엽;박화영;정연욱;김현종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.191-195
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    • 2003
  • The formation degree of sustain (ITO pattern) decides quality of PDP (plasma display panel). For this reason. it makes efforts in search defects more than 30 ${\mu}{\textrm}{m}$. Now, the existing inspection process is dependent upon naked eye or SEM equipment in off-line PDP manufacturing process. In this study developed prototype inspection system of PDP ITO glass. This system creates information that detects and sorts kind of defect automatically. Design ed inspection technology adopts line-scan method by slip-beam formation for the minimum of inspection time and image processing algorithm is embodied in detection ability of developed system. Designed algorithm had to make good use of kernel matrix which draws up an approach to geometry. A characteristic of area-shaped defects, as pin hole, substance, protrusion et al, are extracted from blob analysis method. Defects, as open, short, spots, et al, are distinguished by line type inspection algorithm. In experiment results, we could have ensured ability of inspection that can be detected with reliability of up to 95% in about 60 seconds

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Stress Distribution of Indium-tin-oxide (ITO) Film on Flexible Substrate by Bending process (Flexible 기판 위의 Bending 처리에 따른 ITO 필름의 Stress 분포 특성)

  • Park, Jun-Back;Hwang, Jeoung-Yeon;Seo, Dae-Shik;Park, Sung-Kyu;Moon, Dae-Gyu;Han, Jeong-In
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.181-184
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    • 2003
  • In this paper, we investigated the position-dependent stress distribution of indium-tin-oxide (ITO) film on Polycarbonate (PC) substrate by external bending force. It was found that there are the maximum crack density at the center position and decreasing crack density as goes to the edge. In accordance with crack distribution, it was observed that the change of electrical resistivity of ITO islands is maximum at the center and decrease as goes to the edge. From the result that crack density is increasing at same island position as face-plate distance (L) decreases, it is evident that the more stress is imposed on same island position as L decreases.

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pH Sensor Application of Printed Indium-Tin-Oxide Nanoparticle Films (Indium-Tin-Oxide 나노입자 인쇄박막의 pH sensor 응용에 대한 연구)

  • Lee, Changhan;Noh, Jaeha;An, Sangsu;Lee, Sangtae;Seo, Dongmin;Lee, Moonjin;Chang, Jiho
    • Journal of Sensor Science and Technology
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    • v.31 no.2
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    • pp.85-89
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    • 2022
  • We investigated a pH sensor using an Indium tin oxide (ITO) nanoparticle (NP) film printed on a flexible substrate. First, the printing precision and mechanical stability of the ITO-printed film were investigated. In particular, the factors that influence the crystallinity of ITO films were studied using X-ray diffraction pattern analysis. The response of the ITO pH sensor was calibrated using a series of standard pH solutions (pH 3-11). The pH values of various specimens were measured using an ITO pH sensor, and the results were compared with those of various pH measurement methods. As a result of the experiment, the maximum error was approximately ± 0.04 pH (0.4 %) at pH 9, which indicated that the ITO pH sensor is highly suitable for pH measurement. Finally, we used the ITO pH sensor to the measure of general specimens such as solvents and beverages and compared the results in comparison with those obtained from several conventional methods.

A Compacted In-line Wet Etch/Cleaning System With a Reverse Moving Control System

  • Im, Seung-Hyeok;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.863-866
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    • 2008
  • For the cost reduction in the fabrication of display panels, a reverse moving system was equipped to a compacted in-line wet etch/cleaning system. For the effect of the alternating movement of substrate on the wet etch process, ITO layers were etched in various moving modes of substrates and the results were compared and analyzed.

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ITO Wet Etch Properties in an In-line Wet Etch/Cleaning System by using an Alternating Movement of Substrate (기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성)

  • Hong, Sung-Jae;Kwon, Sang-Jik;Cho, Eou-Sik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.8
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    • pp.715-718
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process. The system was equipped with a reverse moving system for the reduction in the size of the in-line wet etch/cleaning system and it was possible for the glass substrate to be moved back and forth and alternated in a wet etch bath. For the comparison of the effect of the normal motion and that of the alternating motion on the in-line wet etch process, indium tin oxide(ITO) pattern was obtained through both wet etch process conditions. The results showed that the alternating motion is not inferior to the normal motion in etch rate and in etch uniformity. It is concluded that the alternating motion is possible to be applied to the in-line etch process.

Characteristics of Laser Direct Patterned Indium Tin Oxide Layer by Overlapping Rates of Laser Beam

  • Li, Zhao-Hui;Ahn, Min-Hyung;Choi, Kyung-Min;Im, Seung-Hyeok;Jung, Kyung-Seo;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1496-1499
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    • 2009
  • A diode-pumped Nd:$YVO_4$ laser was used to obtain indium tin oxide (ITO) patterns on glass substrate with various overlapping rates. The results showed that the overlapping rate of laser beam influences on the edge structure of ITO pattern and the surface roughness of ablated groove bottom. At a laser repetition rate of 40 kHz, the optimized condition of overlapping rate was 75 %.

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