• Title/Summary/Keyword: High density plasma

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Effect of Dietary Iron Levels on Lipid Metabolism, Antioxidative and Antithrombogenic Capacities in 16-month-old Rats (식이 철분 수준이 노령흰쥐의 지방대사, 항산화능 및 항혈전능에 미치는 영향)

  • 김순기;박주연;김미경
    • Journal of Nutrition and Health
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    • v.37 no.4
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    • pp.273-280
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    • 2004
  • This study was conducted to examine the effect of dietary iron levels on lipid metabolism, antioxidative and antithrombogenic capacities in 16-month-old rats. Thirty-two Sprague-Dawley male 16-month-old rats weighing 618 $\pm$ 6 g were raised for 10 days with medium-iron diet (35 ppm in diet) and blocked into 4 groups according to their body weights. One of groups was sacrificed to obtain initial data and the rest 3 groups were raised for 3 months with experimental diets containing different levels of iron (5 ppm, 35 ppm, and 350 ppm). Total lipid, triglyceride and total chole-sterol concentrations in plasma and liver, HDL-cholesterol concentration in plasma, fecal total lipid triglyceride and total cholesterol excretions, thiobarbituric acid reactive substances (TBARS) level in plasma LDL + VLDL (low density lipoprotein + very low density lipoprotein) fractions, blood-clotting time and eicosanoids levels in plasma were measured. The results are as follows: Plasma total lipid, triglyceride and total cholesterol concentrations, TBARS level in plasma LDL + VLDL fractions were increased and blood-clotting time tended to be shortened during 3 months of experimental period. Low (5 ppm) iron diet improved lipid metabolism via increasing HDL-cholesterol and fecal choles-terol excretion. High (350 ppm) iron diet decreased plasma total lipid, triglyceride and total cholesterol concentrations as compared to medium (35 ppm) iron diet and lowered body weight and epididymal fat pad weight. On the other hand, TBARS level in plasma LDL + VLDL fractions and blood-clotting time were increased with high iron diet. It is plausible that low iron diet improves lipid metabolism, antioxidative and antithrombogenic capacities in 16-month-old rats.

The influence of Ne-Xe gas mixture ratio on vacuum Ultraviolet and infrared line in AC-PDP

  • Oh, Phil-Y.;Cho, I.R.;Jung, Y.;Park, K.D.;Ahn, J.C.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.743-747
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    • 2003
  • The improvement of luminance and luminous efficiency is the one of the most important part in AC-PDPs. To achieve high luminance and luminous efficiency, high VUV emission efficiency is needed. We measured the emission spectra of vacuum ultraviolet(VUV) and infrared(IR) rays in surface discharge AC-PDP with Ne-Xe mixture gas. The influence of Ne-Xe gas-mixture ratio on resonance state $Xe^{\ast}(3P_{1})$ and exited state $Xe^{\ast}(3P_{2})$ has been investigated. It is found that the intensity of VUV 147nm emission is proportional to that of the IR 828 nm emission, and the VUV 173nm emission is roughly proportional to that of the IR 823nm emission. The electron temperature and plasma density have been experimentally measured from the center of sustaining electrode gap by a micro Langmuir probe in AC-PDPs. The plasma density from the center of sustaining electrode gap are shown to be maximum value of $9{\times}10^{11}cm^{-3}$, where the electron temperature is about 1.6 eV in this experiment

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Analysis of BNNT(Boron Nitride Nano Tube) synthesis by using Ar/N2/H2 60KW RF ICP plasma in the difference of working pressure and H2 flow rate

  • Cho, I Hyun;Yoo, Hee Il;Kim, Ho Seok;Moon, Se Youn;Cho, Hyun Jin;Kim, Myung Jong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.179-179
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    • 2016
  • A radio-frequency (RF) Inductively Coupled Plasma (ICP) torch system was used for boron-nitride nano-tube (BNNT) synthesis. Because of electrodeless plasma generation, no electrode pollution and effective heating transfer during nano-material synthesis can be realized. For stable plasma generation, argon and nitrogen gases were injected with 60 kW grid power in the difference pressure from 200 Torr to 630 Torr. Varying hydrogen gas flow rate from 0 to 20 slpm, the electrical and optical plasma properties were investigated. Through the spectroscopic analysis of atomic argon line, hydrogen line and nitrogen molecular band, we investigated the plasma electron excitation temperature, gas temperature and electron density. Based on the plasma characterization, we performed the synthesis of BNNT by inserting 0.5~1 um hexagonal-boron nitride (h-BN) powder into the plasma. We analysis the structure characterization of BNNT by SEM (Scanning Electron Microscopy) and TEM (Transmission Electron Microscopy), also grasp the ingredient of BNNT by EELS (Electron Energy Loss Spectroscopy) and Raman spectroscopy. We treated bundles of BNNT with the atmospheric pressure plasma, so that we grow the surface morphology in the water attachment of BNNT. We reduce the advancing contact angle to purity bundles of BNNT.

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Spatiotemporal Behavior of the Excited Xe Atom Density in the $1s_5$ Metastable State According to the Hoof-type Electrode Structure in an Alternating-current Plasma Display Pane

  • Kim, Yong-Hee;Hong, Young-June;Choi, Joon-Ho;Cho, Byeong-Seong;Uhm, Han-Sub;Choi, Eun-Ha
    • Journal of Information Display
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    • v.11 no.4
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    • pp.149-153
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    • 2010
  • To improve the luminescence characteristics of high-efficiency alternating-current plasma display panels (AC-PDPs), we developed a new hoof-type electrode structure, and we studied the spatiotemporal behavior of the density of the excited Xenon atom in the $1s_5$ metastable state via laser absorption spectroscopy. Using this structure, the maximum density of the excited Xenon atom per cell was improved by 2.4 times that when the conventional electrode structure was used.

Properties of Electron Temperature and Electron Density in Inductively Coupled Xenon Plasma (유도결합형 제논 플라즈마의 전자온도, 전자밀도 특성)

  • Her, In-Sung;Choi, Gi-Seung;Lee, Jong-Chan;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2418-2420
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    • 2005
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma(ICP). In results at several dependences of $20{\sim}100mTorr$ Xenon pressure, $50{\sim}200W$ RF power and horizontal distribution were especially mentioned. When Xe pressure was 20mTorr and RF power was 200W, the electron temperature and density were respectively 3.58eV and $3.56{\times}10^{12}cm^{-3}$. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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SILICON DIOXIDE FILMS FOR INTERMETAL DIELECTRIC APPLICATIONS DEPOSITED BY AN ECR HIGH DENSITY PLASMA SYSTEM

  • Denison, D.R.;Harshbarger, W.R.
    • Journal of the Korean Vacuum Society
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    • v.4 no.S1
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    • pp.130-137
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    • 1995
  • Deopsition of thermal quality SiO2 using a high density plasma ECR CVD process has been demonstrated to give void and seam free gap fill of high aspect ratio metallization structures with a simple oxygen-silane chemistry. This is achieved by continuous sputter etching of the film during the deposition process. A two-step process is utilized to deposit a composite layer for higher manufacturing efficiency. The first step, which has a deposition rate of approximately 0.5 $\mu$m/min., is used to provide complete gap fill between the metal lines. The second step, which has a deposition rate of up to 1.5 $\mu$m/min., is used to deposit a total thickness of 2.0$\mu$m for the intermetal dielectric film. The topography of this composite film is very compatible with subsequent chemicl mechanical polishing(CMP) planarization processing.

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Visualization of weld plume using high-speed holography (고속 홀로그래피에 의한 용접 플룸 거동의 가시화)

  • 백성훈;박승규;김민석;정진만;김철중
    • Journal of Welding and Joining
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    • v.17 no.1
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    • pp.71-76
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    • 1999
  • The real-time holographic interferometer with digital high-speed camera is applied to the experimental study of laser induced plasma/plume in pulsed Nd:YAG laser welding. A pulsed Nd:YAG laser with 1.2 kW average power is applied to generate laser induced plume. The recording speed of the high-speed camera is 3,000 f/s. The high speed photographs of weld plume without another visualization method, are compared with the visualization photographs with holographic interferometer. The radiation intensity from the laser induced plume is recorded by the high speed photographs, which fluctuated during laser radiation and disappeared after laser end. The density distribution of the plume is recorded by the holographic visualization method. The experimental results show the process of generation of the laser induced plasma/plume, and give the feasibility of quantitative measurement of laser induced plume in laser welding.

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Large Area Plasma Characteristics using Internal Linear ICP (Inductively Coupled Plasma) Source for the FPD processing

  • Kim, Kyong-Nam;Lim, Jong-Hyeuk;Yeom, Geun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.544-547
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    • 2006
  • In this study, the characteristics of large area internal linear ICP sources of $1,020mm{\times}920mm$ (substrate area is $880mm{\times}660mm$) were investigated using a multiple linear antennas with U-type parallel connection. Using the multiple linear antennas with U-type parallel connection, a high plasma density of $2{\times}10^{11}/cm^3$ and a high power transfer efficiency of about 88% could be obtained at 5kW of RF power and with 20mTorr Ar. A low plasma potential of less than 26V and a low electron temperature of $2.6{\sim}3.2eV$ could be also obtained. The measured plasma uniformity on the substrate size of 4th generation $(880mm{\times}660mm)$ was about 4%, therefore, it is believed that the multiple linear antennas with U-type parallel connection can be successfully applicable to the large area flat panel display processing.

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GaN Dry Etching Characteristics using a planar Inductively coupled plasma (평판형 유도 결합 플라즈마틀 이용한 GaN 건식 식각 특성)

  • Kim, Moon-Young;Kim, Tae-Hyun;Jang, Sang-Hun;Tae, Heung-Sik
    • Proceedings of the KIEE Conference
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    • 1997.11a
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    • pp.276-278
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    • 1997
  • The reliable etching process is one of the essential steps in fabricating GaN based-device. High etch rate is needed to obtain a deeply etched structure and perfect anisotropic etched facet is needed to obtain lasing profile. In the research, therefore, we had proposed a planar inductively coupled plasma etcher (Planar ICP Etcher) as a high density plasma source, and studied the etching mechanism using the $CH_4/H_2$/Ar gas mixture. Dry etching characteristics such as etch rate, anisotropic etching profile and so on, for the III-V nitride layers were investigated using Planar ICP Etcher, based on the plasma characteristic as a variation of plasma process parameters.

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Plasma spectroscopy aimed at quantifying the flame equivalence ratio (화염의 정성적 당량비 측정을 위한 Plasma Diagnostics에 관한 연구)

  • Lee, SeokHwan;Yoh, Jai-ick
    • 한국연소학회:학술대회논문집
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    • 2013.06a
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    • pp.99-101
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    • 2013
  • The equivalence ratio is measured by LIBS(Laser-induced Breakdown spectroscopy) in hydrocarbon flame and high temperature (${\sim}3200^{\circ}C$) oxyhydrogen flame, where a stoichiometric mixture of hydrogen and oxygen is produced from water through electrolysis. The ratio of the hydrogen and oxygen (H/O) atomic lines intensities is used for quantitatively determining the quivalence ratio. laser energy is evaluated for determining the optimal condition for plasma diagnostics. The minimum laser energy for generating plasma in a laminar premixed hydrocarbon flame was about 70 mJ, whereas oxyhydrogen flame. consequently the irradiated spot of a lower density in high temperature oxyhydrogen flame gave rise to bigger plasma in size, thus limiting the spatial resolution of the LIBS measurement.

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