• Title/Summary/Keyword: Hall-effect

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Thermal and Mechanical Properties of ZrB2-SiC Ceramics Fabricated by Hot Pressing with Change in Ratio of Submicron to Nano Size of SiC (서브마이크론/나노 크기의 SiC 비율변화에 따른 ZrB2-SiC 세라믹스의 열적, 기계적 특성)

  • Kim, Seongwon;Chae, Jung-Min;Lee, Sung-Min;Oh, Yoon-Suk;Kim, Hyung-Tae
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.410-415
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    • 2013
  • $ZrB_2$-SiC ceramics are fabricated via hot pressing with different ratios of submicron or nano-sized SiC in a $ZrB_2$-20 vol%SiC system, in order to examine the effect of the SiC size ratio on the microstructures and physical properties, such as thermal conductivity, hardness, and flexural strength, of $ZrB_2$-SiC ceramics. Five different $ZrB_2$-SiC ceramics ($ZrB_2$-20 vol%[(1-x)SiC + xnanoSiC] where x = 0.0, 0.2, 0.5, 0.8, 1.0) are prepared in this study. The mean SiC particle sizes in the sintered bodies are highly dependent on the ratio of nano-sized SiC. The thermal conductivities of the $ZrB_2$-SiC ceramics increase with the ratio of nano-sized SiC, which is consistent with the percolation behavior. In addition, the $ZrB_2$-SiC ceramics with smaller mean SiC particle sizes exhibit enhanced mechanical properties, such as hardness and flexural strength, which can be explained using the Hall-Petch relation.

Fabrication and characterization of n-IZO / p-Si and p-ZnO:(In, N) / n-Si thin film hetero-junctions by dc magnetron sputtering

  • Dao, Anh Tuan;Phan, Thi Kieu Loan;Nguyen, Van Hieu;Le, Vu Tuan Hung
    • Journal of IKEEE
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    • v.17 no.2
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    • pp.182-188
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    • 2013
  • Using a ceramic target ZnO:In with In doping concentration of 2%, hetero-junctions of n-ZnO:In/p-Si and p-ZnO:(In, N)/n-Si were fabricated by depositing Indium doped n - type ZnO (ZnO:In or IZO) and Indium-nitrogen co-doped p - type ZnO (ZnO:(In, N)) films on wafers of p-Si (100) and n-Si (100) by DC magnetron sputtering, respectively. These films with the best electrical and optical properties were then obtained. The micro-structural, optical and electrical properties of the n-type and p-type semiconductor thinfilms were characterized by X-ray diffraction (XRD), RBS, UV-vis; four-point probe resistance and room-temperature Hall effect measurements, respectively. Typical rectifying behaviors of p-n junction were observed by the current-voltage (I-V) measurement. It shows fairly good rectifying behavior with the fact that the ideality factor and the saturation current of diode are n=11.5, Is=1.5108.10-7 (A) for n-ZnO:In/p-Si hetero-jucntion; n=10.14, Is=3.2689.10-5 (A) for p-ZnO:(In, N)/n-Si, respectively. These results demonstrated the formation of a diode between n-type thin film and p-Si, as well as between p-type thin film and n-Si..

Development and Performance Test of DC Smart Metering System for the DC Power Measurement of Urban Railway (도시철도 직류 전력량 계측을 위한 직류용 스마트미터링 시스템 개발 및 성능시험)

  • Jung, Hosung;Shin, Seongkuen;Kim, Hyungchul;Park, Jongyoung
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.63 no.5
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    • pp.713-718
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    • 2014
  • DC urban railway power system consists of DC power network and AC power network. The DC power network supplies electric power to railway vehicles and the AC power network supplies electric power to station electric equipment. Recently, because of power consumption reduction and peak load shaving, intelligent measurement of regenerative energy and renewable energy adapted on DC urban railway is required. For this reason, DC smart metering system for DC power network shall be developed. Therefore, in this paper, DC voltage sensor, current sensor, and DC smart meter were developed and evaluated by performance test. DC voltage sensor was developed for measuring standard voltage range of DC urban railway, and DC current sensor was developed as hall effect split core type in order to install in existing system. DC smart meter possesses function of general intelligent electric power meter, such as measuring electricity and wireless communication etc. And, DC voltage sensor showed average 0.17% of measuring error for 2,000V/50mA, and current sensor showed average 0.21% of measuring error for ${\pm}2,000V/{\pm}4V$ in performance test. Also DC smart meter showed maximum 0.92% of measuring error for output of voltage sensor and current sensor. In similar environment for real DC power network, measuring error rate was under 0.5%. In conclusion, accuracy of DC smart metering system was confirmed by performance test, and more detailed performance will be verified by further real operation DC urban railway line test.

Initial Pole Position Estimation Algorithm of a Z-Axis PMLSM (Z축 선형 영구자석 동기전동기의 초기 자극위치 추정 알고리즘)

  • Lee, Jin-Woo
    • The Transactions of the Korean Institute of Power Electronics
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    • v.13 no.1
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    • pp.41-45
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    • 2008
  • This paper deals with the estimation method on the initial pole position of a z-axis permanent magnet linear synchronous motor(PMLSM) without magnetic pole sensors such as Hall sensors. The proposed method takes account of the gravitational force at z-axis and also the load conditions. The algorithm consists of two steps. The first step is to approximately estimate the initial q-axis by monitoring the movements due to the test current at predefined different test q-axes. The second step is to estimate the real q-axis as accurately as possible by using the outputs corresponding to torques due to the test current at three different test q-axes in order to avoid the effect of load mass variations. Experimental results on the z-axis PMLSM show good estimation characteristics of the proposed method irrespective of load mass conditions.

The Properties of Atomic Layer Deposited Al-Doped ZnO Films Using H2O and O3 As Oxidants (H2O, O3 반응기체로 원자층 증착된 Al-doped ZnO 박막의 특성)

  • Kim, Min Yi;Cho, Young Joon;Chang, Hyo Sik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.10
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    • pp.652-657
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    • 2015
  • We have investigated the properties of Al-doped ZnO (AZO) thin films as functions of atomic layer deposition (ALD) oxidants. AZO transparent conducting oxides (TCOs) layer was deposited by ALD with adding trimethylaluminum (TMA) and diethylzinc (DEZn). AZO films were deposited at low temperature with $H_2O$ and $O_3$ as oxidants. Electrical, optical and structural properties of AZO thin films were investigated by 4-point probe, Hall effect measurement, UV-VIS, and AFM. Microstructure and atomic bonding states were investigated by HRXRD and XPS. The resistivity of AZO films grown using $H_2O$ was lower than the films grown using $H_2O$ and $O_3$, by approximately two orders of magnitude. The differences in oxygen vacancy peak intensity of AZO films were correlated to the optical and electrical properties.

Study on Thermoelectric Properties of Cu Doping of Pulse-Electrodeposited n-type Bi2(Te-Se)3 Thin Films (펄스 전기도금법에 의해 제조된 n형 Bi2(Te-Se)3 박막의 Cu 도핑에 따른 열전특성에 관한 연구)

  • Heo, Na-Ri;Kim, Kwang-Ho;Lim, Jae-Hong
    • Journal of Surface Science and Engineering
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    • v.49 no.1
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    • pp.40-45
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    • 2016
  • Recently, $Bi_2Te_3$-based alloys are the best thermoelectric materials near to room temperature, so it has been researched to achieve increased figure of merit(ZT). Ternary compounds such as Bi-Te-Se and Bi-Sb-Te have higher thermoelectric property than binary compound Bi-Te and Sb-Te, respectively. Compared to DC plating method, pulsed electrodeposition is able to control parameters including average current density, and on/off pulse time etc. Thereby the morphology and properties of the films can be improved. In this study, we electrodeposited n-type ternary Cu-doped $Bi_2(Te-Se)_3$ thin film by modified pulse technique at room temperature. To further enhance thermoelectric properties of $Bi_2(Te-Se)_3$ thin film, we optimized Cu doping concentration in $Bi_2(Te-Se)_3$ thin film and correlated it to electrical and thermoelectric properties. Thus, the crystal, electrical, and thermoelectric properties of electrodeposited $Bi_2(Te-Se)_3$ thin film were characterized the XRD, SEM, EDS, Seebeck measurement, and Hall effect measurement, respectively. As a result, the thermoelectric properties of Cu-doped $Bi_2(Te-Se)_3$ thin films were observed that the Seebeck coefficient is $-101.2{\mu}V/K$ and the power factor is $1412.6{\mu}W/mK^2$ at 10 mg of Cu weight. The power factor of Cu-doped $Bi_2(Te-Se)_3$ thin film is 1.4 times higher than undoped $Bi_2(Te-Se)_3$ thin film.

Growth and temperature dependence of energy band gap for $CuGaSe_2$ Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $CuGaSe_2$ 단결정 박막의 성장과 에너지 밴드갭의 온도 의존성)

  • Lee, Sang-Youl;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.97-98
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    • 2007
  • A stoichiometric. mixture of evaporating materials for $CuGaSe_2$ single crystal thin films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuGaSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.615\;{\AA}$ and $11.025\;{\AA}$, respectively. To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuGaSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $4.87{\times}10^{17}\;cm^{-3}$ and $129\;cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;=\;1.7998\;eV\;-\;(8.7489\;{\times}\;10^{-4}\;eV/K)T^2/(T\;+\;335\;K)$.

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Electrical Properties of V-I Curve of p-ZnO:Al/n-ZnO:Al Junction Fabricate by RF Magnetron Sputtering

  • Jin, Hu-Jie;So, Soon-Jin;Song, Min-Jong;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.408-409
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    • 2007
  • Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ by RF magnetron sputtering. Target was ZnO ceramic mixed with 2wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}\;to\;4.04{\times}10^{18}cm^{-3}$, mobilities from 0.194 to $2.3cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4{\Omega}cm$. P-type sample has density of $5.40cm^{-3}$ which is smaller than theoretically calculated value of $5.67cm^{-3}$. XPS spectra show that O1s has O-O and Zn-O structures and A12p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

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Effects of epilayer growth temperature on properties of undoped GaN epilayer on sapphire substrate by two-step MOCVD (2단계 MOCVD법에 의해 사파이어 기판 위 성장된 undoped GaN 에피박막의 특성에 미치는 고온성장 온도변화의 영향)

  • Chang K.;Kwon M. S.;Cho S. I.
    • Journal of the Korean Vacuum Society
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    • v.14 no.4
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    • pp.222-228
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    • 2005
  • Undoped GaN epitaxial layer was grown on c-plane sapphire substrate by a two-step growth with metalorganic chemical vapor deposition(MOCVD). We have investigated the effects of the variation of final growth temperature on surface morphology, roughness, crystal quality, optical property, and electrical property In a horizontal MOCVD reactor, the film was grown at 300 Tow low-pressure with a fixed nucleation temperature of $500^{\circ}C$, varing the final growth temperature from $850\~1050^{\circ}C$ . The undoped GaN epilayers were characterized by atomic force microscopy, high-resolution x-ray diffractometer, photoluminescence, and Hall effect measurement.

Co-sputtering법으로 제작된 화합물 반도체 박막형 태양전지에서 $CuInSe_2$(CIS) 광흡수층의 열처리 효과

  • Kim, Hae-Jin;Lee, Hye-Ji;Son, Seon-Yeong;Park, Seung-Hwan;Kim, Hwa-Min;Hong, Jae-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.269-269
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    • 2010
  • 현재 화석연료의 부족으로 인한 에너지 수급의 불균형, 자연환경의 파괴로 인해 대체에너지 개발이 절실히 요구되고 있다. 이러한 문제점을 극복하기 위한 방안으로 태양전지에 대한 관심이 높아지고 있다. 기존 결정형 실리콘 태양전지와 비교해 화합물 반도체를 기반으로 한 박막형 태양전지는 친환경적인 제품이면서 제조원가를 절감시킬 수 있고, 반영구적인 수명 및 값싼 기판을 활용할 수 있는 장점으로 인해 활발한 연구가 진행되고 있다. 본 실험에서는 Co-sputtering법으로 제작된 $CuInSe_2$(CIS)를 광활성층으로 한 박막형 태양전지에서 실온 ${\sim}550^{\circ}C$의 다양한 온도에서 후열 처리된 CIS 박막들의 전기적, 구조적, 광학적인 특성들을 분석하였다. 제작된 박막들 가운데 Hall Effect 측정결과 $550^{\circ}C$에서 후열 처리된 박막이 가장 높은 1.227E+22(/$cm^3$)의 캐리어 농도와 1.581(cm/$V{\cdot}s$)의 홀 이동도를 가지며, 3.092E-4(${\Omega}{\cdot}cm$)의 가장 낮은 비저항 값을 갖는 것으로 나타났다. EFM 측정결과 열처리 하지 않은 박막에 비해 후열처리된 CIS 박막의 전도성이 전체적으로 높아졌다. 특히, $550^{\circ}C$에서 후열 처리된 박막의 표면은 전체적으로 전기 전도성이 높은 결정립들이 골고루 분포하며 가장 높은 표면 포텐셜 에너지 값을 갖는 것으로 나타났다. 박막들의 구조적 특성을 분석하기 위해 SEM과 XRD를 측정한 결과, $350^{\circ}C$에서 후열 처리된 박막들은 열처리 되지 않은 박막과 비교해 표면형상 변화가 일어났으며, $550^{\circ}C$에서 후열 처리된 CIS 박막들은 $CuInSe_2$(112) 방향이 향상된 chalcopyrite-like 구조를 가지면서 박막 밀도가 높고 결정립의 크기가 증가된 것을 확인하였다. 이는 박막 성장시 기판온도의 상승으로 CIS 박막 내에서 셀레늄의 확산과 상호작용으로 3원 화합물이 재결정화되어 구조적인 특성향상에 기여하였기 때문이다. 결론적으로 본 연구는 CIS 광활성층에서 후열 처리의 효과들 뿐만아니라 박막 증착시 co-sputtering법을 이용함으로써 증착시간의 감소 및 대면적화와 대량생산으로도 적용 가능함을 제시하고자 한다.

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