• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.104-104
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• 2010

현재 디스플레이 시장은 급변하게 변화하고 있다. 특히, 비정질 실리콘의 경우 디스플레이의 채널층으로 주로 상용화되어 왔다. 비정질 실리콘 기반의 박막 트랜지스터는 제작의 경제성 및 균일성을 가지고 있어서 널리 상용화되고 있다. 하지만 비정질 실리콘의 경우 낮은 전자 이동도(< $1\;cm^2/Vs$)로 인하여 디스플레이의 대면적화에 부적합하며, 광학적으로 불투명한 특성을 갖기 때문에 차세대 디스플레이의 응용에 불리한 점이 있다. 이런 문제점의 대안으로 현재 국내외 여러 연구 그룹에서 산화물 기반의 반도체를 박막 트랜지스터의 채널층으로 사용하려는 연구가 진행중이다. 산화물 기반의 반도체는 밴드갭이 넓어서 광학적으로 투명하고, 상온에서 증착이 가능하며, 비정질 실리콘에 비해 월등히 우수한 이동도를 가짐으로 디스플레이의 대면적화에 유리하다. 특히 Zinc Oxide, Tin Oxide, Titanum Oxide등의 산화물이 연구되고 있으며, indium이나 aluminum등을 첨가하여 전기적인 특성을 향상시키려는 노력을 보이고 있다. Tin oxide의 경우 천연적으로 풍부한 자원이며, 낮은 가격이 큰 이점으로 작용을 한다. 또한, $SnO_2$의 경우 ITO나 ZnO 열적으로 화학적 과정에서 더 안정하다고 알려져 있다. 본 연구에서는 $SnO_2$ 기반의 박막 트랜지스터를 DC magnetron sputtering를 이용하여 상온에서 제작을 하였다. 일반적으로, $SnO_2$의 경우 증착 과정에서 산소 분압 조절과 oxygen vacancy 조절를 통하여 박막의 전도성을 조절할 수 있다. 이렇게 제작된 $SnO_2$의 박막을 High-resolution X-ray diffractometer, photoluminescence spectra, Hall effect measurement를 이용하여 전기적 및 광학적 특성을 알 수 있다. 그리고 후열처리 통하여 박막의 전기적 특성 변화를 확인하였다. gate insulator의 처리를 통하여 thin film의 interface의 trap density를 감소시킴으로써 소자의 성능 향상을 시도하였다. 그리고 semiconductor analyzer로 소자의 출력 특성 및 전이 특성을 평가하였다. 그리고 Temperature, Bias Temperature stability, 경시변화 등의 다양한 조건에서의 안정성을 평가하여 안정성이 확보된다면 비정질 실리콘을 대체할 유력한 후보 중의 하나가 될 것이라고 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.389-389
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• 2012

Molybdenum is one of the most important materials used as a back ohmic contact for $Cu(In,Ga)(Se,S)_2$ (CIGS) solar cells because it has good electrical properties as an inert and mechanically durable substrate during the absorber film growth. Sputter deposition is the common deposition process for Mo thin films. Molybdenum thin films were deposited on soda lime glass (SLG) substrates using direct-current planar magnetron sputtering technique. The outdiffusion of Na from the SLG through the Mo film to the CIGS based solar cell, also plays an important role in enhancing the device electrical properties and its performance. The structure, surface morphology and electrical characteristics of Mo thin films are generally dependent on deposition parameters such as DC power, pressure, distance between target and substrate, and deposition temperature. The aim of the present study is to show the resistivity of Mo layers, their crystallinity and morphologies, which are influenced by the substrate temperature. The thickness of Mo films is measured by Tencor-P1 profiler. The crystal structures are analyzed using X-ray diffraction (XRD: X'Pert MPD PRO / Philips). The resistivity of Mo thin films was measured by Hall effect measurement system (HMS-3000/0.55T). The surface morphology and grain shape of the films were examined by field emission scanning electron microscopy (FESEM: Hitachi S-4300). The chemical composition of the films was obtained by the energy dispersive X-ray spectroscopy (EDX). Finally the optimum substrate temperature as well as deposition conditions for Mo thin films will be developed.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.10
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• pp.5115-5122
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• 2013

This paper has studied about the development and application of landslide collapse prediction real-time monitoring system based on USN to detect and measure the collapse of landslide. The rainfall measuring sensor, gap water pressure sensor, indicator displacement measuring sensor, index inclination sensor, water content sensor and image analysis sensor are selected and these are applied on the test bed. Each sensor's operation and performance for reliability verification is tested by the instrument which is installed in the field. As the result, u-IT based real-time landslide monitoring system which is developed by this research for landslide collapse detection could minimize life and property damages because it makes advance evacuation with collapse risk pre-estimate through real-time monitoring on roadside cut and bedrock slopes. This system is based on the results of this study demonstrate the effect escarpment plan are spread throughout.

• Journal of IKEEE
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• v.17 no.2
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• pp.182-188
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• 2013

Using a ceramic target ZnO:In with In doping concentration of 2%, hetero-junctions of n-ZnO:In/p-Si and p-ZnO:(In, N)/n-Si were fabricated by depositing Indium doped n - type ZnO (ZnO:In or IZO) and Indium-nitrogen co-doped p - type ZnO (ZnO:(In, N)) films on wafers of p-Si (100) and n-Si (100) by DC magnetron sputtering, respectively. These films with the best electrical and optical properties were then obtained. The micro-structural, optical and electrical properties of the n-type and p-type semiconductor thinfilms were characterized by X-ray diffraction (XRD), RBS, UV-vis; four-point probe resistance and room-temperature Hall effect measurements, respectively. Typical rectifying behaviors of p-n junction were observed by the current-voltage (I-V) measurement. It shows fairly good rectifying behavior with the fact that the ideality factor and the saturation current of diode are n=11.5, Is=1.5108.10-7 (A) for n-ZnO:In/p-Si hetero-jucntion; n=10.14, Is=3.2689.10-5 (A) for p-ZnO:(In, N)/n-Si, respectively. These results demonstrated the formation of a diode between n-type thin film and p-Si, as well as between p-type thin film and n-Si..

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.10
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• pp.652-657
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• 2015

We have investigated the properties of Al-doped ZnO (AZO) thin films as functions of atomic layer deposition (ALD) oxidants. AZO transparent conducting oxides (TCOs) layer was deposited by ALD with adding trimethylaluminum (TMA) and diethylzinc (DEZn). AZO films were deposited at low temperature with $H_2O$ and $O_3$ as oxidants. Electrical, optical and structural properties of AZO thin films were investigated by 4-point probe, Hall effect measurement, UV-VIS, and AFM. Microstructure and atomic bonding states were investigated by HRXRD and XPS. The resistivity of AZO films grown using $H_2O$ was lower than the films grown using $H_2O$ and $O_3$, by approximately two orders of magnitude. The differences in oxygen vacancy peak intensity of AZO films were correlated to the optical and electrical properties.

• Journal of the Korean Vacuum Society
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• v.14 no.4
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• pp.222-228
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• 2005

Undoped GaN epitaxial layer was grown on c-plane sapphire substrate by a two-step growth with metalorganic chemical vapor deposition(MOCVD). We have investigated the effects of the variation of final growth temperature on surface morphology, roughness, crystal quality, optical property, and electrical property In a horizontal MOCVD reactor, the film was grown at 300 Tow low-pressure with a fixed nucleation temperature of $500^{\circ}C$, varing the final growth temperature from $850\~1050^{\circ}C$ . The undoped GaN epilayers were characterized by atomic force microscopy, high-resolution x-ray diffractometer, photoluminescence, and Hall effect measurement.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.197-197
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• 2010

본 연구에서는 RF/DC dual 마그네트론 스퍼터 시스템을 이용하여 Glass 기판 상에 유기태양전지용 Nb-doped $TiO_2$ (NTO)/Ag/NTO 다층 투명전극을 성막하고 이 다층 투명전극을 $200^{\circ}C{\sim}700^{\circ}C$ 온도 범위에서 급속 열처리 (Rapid Thermal Annealing ; RTA)를 통하여 전기적, 광학적, 구조적 및 표면의 특성 변화를 연구하였다. Hall effect measurement, UV-Vis spectrometer, FESEM 분석을 통하여 다층투명전극의 전기적, 광학적, 표면분석을 하였고 Synchrotron 분석을 통하여 온도에 따른 구조변화를 분석하였다. 상온에서 성막된 다층투명전극은 30nm 두께의 NTO 박막 사이에 얇은 9nm의 얇은 Ag 층을 삽입한 구조로써 10ohm/square 이하의 매우 낮은 면저항과 ${\sim}10^{-5}\;ohm-cm$ 의 비저항, Anti-reflection 효과에 의해 85% 이상의 높은 광투과성을 나타내었다. RTA 온도가 증가함에 따라 전기적, 광학적 특성은 약간 향상되었고 비정질 구조를 유지함을 알 수 있었다. 그러나 높은 온도범위에서는 비정질 구조에서 Anatase 상으로 결정구조가 변화함을 알 수 있었고 전기적, 광학적 특성이 감소됨을 알 수 있었다. NTO/Ag/NTO 다층 투명전극을 유기태양전의 Anode로 적용하여 특성을 비교한 결과 RTA 온도가 증가함에 따라 유기태양전지의 효율 또한 증가하였고 최적화된 온도 조건에서 2.49% 의 높은 효율을 얻을 수 있었다. 이를 통해 우수한 특성을 나타내는 NTO/Ag/NTO 다층투명전극이 기존의 디스플레이 및 태양전지 등의 투명전극 재료로 주로 사용되어 온 ITO (Indium Tin Oxide) 를 대체 할 수 있는 재료로써의 가능성을 제시하였다.

• Korean Journal of Materials Research
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• v.25 no.3
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• pp.125-131
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• 2015

Fluorine-doped $SnO_2$ (FTO) thin film/Ag nanowire (NW) double layers were fabricated by means of spin coating and ultrasonic spray pyrolysis. To investigate the optimum thickness of the FTO thin films when used as protection layer for Ag NWs, the deposition time of the ultrasonic spray pyrolysis process was varied at 0, 1, 3, 5, or 10 min. The structural, chemical, morphological, electrical, and optical properties of the double layers were examined using X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, transmission electron microscopy, the Hall effect measurement system, and UV-Vis spectrophotometry. Although pure Ag NWs formed isolated droplet-shaped Ag particles at an annealing temperature of $300^{\circ}C$, Ag NWs covered by FTO thin films maintained their high-aspect-ratio morphology. As the deposition time of the FTO thin films increased, the electrical and optical properties of the double layers degraded gradually. Therefore, the double layer fabricated with FTO thin films deposited for 1 min exhibited superb sheet resistance (${\sim}14.9{\Omega}/{\Box}$), high optical transmittance (~88.6 %), the best FOM (${\sim}19.9{\times}10^{-3}{\Omega}^{-1}$), and excellent thermal stability at an annealing temperature of $300^{\circ}C$ owing to the good morphology maintenance of the Ag NWs covered by FTO thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.4
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• pp.256-261
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• 2021

Indium-doped Mg_0.05Zn_0.95O thin films were deposited on glass substrates by a sol-gel method. Three types of indium precursors such as indium chloride, indium acetate, and indium nitrate were used as doping sources. Physical properties of fabricated thin films were analyzed through XRD (x-ray diffraction), UV-vis spectrophotometer, Hall effect measurement, and EDS (energy dispersive x-ray spectroscopy). All In-doped thin films grown in this study exhibited a preferred orientation of (002) with over 80% transmittance. The results showed that the Mg_0.05Zn_0.95O thin film from indium chloride as the indium precursor has higher crystallinity and transmittance with lower resistivity when compared with those from other indium precursors.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.83-83
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• 2003

The stochiometric mix of evaporating materials for the CuInSe$_2$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, CuInSe$_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were 62$0^{\circ}C$ and 41$0^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of CuInSe$_2$ single crystal thin films measured from Hall effect by van der Pauw method are 9.62$\times$10$^{16}$ cm$^{-3}$ , 296 $\textrm{cm}^2$/V.s at 293 K, respectively From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the CuInSe$_2$ single crystal thin film, we have found that the values of spin orbit splitting ΔSo and the crystal field splitting ΔCr were 6.1 meV and 175.2 meV at 10 K, respectively. From the photoluminescence measurement on CuInSe$_2$ single crystal thin film, we observed free excition (Ex) existing only high quality crystal and neutral bound exiciton (D$^{\circ}$,X) having very strong peak intensity. Then, the full-width-at -half-maximum(FWHM) and binding energy of neutral donor bound excition were 7 meV and 5.9 meV, respectivity. By Haynes rule, an activation energy of impurity was 59 meV.