The effect of UV/O$_3$ and HF cleaning on the removal of metallic impurity and on the gate-oxide properties
($UV/O_3$ 과 HF 세정이 금속불순물 제거와 gate 산화막 특성에 미치는 영향)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1996.05a
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- pp.75-75
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- 1996