• JSTS:Journal of Semiconductor Technology and Science
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• 제6권3호
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• pp.154-161
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• 2006

This paper describes the new types of ngative differential resistance (NDR) IC applications which use a monolithic quantum-effect device technology based on the RTD/HBT heterostructure design. As a digital IC, a low-power/high-speed MOBILE (MOnostable-BIstable transition Logic Element)-based D-flip flop IC operating in a non-return-to-zero (NRZ) mode is proposed and developed. The fabricated NRZ MOBILE D-flip flop shows high speed operation up to 34 Gb/s which is the highest speed to our knowledge as a MOBILE NRZ D-flip flop, implemented by the RTD/HBT technology. As an analog IC, a 14.75 GHz RTD/HBT differential-mode voltage-controlled oscillator (VCO) with extremely low power consumption and good phase noise characteristics is designed and fabricated. The VCO shows the low dc power consumption of 0.62 mW and good F.O.M of -185 dBc/Hz. Moreover, a high-speed CML-type multi-functional logic, which operates different logic function such as inverter, NAND, NOR, AND and OR in a circuit, is proposed and designed. The operation of the proposed CML-type multi-functional logic gate is simulated up to 30 Gb/s. These results indicate the potential of the RTD based ICs for high speed digital/analog applications.

• 한국전기전자재료학회논문지
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• 제17권9호
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• pp.916-923
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• 2004

In this paper, the strained Si$_{0.9}$Ge$_{0.1}$ epitaxial layers grown by a reduced pressure chemical vapor deposition (RPCVD) on Si (100) were characterized by Rutherford backscattering spectrometery (RBS) for the fabrication of an SiGe heterojunction bipolar transistor(HBT). RBS spectra of the ${Si}_0.9{Ge}_0.1$epitaxial layers grown on the Si substrates which were implanted with the phosphorus (P) ion and annealed at a temperature between $850^{\circ}C$ - $1000^{\circ}C$ for 30min were analyzed to investigate the post thermal annealing effect on the grown${Si}_0.9{Ge}_0.1$epitaxial layer quality. Although a damage of the substrates by P ion-implantation might be cause of the increase of RBS yield ratios, but any defects such as dislocation or stacking fault in the grown ${Si}_0.9{Ge}_0.1$ epitaxial layer were not found in transmission electron microscope (TEM) photographs. The post high temperature rapid thermal annealing (RTA) effects on the crystalline quality of the ${Si}_0.9{Ge}_0.1$ epitaxial layers were also analyzed by RBS. The changes in the RBS yield ratios were negligible for RTA a temperature between $900^{\circ}C$ - $1000^{\circ}C$for 20 sec, or $950^{\circ}C$for 20 sec - 60 sec. A SiGe HBT array shows a good Gummel characteristics with post RTA at $950^{\circ}C$ for 20 sec.sec.sec.

• 한국전자파학회논문지
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• 제18권2호
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• pp.177-182
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• 2007

본 논문은 InGaP/GaAs HBT 공정을 통해 제작한 적응성궤환 잡음제거시스템용 낮은 위상잡음을 갖는 LC 차동 전압제어 발진기를 제안합니다. 전압제어 발진기는 필터링 기술을 포함한 향상된 공진 탱크 구조를 갖습니다. 비대칭 인덕터 대칭 캐패시터 구조로 제안된 전압제어 발진기의 출력 가변 범위는 207 MHz입니다. 출력 전력은 balun과 케이블 손실을 포함하여 -6.68 dBm입니다. 10 kHz, 100 kHz, 1 MHz에서의 위상잡음은 각각 -102.02, -112.04 그리고 -130.4 dBc/Hz입니다. 이 전압제어 발진기는 총 $0.9{\times}0.9mm^2$ 면적 내에 집적화되었습니다.

• 한국통신학회논문지
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• 제33권1A호
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• pp.85-90
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• 2008

Emitter degeneration에 의한 band SiGe HBT 이중 평형형 상향 주파수 혼합기의 선형성 개선 효과를 비교하였다. 시뮬레이션을 통해 출력 전력과 변환 이득을 동시에 고려하여 degeneration 저항값을 최적화 시켰으며 이를 $0.35{\mu}m$ Si-BiCMOS 공정을 이용하여 제작하였다. 제작 및 측정 결과, -5 dBm의 8.0 GHz LO 신호 및 100 MHz의 IF 신호 입력 시, degeneration 저항이 없는 상향 주파수 혼합기는 15.5 dB의 선형 변환 이득과 -13 dBm의 RF 출력 전력 및 3.7 dBm의 $OIP_3$를 나타내었고, degeneration 저항을 사용한 상향 주파수 혼합기는 9 dB의 선형 변환 이득과 -10 dBm의 RF 출력 전력 및 8.7 dBm의 $OIP_3$를 각각 나타내었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권1호
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• pp.29-34
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• 2015

This paper reports a couple of key circuit blocks developed for heterodyne receiver front-ends operating near 140 GHz based on SiGe HBT technology. Firstly, a 123-GHz oscillator was developed based on Colpitts topology, which showed -5 dBm output power and phase noise of -107.34 dBc/Hz at 10 MHz. DC power dissipation was 25.6 mW. Secondly, a 135 GHz mixer was developed based on a modified Gilbert Cell topology, which exhibited a peak conversion gain of 3.6 dB at 1 GHz IF at fixed LO frequency of 134 GHz. DC power dissipation was 3 mW, which mostly comes from the buffer.

• Journal of electromagnetic engineering and science
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• 제5권4호
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• pp.153-160
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• 2005

In this paper, the novel microwave oscillator incorporating a planar cavity resonator(PCR) is presented to reduce the phase noise of the oscillator in a planar environment. Compared to the conventional planar( $\lambda$/4 open stub resonator), the phase noise is improved about 16 dBc/Hz @100 kHz. The design of the oscillator is based on a reflection type configuration using the low 1/f SiGe HBT transistor(LPT16ED). The output power is measured 2.76 dBm at 12.5 GHz. In this paper, the oscillator used to the PCR can be expected to provide a solution for low phase noise oscillator in microwave circuits.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.840-843
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• 2001

In this study, temperature dependency of current gain for AlGaAs/GaAs/GaAs HBT is analytically proposed over the temperature range between 300K and 600K. Energy bandgap, effective mass, intrinsic carrier concentration are considered as temperature dependent parameters. Collector current which is numerically calculated is then analytically expressed to enhance the speed of calculation for current gain. From the results, current gain decreases as the temperature increases. These results will be used to expect the unity current gain frequency f$_{T}$ in conjunction with emitter-base and collector- base capacitances.s.

• 한국진공학회지
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• 제9권2호
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• pp.167-171
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• 2000

AlGaAs/GaAs HBT의 동작특성에 미치는 에미터 구조의 영향을 조사하였다. 에미터의 크기 변화에 의해 차단주파수와 최대공진주파수가 변화하였으며, 이는 에미터 구조에 따라 저항과 접합용량이 변하기 때문이다. 또한 에미터의 주변길이와 접합면적도 HBT의 고주파 특성에 영향을 미치는 것을 알 수 있다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.366-370
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• 2002

GaAs has become a very popular material for the fabrication of high frequency, low noise and microwave power devices. GaAs devices are also well suited for high temperature operation because of the large band gap of this material. The standard GaAs technology and device structures have to be modified for stable operation at high temperature. In this paper, AlGaAs/GaAs HBT considering stable ohmic contact at high temperature as well as thermal effect such as self-heating effect are introduced. All the data obtained study will be used as input data for the simulator and the result will be compared with an analytical model available in this study,

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권11호
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• pp.546-550
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• 2002

In this paper, Heterojunction phototransistors(HPT's) with an optically transparent ITO emitter contacts were fabricated. The ITO ohmic contacts were realized by employing thin imdium layer between the ITO and $n^+$-InP layers. The ITO contact was annealed at $250^{\circ}C$. The specific contact resistance of about $6.6{\times}10^{-4}{\Omega}cm^2$ was measured by use of the transmission line model (TLM). Heterojunction bipolar transistors (HBTs) having the same device layout were fabricated to compare with HPTs. The DC characteristics of the InP/InGaAs HPT showed the similar electrical characteristics of the HBT. Emitter contact resistance($R_E$) of about $6.4{\Omega}$ was extracted, which was very similar to that of the HBT. The optical characteristics of HPT's were generated by illuminating the device with light from $1.3{\mu}m$ light. It showed that HPT's can be controlled optically.