• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.3
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• pp.699-706
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• 2018

The permeation properties of plasma polymer membranes were studied for permanent gases such as He, $H_2$, $O_2$, $N_2$, $CH_4$ and condensable vapors such as $CO_2$, $C_2H_4$, $C_3H_8$. The plasma polymers were prepared by the discharge of microwave or radiofrequency(RF) wave. Hexamethyldisiloxane (HMDS) vapor was used as a monomer for plasma polymerization. In HMDS plasma-polymerized membranes prepared under microwave discharge, the permeability coefficient was dependent of the kinetic molecular diameter of the permeate gases. Additionally the membranes showed higher $O_2/N_2$ permselectivity compared to the plasma polymers from radiofrequency discharge. On the contrary, in the HMDS plasma-polymerized membranes prepared under radiofrequency discharge, the permeability coefficient was dependent of the critical temperature of the permeant gases. The membranes showed high selectivities of $C_2H_4$ and $C_3H_8$ over $N_2$. The permeability coefficient of plasma polymerized membranes prepared under microwave discharge was dependent of the molecular diameter of permeant gases because of high crosslinking density of the membrane. However, the crosslinking density of the plasma polymerized membranes prepared under RF discharge was lower because the energy density of RF wave is weaker than that of microwave. Hence, the permeability of RF plasma polymerized membranes became dependent of the critical temperature rather than molecular diameter of the gases.

• Journal of the Microelectronics and Packaging Society
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• v.11 no.1
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• pp.77-85
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• 2004

To evaluate the effect of plasma cleaning on the soldering reliability the plasma cleaning using Ar-10vol%$H_2$ gas was applied on a UBM(Under Bump Metallization). The UBM consisted of Au/ Cu/ Ni/ Al layers which were deposited on a Si-wafer with 20 nm/ 4 $\mu\textrm{m}$/ 4 $\mu\textrm{m}$/ 0.4 $\mu\textrm{m}$ thickness respectively. Sn-3.5%Ag, Sn-3.5%Ag-0.7%Cu and Sn-37%Pb solder balls sized of 500 $\mu\textrm{m}$ in diameter were used. Solder balls on the UBM were plasma reflowed under Ar-10%$H_2$ plasma (with or without plasma cleaning). They were compared with air reflowed solder balls with flux. The spreading ratios of plasma reflowed solder with plasma cleaning was 20-40% higher than that of plasma reflowed solder without plasma cleaning. The shear strength of plasma reflowed solder with plasma cleaning was about 58-65MPa. It showed 60-80% higher than that of plasma reflowed solder without plasma cleaning and 15-35% higher than that of air reflowed solder. Thus it was believed that plasma cleaning for the UBM using Ar-10vol%$H_2$ gas was considerably effective for the improvement of the strength of solder ball.

• Journal of Environmental Science International
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• v.29 no.5
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• pp.575-578
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• 2020

The plasma cortisol of nurserypigs was examined using an outdoor efficacy testwith a digital content-based approach in animal welfare convergence types. Nine nurserypigs,without discriminating between female and male, were classified into 2 groups of 3 pigs each: control and group 1 (effect+nature), control and group 2(effect+nature+music). The control group was the same for group 1 and 2 to compare the effects using a t-test. There was no significant difference in plasma cortisol levels between the control group and group 1 until 4 h after stress induction. However, significant differences were subsequently found between the control group and group 1 from 8 h to 72 h (p<0.05). Further, plasma cortisol was not affected in group 2 at 0 h through 8 h and 72 h. At 12 h through 48 h, group 2 showed a reduction in plasma cortisol level compared to the control group(p<0.05). These results indicated that after stress induction, applying effect plus nature or effect plus nature plus music can effectively decrease plasma cortisol levels in nursery pigs within8 h through 72 h and may serve as a better model for digital content-based approach in animal welfare convergence types.

• Journal of the Korean Vacuum Society
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• v.8 no.3A
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• pp.249-255
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• 1999

Deposition characteristics of Cu thin films using Ar carrier gas and $H_2$ processing gas at various working pressures and substrate temperatures were investigated. Also, effects of $H_2$ pretreatment using plasma at $200^{\circ}C$ of substrate temperature and 0.6 Torr of chamber pressure were stdied. Cu thin films were deposited on TiN/Si substrate at working pressure of 0.5~1.5 Torr, substrate temperatures of 140~$240^{\circ}C$ with (hface)Cu(tmvs). Substrates were pretreated by $H_2$ plasma, and Cu films deposited in situ using twofold shower head. The purity, electrical resistivity, thickness, surface morphology, optical properties of the deposited Cu films were measured b the AES, four point probe, stylus profiler, SEM,. and the uv-visible spectrophotometer. This study suggests that $H_2$ plasma is an effective method for enhancing deposition rate and for producing high quality copper thin films.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.802-805
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• 2003

The ion-induced secondary electron emission coefficient ${\gamma}$ for MgO thin film with $O_{2}$ plasma treatment has been investigated by ${\gamma}$-FIB (focused ion beam) system. The MgO thin film deposited from sintered material with $O_2$ plasma treatment is found to have higher ${\gamma}$ than that without $O_{2}$ plasma treatment. The energy of $Ne^{+}$ ions used has been ranged from 100eV to 200eV throughout this experiment. It is found that the highest secondary electron emission coefficient ${\gamma}$ has been achieved for 10 minutes of $O_{2}$ plasma treatment.

• Proceedings of the Korean Vacuum Society Conference
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• 2008.08a
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• pp.285-285
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• 2008

• Journal of the Korean Society for Heat Treatment
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• v.12 no.2
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• pp.166-173
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• 1999

Commercial carbon steels containing 0.2~0.55 wt.----C were plasma-nitrided or plasma nitrocarburized at $550^{\circ}C$ for 21.6Ks using $H_2-N_2$ or $H_2-N_2$-CO mixed gas respectively. The characteristics of hardening and wear-resistance of each treatment were studied and compared. And also microstructure of nitrided layer and nitrides formed in compound layer near surface were studied. All plasma-nitrided steels investigated showed remarkable increase of surface hardness with the increase of carbon content. But nitrocarburized steels resulted in higher surface-hardness than plasma-nitrided steels, which means that nitrocarburized has higher surface-hardening effect. Plasma-nitrided steels showed hardness increase in through-thickness direction near surface. And also nitrocarburized steels showed similar hardness distribution in through-thickness direction to that of plasma-nitrided steel. However, nitrocarburized steels had higher cross-sectional maximum-hardness than plasma-nitrided steels as much as 100Hv. Wear test showed that the amount of specific wear was reduced by both plasma-nitriding and nitrocarburized, showing that the amount of specific wear was not related to the hardness. But non-treated specimen showed that the amount of specific wear was related to the hardness.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.163-163
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• 2003

TiN barrier막 위에 metal organic chemical deposition(MOCVD)법으로 RuO$_2$ 를 증착시 TiN막 표면을 세정처리하지 않을 경우 RuO$_2$의 핵생성이 어렵고, 그로 인해 RuO$_2$ 연속막이 형성되기 힘들다. 그러므로 RuO$_2$의 핵생성을 향상시키기 위해 TiN막에 대한 전처리 세정이 필수적이다. TiN막의 전처리 세정방법으로 ECR plasma 세정법을 사용하였으며, $O_2$ plasma와 H$_2$ plasma 그리고 Ai plasma를 이용해 각각의 exposure time을 변화시키며 전처리 세정을 실시하였다. H$_2$ plasma와Ar plasma의 exposure time이 증가됨에 따라 RuO$_2$의 핵생성이 향상되었다. 본 연구에서는 scanning electron microscopy(SEM), Auger electron emission spectrometry(AES), Atomic Force Microscope(AFM), X-ray diffraction (XRD) 등의 분석을 통해 TiN막 표면에 대한 ECR plasma 전처리 세정 이 RuO$_2$의 핵생성과 연속막 성장에 미치는 효과에 대해 조사하였다.

• Journal of Environmental Science International
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• v.22 no.12
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• pp.1561-1569
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• 2013

This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (${\cdot}OH$, $H_2O_2$ and $O_3$) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, $1^{st}$ voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. $H_2O_2$ and $O_3$.) $H_2O_2$ and $O_3$ was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum $1^{st}$ voltage for RNO degradation were 90 V. As the increased of $1^{st}$ voltage, generated $H_2O_2$ and $O_3$ concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower $H_2O_2$ and $O_3$ generation were observed. However, RNO degradation was not varied with the change of the solution pH.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.491-491
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• 2013

A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.