Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in $O_2/N_2$/Ar chemistries

Lee, H.J. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Park, Y.R. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, J.S. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Ahn, J.H. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kwon, B.S. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, H.W. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, S.I. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, N.E. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University)