• Title/Summary/Keyword: Grain v1

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Lipoxygenase Activity in Black Rices

  • Lee, You-Seok;Song, Seon-Joo;Rhee, Chong-Ouk
    • Journal of Applied Biological Chemistry
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    • v.42 no.3
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    • pp.130-133
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    • 1999
  • Lipoxygenase activities of three cultivars of black rice (Chindo, Suwon-415, Yongkeum-1) were determined using an oxygen polargraphic method to measure oxygen uptake. Studies at different pH levels revealed that the optimum pH was about pH 7.0 for Suwon-415 and pH 7.5 for Chindo and Yongkeum-1. The specific activities of Chindo, Suwon-415 and Yongkeum-1 at optimal pH were 41.0, 27.3, and 29.6 unit/mg-protein, respectively. In all the cultivars, there was an increase in the activity with increase in reaction temperature. Enzyme activity was tested at different concentrations of the substrate. The resulting $K_m$ and $V_{max}$ values of Chindo, Suwon-415, and Youngkeum-1 were 0.059, 0.050, and 0.066 mM and 2020, 2283, and 1616 unit/g-grain, respectively. Enzyme activity decreased at all storage temperatures(25, 4, and $-40^{\circ}C$).

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Electrical and Structural Properties of $CuInS_2$ thin films fabricated by EBE(Electronic Beam Evaporator) Method (전자빔 증착기로 증착된 $CuInS_2$ 박막의 전기적 구조적 특성)

  • Yang, Hyeon-Hun;Kim, Young-Jun;Jeong, Woon-Jo;Park, Gye-Choon
    • 한국신재생에너지학회:학술대회논문집
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    • 2006.06a
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    • pp.170-173
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    • 2006
  • [ $CuInS_2$ ] filims were appeared from 0.84 to 1.27 of Cu/In composition ratio and sulfur composition ratios of $CuInS_2$ thin films fabricated, Also when Cu/In composition ratio was 1.03, $CuInS_2$ thin film with chalcopyrite structure had the highest XRD peak (112). And lattice constant (a) of and grain size of the film tin s ambient were appeared a little larger than those in only Vacuum The films in S ambient were p-type with resistive of around $10^{-1}{\Omega}cm$ and optical energy band gaps of the films in S ambient were appeared a little larger than those in only Vacuum. Analysis of the optical energy band gap of $CuInS_2$ thin films a value of 1.53eV.

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Piezoelectric/magnetic Properties and Magnetoelectric Effects in (1-x) [0.5PZT-0.25PNN-0.25PZN] - x [Ni0.9Zn0.1Fe2O4] Particulate Ceramic Composites ((1-x) [0.5PZT-0.25PNN-0.25PZN]- x [Ni0.9Zn0.1Fe2O4] 세라믹스의 압전/자성 성질 및 자기전기적 효과)

  • Park, Young-Kwon;Son, Se-Mo;Ryu, Ji-Goo;Chung, Su-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.11
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    • pp.869-874
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    • 2010
  • Magnetoelectric composites with compositions (1-x)[0.5PZT-0.25PNN-0.25PZN](ferroelectric) - x[$(Ni_{0.9}Zn_{0.1})Fe_2O_4$](ferrite) in which x varies as 0, 0.1, 0.2, 0.4, 0.6, 0.8, 1.0 were prepared by conventional ceramic process. The presence of two phases (ferroelectric phase with large grain and ferrite phase with small grain) in the particulate ceramic composites was confirmed by XRD, SEM and EDX. The ferroelectric and magnetic properties of the composites were studied by measuring the P-E and M-H hysterisis loop on the composite composition (x=0, 0.1, 0.2, 1), they were strongly affects of the phase content in composite. The magnetoelectric votage was measured as a function of DC magnetic field and the maximum magnetoelectric voltage coefficient of 14 mV/cm Oe was observed in x=0.2(80 mol% ferroelectric and 20 mol% ferrite phase).

Magnetoelectric Effect in$CoFe_2O_4-PZT$Composites ($CoFe_2O_4-PZT$ 복합체의 Magnetoelectric 효과)

  • 최임구;권순주;박수현;정윤희
    • Journal of the Korean Magnetics Society
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    • v.7 no.6
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    • pp.285-292
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    • 1997
  • We have studied magnetoelectric effect with cobalt ferrite-Pb(Zr, Ti) $O_3$ composites made by solid state reaction. The maximum magnetoelectric voltage coefficient, $(dE/ dH)_{max}$, increased with longer sintering time and higher volume fraction of the cobalt ferrite. The magnetic field for $(dE/ dH)_{max}$ became lower with increasing the sintering time and decreasing the volume fraction of the cobalt ferrite. The phenomena were explained in terms of grain size change, mechanical coupling efficiency, easiness of magnetization and polarization. We obtained the highest magnetoelectric voltage coefficient of 0.174V/cm-Oe, which is about 30% higher than the best value reported.

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ELECTRO-CHEMICAL ASPECTS OF STRESS CORROSION OF MILD STEELS ( I ) (연강의 전기화학적인 응력부식에 관한 연구 (I))

  • KIM Suk-Ho
    • Korean Journal of Fisheries and Aquatic Sciences
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    • v.7 no.4
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    • pp.234-237
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    • 1974
  • Electro-chemical aspects of stress corrosion on the mild steels when immersed in the $5\%\;H_2SO_4$ solution and charged with 100mV and 100mA were discussed. The main results of the experiment are follows; 1. The weight loss by corrosion was concerned with the applied stress. and the larger the applied stress, the greater the weight loss. 2. Reduction of corrosion stress was a factor of inverse proportion to the applied stress. 3. Corrosion began at first on the parts of impurities concentrated and the grain boundaries, and gradually developed and spreaded out. 4. The materials of unsteady structure deformed of space lattice by the high stress or work-hardening showed less reduction of corrosion stress.

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Comparative Study on Interfacial Traps in Organic Thin-Film Transistors According to Deposition Methods of Organic Semiconductors

  • Park, Jae-Hoon;Bae, Jin-Hyuk
    • Journal of the Korean Applied Science and Technology
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    • v.30 no.2
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    • pp.290-296
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    • 2013
  • We analysed interfacial traps in organic thin-film transistors (TFTs) in which pentacene and 6,13-bis(triisopropylsilylethynyl)-pentacene (TIPS-pentacene) organic semiconductors were deposited by means of vacuum-thermal evaporation and drop-coating methods, respectively. The thermally-deposited pentacene film consists of dentritic grains with the average grain size of around 1 m, while plate-like crystals over a few hundred microns are observed in the solution-processed TIPS-pentacene film. From the transfer characteristics of both TFTs, lower subthreshold slope of 1.02 V/decade was obtained in the TIPS-pentacene TFT, compared to that (2.63 V/decade) of the pentacene transistor. The interfacial trap density values calculated from the subthreshold slope are about $3.4{\times}10^{12}/cm^2$ and $9.4{\times}10^{12}/cm^2$ for the TIPS-pentacene and pentacene TFTs, respectively. Herein, lower subthreshold slope and less interfacial traps in TIPS-pentacene TFTs are attributed to less domain boundaries in the solution-processed TIPS-pentacene film.

Synthesis and Characterization of Novel Rare-earth Oxides Precursors

  • Lee, Euy Jin;Park, Bo Keun;Chung, Taek-Mo;Kim, Chang Gyoun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.366.1-366.1
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    • 2014
  • The rare-earth oxides M2O3 (M=La, Pr, Gd) are good insulators due to their large band gap (3.9eV for Pr2O3, 5.6eV for Gd2O3), they have high dielectric constants (Gd2O3 K=16, La2O3 K=27, Pr2O3 K=26-30) and, compared to ZrO2 and HfO2, they have higher thermodynamic stability on silicon making them very attractive materials for high-K dielectric applications. Another attractive feature of some rare-earth oxides is their relatively close lattice match to that of silicon, offering the possibility of epitaxial growth and eliminating problems related to grain boundaries in polycrystalline films. Metal-organic chemical vapor deposition (MOCVD) has been preferred to PVD methods because of the possibility of large area deposition, good composition control and excellent conformal step coverage. Herein we report on the synthesis of rare-earth oxide complexes with designed alkoxide and aminoalkoxide ligand. These novel complexes have been characterized by means of FT-IR, elemental analysis, and thermogravimetric analysis (TGA).

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Electrical properties of ZnO varistors with sintering temperature (소결온도에 따른 ZnO varistor의 전기적 특성)

  • Cho, Hyun-Moo;Lee, Jong-Deok;Park, Sang-Man;Lee, Sung-Gap
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.307-308
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    • 2005
  • ZnO varistor ceramics were fabricated as a function of the sintering temperature from $1125^{\circ}C$ to $1200^{\circ}C$ with glass-frit 0.03wt% addition. The average grain size was increased from 10.4 ${\mu}m$ to 23.7 ${\mu}m$, and varistor voltage was decreased from 538 V to 329 V with rising of the sintering temperature. The nonlinear coefficient a showed similar value from 75 to 80 and leakage current of all specimens exhibited the result of $1{\mu}A$ at 82% of varistor voltage. But the clamping voltage ratio of the specimens sintered at $1175^{\circ}C$ was 1.37 at 25A [$8/20{\mu}s$]. Also, endurance of surge current and deviation of varistor voltage of sintered specimens at $1175^{\circ}C$ were $6400A/cm^2$, $\Delta$-3.32%, respectively.

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Improvement of Fatigue Properties in Ferroelectric Dy-Doped Bismuth Titanate(BDT) Thin Films Deposited by Liquid Delivery MOCVD System (Liquid Delivery MOCVD로 증착된 강유전체 BDT 박막의 피로 특성 향상)

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.171-171
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    • 2007
  • Dysprosium-doped bismuth titanate (BDT) thin films were successfully deposited on Pt(111)/Ti/$SiO_2$/Si(100) substrates by liquid delivery MOCVD process and their structural and ferroelectric properties were characterized. Fabricated BDT thin films were found to be random orientations, which were confirmed by X-ray diffraction experiment and scanning electron microscope analysis. The crystallinity of the BDT films was improved and the average grain size increased as the crystallization temperature increased from 600 to $720^{\circ}C$ at an interval of $40^{\circ}C$. The BDT thin film annealed at $720^{\circ}C$ showed a large remanent polarization (2Pr) of $52.27\;{\mu}C/cm^2$ at an applied voltage of 5V. The BDT thin film exhibits a good fatigue resistance up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz with applied pulse of ${\pm}5\;V$. These results indicate that the randomly oriented BDT thin film is a promising candidate among ferroelectric materials useti비 in lead-free nonvolatile ferroelectric random access memory applications.

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Analysis of the Threshold Voltage Instability of Bottom-Gated ZnO TFTs with Low-Frequency Noise Measurements (Low-Frequency Noise 측정을 통한 Bottom-Gated ZnO TFT의 문턱전압 불안정성 연구)

  • Jeong, Kwang-Seok;Kim, Young-Su;Park, Jeong-Gyu;Yang, Seung-Dong;Kim, Yu-Mi;Yun, Ho-Jin;Han, In-Shik;Lee, Hi-Deok;Lee, Ga-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.7
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    • pp.545-549
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    • 2010
  • Low-frequency noise (1/f noise) has been measured in order to analyze the Vth instability of ZnO TFTs having two different active layer thicknesses of 40 nm and 80 nm. Under electrical stress, it was found that the TFTs with the active layer thickness of 80 nm shows smaller threshold voltage shift (${\Delta}V_{th}$) than those with thickness of 40 nm. However the ${\Delta}V_{th}$ is completely relaxed after the removal of DC stress. In order to investigate the cause of this threshold voltage instability, we accomplished the 1/f noise measurement and found that ZnO TFTs exposed the mobility fluctuation properties, in which the noise level increases as the gate bias rises and the normalized drain current noise level($S_{ID}/{I_D}^2$) of the active layer of thickness 80 nm is smaller than that of active layer thickness of thickness 40 nm. This result means that the 80 nm thickness TFTs have a smaller density of traps. This result correlated with the physical characteristics analysis performmed using XRD, which indicated that the grain size increases when the active layer thickness is made thicker. Consequently, the number of preexisting traps in the device increases with decreasing thickness of the active layer and are related closely to the $V_{th}$ instability under electrical stress.