• Title/Summary/Keyword: Gate electrodes

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Transparent and Flexible All-Organic Multi-Functional Sensing Devices Based on Field-effect Transistor Structure

  • Trung, Tran Quang;Tien, Nguyen Thanh;Seol, Young-Gug;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.491-491
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    • 2011
  • Transparent and flexible electronic devices that are light-weight, unbreakable, low power consumption, optically transparent, and mechanical flexible possibly have great potential in new applications of digital gadgets. Potential applications include transparent displays, heads-up display, sensor, and artificial skin. Recent reports on transparent and flexible field-effect transistors (tf-FETs) have focused on improving mechanical properties, optical transmittance, and performances. Most of tf-FET devices were fabricated with transparent oxide semiconductors which mechanical flexibility is limited. And, there have been no reports of transparent and flexible all-organic tf-FETs fabricated with organic semiconductor channel, gate dielectric, gate electrode, source/drain electrode, and encapsulation for sensor applications. We present the first demonstration of transparent, flexible all-organic sensor based on multifunctional organic FETs with organic semiconductor channel, gate dielectric, and electrodes having a capability of sensing infrared (IR) radiation and mechanical strain. The key component of our device design is to integrate the poly(vinylidene fluoride-triflouroethylene) (P(VDF-TrFE) co-polymer directly into transparent and flexible OFETs as a multi-functional dielectric layer, which has both piezoelectric and pyroelectric properties. The P(VDF-TrFE) co-polumer gate dielectric has a high sensitivity to the wavelength regime over 800 nm. In particular, wavelength variations of P(VDF-TrFE) molecules coincide with wavelength range of IR radiation from human body (7000 nm ~14000 nm) so that the devices are highly sensitive with IR radiation of human body. Devices were examined by measuring IR light response at different powers. After that, we continued to measure IR response under various bending radius. AC (alternating current) gate biasing method was used to separate the response of direct pyroelectric gate dielectric and other electrical parameters such as mobility, capacitance, and contact resistance. Experiment results demonstrate that the tf-OTFT with high sensitivity to IR radiation can be applied for IR sensors.

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Property Comparison of Ru-Zr Alloy Metal Gate Electrode on ZrO2 and SiO2 (ZrO2와 SiO2 절연막에 따른 Ru-Zr 금속 게이트 전극의 특성 비교)

  • Seo, Hyun-Sang;Lee, Jeong-Min;Son, Ki-Min;Hong, Shin-Nam;Lee, In-Gyu;Song, Yo-Seung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.9
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    • pp.808-812
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    • 2006
  • In this dissertation, Ru-Zr metal gate electrode deposited on two kinds of dielectric were formed for MOS capacitor. Sample co-sputtering method was used as a alloy deposition method. Various atomic composition was achieved when metal film was deposited by controlling sputtering power. To study the characteristics of metal gate electrode, C-V(capacitance-voltage) and I-V(current-voltage) measurements were performed. Work function and equivalent oxide thickness were extracted from C-V curves by using NCSU(North Carolina State University) quantum model. After the annealing at various temperature, thermal/chemical stability was verified by measuring the variation of effective oxide thickness and work function. This dissertation verified that Ru-Zr gate electrodes deposited on $SiO_{2}\;and\;ZrO_{2}$ have compatible work functions for NMOS at the specified atomic composition and this metal alloys are thermally stable. Ru-Zr metal gate electrode deposited on $SiO_{2}\;and\;ZrO_{2}$ exhibit low sheet resistance and this values were varied with temperature. Metal alloy deposited on two kinds of dielectric proposed in this dissertation will be used in company with high-k dielectric replacing polysilicon and will lead improvement of CMOS properties.

Flexible OTFT-OLED Display Panel using Ag-paste for Source and Drain Electrodes

  • Ryu, Gi-Seong;Kim, Young-Bea;Song, Hyun-Jin;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1789-1791
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    • 2007
  • We fabricated OTFT-OLED display panel by using Ag-paste for source and drains electrode of OTFTs. The OTFTs were fabricated by solution processes such as spin-coating for PVP gate dielectric and screen printing for S/D electrodes with Ag-paste, except pentacene active layer which was deposited by evaporation. The mobility was 0.024 cm2/V.sec , off state current ${\sim}10-11A$, threshold voltage 7.6 V and on/off current ratio ${\sim}105$. The panel consisted of 16 x 16 pixels and each pixel consisted of 2 OTFTs, 1 Capacitor and 1 OLED. The pixels successfully worked in terms of current magnitude supplied to OLED and the control ability of driving and switching OTFTs.

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Organic Thin-Film Transistors with Screen Printed Silver Source/Drain Electrodes

  • Kim, Sam-Soo;Kim, Min-Soo;Choi, Gyu-Seok;Kim, Heon-Gon;Kim, Yong-Bae;Lee, Dong-Gu;Roh, Jae-Seong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1305-1307
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    • 2007
  • We show that the electrical properties of organic thinfilm transistors(OTFTs) can be enhanced by controlling the morphology of interface between screen printed electrodes and gate dielectrics. Modified surface of the insulator layer($SiO_2$) affect on the interface energy of electrode on $SiO_2$ layer. Contact angle measurement and FT-IR spectrum shows that the interface is properly modified. OTFTs device with high efficiency has been realized through modification of interface layer.

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Characterization of instability in a-Si:H TFT LCD utilizing copper as electrodes

  • Kuan, Yung-Chia;Liang, Shuo-Wei;Chiu, Hsian-Kun;Sun, Kuo-Sheng
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.747-751
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    • 2006
  • The hydrogenated amorphous silicon thin film transistor (a-Si:H TFT) with copper as source and drain electrode has been fabricated to obtain its transfer characteristics and stressed with positive and negative bias to investigate the instability variation comparing to conventional MoW-Al based TFT device. The results show that there is no copper diffusion into active layer of a-Si:H TFT, even during the thermal process. In addition, a 15-inch XGA a Si:H TFT LCD display utilizing Cu as gate electrodes has been developed.

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The Effects of Doctoring Process in Gravure Off-set Printing on Patterning of Electrodes with Ag Ink (은 잉크를 이용한 그라비아 오프셋의 전극인쇄에서 닥터링 공정의 영향)

  • Choi, Ki Seong;Park, Jin Seok;Song, Chung-Kun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.6
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    • pp.462-467
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    • 2013
  • In this paper, we analyzed the effects of doctoring process on the patterns of Ag ink in gravure off-set printing. The parameters of doctoring process were the angle and the pressure, which was represented by the depth of blade movement to the gravure roll, of doctor blade to the surface of gravure roll, and the angle of patterns engraved on the gravure roll to the doctor blade moving direction. The proper parameters were extracted for the fine patterns and they were 15 mm for the pressure, $60^{\circ}$ for the blade angle. And the angle of patterns with respect to the blade movement should be less than $40^{\circ}$ for the best results. The gravure off-set printing with the above parameters was carried out to print gate electrodes and scan bus lines of OTFT-backplane for e-paper. The line width of $50{\mu}m$ was successfully obtained. The thickness of electrodes was $2.5{\mu}m$ and the surface roughness was $0.65{\mu}m$ and the sheet resistance was $15.8{\Omega}/{\Box}$.

Ru and $RuO_2$ Thin Films Grown by Atomic Layer Deposition

  • Shin, Woong-Chul;Choi, Kyu-Jeong;Jung, Hyun-June;Yoon, Soon-Gil;Kim, Soo-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.149-149
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    • 2008
  • Metal-Insulator-Metal(MIM) capacitors have been studied extensively for next generation of high-density dynamic random access memory (DRAM) devices. Of several candidates for metal electrodes, Ru or its conducting oxide $RuO_2$ is the most promising material due to process maturity, feasibility, and reliability. ALD can be used to form the Ru and RuO2 electrode because of its inherent ability to achieve high level of conformality and step coverage. Moreover, it enables precise control of film thickness at atomic dimensions as a result of self-limited surface reactions. Recently, ALD processes for Ru and $RuO_2$, including plasma-enhanced ALD, have been studied for various semiconductor applications, such as gate metal electrodes, Cu interconnections, and capacitor electrodes. We investigated Ru/$RuO_2$ thin films by thermal ALD with various deposition parameters such as deposition temperature, oxygen flow rate, and source pulse time. Ru and $RuO_2$ thin films were grown by ALD(Lucida D150, NCD Co.) using RuDi as precursor and O2 gas as a reactant at $200\sim350^{\circ}C$.

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Fabrication of Flexible OTFT Array with Printed Electrodes by using Microcontact and Direct Printing Processes

  • Jo, Jeong-Dai;Lee, Taik-Min;Kim, Dong-Soo;Kim, Kwang-Young;Esashi, Masayoshi;Lee, Eung-Sug
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.155-158
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    • 2007
  • Printed organic thin-film transistor(OTFT) to use as a switching device for an organic light emitting diode(OLED) were fabricated in the microcontact printing and direct printing processes at room temperature. The gate electrodes($5{\mu}m$, $10{\mu}m$, and $20{\mu}m$) of OTFT was fabricated using microcontact printing process, and source/drain electrodes ($W/L=500{\mu}m/5{\mu}m$, $500{\mu}m/10{\mu}m$, and $500{\mu}m/20{\mu}m$) was fabricated using direct printing process with hard poly(dimethylsiloxane)(h-PDMS) stamp. Printed OTFT with dielectric layer was formed using special coating system and organic semiconductor layer was ink-jet printing process. Microcontact printing and direct printing processes using h-PDMS stamp made it possible to fabricate printed OTFT with channel lengths down to $5{\mu}m$, and reduced the process by 20 steps compared with photolithography. As results of measuring he transfer characteristics and output characteristics of OTFT fabricated with the printing process, the field effect characteristic was verified.

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A STUDY ON THE ELECTRICAL CHARACTERISTICS IMPROVEMENTS OF PENTACENE-BASED ORGANIC THIN FILM TRANSISTORS (Pentacene을 이용한 유기 TFT의 전기적 특성 향상에 관한 연구)

  • Lee, Jong-Hyuk;Park, Jae-Hoon;Ryu, Se-Won;Kim, Hyung-Joon;Choi, Jong-Sun
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1515-1517
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    • 2001
  • In this work the electrical characteristics of organic TFTs with the semiconductor-insulator interfaces have been interested. Pentacene is used as an active semiconducting layer. The semiconductor layer of pentacene was thermally evaporated in vacuum at a pressure of about $2{\times}10^{-6}$ Torr and at a deposition rate of 0.3$\AA$/sec. Aluminium and gold were used for gate and source/drain electrodes. before pentacene is deposited on the insulator, the gate dielectric surfaces of two samples were rubbed with lateral and perpendicular to direction of the channel length respectively.

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Self sustained n-type memory transistor devices based on natural cellulose paper fibers

  • Martins, R.;Barquinha, P.;Pereira, L.;Goncalves, G.;Ferreira, I.;Fortunato, E.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1044-1046
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    • 2009
  • Here we report the architecture for a non-volatile n-type memory paper field-effect transistor. The device is built using the hybrid integration of natural cellulose fibers (pine and eucalyptus fibers embedded in an ionic resin), which act simultaneously as substrate and gate dielectric, with amorphous GIZO and IZO oxides as gate and channel layers, respectively. This is complemented by the use of continuous patterned metal layers as source/drain electrodes.

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