• Title/Summary/Keyword: Gate design

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Analysis of Electrical Characteristics of Shield Gate Power MOSFET for Low on Resistance (차폐형 게이트 구조를 갖는 전력 MOSFET의 전기적 특성 분석에 관한 연구)

  • Kang, Ey-Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.2
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    • pp.63-66
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    • 2017
  • This research was about shielded trench gate power MOSFET for low voltage and high speed. We used T-CAD tool and carried out process and device simulation for exracting design and process parameters. The exracted parameters was used to design shieled and conventional trench gate power MOSFET. And The electrical characteristics of shieled and conventional trench gate power MOSFET were compared and analyzed for their power device applications. As a result of analyzing electrical characteristics, the recorded breakdown voltages of both devices were around 120 V. The electric distributions of shielded and conventional trench gate power MOSFET was different. But due to the low voltage level, the breakdown voltage was almost same. And the other hand, the threshold voltage characteristics of shielded trench gate power MOSFET was superior to convention trench gate power MOSFET. In terms of on resistance characteristics, we obtained optimal oxied thickness of $3{\mu}m$.

Optimization of feed system of base mold for washing machine using CAE (사출성형 CAE를 이용한 세탁기용 Base 성형용 금형의 유동 시스템 최적화)

  • Yoo, Min-ji;Kim, Kyung-A;Han, Seong-Ryeol
    • Design & Manufacturing
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    • v.15 no.1
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    • pp.1-7
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    • 2021
  • The position of the gate is one of the important factors for optimal injection molding. This is because inappropriate gate positions cannot fill the cavity uniformly, which can lead to defects such as contraction. In this study, CAE was performed on hot runner injection molding of the washing machine base and plasticity was compared by changing gate position from existing gate position. A total of two alternatives have been applied to compare the plasticity of the washing machine base according to its optimal gate position. The gate position of the improved molds and the gate position of the current mold is analyzed by injection molding analysis. The results of the fill time, the pressure at V/P switchover, clamping force, and deflection were compared. In washing machine base injection molding, the deflection was reduced by about 3.76% in the improved mold 2. In improved mold 1, the fill time during injection molding was reduced by 3.32% to enable uniform charging, and the clamping force was reduced by 31.24%. We have confirmed that the position of the gate can change the charging pressure and the clamping force and affect the quality and cost savings of the molded product.

Optimization of Side Gate in the Design for Nano Structure Double Gate MOSFET (나노 구조 Double Gate MOSFET 설계시 side gate의 최적화)

  • 김재홍;고석웅;정학기
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2002.11a
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    • pp.490-493
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    • 2002
  • In this study, we have investigated optimum value for side gate length and side gate voltage of double gate (DG) MOSFET with main gate and side gate. We know that optimum side gate voltage for each side length is about 3V. Also, we know that optimum side gate length for each main gate length is about 70nm. We have presented the transconductance and subthreshold slope for each side gate length. We have simulated using ISE-TCAD tool for characteristics analysis of device.

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A Study on the development quality control by application of QFD and Stage-gate in defense system (QFD 및 Stage-gate 모델을 활용한 국방분야 개발단계 품질관리 방안 연구)

  • Jang, Bong Ki
    • Journal of Korean Society for Quality Management
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    • v.42 no.3
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    • pp.279-290
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    • 2014
  • Purpose: The purpose of this study is to propose adoption of QFD and Stage-gate in order to analyze the quality of korea defense system. Methods: Drawing change data of initial production phase in korea defense system were anlayzed and a practical method was proposed. Results: The results of this study are as follows; Off line Quality Control should be introduced in development phase. Specially, in case of defense system, the best method is QFD(Quality Function Deployment) and Stage-gate process. At first, QFD 1 step defines product planning from VOC(Voice Of Customer), QFD 2 step specifies part planning from product planning, QFD 3 step defines process planning from part planning, QFD 4 step defines production planning from previous process planning. Secondly, Stage-gate process is adopted. This study is proposed 5 stage-gate in case of korea defense development. Gate 1 is located after SFR(System Function Review), Gate 2 is located after PDR(Preliminary Design Review), Gate 3 is located after CDR(Critical Design Review), Gate 4 is located after TRR(Test Readiness Review) and Gate 5 is located before specification documentation submission. Conclusion: Off line QC(Quality Control) in development phase is necessary prior to on line QC(Quality Control) in p roduction phase. For the purpose of off line quality control, QFD(Quality Function Deployment) and Stage-gate process can be adopted.

Device Design Guideline for Nano-scale SOI MOSFETs (나노 스케일 SOI MOSFET를 위한 소자설계 가이드라인)

  • Lee, Jae-Ki;Yu, Chong-Gun;Park, Jong-Tae
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.39 no.7
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    • pp.1-6
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    • 2002
  • For an optimum device design of nano-scale SOI devices, this paper describes the short channel effects of multi-gate structures SOI MOSFETs such as double gate, triple gate and quadruple gate, as well as a new proposed Pi gate using computer simulation. The simulation has been performed with different channel doping concentrations, channel widths, silicon film thickness, and vertical gate extension depths of Pi gate. From the simulation results, it is found that Pi gate devices have a large margin in determination of doping concentrations, channel widths and film thickness comparing to double and triple gate devices because Pi gate devices offer a better short channel effects.

Development of STAGE-GATE based Evaluation Index for the Improvement of Design Quality of Plant Material (플랜트 기자재 설계품질 향상을 위한 STAGE-GATE 기반 평가항목 개발)

  • Lee, In Tae;Baek, Dong Hyun
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.43 no.2
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    • pp.65-71
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    • 2020
  • Worldwide plant market keeps maintaining steady growth rate and along with this trend, domestic plant market and its contractors also maintain such growing tendency. However, in spite of its external growth, win-win growth of domestic material industry that occupies the biggest share in plant industry cost portion is extremely marginal in reality. Domestic plant material suppliers are required to increase awareness of domestic material brand by securing quality and reliability of international standard through improvement of design quality superior to that of overseas material suppliers. Improvement of design quality of plant material becomes an essential element, not an option, for survival of domestic plant industry and its suppliers. Under this background, in this study, priority and importance by each evaluation index was analyzed by materializing plant design stage through survey of experts and defining evaluation index by each design stage and based on this analysis result, evaluation index of stage-gate based decision-making process that may improve design quality of plant material was suggested. It is considered that by utilizing evaluation index of stage-gate based decision-making process being suggested in this study, effective and efficient decision-making of project decision-makers would be enabled and it would be contributory to improve design quality of plant material.

A Study on the contact surface of Stem and Bellows of Gate Valve in Nuclear Power Plants (원자력발전소 게이트밸브의 스템 - 벨로우즈 접촉면에 관한 연구)

  • Ko, Seok-Hoon;Shim, Dong-Hyouk;Kim, Dae-Youl;Choi, Myung-Jin
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2006.05a
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    • pp.1044-1048
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    • 2006
  • Nuclear power generation is very dangerous in occasion that skirt of structure by earthquake although it is high effective generation that can make a lot of energies with few raw material. when design, it must consider a lot of problems caused by an earthquake. The seismic analysis of the structure has been great concern in the engineering society with an effort to reduce the severe damages from an earthquake. So the earthquake resistant design is one of the crucial design procedures of a gate valve used in nuclear power generation. The gate valve which has the contact area between stem and bellows. Because of the contact area. The gate valve should be given high stress and frictional wear. In this thesis, Considering the gate valve which has some contact distance between stem and bellows. The gate valve which has some contact distance is analyzed by a commercial FEM code of Ansys and Then compared to the gate valve behavior which doesn't have contact distance.

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A Study on the Development of Automatic Drawing System for Water-gate (수문의 자동설계 시스템 개발에 관한 연구)

  • 김일수
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 1999.10a
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    • pp.87-92
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    • 1999
  • The biggest challenge facing today manufacturing industry is better quality and high productivity. From an economic point of view, productivity is the most important parameter, as high productivity will reduce the cost. However, the customers of today are not only cost concerned, but also quality conscious. So high accuracy levels should also be achieved in the manufacturing process. This paper reports the development of a automatic design system based on AutoCAD program. This work is composed of three section that are design of top down menu, guide frame and gate lifter for water-gate programed by AutoLISP language and runned Windows system. The developed system ultimately generates the design for a water gate through AutoCAD program. In the design of the water gate, it needs about 23 hours with an expert, but this system can be only 80 seconds without an expert.

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Gate Tunneling Current and QuantumEffects in Deep Scaled MOSFETs

  • Choi, Chang-Hoon;Dutton, Robert W.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.1
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    • pp.27-31
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    • 2004
  • Models and simulations of gate tunneling current for thinoxide MOSFETs and Double-Gate SOIs are discussed. A guideline in design of leaky MOS capacitors is proposed and resonant gate tunneling current in DG SOI simulated based on quantum-mechanicalmodels. Gate tunneling current in fully-depleted, double-gate SOI MOSFETs is characterized based on quantum-mechanical principles. The simulated $I_G-V_G$ of double-gate SOI has negative differential resistance like that of the resonant tunnel diodes.

Design and Structural Analysis of Dry Dock Gate (드라이도크 게이트의 설계 및 구조해석)

  • Park, Joo-Shin;Ahn, Hwan-Jin;Jung, Gil-Yong
    • Journal of the Korean Society of Marine Environment & Safety
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    • v.14 no.4
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    • pp.325-331
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    • 2008
  • Recently, new shipbuilding yards with medium capacity are established due to influence of prosperous condition no shipbuilding industry in Korea. These shipbuilding yards have characteristics such as high capacity facilities and followed system of dock launching just like major shipbuilding yards. The present paper explains the dry dock design and structural strength analysis by using FEM. The design stage used TRIBON M3 system while the estimation of structural strength used ANSYS Multiphysics module. The dry dock gate did not frequently open and close, it had to sustain against external wave load during building a ship. Moreover, documents related to design of dry dock gate have no guidelines about design criterion and process of structural strength calculation. It is necessary to make the guidelines about design of dry dock gate. It is expected that this paper will be a good reference to the design of dry dock gate.

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