• 제목/요약/키워드: GaInZnO

검색결과 510건 처리시간 0.031초

Comparison of Ga-doped and Ag-doped ZnO Nanowire Gas-sensor Sensitivity and Selectivity

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제16권6호
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    • pp.334-337
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    • 2015
  • Pure ZnO, ZnO nanowires doped with 3 wt.% Ga (3GZO) and doped with 3 wt.% Ag (3SZO) were grown by a hot-walled pulse laser deposition (HW-PLD) technique. The optical and chemical properties of Ga and Ag doped nanowires was analyzed. Nanowires were determined to be under 200 nm in diameter and several μm in length. Change of significant resistance was observed and the gas detection sensitivities of ZnO, 3GZO and 3SZO nanawires were compared. The sensitivities of ZnO, 3GZO, and 3SZO nanowire sensors were measured at 300℃ for 1 ppm of ethanol gas at 97%, 48%, and 203%, respectively.

패턴된 GaN 에피층 위에 ZnO 막대의 수직성장 (Growth of vertically aligned Zinc Oxide rod array on patterned Gallium Nitride epitaxial layer)

  • 최승규;이성학;장재민;김정아;정우광
    • 한국재료학회지
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    • 제17권5호
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    • pp.273-277
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    • 2007
  • Vertically aligned Zinc Oxide rod arrays were grown by the self-assembly hydrothermal process on the GaN epitaxial layer which has a same lattice structure with ZnO. Zinc nitrate and DETA solutions are used in the hydrothermal process. The $(HfO_2)$ thin film was deposited on GaN and the patterning was made by the photolithography technique. The selective growth of ZnO rod was achieved with the patterned GaN substrate. The fabricated ZnO rods are single crystal, and have grown along hexagonal c-axis direction of (002) which is the same growth orientation of GaN epitaxial layer. The density and the size of ZnO rod can be controlled by the pattern. The optical property of ordered array of vertical ZnO rods will be discussed in the present work.

Al2O3 기판위에 증착한 ZnGa2O4 형광체 박막의 산소분압에 따른 형광특성 (Photoluminescence Behaviors of the ZnGa2O4 Phosphor Thin Films on Al2O3 substrates as a Function of Oxygen Pressures)

  • 이성수
    • 센서학회지
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    • 제11권2호
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    • pp.118-123
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    • 2002
  • $ZnGa_2O_4$ 형광체 박막을 기판 온도를 $550^{\circ}C$에 고정시키고 산소 분압을 100, 200, 300 mTorr로 변화시키며 $Al_2O_3$(0001) 기판 위에 펄스 레이저 증착법을 이용하여 증착하였다. 다른 산소 분압에서 성장한 박막들의 미세 결정구조와 형광특성을 조사하였으며, 산소분압이 증가할수록 박막의 결정성이 변화하였으며 박막의 조성비가 다름을 형광특성을 통하여 알 수 있었다. 발광 스펙트럼은 460 nm에서 최고 피크값 을 나타내었으며, 300 nm에서 600 nm까지 갖는 넓은 밴드의 형광 특성을 나타내었다. 최적의 조건에서 성장된 박막의 형광 밝기를 고려해볼 때 $Al_2O_3$(0001) 기관이 우수한 $ZnGa_2O_4$ 형광체 박막을 성장시킬 수 있는 기판들 중 하나임을 확인하였다.

기판온도 및 Annealing에 따른 ZnGa2O4 형광체 박막의 특성 (Characteristics of ZnGa2O4 Phosphor Thin Film with Temperature of Substrate and Annealing)

  • 김용천;홍범주;권상직;이달호;김경환;박용서;최형욱
    • 한국전기전자재료학회논문지
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    • 제18권2호
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    • pp.187-191
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    • 2005
  • A ZnGa$_2$O$_4$ phosphor target was synthesized through solid-state reactions at a calcine temperature of 700 $^{\circ}C$ and sintering temperature of 1300 $^{\circ}C$ in order to deposit ZnGa$_2$O$_4$ phosphor thin film at various temperature using rf magnetron sputtering system. A ZnGa$_2$O$_4$ phosphor thin film was deposited on Si(100) substrate and annealed by a rapid thermal processor(RTP) at 700 $^{\circ}C$, for 15 sec. The x-ray diffraction patterns of ZnGa$_2$O$_4$ phosphor target and thin film showed the main peak (311) direction. ZnGa$_2$O$_4$ thin film has better crystalization due to as function of increasing substrate and annealing temperature. The cathodoluminescence(CL) spectrums of ZnGa$_2$O$_4$ phosphor thin film showed the main peak 420 nm wavelength and the maximum intensity at the substrate temperature of 500 $^{\circ}C$ and annealing temperature of 700 $^{\circ}C$, for 15 sec.

Comparison of Optical Properties of Ga-doped and Ag-doped ZnO Nanowire Measured at Low Temperature

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제15권5호
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    • pp.262-264
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    • 2014
  • Pristine ZnO, 3 wt.% Ga-doped (3GZO) and 3 wt.% Ag-doped (3SZO) ZnO nanowires (NWs) were grown using the hot-walled pulse laser deposition (HW-PLD) technique. The doping of Ga and Ag in ZnO NWs was observed by analyzing the optical and chemical properties. We optimized the synthesis conditions, including processing temperature, time, gas flow, and distance between target and substrate for the growth of pristine and doped ZnO NWs. The diameter and length of pristine and doped ZnO NWs were controlled under 200 nm and several ${\mu}m$, respectively. Low temperature photoluminescence (PL) was performed to observe the optical property of doped NWs. We clearly observed the shift of the near band edge (NBE) emission by using low temperature PL. In the case of 3GZO and 3SZO NWs, the center photon energy of the NBE emissions shifted to low energy direction using the Burstein Moss effect. A strong donor-bound exciton peak was found in 3 GZO NWs, while an acceptor-bound exciton peak was found in 3SZO NWs. X-ray photoelectron spectroscopy (XPS) also indicated that the shift of binding energy was mainly attributed to the interaction between the metal ion and ZnO NWs.

The Magnetic Field Dependence Properties of Quasi Two Dimensional Electron-piezoelectric Potential Interacting System in GaN and ZnO

  • Lee, S.H.;Sug, J.Y.;Lee, J.H.;Lee, J.T.
    • Journal of Magnetics
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    • 제16권4호
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    • pp.408-412
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    • 2011
  • We investigated theoretically the magnetic field dependence of the quantum optical transition of qusi 2-Dimensional Landau splitting system, in GaN and ZnO. We apply the Quantum Transport theory (QTR) to the system in the confinement of electrons by square well confinement potential. We use the projected Liouville equation method with Equilibrium Average Projection Scheme (EAPS). Through the analysis of this work, we found the increasing properties of the optical Quantum Transition Line Shapes(QTLSs) which show the absorption power and the Quantum Transition Line Widths(QTLWs) with the magnetic-field in GaN and ZnO. We also found that QTLW, ${\gamma}(B)_{total}$ of GaN < ${\gamma}(B)_{total}$ of ZnO in the magnetic field region B < 25 Tesla.

ZnGa$_2$O$_4$형광박막의 발광특성에 미치는 도핑 및 어닐리의 효과 (Doping and Annealing Effect on Luminescent Characteristics of $_2$ Phosphor Thin Films)

  • 정영호;정승묵;김석범;김영진
    • 한국세라믹학회지
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    • 제35권6호
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    • pp.619-625
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    • 1998
  • Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin film phosphors were prepared on Si(100) wafers and ITO coated glass substrates by rf magnetron sputtering technique and the effects of the substrates dopant and the sputtering paramet-ers were analyzed, Changes of the oreintation were observed after annealine tratment. The grain size of {{{{ {Zn {Ga }_{2 }O }_{4 } }} : Mn thin film deposited on Si wafer was smaller than that on ITO/glass substrate which resulted in higher PL intensity. The PL spectra of Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin films showed sharp green luminescence spec-trum. According to CL spectrum it could be concluded that Mn ions acted as an actuator for green emission by substituting Zn atom sites.

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Preparation and Photoluminescence Properties of the ZnGa₂O₄: Mn Phosphor by Polymerized Complex Precursor

  • 조두환;정하균;석상일;박도순
    • Bulletin of the Korean Chemical Society
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    • 제18권6호
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    • pp.608-612
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    • 1997
  • The preparation and photoluminescence properties of $ZnGa_2O_4$ : Mn phosphor are presented. Under 254 nm excitation $Zn_1-_xMn_xGa_2O_4$ exhibits the green emission band at 506 nm wavelength and maximum intensity where x=0.005. The manganese activated $ZnGa_2O_4$ phosphor prepared by the polymerized complex method shows a remarkable increase in the emission intensity and is smaller particle size than that prepared by conventional method. Also, electron paramagnetic resonance study on $ZnGa_2O_4$ : Mn powders indicates that the increase in emission intensity after firing treatment in mild hydrogen reducing atmosphere is due to the conversion of the higher valent manganese to $Mn^{2+}$.

Ga의 도핑농도에 따른 ZnO 박막의 특성 (Effects of Doping Concentration on the Properties of Ga-doped ZnO Thin Films Prepared by RF Magnetron Sputtering)

  • 김형민;마대영;박기철
    • 한국전기전자재료학회논문지
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    • 제25권12호
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    • pp.984-989
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    • 2012
  • We have investigated the structural, electrical and optical properties of Ga-doped ZnO (GZO) thin films prepared by RF magnetron sputtering with laboratory-made ZnO targets containing 1, 3, 5, 7 wt% of $Ga_2O_3$ powder as a doping source. The GZO thin films show the typical crystallographic orientation with c-axis regardless of $Ga_2O_3$ content in the targets. The $3,000{\AA}$ thick GZO thin films with the lowest resistivity of $7{\times}10^{-4}{\Omega}{\cdot}cm$ are obtained by using the GZO ($Ga_2O_3$= 5 wt%) target. Optical transmittance of all films shows higher than 80% at the visible region. The optical energy band gap for GZO films increases as the carrier concentration ($n_e$) in the film increases.