• 제목/요약/키워드: GATE simulator

검색결과 147건 처리시간 0.026초

유압실린더 구동식 전도 수문의 실시간 모의시험기 개발 (Development of the Real-Time Simulator of a Turning-Type Sluice Gate Actuated by the Hydraulic Cylinder)

  • 이성래
    • 한국자동차공학회논문집
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    • 제14권4호
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    • pp.192-198
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    • 2006
  • The real-time simulator of a turning-type sluice gate actuated by the hydraulic cylinders is developed using a PC and a visual C++ program language. The real-time simulator receives the directional control valve signal selected by the operator using the mouse, updates the state variables of the turning-type sluice gate system responding to the control signal, and draws the moving figures of the sluice gate, cylinder, reserved water every drawing time on the PC monitor. Also, the operator can observe the sluice gate angle, cylinder force, cylinder pressures, and hydraulic power representing the operation of sluice gate system through the PC monitor every drawing time. The simulator can be a very useful tool to design and improve the turning-type sluice gate system.

이중 Gate를 갖는 Trench Emitter IGBT의 특성 (The Characteristics of a Dual gate Trench Emitter IGBT)

  • 강영수;정상구
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권9호
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    • pp.523-526
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    • 2000
  • A dual gate trench emitter IGBT structure is proposed and studied numerically using the device simulator MEDICI. The on-state forward voltage drop latch-up current density turn-off time and breakdown voltage of the proposed structure are compared with those of the conventional DMOS-IGBT and trench gate IGBT structures. The proposed structure forms an additional channel and increases collector current level resulting in reduction of on -state forward voltage drop. In addition the trench emitter increases latch-up current density by 148% in comparison with that for the conventional DMOS-IGBT and by 83% compared with that for the trench gate IGBT without degradation in breakdown voltage when the half trench gate width(Tgw) and trench emitter depth(Ted) are fixed at $1.5\mum\; and\; 2\mum$, respectively

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교육용 디지털 논리회로 시뮬레이터 설계 및 구현 (Design & Implementation of an Educational Digital Logic Circuit Simulator)

  • 김은주;류승필
    • 컴퓨터교육학회논문지
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    • 제11권2호
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    • pp.65-78
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    • 2008
  • 기존의 교육용 디지털 시뮬레이터들은 논리소자(AND, OR gate 등)의 입력 포트 수, 선의 상태변화, custom component등에 대한 제한이 있다. 본 논문에서는 이러한 제한을 완화시키고, 큰 규모의 논리를 여러 개의 도면으로 나누어 처리할 수 있는 확장형 디지털 논리 회로 시뮬레이터 XSIM (eXpandable digital logic circuit SIMulator)을 제안한다. XSIM은 큰 회로를 여러 개의 페이지로 나누어 작업이 가능함으로 복잡한 논리도면 구성이나, 팀별수업에 도움이 될 것으로 기대된다.

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나노 구조 Double Gate MOSFET의 핀치오프특성에 관한 연구 (A study on the pinch-off characteristics for Double Gate MOSFET in nano structure)

  • 고석웅;정학기
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2002년도 추계종합학술대회
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    • pp.498-501
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    • 2002
  • 본 논문에서는 main gate(MG)와 side gate(SG)를 갖는 double gate(DG) MOSFET를 디자인하고 TCAD를 이용하여 시뮬레이션하였다. MG와 SG의 길이(LMG, LSG)는 각각 50nm, 70nm로 하였으며, MG와 SG의 전압(VMG, VSG)이 각각 1.5V, 3.0V일 때 드레인전압(VD)을 0에서 1.5V까지 변화시키면서 핀치오프특성을 조사하였다. LMG가 아주 작음에도 불구하고, 핀치-오프특성이 아주 좋게 나타났다. 이것은 DG MOSFET의 VMG가 게이트를 제어하는 역할을 잘 수행하여 나노 구조에서 유용한 구조임을 알 수 있었다.

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OFF 전류의 감소를 위한 다결정 실리콘 박막 트랜지스터의 구조 연구 (A Study on the Structure of Polycrystalline Silicon Thin Film Transistor for Reducing Off-Current)

  • 오정민;민병혁;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 하계학술대회 논문집 B
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    • pp.1292-1294
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    • 1993
  • This paper proposes a new structure of polycrystalline silicon(poly-Si) thin film transistor(TFT) having a thick gate-oxide below the gate edge. The new structure is fabricated by the gate re-oxidation in wet ambient. It is shown that the thick gate-oxide below the gate edge is effective in reducing the leakage current and the gate-drain overlap capacitance. We have simulated this device by using the SSUPREM4 process simulator and the SPISCES-2B device simulator. As a simulation result it is found that the new structure provides a low tentage current less than 0.2 pA and achieves a on/off ratio as high as $5{\times}10^7$.

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나노 구조 Double Gate MOSFET의 핀치오프특성에 관한 연구 (A study on the pinch-off characteristics for Double Cate MOSFET in nuo structure)

  • 고석웅;정학기
    • 한국정보통신학회논문지
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    • 제6권7호
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    • pp.1074-1078
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    • 2002
  • 본 논문에서는 main gate(MG)와 side gate(SG)를 갖는 double gate(DG) MOSFET를 디자인하고 TCAD를 이용하여 시뮬레이션하였다. MG와 SG의 길이(LMG, LSG)는 각각 50nm, 70nm로 하였으며, MG와 SG의 전압(VMG, VSG)이 각각 1.5V, 3.0V일 때 드레인전압(VD)을 0에서 1.5V까지 변화시키면서 핀치오프특성을 조사하였다. LMG가 아주 작음에도 불구하고, 핀치-오프특성이 아주 좋게 나타났다. 이것은 DG MOSFET의 VMG가 게이트를 제어하는 역할을 잘 수행하여 나노 구조에서 유용한 구조임을 알 수 있었다.

Design and Implementation of an FPGA-based Real-time Simulator for a Dual Three-Phase Induction Motor Drive

  • Gregor, Raul;Valenzano, Guido;Rodas, Jorge;Rodriguez-Pineiro, Jose;Gregor, Derlis
    • Journal of Power Electronics
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    • 제16권2호
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    • pp.553-563
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    • 2016
  • This paper presents a digital hardware implementation of a real-time simulator for a multiphase drive using a field-programmable gate array (FPGA) device. The simulator was developed with a modular and hierarchical design using very high-speed integrated circuit hardware description language (VHDL). Hence, this simulator is flexible and portable. A state-space representation model suitable for FPGA implementations was proposed for a dual three-phase induction machine (DTPIM). The simulator also models a two-level 12-pulse insulated-gate bipolar transistor (IGBT)-based voltage-source converter (VSC), a pulse-width modulation scheme, and a measurement system. Real-time simulation outputs (stator currents and rotor speed) were validated under steady-state and transient conditions using as reference an experimental test bench based on a DTPIM with 15 kW-rated power. The accuracy of the proposed digital hardware implementation was evaluated according to the simulation and experimental results. Finally, statistical performance parameters were provided to analyze the efficiency of the proposed DTPIM hardware implementation method.

게이트 및 기능 레벨 논리 시뮬레이터 (A Gate and Functional Level Logic Simulator)

  • 박홍준;김종성;조순복;신용철;임인칠
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(II)
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    • pp.1577-1580
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    • 1987
  • This paper proposes a gate and functional level logic simulator which can be run on XENIX O.S. The simulator has hierarchical structure including Hardware Description Language compiler, Waveform Description Language compiler, and Simulation Command Language compiler. The Hardware Description Language compiler generates data structure composed of gate structure, wire structure, condition structure, and event structure. Simulation algorithm is composed of selective trace and event-driven methods. To improve simulation speed, Cross Referenced Linked List Structure ia defined in building the data structure of circuits.

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내장된 전송게이트를 가지는 Gate/Body-Tied PMOSFET 광 검출기의 모델링 (Modeling of Gate/Body-Tied PMOSFET Photodetector with Built-in Transfer Gate)

  • 이민호;조성현;배명한;최병수;최평;신장규
    • 센서학회지
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    • 제23권4호
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    • pp.284-289
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    • 2014
  • In this paper, modeling of a gate/body-tied (GBT) PMOSFET photodetector with built-in transfer gate is performed. It can control the photocurrent with a high-sensitivity. The GBT photodetector is a hybrid device consisted of a MOSFET, a lateral BJT, and a vertical BJT. This device allows for amplifying the photocurrent gain by $10^3$ due to the GBT structure. However, the operating parameters of this photodetector, including its photocurrent and transfer characteristics, were not known because modeling has not yet been performed. The sophisticated model of GBT photodetector using a process simulator is not compatible with circuit simulator. For this reason, we have performed SPICE modeling of the photodetector with reduced complexity using Cadence's Spectre program. The proposed modeling has been demonstrated by measuring fabricated chip by using 0.35 im 2-poly 4-metal standard CMOS technology.

다층 리지스트 다층 기판 구조에서의 전자빔 리소그래피 공정을 위한 몬테카를로 시뮬레이터의 개발 (Development of a Monte Carlo Simulator for Electron Beam Lithography in Multi-Layer Resists and Multi-Layer Substrates)

  • 손명식;이진구;황호정
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2002년도 하계종합학술대회 논문집(2)
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    • pp.53-56
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    • 2002
  • We have developed a Monte Carlo (MC) simulator for electron beam lithography in multi-layer resists and multi-layer substrates in order to fabricate and develop high-speed PHEMT devices for millimeter- wave applications. For the deposited energy calculation to multi-layer resists by electron beam in MC simulation, we modeled newly for multi-layer resists and heterogeneous multi-layer substrates. Using this model, we simulated T-gate or r-gate fabrication process in PHEMT device and showed our results with SEM observations.

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