• KOREAN JOURNAL OF CROP SCIENCE
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• v.30 no.1
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• pp.26-32
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• 1985

Ten recommended rice varieties were cultivated in paddy area affected by air-pollutants and in normal area to select varieties adaptable to air-pollution environment. Rice plants grown in pollution site showed higher contents of total sulfur and fluorine in leaf through the whole growing period compared with those in non-pollution site, and rice leaves destroyed by air-pollutants were found only in pollution site. Rice grain yield and four yield components of ten rice varieties grown in pollution site were lower than those in normal area. Five rice varieties among ten were selected as adaptable to air-pollution environment, based on their yielding potential in pollution site and grain yield ratio between two sites. Rice varieties adaptable to pollution showed little variation of percent ripened grains and number of panicles per hill between two sites. Chlorophyll content in flag leaf of rice plants grown in pollution area was lower than in non-pollution area. No relationship was found between grain yield ratio (pollution/non-pollution site) of ten varieties and total sulfur content ratio, fluorine content ratio, chlorophyll content ratio between two sites, and percent destroyed leaf in pollution site, respectively. This result suggest that varietal adaptability to air-pollution environment is not related with the amount of pollutants absorbed, but with the degree of response to pollutants.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.44.2-44.2
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• 2009

Polycrystalline materials suchas yttria and alumina have been applied as a plasma resisting material for the plasma processing chamber. However, polycrystal line material may easily generate particles and the particles are sources of contamination during the plasma enhanced process. Amorphous material can be suitable to prevent particle generation due to absence of grain-boundaries. We manufactured nitrogen-containing $SiO_2-Al_2O_3-Y_2O_3$ based glasses with various contents of silicon and fixed nitrogen content. The thermal properties, mechanical properties and plasma etching rate were evaluated and compared for the different composition samples. The plasma etching behavior was estimated using XPS with depth profiling. From the result, the plasma etching rate highly depends on the silicon content and it may results from very low volatile temperature of SiF4 generated during plasma etching. The silicon concentration at the plasma etched surface was very low besides the concentration of yttrium and aluminum was relatively high than that of silicon due to high volatile temperature of fluorine compounds which consisted with aluminum and yttrium. Therefore, we conclude that the samples having low silicon content should be considered to obtain low plasma etching rate for the plasma resisting material.

• Journal of the Korean Ceramic Society
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• v.23 no.4
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• pp.1-10
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• 1986

The crystallization behaviour and the machinability of mica glass-ceramics with the content of F1 were studied. The material was made from the $K_2O-MgO-Al_2O_3-B_2O_3-SiO_2-F$ glasses by the heattreatment at 80$0^{\circ}C$-110$0^{\circ}C$ where the content of F-1 was changed in the range from 1, 3wt% to 6.1wt%. X-ray diffraction phase analysis and optical observation were adopted to study the crystallization behaviour. The machinability was measured by a manual sawing test and MOR. The crystal phases of these glass-ceramics identified by XRD were chondrodite fluoborite and norbergite at low temperature but fluorophlogopite at high temperature. The crystallization of glasses containing 1.3wt% -2.5wt% F-1 were predominately controlled by surface crystallization while the crystallization of glasses containing 3.8 wt% -6.1wt% F-1 were controlled by volume crystallization. Among the test the best machinability and strength value were obtained from those specimens contained fluoride 4.2wt% -4.4wt% and when the heattreatment was performed at 95$0^{\circ}C$-110$0^{\circ}C$ for 2 hours.

• Applied Chemistry for Engineering
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• v.8 no.1
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• pp.99-107
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• 1997

This study Provides the treatment methods of liquid wastes from the dissolution/purification process of nuclear fuel raw material and the fabrication process of nuclear fuel powder. One of the treatment methods is to process liquid waste from uranium raw material dissolution/purification process. This waste, of the strong acid, can be reused to dissolve the fine ADU particles in filtrate which is ADU waste of pH 8.0 converted from AUC waste after recovery of uranium. To dissolve the fine ADU particles, ADU filtrate was pretreated to pH 4.0 with the dissolution/purification waste, and then mixed with the lime to pH 9.2 and aged for 30 minutes. From this processing, uranium content of the filtrate was decreased to below 3ppm. The waste from fuel powder fabrication is emulsified solution dispersed with fine oil droplets. This emulsion was destroyed effectively by adding and mixing the nitric acid with rapid heating at the same time. After this processing, $Na_2U_2O_7$ compound is produced by addition of NaOH. Optimum condition of this processing was shown at pH 11.5, and uranium content of the filtrate was analyzed to 5ppm. To remove the trace of uranium in the filtrate, lime should be added. Otherwise, 4N nitric acid was used to destroy the emulsion directly, and then lime was added to this waste. Uranium content of the treated filtrate was below 1 ppm. In addition to these wastes, the trace of uranium in filtrate after recovery of uranium from the AUC waste which is produced during PWR power preparation, is treated with NaOH to takeup fluorine(F) in the waste because fluorine is valuable and toxic material. In the finally treated waste, uranium was not detected.

• Journal of Korean Ophthalmic Optics Society
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• v.15 no.3
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• pp.207-212
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• 2010

Purpose: Rigid gas permeable (RGP) contact lenses, based on fluorosilicone acrylate, were treated with plasma in air. Methods: The chemical compositions were analyzed by using X-ray photoelectron spectroscopy (XPS), the surface morphology and roughness of RGP contact lenses were observed by using atomic force microscopy (AFM), and the wettability changes were estimated by wetting angle measurement. Results: As the contact lenses were treated by the plasma, the F contents decreased significantly, and the O and Si contents increased on the surface. The number of oxygen-containing hydrophilic radicals (C-O and Si-O) increased greatly, the hydrophobic surface decreased, and the wetting angle increased. But the C-O bonds created with exchange of the fluorine did not increase a wettability. The surface compositions were not remarkably changed for the 6 months after plasma treatment, but the wetting angle increased again. Conclusions: It was considered that the improved wettability of the RGP contact lenses of high fluorine content after plasma treatment was affected by the activation of surface, the increase of Si-O, and the decrease of hydrophobic surface.

• Korean Chemical Engineering Research
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• v.56 no.3
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• pp.327-334
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• 2018

Water-repellent coating solutions were prepared by sol-gel method using tetraethoxysilane (TEOS) and methyltrimethoxysilane (MTMS) as precursors. The solutions were spin-coated on a cold-rolled steel sheet and thermally cured to prepare a non-fluorine water-repellent coating films. The effects of molar ratios of MTMS/TEOS, water concentration and ammonia concentration on the hydrophobic properties of the coating films were studied. The contact angle of water on coating films prepared by varying the molar ratio of MTMS/TEOS to 1~20 showed a maximum value of $108^{\circ}$ when the MTMS/TEOS molar ratio was 10. With increasing water content, the coating films showed the larger contact angles and the better the water repellency. As the amount of ammonia added was increased, the contact angles of coating films were increased, showing the better the water repellency. It is considered that the larger the amount of ammonia added, the larger the size of the silica particles generated, which increases the surface roughness of the silica particles, thereby increasing the water repellency.

• Korean Journal of Materials Research
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• v.10 no.2
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• pp.166-170
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• 2000

Nuclear fuel $UO_{2+x}$ power was produced from concentrated $UF_6$ by the DCP(Dry Conversion Process). The characterstics of $UO_{2+x}$ powder, prepared with respect to steam flowing conditions and temperature variations in a rotary kiln reactor, have been investigated with a uranium analyzer, water vapor measurement, and SEM. Fluorine content of the powder could be reduced to 8ppm. The moisture content was found to be optimized.

• Electrical & Electronic Materials
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• v.9 no.4
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• pp.404-409
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• 1996

The structural and electric properties of $Y_{1-x}$YbF$_{x}$Ba$_{2}$Cu$_{3}$O$_{7-y}$(x=0.0, 0.1, 0.2, 0.3, 0.4, 0.5 and 0.6) have been investigated by using XRD(X-ray diffraction), TMA(thennomechanical analysis), NMR(nuclear magnetic resonance) analysis and four probe method. $Y_{1-x}$YbF$_{x}$Ba$_{2}$Cu$_{3}$O$_{7-y}$ samples were prepared by conventional solid-state reaction method using $Y_{2}$O$_{3}$, BaCO$_{3}$, CuO and YbF$_{3}$ power. TMA and high temperature XRD results shows that orthorhombic to tetragonal phase transition occurs in the unfluorinated 1-2-3 sample while the phase change is not observed in the fluorinated 1-2-3 samples. Superconducting transition temperature(T$_{c}$) increases with increasing YbF$_{3}$ content ; T$_{c}$, of the sample reaching maximum of 102K for x=0.3, and then decreases with further increasing YbF$_{3}$ content. The structural analysis and T$_{c}$ results shows that the fluorine doping stabilize the orthorhombic phase, together with the increase in T$_{c}$.}$ c/.TEX> c/.

• Journal of the Korean Ceramic Society
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• v.49 no.4
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• pp.328-332
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• 2012

Etch rates of Si and high purity SiC have been compared for various fluorocarbon plasmas. The relative plasma resistance of SiC, which is defined as the etch rate ratio of Si to SiC, varied between 1.4 and 4.1, showing generally higher plasma resistance of SiC. High resolution X-ray photoelectron analysis revealed that etched SiC has a surface carbon content higher than that of etched Si, resulting in a thicker fluorocarbon polymer layer on the SiC surface. The plasma resistance of SiC was correlated with this thick fluorocarbon polymer layer, which reduced the reaction probability of fluorine-containing species in the plasma with silicon from the SiC substrate. The remnant carbon after the removal of Si as volatile etch products augments the surface carbon, and seems to be the origin of the higher plasma resistance of SiC.

• Applied Science and Convergence Technology
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• v.24 no.2
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• pp.41-46
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• 2015

Transparent conductive oxides (TCOs) are essential material in optoelectronics such as solar cells, touch screens and light emitting diodes. Particularly TCOs are attractive material for infrared cut off film due to their high transparency in the visible wavelength range and high infrared reflectivity. Among the TCO, Indium tin oxide has been widely used because of the high electrical conductivity and transparency in the visible wavelength region. But ITO has several limitations; expensive and low environmental stability. On the other hands, fluorine doped tin oxide (FTO) is well known for low cost, weather ability and stable in acidic and hydrogen. In this study, two different magnetron sputtering techniques with RF and DC modes at room temperature deposition of FTO thin film was conducted. The change of oxygen content is influence on the topography, transmittance and refractive index.