• Tribology and Lubricants
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• 제24권6호
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• pp.355-361
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• 2008

In highly stressed machine elements such as angular contact ball bearings and toroidal type traction drives, the elastohydrodynamic lubrication of elliptical contacts with both rolling and spinning motion are occur. In this paper, a finite difference method with non-uniform grid systems and the Newton-Raphson method are applied to solve the problems. Pressure distributions, film contours and variations of the minimum and central film thicknesses are compared with various ellipticity parameter, dimensionless speed and load parameter. The results showed that the spinning motion has significant influence especially on the film shapes. Reduction of the minimum film thickness under spinning is remarkable whereas the central film thickness is relatively less. Especially variations of the minimum film thicknesses with rolling velocity, load and ellipticity ratio are a great different from those of pure rolling. Therefore present numerical scheme can be used in the analysis of general elliptical contact EHL problems and further studies are required.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2004년도 학술대회지
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• pp.283-288
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• 2004

The measurement of ultra low aspect ratio fluid film thickness is very crucial technique both for the verification of lubrication media characteristics and for the clearance design in many precision components such as MEMS, precision bearings and other slideways. Many technologies are applied to the measurement of ultra low aspect ratio fluid film thickness (i.e. elastohydrodynamic lubrication film thickness). In particular, in-situ optical interferometric method has many advantages in making the actual contact behaviors realized with the experimental apparatus. This measurement method also does the monitoring of the surface defects and fractures happening during the contact behavior, which are delicately influenced by the surface conditions such as load, velocity, lubricant media as well as surface roughness. Careful selection of incident lights greatly enhances the fringe resolutions up to $\~1.0$ nanometer scale with digital image processing technology. In this work, it is found that coaxial aligning trichromatic incident light filtering system developed by the author can provide much finer resolution of ultra low aspect ratio fluid film thickness than monochromatic or dichromatic incident lights, because it has much more spectrums of color components to be discriminated according the variations of film thickness. For the measured interferometric images of ultra low aspect ratio fluid film thickness it is shown how the film thickness is finely digitalized and measured in nanometer scale with digital image processing technology and space layer method. The developed measurement system can make it possible to visualize the contact deformations and possible fractures of contacting surface under the repeated loading condition.

• 센서학회지
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• 제20권2호
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• pp.114-117
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• 2011

A thick 25 ${\mu}m$ thickness poled P(VDF/TrFE) film pyroelectric infrared ray sensor has been fabricated and then thin 1.6 ${\mu}m$ thickness P(VDF/TrFE) film pyroelectric infrared ray sensor has been fabricated also. These thick and thin P(VDF/TrFE) film pyroelectric infrared ray sensor was mounted in TO-5 housing to detect infrared light of 5.5 ~ 14 ${\mu}m$ wavelength for human body detecting with each other. The noise output voltage of the thick P(VDF/TrFE) film pyroelectric infrared ray sensor were 380 mV and NEP(noise equivalent power) is $3.95{\times}10^{-7}$ W which is the similar value with the commercial pyroelectric infrared ray sensor using ceramic materials as a sensing material. The NEP and specific detectivity $D^*$ of the thin P(VDF/TrFE) film pyroelectric infrared ray sensor were $2.13{\times}10^{-8}$ W and $9.37{\times}106$ cm/W under emission energy of 13 ${\mu}W/cm^2$ respectively. These result caused by lower thermal diffusion coefficient of a thin 1.6 ${\mu}m$ thickness PVDF/TrFE film than the thick 25 ${\mu}m$ thickness poled P(VDF/TrFE) film pyroelectric infrared ray sensor.

• Nuclear Engineering and Technology
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• 제55권4호
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• pp.1518-1527
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• 2023

A method was proposed for in-situ evaluating the thickness and resistivity of the oxide/hydroxide film formed on the surface of aluminum alloy exposed to sump water formed in the containment after a loss-of-coolant accident. The evaluation entailed fitting a model for the film impedance, which has film thickness and other variables describing the resistivity profile of the film along its thickness direction as fitting parameters, to the practically measured electrochemical impedance data. The obtained resistivity profiles implied that the films formed at pHs_25℃ 7, 8, 9, 10, and 11 all had a duplex structure; compared to the outer layer in contact with the solution, the inner layer of the film had a much higher resistivity and was inferred to be denser and provide most of the protectiveness of the film. Both the thickness and the total resistance of the film decreased with the increasing solution pH_25℃, suggesting that the films formed in more alkaline solutions had less protectiveness against corrosion, consistent with the increasing aluminum alloy corrosion rates previously identified.

• E2M - 전기 전자와 첨단 소재
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• 제7권2호
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• pp.145-151
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• 1994

The multi-dielectric layer SiOz/Si3N4/SiO2(ONO) is used to scale down the memory device. In this paper, the change of composition in ONO layer due to the process condition and the conduction mechanism are observed. The composition of the oxide film grown through the oxidation of nitride film is analyzed using auger electron spectroscopy(AES). AES results show that oxygen concentration increases at the interface between oxide and nitride layers as the thickness -of the top oxide layer increases. Results of I-V measurement show that the insulating properties improve as the thickness of the top oxide layer increases. But when the thickness of the nitride layer decreases below 63.angs, insulating peoperties of film 28.angs. of top oxide and film 35.angs. turn over showing that insulating property of film 28.angs. of top oxide is better than that of film 35.angs. of top oxide. This phenomenon of turn over is thought as the result of generation of surface state due to oxygen flow into nitride during oxidation process. As the thickness of the top oxide and nitride increases, the electrical breakdown field increases, but when the thickness of top oxide reaches 35.angs, the same phenomenon of turn over occurs. Optimum film thickness for scaled multi-layer dielectric of memory device SONOS is estimated to be 63.angs. of nitride layer and 28.angs. of top oxide layer. In this case, maximum electrical breakdown field and leakage current are 18.5[MV/cm] and $8{\times}{10^-12}$[A], respectively.

• 한국분무공학회지
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• 제12권4호
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• pp.211-219
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• 2007

The liquid film thickness inside a pressure-swirl nozzle was measured, and then the measured liquid film thickness was compared with the results from previous empirical equations. The liquid film inside the nozzle was visualized using extended transparent nozzles and a microscopic imaging system, and then the measurement error was evaluated using optical geometry analysis. The high injection pressures up to 7MPa were adopted to simulate the injection conditions of the direct-injection spark-ignition engines. The totally different two injectors with different fuels, nozzle lengths, nozzle diameters and swirlers were utilized to obtain the comprehensive equations. The results showed that the liquid film thickness very slightly decreased at high injection pressures and the empirical equations overestimated the effect of injection pressure. Most of empirical equations did not include the effect of nozzle length and swirler angle, although it caused significant change in liquid film thickness. A new empirical equation was suggested based on the experimental results with the effects of fuel properties, injection pressure, nozzle diameter, nozzle length and swirler angle.

• 한국정보통신학회논문지
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• 제22권1호
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• pp.117-124
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• 2018

박막 두께가 다른 무접합 비정질 InGaZnO 막막 트랜지스터를 제작하고 박막 두께, 동작 온도 및 빛의 세기에 따른 소자의 성능 변수를 추출하고 게이트 산화층 항복전압을 분석하였다. 박막의 두께가 클수록 소자의 성능이 우수하나 드레인 전류의 증가로 게이트 산화층 항복전압은 감소하였다. 고온에서도 소자의 성능은 개선되었으나 게이트 산화층 항복 전압은 감소하였다. 빛의 세기가 증가할수록 광자에 의해 생성된 전자로 드레인 전류는 증가 하였으나 역시 게이트 산화층 항복전압은 감소하였다. 박의 두께가 클수록, 고온일수록, 빛의 세기가 강할수록 채널의 전자수가 증가하여 산화층으로 많이 주입되었기 때문이다. 무접합 a-IGZO 트랜지스터를 BEOL 트랜지스터로 사용하기 위해서는 박막 두께 및 동작 온도를 고려해서 산화층 두께를 설정해야 됨을 알 수 있었다.

• 산업경영시스템학회지
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• 제38권3호
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• pp.21-28
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• 2015

As film products are increasingly used in a wide range of areas, from producing traditional flexible packaging to high-tech electronic products, a higher level of quality is demanded. Most film products are made in the form of rolled finished goods, therefore, various quality issues related to their shape characteristics must be addressed. The thickness of the film products is one of the most common and important critical-to-quality attributes (CTQs). Particularly, the degree of thickness uniformity is more important than other thickness parameters, because it will be potential causes of many secondary thickness-related quality problems, such as wrinkles or faulty windings. To control the degree of thickness uniformity, the fixed bending region is oneof the most important CTQs to manage. Fixed bending regions are special points in the transverse direction of a rolled product with consistent minute variations of the thickness gap. This paper describes the measurement and analysis of thickness uniformity data, which were performed in a real manufacturing field of biaxial oriented polypropylene (BOPP) film. In previous researches, quality function deployment (QFD) or fault tree analysis were used to find the most critical process attributes out to controlthe CTQ of thickness uniformity. Whereas, this paper uses traditional control charts to find the most critical process attributes out in this problem. In addition, the selection of one of the major critical process attributes (CTPs) that is expected to affect the CTQ of thickness uniformity is also described. The selected critical-to-process attributes are the controlled temperatures along the transverse direction. A dramatic improvement in thickness uniformity was observed when the selected CTPs were controlled.

• Transactions on Electrical and Electronic Materials
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• 제18권2호
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• pp.93-96
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• 2017

The structural, electrical and optical properties of Ti thin films fabricated by dual magnetron sputtering were investigated under various film thicknesses. The fabricated Ti thin films exhibited uniform surfaces, crystallinity, various grain sizes, and with various film thicknesses. Also, the crystallinity and grain size of the Ti thin films increased with the increase of film thickness. The electrical properties of Ti thin films improved with the increase of film thickness. The results showed that the performance of TCO-less DSSC critically depended on the film thickness of the Ti working electrodes, due to the conductivity of Ti thin film. However, the maximum conversion efficiency of TCO-less DSSC was exhibited at the condition of 100 nm thickness due to the surface scattering of photons caused by the variation of grain size.

• 대한기계학회논문집B
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• 제31권12호
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• pp.1017-1023
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• 2007

This study is intended to analyze the effect of thin ink-film thickness around rotating printing roll on the printing quality in the gravure printing process which is used for making electronics circuit like a RFID tag with a conductive ink. The present work numerically estimates the film thickness around rotating roller partially immersed in ink for which the volume of fluid (VOF) method was adopted to figure out the film formation process around rotating roller. Parameter studies were performed to compare the effect of ink properties (viscosity, surface tension), operating condition (roller rotating speed, initial immersed angle) on the film thickness. The result indicates that the film thickness has a strong dependency on the rotating speed, while the surface tension has negligible effect.