• Title/Summary/Keyword: Field emitter

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Effects of the irrigation Rate on Wetted Patterns in Sandy Loam Soil Under Trickle irrigation Condition (점적관개에서 관개율이 Sandy Loam토양의 습윤양상에 미치는 영향)

  • 김철수;이근후
    • Magazine of the Korean Society of Agricultural Engineers
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    • v.31 no.2
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    • pp.104-115
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    • 1989
  • In an effort to clarify the wetted patterns of sandy loam soil under trickle irrigation conditions, the distance of wetted zone, infiltration capacity and soil wetted patterns, etc. were measured by gypsum block as soil moisture sensor located every 5 cm vertically and horizontaly in the soil bin under the such conditions as a). irrigation rates set to 2, 4, 6, 8 liters per hour b). total amount of water applied fixed to 14.62 liters per soil bin c) the hearing force of soil measured by plate penetrometer ranging from 1.04 to 1.22kg/cm$_2$ The results can be summarized as follows ; 1. The wetted distance in horizontal direction(H), the wetted distance in vertical direction(D), the horizontal infiltration capacity (iH) and the vertical infiltration capacity(in)could by explained as a function of time t. 2. The horizontal wetted distance (H) is explained by an exponetial function H= a$.$ t where b was found ranging from 021 to 026 under surface trickle irrigation, which was considered a lotlower than the classical value of 0.5 and these measurements were indifferent to the increasing irrigation rates. 3. As for the surface trickle irrigation where horizontal infiltration capacity(iH) is explained as iH = A $.$ t h, the coefficient A increases with respect to irrigation rates within the limits of 0.89~1.34. 4. In terms of surface trickle irrigation of the ratio of Dm Which is maximum vertical wetted distance to Hm, which is maximum horizontal wetted distance, found to be within range of 1.0 to 1.21. It was also noted that the value of Dm decreses when irrigation rates increases while the value of Hm changes the opposite direction. 5. The optimum location of sensors from emitter for surface trickle irrigation should he inside of hemisphere whose lateral radius is 28~30cm long and vertical radius is 10~12cm long. The distance between emitters should be within 60cm long. 6. In the study of vertical wetted distance( D) where D= a $.$ tb, the exponential coefficient b ranged from 0.61 to 0.75 in surface trickle irrigation, and from 0A9 to 0.68 for subsurface trickle irrigation. These measurements showed an increasing tendency to with respect to irrigation rates. 7. In case of vertical infiltration capacity( in), where iD= A $.$ t 1-h, the coefficient A for surface trickle irrigation found to be within range of 0.16 to 0.19 and did not show any relationships with varying degree of irrigation rates. However, the coefficient was varying from 0.09 to 0.22 and showed a tendency to increase vis-a-vis irrigation rates for subsurface trickle irrigation, in contrast. 8. In the observation of subsurface trickle irrigation, it was found that Dm/Hm ratio was within 1.52 to 1.91 and showed a decreasing tendency with respect to increasing rates of irrigation. 9. The location of sensors for subsurface trickle irrigation follows same pattern as above, with vertical distance from emitter being 10~17cm long and horizontal 22~25cm long. The location of emitter should be 50 cm. 10.The relationship between VS which is the volume of wetted soil and Q which is the total amount of water when soil is reached field capacity could be explained as VS= 2.914Q0.91and the irrigation rates showed no impacts on the above relationship.

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A Numerical Model of Three-dimensional Soil Water Distribution for Drip Irrigation Management under Cropped Conditions (작물 흡수를 고려한 3차원 토양수분 분포 모델 개발을 통한 최적 점적 관개 연구)

  • Kwon, Jae-Phil;Kim, Seung-Hyun;Yoo, Sun-Ho;Ro, Hee-Myong
    • Applied Biological Chemistry
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    • v.43 no.2
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    • pp.116-123
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    • 2000
  • A numerical model of three-dimensional soil water distribution for drip irrigation management under cropped conditions was developed using Richards equation in Cartesian coordinates. The model accounts for both seasonal and diurnal changes in evaporation and transpiration, and the growth of plant root and the shape of root zone. Solutions were numerically approximated using the Crank-Nicolson implicit finite difference technique on the block-centered grid system and the Gauss-Seidel elimination in tandem. The model was tested under several conditions to allow the flow rates and configurations of drip emitters vary. In general, simulation results agreed well with experimental results and were as follows. The velocity of soil-water flow decreased drastically with distance from the drip source, and the rate of expansion of the wetted zone decreased rapidly during irrigation. The wetting front of wetted zone from a surface drip emitter traveled farther in vertical direction than in horizontal direction. Under this experimental weather condition, water use efficiency of a drip-irrigated apple field was greatest for 4-drip-emitter system buried at 25 cm, resulting from 10% increase in transpiration but 20% reduction in soil evaporation compared to those for surface 1-drip emitter system. Soil moisture retention curve obtained using disk tension infiltrometer showed significant difference from the curve obtained with pressure plate extractor.

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The reliability physics of SiGe hetero-junction bipolar transistors (실리콘-게르마늄 이종접합 바이폴라 트랜지스터의 신뢰성 현상)

  • 이승윤;박찬우;김상훈;이상흥;강진영;조경익
    • Journal of the Korean Vacuum Society
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    • v.12 no.4
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    • pp.239-250
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    • 2003
  • The reliability degradation phenomena in the SiGe hetero-junction bipolar transistor (HBT) are investigated in this review. In the case of the SiGe HBT the decrease of the current gain, the degradation of the AC characteristics, and the offset voltage are frequently observed, which are attributed to the emitter-base reverse bias voltage stress, the transient enhanced diffusion, and the deterioration of the base-collector junction due to the fluctuation in fabrication process, respectively. The reverse-bias stress on the emitter-base junction causes the recombination current to rise, increasing the base current and degrading the current gain, because hot carriers formed by the high electric field at the junction periphery generate charged traps at the silicon-oxide interface and within the oxide region. Because of the enhanced diffusion of the dopants in the intrinsic base induced by the extrinsic base implantation, the shorter distance between the emitter-base junction and the extrinsic base than a critical measure leads to the reduction of the cut-off frequency ($f_t$) of the device. If the energy of the extrinsic base implantation is insufficient, the turn-on voltage of the collector-base junction becomes low, in the result, the offset voltage appears on the current-voltage curve.

Field Emission Characteristics of Surface-treated CNT Emitter by Ar Ion Bombardment (아르곤 이온에 의해 표면처리된 CNT 에미터의 전계방출 특성)

  • Kwon, Sang-Jik
    • 전자공학회논문지 IE
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    • v.44 no.2
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    • pp.26-31
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    • 2007
  • A surface treatment was performed after the screen printing of a carbon nanotube paste for obtaining the carbon nanotube field emission array(CNT FEA) on the soda-lime glass substrate. In this experiment, Ar ion bombardment was applied as an effective surface treatment method. After making a cathode electrode on the glass substrate, photo sensitive CNT paste was screen-printed, and then back-side was exposure by uv light. Then, the exposed CNT paste was selectively remained by development. After post-baking, the remained CNT paste was bombarded by accelerated Ar ions for removing some binders and exposing only CNTs. As results, the field emission characteristics were strongly depended on the accelerating energy. At 100 eV, the emission was highest and as the acceleration energy increases more then 100 eV, the emission decreased. This was due to the removal of CNT itself as well as binders.

The effect of wet-etching process on the gate insulator for fabrication of metal tip FEA (Metal tip FEA 의 제조시 식각 용액이 게이트 산화막에 미치는 영향)

  • Jung, Yu-Ho;Jung, Jae-Hoon;Park, Heung-Woo;Song, Man-Ho;Lee, Yun-Hi;Ju, Byeong-Kwon;Oh, Myung-Hwan;Kim, Chul-Ju
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1450-1452
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    • 1996
  • In order to optimize the characteristics of gate insulator for FED(field emission device), we investigated the effect of wet-etching process on the gate insulator for fabrication of FED. We used the general three types of etchants for fabrication of the metal tip FEA(field emitter array), they are MO and oxide etchants to form the gate hole, and Al etchant to remove the release layer. In the result of the breakdown field of the insulator by the measure of the current-voltage characteristics, the breakdown field of insulator for immersing in oxide etchant was rapidly lowering with increasing etching time, but that for immersing in Al etchant was slow lowering. Also, in comparing cleaning with non-cleaning samples, the breakdown field of the cleaning samples was higher than that of non-cleaning samples.

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Field Emission Characteristics of Carbon Nanotube-Copper Composite Structures Formed by Composite Plating Method (복합도금법으로 형성된 탄소나노튜브-구리 복합구조물의 전계방출특성)

  • Sung Woo-Yong;Kim Wal-Jun;Lee Seung-Min;Yoo Hyeong-Suk;Lee Ho-Young;Joo Seung-Ki;Kim Yong-Hyup
    • Journal of the Korean institute of surface engineering
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    • v.38 no.4
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    • pp.163-166
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    • 2005
  • Carbon nanotube-copper composite structures were fabricated using composite plating method and their field emission characteristics were investigated. Multi-walled carbon nanotubes (MWNTs) synthesized by chemical vapor deposition were used in the present study. It was revealed that turn-on field was about $3.0\;V/{\mu}m$ with the current density of $0.1\;{\mu}A/cm^2.$ We observed relatively uniform emission characteristics as well as stable emission current Carbon nanotube-copper composite plating method is efficient and it has no intrinsic limit on the deposition area. Moreover, it gives strong adhesion between emitters and an electrode. Therefore, we recommend that carbon nanotube-copper composite plating method can be applied to fabricate electron field emitters for large area FEDs and large area vacuum lighting sources.

Fabrication and Characterization of Si-tip Field Emitter Array (실리콘 팁 전계 방출 소자의 제조 및 동작 특성 평가)

  • 주병권;이상조;박재석;이윤희;전동렬;오명환
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.1
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    • pp.65-73
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    • 1999
  • Si-tip FEAs were fabricated by a lift-off based process and their operating properties were evaluated. The dependence of emission current on applied gate and anode voltages, maximum emission current, hysteresis phenomena, MOSFET-type curves, current fluctuation, light emission from the emitted electrons, and failure mechanism of the device were widely discussed based on the experimental results.

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Fabrication of carbon nanotube electron beam (C-beam) for thin film modification

  • Kang, Jung Su;Lee, Su Woong;Lee, Ha Rim;Chung, Min Tae;Park, Kyu Chang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.171.1-171.1
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    • 2015
  • Carbon nanotube emitters is very promising electron emitter for electron beam applications. We introduced the carbon nanotube electron beam (C-beam) exposure technic using triode structure. As a source, the electron beam emit from CNT emitters placed at the cathode by high electric field. Through the gate mesh, with high accelerating energy, the electron can be extracted easily and impact at the anode plate. For thin film modification, after the C-beam exposure on the amorphous silicon thin film, we found phase changes and it showed a high crystallinity from the Raman measurement. We expect that this crystallized film will be a good candidate as a new active layer of TFT.

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A New Structure of Triode-type CNT-FEAs for Enhanced Electron Emission and Beam Focusing

  • Jun, Pil-Goo;Kwak, Byung-Hwak;Noh, Hyung-Wook;Lee, Soo-Myun;Uh, Hyung-Soo;Park, Sang-Sik;Ko, Sung-Woo;Cho, Euo-Sik;Lee, Jong-Duk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.456-458
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    • 2004
  • We proposed a novel triode-type carbon nanotube field emitter arrays in which extracted gate is surrounded by CNT emitters. We carried out 3-dimensional numerical calculations of electrostatic potential for the proposed CNT-FEAs using the finite element method and compared the results with those obtained from the structure of conventional CNT-FEAs. It was found that the proposed structure could reduce the turn-on voltage for electron emission and improve beam focusing.

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Development and Evaluation of an Electron Beam Source for Microscopy and Its Applications

  • Ahn, Seung-Joon;Oh, Tae-Sik;Kim, Ho-Seob;Ahn, Seong-Joon
    • Journal of the Optical Society of Korea
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    • v.14 no.2
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    • pp.127-130
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    • 2010
  • We have developed an efficient electron beam (e-beam) source, a microcolumn, that can be used as a source module for of microscopy and its applications. To obtain a low operating voltage, a very sharp cold field electron emitter was developed by electrochemically etching a tungsten wire. Laser diffraction was used for the fabrication of high-quality electron lenses and for their precise alignment. The measurement of the e-beam currents, and SEM images captured by the microcolumn confirmed the potential of the device as a very good e-beam source.