• 제목/요약/키워드: Ferroelectric hysteresis

검색결과 173건 처리시간 0.026초

AFE 영역 PLZT 박막의 전기 및 광학 특성 (Electrical and Optical Characteristics of PLZT Thin Films in AFE region)

  • 류완균;최형욱;장낙원;강종윤;백동수;박창엽
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
    • /
    • pp.1.1-4
    • /
    • 1995
  • In this study, PLZT thin films in AFE region prepared by sol-gel processing were investigated. And PLZT stock solutions were spin-coated on ITO-glass. The PLZT thin films were annealed by RTA. Hysteresis curves, dielectric characteristics and optical transmittances were measured in order to investigates the characteristics far the thin films. The PLZT thin films were crystallized at 750$^{\circ}C$ for 5 mimutes by RTA and the rosette structure composed of perovskite observed in the thin films. In case La content was 2/90/10 antiferroelectric-ferroelectric phase boundary was 2/90/10 PLZT thin film, and its hysteresis curve was good for application of optical information storage.

Ar/Cl$_2$ 유도결합플라츠마 식각 후 SBT 박막의 전기적 특성 (Electrical Properties of SBT Thin Films after Etching in Cl$_2$/Ar Inductively Coupled Plasma)

  • 이철인;권동표;깅창일
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
    • /
    • pp.58-61
    • /
    • 2002
  • SBT thin films were etched at different content of Cl$_2$in Cl$_2$/Ar plasma. We obtained the maximum etch rate of 883 ${\AA}$/min at Cl$_2$(20%)/Ar(80%). As Cl$_2$ gas increased in Cl$_2$/Ar plasma, the etch rate decreased. The maximum etch rate may be explained by variation of volume density for Cl atoms and by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction with formation of low-volatile products, which can be desorbed only by ion bombardment. The variation of volume density for Cl, F and Ar atoms and ion current density were measured by the optical emission spectroscopy and Langmuir probe. To evaluate the physical damage due to plasma, X-ray diffraction and atomic force microscopy analysis carried out. After etching process, P-E hysteresis loops were measured by ferroelectric workstation.

  • PDF

강인제어 기법과 입력성형법을 이용한 자벌레의 정밀 위치 제어 (Precise Position Control of Inchworm Using Robust Control Technique and Input Shaping)

  • 양광용;황윤식;김영식;김인수
    • 한국소음진동공학회논문집
    • /
    • 제19권2호
    • /
    • pp.169-175
    • /
    • 2009
  • This paper presents motion control of the Inchworm composed of the piezoelectric actuators and mechanical elements. Piezoelectric actuator shows nonlinear response characteristics including hysteresis due to the ferroelectric characteristics. This paper proposes feedback control scheme to improve the ability of tracking response to complex input signal and suppress the phenomenon of hysteresis using the sliding mode control technique with the integrator. The sliding mode control system has the limit to minimize both the settle time and overshoot. For making up this limit, this paper also suggests input shaping technique suitable to the inchworm control system.

LQG/LTR 기법을 이용한 이송자벌레 변위의 정밀 제어 (Precise Control of Inchworm Displacement Using the LQG/LTR Technique)

  • 전윤한;황윤식;박흥석;김인수
    • 한국생산제조학회지
    • /
    • 제24권4호
    • /
    • pp.414-420
    • /
    • 2015
  • In this study, the linear quadratic Guassian loop transfer recovery (LQG/LTR) control technique was combined with an integrator and applied to an inchworm having piezoelectric actuators for precise motion tracking. The piezoelectric actuator showed nonlinear response characteristics, including hysteresis, due to its ferroelectric characteristics and the residual displacement phenomenon. This paper proposes a feedback control scheme using the LQG/LTR controller with an integrator to improve the ability to track the response to complex input signals and to suppress the phenomenon of hysteresis and residual vibration. Experimental results show that the developed feedback control system for an inchworm can track the various motion contours quickly without residual vibration or overshoot.

LaFeO3 함량에 따른 (1-x)Bi0.5(Na0.78K0.22)0.5TiO3-xLaFeO3의 강유전, 압전 특성 (Effect of LaFeO3 Doping on the Ferroelectric and Piezoelectric Properties of Bi0.5(Na0.78K0.22)0.5TiO3 Lead-Free Piezoceramics)

  • 박춘길;임지호;박정수
    • 한국전기전자재료학회논문지
    • /
    • 제30권3호
    • /
    • pp.157-161
    • /
    • 2017
  • $(1-x)Bi_{0.5}(Na_{0.78}K_{0.22})_{0.5}TiO_3-xLaFeO_3$ ceramics were fabricated using a solid state reaction method. The microstructural, ferroelectric and piezoelectric properties were characterized using X-ray diffraction (XRD), scanning electron microscope (SEM), and polarization hysteresis loops (P-E). XRD results indicated that BNKT ceramic crystal structure modified by $LaFeO_3$ was transformed from a ferroelectric tetragonal to a non-polar pesudo-cubic phase with increased $LaFeO_3$ content. The improved piezoelectric properties resulted from the addition of $LaFeO_3$ up to 3 mol%. The $LaFeO_3$ 3mol% sample showed markedly improved piezoelectric and strain behaviors in comparison with pure BNKT ceramic.

$LiNbO_3$ 강유전체 박막을 이용한 MFS 커패시터의 게이트 전극 변화에 따른 특성 (Properties of MFS capacitors with various gate electrodes using $LiNbO_3$ferroelectric thin film)

  • 정순원;김광호
    • 한국진공학회지
    • /
    • 제11권4호
    • /
    • pp.230-234
    • /
    • 2002
  • 고온 급속 열처리를 행한 $LiNbO_3Si$/(100) 구조를 가지고 여러 가지 전극을 사용하여 금속/강유전체/반도체 커패시터를 제작하였으며, 제작한 커패시터의 비휘발성 메모리 응용 가능성을 확인하였다. MFS 커패시터의 C-V 특성 곡선에서는 LiNbO$_3$박막의 강유전성으로 인한 히스테리시스 특성이 관측되었으며, 1 MHz C-V 특성 곡선의 축적 영역에서 산출한 비유전율은 약 25 이었다. Pt 전극을 사용하여 제작한 커패시터에서는 인가 전계 500 kV/cm 범위에서 $1\times10^{-8}$ A/cm 이하의 우수한 누설전류 특성이 나타났다. midgap 부근에서의 계면 준위 밀도는 약 $10^{11}\textrm{cm}^2$.eV 이었으며, 잔류분극 값은 약 1.2 $\muC/\textrm{cm}^2$ 였다. Pt 전극과 A1 전극 모두 500 kHz 주파수의 바이폴러 펄스를 인가하면서 측정한 피로 특성에서 $10^{10}$ cycle 까지 측정된 잔류 분극 값이 초기 값과 같았다.

$LiNbO_3$ 강유전체 박막을 이용한 저전압용 MFS 디바이스의 특징 (Properties of Low Operating Voltage MFS Devices Using Ferroelectric $LiNbO_3$ Film)

  • 김광호;정순원;김채규
    • 전자공학회논문지D
    • /
    • 제36D권11호
    • /
    • pp.27-32
    • /
    • 1999
  • 고온 열처리 시킨 $LiNbO_3/Si$(100) 구조를 이용한 MFS 디바이스를 제작하여 비휘발성 메모리 동작을 확인하였다. 제작한 트랜지스터의 선형영역에서 산출한 전계효과 이동도와 상호 컨덕턴스는 각각 약 $600cm^2/Vs$ 및 0.16mS/mm 이었다. 0.5V의 게이트 전압(즉, read 전압)에서 측정한 드레인 전류의 온/오프 비는 $10^4$배 이상이었다. 분극반전에 사용한 전압은 ${\pm}3V$ 이하로 매우 낮아 이는 저소비전력용 집적회로에 적용시키기에 기대가 된다. 세게 도핑시킨 반도체위에 제작한 MFS 커패시터는 500kHz의 바이폴라 전압펄스(peak-to-peak 6V, 50% duty cycle) 측정으로 $10^{10}$ cycle 까지도 분극의 열화현상이 없는 양호한 특성을 얻었다.

  • PDF

졸-겔법으로 제조한 $PbTiO_3$ Interlayered PZT 박막의 미세구조와 강유전 특성 (Microstructure and Ferroelectric Properties of Sol-gel Derived $PbTiO_3$ Interlayered PZT Thin Films)

  • 임동길;최세영;정형진;오영제
    • 한국세라믹학회지
    • /
    • 제32권12호
    • /
    • pp.1408-1416
    • /
    • 1995
  • Microstructure and ferroelectric properties of sol-gel derived PZT(52/48) and PT interlayered PZT(52/48) thin films on Pt/Ti/SiO2/Si substrates were investigated. Films were fabricated using Acetylacetone chelated PT and PZT(52/48) sols. PZT(52/48) thin films annealed at $700^{\circ}C$ for 20 min showed the rosette structure with the size of 1.2~1.6${\mu}{\textrm}{m}$ and the pyrochlore phse was contained. PT interlayered PZT thin films, which is inserted by PbTiO3 thin layer with the thickness of 130 $\AA$ between PZT thin film and electrode, consisted of a single perovskite phase after annealing above 55$0^{\circ}C$. They exhibited the uniform and columnar grains of 0.1~0.16${\mu}{\textrm}{m}$, which are applicable for microelectronic device including non-volatile memory. Typical P-E hysteresis loops could be obtained from PT interlayered PZT thin film at as low as the annealing temperature of 50$0^{\circ}C$. Ferroelectric properties of PT interlayered PZT thin films were improved as increasing annealing temperature up to $700^{\circ}C$, and then deteriorated at 75$0^{\circ}C$. PZT(52/48) and PT interlayered PZT(52/48) thin film annealed at $700^{\circ}C$ for 20 min displayed Ps=38.8$\mu$C/$\textrm{cm}^2$, Pr=10.0$\mu$C/$\textrm{cm}^2$, Ec=65.3 kV/cm and Ps=28.5$\mu$C/$\textrm{cm}^2$, Pr=9.8$\mu$C/$\textrm{cm}^2$, Ec=76.1 kV/cm, respectively.

  • PDF

Cl2/CF4 플라즈마에 Ar, O2 첨가에 따른 PZT 박막의 식각 손상 개선 효과 (Reduce of Etching Damage of PZT Thin Firms with Addition of Ar and O2 in Cl2/CF4 Plasma)

  • 강명구;김경태;김창일
    • 한국전기전자재료학회논문지
    • /
    • 제15권4호
    • /
    • pp.319-324
    • /
    • 2002
  • In this study, the reduce of plasma etching damage in PZT thin film with addictive gas and re-annealing after etching have been investigated. The PZT thin films were etched as a function of $Cl_2/CF_4$ with addition of Ar and $O_2$ with inductively coupled plasma. The etch rates of PZT thin films were 1450 ${\AA}/min$ at 30% additive Ar and 1100 ${\AA}/min$ at 10% auditive $O_2$ into $Cl_2/CF_4$ gas mixing ratio of 8/2. In order to reduce plasma damage of PZT thin films after etching, the etched PZT thin films were re-annealed at various temperatures at $O_2$ atmosphere. From the hysteresis curries, the ferroelectric properties are improved by $O_2$ re-annealing process. The improvement of ferroelectric behavior at annealed PZT films is consistent wish the increase of the (100) and (200) PZT peaks revealed by x-ray diffraction (XRD). From x ray photoelectron spectroscopy (XPS) analysis, the intensity of Pb-O, Zr-O and Ti-O peak are increased and the chemical residue peak is reduced by $O_2$ re-annealing. The ferroelectric behavior consistent with the dielectric nature of $Ti_xO_y$ is recovered by $O_2$ recombination during rapid thermal annealing process.