• 대한치과보철학회지
• /
• 제44권5호
• /
• pp.628-641
• /
• 2006

Statement of problem: Dental magnetic materials have been applied to removable prosthetic appliances, maxillofacial prostheses, obturator and dental implant but they still have some problems such as low corrosion resistance in oral environments. Purpose: To increase the corrosion resistance of dental magnetic materials, surfaces of Sm-Co and Nd-Fe-B based magnetic materials were plated with TiN and sealed with stainless steels. Materials and methods : Surfaces of Sm-Co and Nd-Fe-B based magnetic materials were plated with TiN and sealed with stainless steels, and then three kinds of electrochemical corrosion test were performed in 0.9% NaCl solution; potentiodynamic, potentiostatic, and electrochemical impedance test. From this study, corrosion behavior, amount of elements released, mean average surface roughness values, the changing of retention force, and magnetic force values were measured comparing with control group of non-coated magnetic materials. Results: The values of surface roughness of TiN coated Sm-Co and TiN coated Nd-Fe-B based magnetic materials were lower than those of non coated Sm-Co and Nd-Fe-B alloy. From results of potentiodynamic test, the passive current density of TiN coated Sm-Co alloy were smaller than those of TiN coated Nd-Fe-B alloy and non coated alloys in 0.9% NaCl solution. From results of potentiostatic and electrochemical impedance test, the surface stability of the TiN coated Sm-Co alloy was more drastically increased than that of the TiN coated Nd-Fe-B alloy and non-coated alloy. The retention and magnetic force after and before corrosion test did not change in the case of TiN coated magnetic alloy sealed with stainless steel. Conclusion: It is considered that the corrosion problem and improvement for surface stability of dental magnetic materials could be solved by ion plating with TiN on the surface of dental magnetic materials and by sealing with stainless steels.

• 한국응용과학기술학회지
• /
• 제29권1호
• /
• pp.108-115
• /
• 2012

수침목재유물은 해저, 호저, 저습지등에서 발견되며 물속에서 외부로 아무런 조치 없이 나오게 되면 수축과 변형을 일으키게 된다. 따라서 보존처리는 목재내부의 물을 화학약품과 치환하고 강도와 치수의 안정화를 이루는 것이다. 이중 EDTA와 PEG는 수침목재유물 보존처리에 가장 많이 사용되는 약품중 하나이다. EDTA는 발굴출토된 목재의 흑화현상의 원인인 타닌산제2철에서 Fe-EDTA의 형태로 흑화현상을 제거한다. 보존처리 후 발생하는 폐 EDTA 용액으로부터 HCl을 첨가하여 Fe-EDTA에서 $Fe^{3+}$를 분리해 내고 강산성에서 EDTA가 석출되는 원리를 이용하여 EDTA의 침전물을 획득하여 재활용하였다. PEG는 수침목재유물의 강화처리에 사용되며 목재 내에서 추출되는 착색유기물에 의해 용액의 색이 검은색으로 변화하게 되며, 폐 PEG 용액을 $H_2O_2$를 이용한 산화작용으로 용액 내에 존재하는 착색유기물을 분해하고 색을 되돌려 재활용하였다.

• 한국초지조사료학회지
• /
• 제23권4호
• /
• pp.229-236
• /
• 2003

orchardgrass 및 white clover의 단파 및 혼파 재배조건에서 미량요소 Fe, Mn, Cu, Zn, Mo 및 B의 조합시비별 목초의 생육, 개화, 수량, 양분 함량 및 초종간 경합지수 등에 미치는 영향 등을 구명하였다. 다량요소 양분을 동일량 시비한 조건에서 7 수준의 미량요소 조합시비는 T$_1$; 대조구, T$_2$; Fe, T$_3$; Fe+Mn, T$_4$； Fe＋Mn＋Cu, T$_{5}$; Fe+Mn+Cu＋Zn, T$_{6}$；Fe+Mn+Cu＋Zn+Mo 및 T$_{7}$； Fe+Mn+Cu+Zn+Mo+B로 하였다. 본 I집에서는 각 조합시비별 목초의 생육, 개화 및 수분생리/하고현상 특성 등에 미치는 영향을 검토하였다. 1, orchardgrass는 T$_3$와 T$_{6}$ 에서 심한 Fe-결핍 황화현상을 보였고, 이는 T$_4$와 T$_{5}$ 에서는 크게 경감되었다. 반면에 T$_1$, T$_2$및 T$_{7}$ 조합시비에서는 황화현상이 없이 정상적인 생육을 보였고, 특히 T$_{7}$완전 조합시비에서는 단파 및 혼파재배 공히 다른 조합시비에 비해서 가장 양호한 생육을 보였다. white clover는 조합시비별 황화현상은 보이지 않았으나 단파재배에서 T$_1$, T$_2$및 T$_{7}$에서는 다른 조합시비에 비해서 더 진한 녹색과 더 양호한 생육을 보였다. 2. 여름 고온기에 orchardgrass는 하고현강을 보였으나 T$_1$과 T$_{7}$에서는 다른 처리구보다 상대적으로 크게 경감 되였다. 황화현상을 보인 조합시비에서는 약한 줄기와 고온으로 인하여 일부 도복현상을 보였다. white clover는 하고현상을 보이지 않았고 처리별 수부요구도의 차이는 분명하지 않았다. 3. 단파재배에서 white clover의 개화 및 화아 수는 T$_{7}$ 및 T$_2$에서 가장 많았고 T$_{7}$에서는 다른 조합시비에 비해서 더 긴 개화기간과 더빠른 만개를 보였다. 이에 비해서 T$_{5}$ 및 T$_{6}$에서는 대조구인 T$_1$보다 적었고 처리 중 가장 적은 개화수를 보였다. T$_{7}$에서 만이 단파 및 혼파재배 공히 개화 수가 화하 수보다 많은 개화 수/화아 수의 비율이 ＞1 이였다(혼파의 T$_{6}$ 예외). 4. Fe-결핍 황화현상은 항시 부적합한 Fe/Mn과 Fe/Mo 비율에 기인되지 않고, 양이온간(Fe, Mn, Cu, Zn), 음이온간(Mo, B), 그리고 이들의 총 농도의 부조화에도 기인된다는 것을 인지할 수 있었다. 그리고 Fe${\times}$Mn${\times}$Mo${\times}$B 간 다량 교호작용이 있으며 이 때 B의 조정자 역할이 큰 것으로 보였다.

• 한국환경과학회지
• /
• 제8권4호
• /
• pp.491-496
• /
• 1999

Removal of Cu(II), Cr(III) and Pb(II) ions from aqueous solutions using the adsorption process on the loesses has been investigated. Variations of contact time, pH, adsorption isotherms and selectivity of coexisting ions were experimental parameters. pH of KJ and YIK samples diluted to 1% solution, was rearly the same with each value of pH 5.58 and 5.49, and both samples showed weak acidic properties. From chemical analysis, both samples contain remarkably different amounts of ${SiO}_{2}$, ${Al}_{2}O_{3}$ and ${Fe}_{2}O_{3}$. From XRD measurement, quartz was mainly observed in both samples. Kaolinite was also observed, also in both samples, but Feldspar was only observed in KJ sample. Adsorption of metal ions on the loesses were reached at equilibrium by shaking for about 30min. The adsorption of Cr(III) ion was higher than that of Cu(II) oand Pb(II) ions. The order of amount adsorbed among the investigated ions was Cr(III)>Pb(II)>Cu(II). In acidic solution, the adsorptivity of loesses was increased as pH increased. The adsorption of Cr(III) ion on the loesses were fitted to the Freundlich isotherms. Freundlich constants(1/n) of KJ and YIK loesses were 0.54 and 0.55, respectively.

• 한국환경과학회지
• /
• 제6권5호
• /
• pp.461-472
• /
• 1997

This study was carried out to investigate the characteristics of chemical components and precipitation at Kimhae area from March, 1992 to June, 1994. The pH values, concentration of soluble ions($Cl^-$, $NO_2^-}$ $NO_3^-}$, $NO_4^{2-}$-, $PO_4^{3-}$. $F^-$, $Mg^{2+}$, $Ca^{2+}$, $Mn^{2+}$, $K^+) and non-soluble metals(Cr.Si. Zn, Pb, Cu, Fe, Mn, Mg, Ad. V. Cal were measured by pH meter, IC (ion Chromatography) and ICP(Inductively Coupled Plasma). The data were analyzed by the dally. hourly distribution characteristics of acidity and chemical components, as well as the correlation between them. The results are as follows. 1. The pH range of precipitation was from 3.45 to 6.80 in Kimhae area. and average value was pH 4.62 and main chemical components were $SO_4^{2-}$, $Cl^-$, $NO_3^-$. The highest pH value and concentration appeared in initial rain, which might result from urbanlzation and industrialization in this area and long term transportation from China. 2. The hourly correction distribution of main anions related to pH value In the rainwater showed $SO_4^{2-}$ > $NO_3^-$ > $Cl^-$. Hourly concentration of heavy metal and each ion was highly correlated with pH in the precipitation.

• 한국전기전자재료학회논문지
• /
• 제23권10호
• /
• pp.747-751
• /
• 2010

In the study, the characteristics of the etched Zinc oxide (ZnO) thin films surface, the etch rate of ZnO thin film in $Cl_2/BCl_3/Ar$ plasma was investigated. The maximum ZnO etch rate of 53 nm/min was obtained for $Cl_2/BCl_3/Ar$=3:16:4 sccm gas mixture. According to the x-ray diffraction (XRD) and atomic force microscopy (AFM), the etched ZnO thin film was investigated to the chemical reaction of the ZnO surface in $Cl_2/BCl_3/Ar$ plasma. The field emission auger electron spectroscopy (FE-AES) analysis showed an elemental analysis from the etched surfaces. According to the etching time, the ZnO thin film of etched was obtained to The AES depth-profile analysis. We used to atomic force microscopy to determine the roughness of the surface. So, the root mean square of ZnO thin film was 17.02 in $Cl_2/BCl_3/Ar$ plasma. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas.

• 한국전기전자재료학회논문지
• /
• 제17권3호
• /
• pp.299-304
• /
• 2004

In recent years, silicon carbide has emerged as an important material for MEMS application. In order to fabricate an SiC film based MEMS structure by using chemical etching method, high operating temperature is required due to high chemical stability Therefore, dry etching using plasma is the best solution. SiC film was deposited by thermal CVD at the temperature of 100$0^{\circ}C$ and pressure of 10 torr. SiC was dry etched with a reactive ion etching (RIE) system, using SF$_{6}$/O$_2$ and CF$_4$/O$_2$ gas mixture. Etch rate has been investigated as a function of oxygen concentration in the gas mixture, rf power, working pressure and gas flow rate. Etch rate was measured by surface profiler and FE-SEM. SF$_{6}$/O$_2$ gas mixture showed higher etch rate than CF$_4$/O$_2$ gas mixture. Maximum etch rate appeared at RF Power of 450W. $O_2$ dilute mixtures resulted in an increasing of etch rate up to 40％, and the superior anisotropic cross section was observe

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2011년도 춘계학술발표대회
• /
• pp.37.1-37.1
• /
• 2011

Miniaturization of lenses has been widely researched by various scientific and engineering techniques. As a result, micro scaled lens structure could be easily achieved from various fabrication techniques; nevertheless it is still challenging to make nano scaled lenses. This paper reports a novel fabrication method of silicon nanotemplate for nanolens array. The inverse structure of nanolens array was fabricated on silicon substrate by reactive ion etching (RIE) process. This technique has a flexibility to produce different tip shapes using different pattern masks. Once the silicon nano-tip array structure is well-defined using an optimized recipe, it is followed by polymer molding to duplicate nanolens array from the template. Finally, the nanostructures formed on silicon nanotemplate and polymer replica were investigated using FE-SEM and AFM measurements. The nano scaled lens can be manufactured from the same template, also using other replication techniques such as imprinting, injection molding and so on.

• Bulletin of the Korean Chemical Society
• /
• 제31권8호
• /
• pp.2304-2308
• /
• 2010

A $LiNi_{0.8}Co_{0.15}Al_{0.05}O_2$ (LNCAO/C) active material composite cathode was coated with carbon. The conductive carbon coating was obtained by addition of surfactant during synthesis. The addition of surfactant led to the formation of an amorphous carbon coating layer on the pristine LNCAO surface. The layer of carbon coating was clearly detected by FE-TEM analysis. In electrochemical performance, although the LNCAO/C showed similar capacity at low C-rate conditions, the rate capability was improved by the form of the carbon coating at high current discharge state. After 40 cycles of charge-discharge processes, the capacity retention of LNCAO/C was better than that of LNCAO. The carbon coating is effectively protected the surface structure of the pristine LNCAO during Li insertion-extraction.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
• /
• pp.868-871
• /
• 2003

In recent years, silicon carbide has emerged as an important material for MEMS application. In order to fabricate an SiC film based MEMS structure by using chemical etching method, high operating temperature is required due to high chemical stability. Therefore, dry etching using plasma is the best solution. SiC film was deposited by thermal CVD at the temperature of $1000^{\circ}C$ and pressure of 10 torr. SiC was dry etched with a reactive ion etching (RIE) system, using $SF_6/O_2$ and $CF_4/O_2$ gas mixture. Etch rate have been investigated as a function of oxygen concentration in the gas mixture, RF power, and working pressure. Etch rate was measured by surface profiler and FE-SEM. $SF_6/O_2$ gas mixture has been shown high etch rate than $CF_4/O_2$ gas mixture. Maximum etch rate appeared at 450W of RF power. $O_2$ dilute mixtures resulted in an increasing of etch rate up to 40%, and the superior anisotropic cross section was observed.