• Title/Summary/Keyword: F/C

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Dissolution Behaviors of Sericin in Cocoon Shell on the Fluorescence Colors (누에고치층의 형광색에 따른 Sericin의 용해성)

  • 손승종;남중희
    • Journal of Sericultural and Entomological Science
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    • v.30 no.1
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    • pp.33-39
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    • 1988
  • In the case of white cocoon, the fluorescence colors are classified as a yellowish fluorescence cocoon(Y.F.C.) and a violet fluorescence cocoon(V.F.C.) by exposing to ultra-violet ray. Accordingly, experiments were carried out to investigate the difference of sericin behaviors between Y.F.C. and V.F.C. by measuring the sericin solubility, surface tension and viscosity of the sericin solution. Also, the reelability of two different type of cocoons was investigated in the silk reeling process. The results were summarized as follows; 1. The sericin solubility of Y.F.C. shell is higher than that of V.F.C. shell with the dissolution temperature and time. It is shown that the sericin solubility curves of Y.F.c. and V.F.C. are similar in shape, but the difference of sericin solubility between Y.F.C. and V.F.C. is more significant at higher bath temperature. 2. The initial sericin dissolution curves of Y.F.C. and V.F.C. cocoon shell can be divided by four parts within the range of dissolving time from 5 minutes to 60 minutes. The initial dissolution velocity of Y.F.C. shell is faster than that of V.F.C. but the velocity difference is negligible after 30 minutes of dissolving time. 3. The gelation of V.F.C. sericin solution is faster than that of Y.F.C. at early stage(in the range of 15 minutes to 60 minutes). 4. In the silk reeling process, the reelability of Y.F.C. is better than that of V.F.C. with about 11%. This is mainly due to the higher sericin solubility in Y.F.C. followed by the fast dissolution velocity.

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Gene Frequencies and Phenotypes of Transferrin C Subtypes and Haptoglobin in Korean Population (한국인집단의 Transferrin C Subtypes와 Haptoglogin Phenotypes의 분포와 유전자 빈도)

  • 이정주;오문유
    • The Korean Journal of Zoology
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    • v.26 no.3
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    • pp.211-217
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    • 1983
  • Genetic polymorphism of transferrin $(T_f)$ subtypes in Jeju population was studied by isoelectric focusing of human sera on polyacrylamide gels under high voltage, and haptolobin (Hp) polymorphism in Seoul and Jeju population was studied by polyacrylamide gel electrophoresis. Among 946 normal samples, three common types of transferrin, $T_{f}C_{1}, T_{f}C_{1}-C_{2} and T_{f}C_{2}$ were observed with some variants migrating slower than $T_{f}C$ subtypes, while among 139 patient (hepatitis) samples, only three common types were found. The gene frequencies were calculated as follows; in normal population, $T_{f}C^{1}$ was 0.7220; $T_{f}C^{2}, 0.2743; T_{f}D^{Jeju}, 0.0037$, and in patient population, $T_{f}C^{1} was 0.7194; T_{f}C^{2}, 0.2806$ respectively. Among 460 samples in Seoul and 502 in Jeju population, three types of haptoglobin, Hp 1-1, Hp 2-1 and Hp 2-2 were observed. The gene frequency of $Hp^1$ was 0.304, $Hp^2$, 0.696 in Seoul and in Jeju, $Hp^1$ was 0.269 and $Hp^2$, 0.731, respectively. The frequencies of the genes and the polymorphic phenotypes were discussed comparatively with the other populations.

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The Characteristics of Residual Films on Silicon Surface $CHF_3/C_2F_6$ Reactive Ion Etching ($CHF_3/C_2F_6$ 플라즈마에 의한 실리콘 표면 잔류막의 특성)

  • 권광호;박형호;이수민;강성준;권오준;김보우;성영권
    • Journal of the Korean Vacuum Society
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    • v.1 no.1
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    • pp.145-152
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    • 1992
  • Si surfaces exposed to CHF3/C2F6 gas plasmas ih reactive ion etching (RIE) have been characterized by X-ray photoelectron spectroscopy (XPS). CHF3/C2F6 gas plasma exposure of Si surface leads to the deposition of residual film containing carbon and fluorine. The narrow scan spectra of C 1s show various bonding states of carbon as C-Si, C-F/H, C-CFx(x $\leq$ 3), C-F, C-F2, and C-F3. The chemical bonding states of fluorine are described with F-Si, F-C and F-O. And the oxygen and silicon are also detected. The effects of parameters for reactive ion etching as CHF3/C2F6 gas ratio, RF power, and pressure are investigated.

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A RESULT ON AN OPEN PROBLEM OF LÜ, LI AND YANG

  • Majumder, Sujoy;Saha, Somnath
    • Bulletin of the Korean Mathematical Society
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    • v.58 no.4
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    • pp.915-937
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    • 2021
  • In this paper we deal with the open problem posed by Lü, Li and Yang [10]. In fact, we prove the following result: Let f(z) be a transcendental meromorphic function of finite order having finitely many poles, c1, c2, …, cn ∈ ℂ\{0} and k, n ∈ ℕ. Suppose fn(z), f(z+c1)f(z+c2) ⋯ f(z+cn) share 0 CM and fn(z)-Q1(z), (f(z+c1)f(z+c2) ⋯ f(z+cn))(k) - Q2(z) share (0, 1), where Q1(z) and Q2(z) are non-zero polynomials. If n ≥ k+1, then $(f(z+c_1)f(z+c_2)\;{\cdots}\;f(z+c_n))^{(k)}\;{\equiv}\;{\frac{Q_2(z)}{Q_1(z)}}f^n(z)$. Furthermore, if Q1(z) ≡ Q2(z), then $f(z)=c\;e^{\frac{\lambda}{n}z}$, where c, λ ∈ ℂ \ {0} such that eλ(c1+c2+⋯+cn) = 1 and λk = 1. Also we exhibit some examples to show that the conditions of our result are the best possible.

Historical backgrounds of Quasi-F spaces and minimal quasi-F covers (Quasi-F 공간과 극소 Quasi-F cover의 역사적 배경)

  • Kim, Chang-Il
    • Journal for History of Mathematics
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    • v.18 no.4
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    • pp.113-124
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    • 2005
  • For a Tychonoff space X, C(X) is a Riesz-space. It is well known that C(X) is order-Cauchy complete if and only if X is a quasi~F space and that if X is a compact space and QF(X) is a minimal quasi-F cover of X, then the order- Cauchy completion of C(X) is isomorphic to C(QF(X)). In this paper, we investigate motivations and historical backgrounds of the definition for quasi-spaces and the construction for minimal quasi-F covers.

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Study on Improvement of Mechanical Property, Oxidation and Erosion Resistance of SiC Matrix Ceramic Composites Reinforced by Hybrid Fabric Composed of SiC and Carbon Fiber (탄화규소섬유와 탄소섬유 하이브리드 직물을 강화재로 한 SiC 매트릭스 세라믹복합재의 기계적물성, 산화 및 삭마 저항성 개선 연구)

  • Yoon, Byungil;Kim, Myeongju;Kim, Jaesung;Kwon, Hyangjoo;Youn, Sungtae;Kim, Jungil
    • Composites Research
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    • v.32 no.3
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    • pp.148-157
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    • 2019
  • In this study, $C_f/SiC$, $SiC_f/SiC$ and $C_f-SiC_f/SiC$ ceramic composites reinforcing carbon fiber, SiC fiber and hybrid fiber were fabricated by hybrid TGCVI and PIP process. After the thermal shock cycle, 3-point bending and Oxy-Acetylene torch test, their mechanical behavior, oxidation and erosion resistance were evaluated. The $C_f/SiC$ composite showed a decrease in mechanical property along with increasing temperature, a pseudo-ductile fracture mode and a large quantity of erosion. The $SiC_f/SiC$ composite exhibited stronger mechanical property and lower erosion rate compared to the $C_f/SiC$, but brittle fracture mode. On the other hand, hybrid type of $C_f-SiC_f/SiC$ composite gave the best mechanical property, more ductile failure mode than the $SiC_f/SiC$, and lower erosion rate than the $C_f/SiC$. During the Oxy-Acetylene torch test, the $SiO_2$ formed by reaction of the SiC matrix with oxygen prevented further oxidation or erosion of the fibers for $C_f-SiC_f/SiC$ and $SiC_f/SiC$ composites particularly. In conclusion, if a hybrid composite with low porosity is prepared, this material is expected to have high applicability as a high temperature thermo-structural composite under high temperature oxidation atmosphere by improving low mechanical property due to the oxidation of $C_f/SiC$ and brittle fracture mode of $SiC_f/SiC$ composite.

Optical and Electrical Characteristics of Fluorocarbon Films Deposited in a High-Density C4F8 Plasma (고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성)

  • Kwon, Hyeokkyu;You, Sanghyun;Kim, Jun-Hyun;Kim, Chang-Koo
    • Korean Chemical Engineering Research
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    • v.59 no.2
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    • pp.254-259
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    • 2021
  • Optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma under various source powers and pressures were investigated. The F/C ratio of the fluorocarbon film deposited in a high-density C4F8 plasma increased with increasing source power and decreasing pressure due to two-step deposition mechanism. The change in the F/C ratio of the film directly affected the optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma. The refractive index of the fluorocarbon film increased with decreasing source power and increasing pressure contrary to the dependence of the film's F/C ratio on the source power and pressure. This was because the increase in the F/C ratio suppressed electronic polarization and weakened the network structures of the film. The resistivity of the fluorocarbon film showed the same behavior as its F/C ratio. In other words, the resistivity increased with increasing source power and decreasing pressure, resulting from stronger repellence of electrons at higher F/C ratios. This work offers the feasibility of the use of the fluorocarbon films deposited in a high-density C4F8 plasma as an alternative to low dielectric constant materials because the optical and electrical properties of the fluorocarbon film can be directly controlled by its F/C ratio.

Semiempirical Estimation of Standard Enthalpy of Formation for Halogen Substituted Hydrocarbons (할로겐화합물의 표준생성열의 계산)

  • Kwang Yul Choo;Pil Heui Lee
    • Journal of the Korean Chemical Society
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    • v.24 no.2
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    • pp.108-114
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    • 1980
  • By using electrostatic model and simple bond additivity scheme a reasonable and simple method was developed for the estimation of standard enthalpy of formation $({\Delta}H_f\;^{\circ})$ of very polar compounds. The bond contributions to the enthalpy of formation for halomethanes were; ${\Delta}H_f\;^{\circ}(C-F)=-36.44\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-Cl)=-2.57\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-Br)=5.32\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-I)=19.18\;kcal/mole,\;and\;{\Delta}H_f\;^{\circ}(C-H)=-3.61\;kcal/mole$, respectively. Using these values and calculated electrostatic energies, the estimated ${\Delta}H_f\;^{\circ}$ values were estimated and found to be in good agreement with observed values.

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Theoretical study on the dissociation reactions of C4F6 molecules

  • Choe, Hui-Cheol;Park, Yeong-Chun;Lee, Yun-Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.36-36
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    • 2010
  • Low-pressure fluorocarbon plasmas are widely used in microelectronics fabrication for a variety of surface modification purposes. In particular, fluorocarbon plasmas are used for the etching of dielectrics such as silicon dioxide and silicon nitride. Among the various fluorocarbons, this study focuses on C4F6 molecules (C4F6s) which are composed of hexafluorocyclobutene (c-C4F6), hexafluoro-1, 3-butadiene (1, 3-C4F6), and hexafluoro-2-butyne (2-C4F6). We have investigated the dissociation reactions of C4F6s, resulting in CF2, CF3, C2F3, and C3F3 fragments, by using the wB97X-D functional with various basis sets. In this presentation, the geometrical properties, energetics, and dissociation mechanisms of C4F6s will be suggested.

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CHARACTERIZING FUNCTIONS FIXED BY A WEIGHTED BEREZIN TRANSFORM IN THE BIDISC

  • Lee, Jaesung
    • Korean Journal of Mathematics
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    • v.27 no.2
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    • pp.437-444
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    • 2019
  • For c > -1, let ${\nu}_c$ denote a weighted radial measure on ${\mathbb{C}}$ normalized so that ${\nu}_c(D)=1$. For $c_1,c_2>-1$ and $f{\in}L^1(D^2,\;{\nu}_{c_1}{\times}{\nu}_{c_2})$, we define the weighted Berezin transform $B_{c_1,c_2}f$ on $D^2$ by $$(B_{c_1,c_2})f(z,w)={\displaystyle{\smashmargin2{\int\nolimits_D}{\int\nolimits_D}}}f({\varphi}_z(x),\;{\varphi}_w(y))\;d{\nu}_{c_1}(x)d{\upsilon}_{c_2}(y)$$. This paper is about the space $M^p_{c_1,c_2}$ of function $f{\in}L^p(D^2,\;{\nu}_{c_1}{\times}{\nu}_{c_2})$ ) satisfying $B_{c_1,c_2}f=f$ for $1{\leq}p<{\infty}$. We find the identity operator on $M^p_{c_1,c_2}$ by using invariant Laplacians and we characterize some special type of functions in $M^p_{c_1,c_2}$.