• Proceedings of the Korean Vacuum Society Conference
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• 2006.08a
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• pp.188-188
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• 2006

• Journal of the Semiconductor & Display Technology
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• v.6 no.3
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• pp.25-33
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• 2007

A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

• Journal of the Korean Institute of Telematics and Electronics
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• v.5 no.1
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• pp.1-5
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• 1968

GaAs single crystals were grown epitaxially from Ga solution with carrier concentrations in the range and electron mobilities between 7,500 and 9,300$\textrm{cm}^2$/v-sec. at 300$^{\circ}$K, and 50,000 and 95,000 $\textrm{cm}^2$/V-sec. at 77$^{\circ}$K. A comparison of the theoretical and experimental curves for the mobility vs. temperature indicates that the significant scattering mechanisms are ionized impurities and phonons in the temperature range of 77$^{\circ}$K to 439$^{\circ}$K. This indicates that the epitaxial layers do not contain other mobility limiting imperfections to a significant degree. Photoluminescence spectra of the. epitaxial layers did not show any emission due to deep lying imperfection leve1s.

• Electrical & Electronic Materials
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• v.9 no.6
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• pp.564-571
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• 1996

We calculated the drift-velocities of electrons and holes of I $n_{0.53}$(A $l_{x}$G $a_{1-x}$ )$_{0.47}$As, which is used for semiconductor materials of high performance HBTs, along with the various doping concentrations and Al mole fractions as well as the electric fields by Monte Carlo experiment. Especially, for the valence bands the accuracy of hole-drift-velocity was improved in the consideration of intervalley scattering due to the inelastic scattering of acoustic phonon. From the results the empirical formulas of the low- and high field mobility of electrons and holes were extracted by using nonlinear least square fitting method. The accuracy of the formulas was proved by comparing the formula of low-field electron mobility as well as drift-velocity of I $n_{0.53}$ G $a_{0.47}$As and of low-field hole mobility of GaAs with the measured values, where the error was below 10%. For the high-field mobilities of electron and hole the results calculated by the formulas were very well matched with the MC experimental results except at the narrow field range where the electrons produced the velocity overshoot and the corresponding error was about 30%.0%. 30%.0%.

• Macromolecular Research
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• v.14 no.6
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• pp.640-645
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• 2006

Polyethylene of bimodal molecular weight distribution was irradiated with an electron beam. The thermal and mechanical properties were examined by DSC, small and wide angle X-ray scattering and static tensile test according to the crystal morphology of the irradiated samples. The crystal morphology change upon irradiation, as revealed by wide angle X-ray scattering, correlated well with the changes in melting enthalpy, whereas the lamellar thickness and the amorphous gap thickness remained virtually unchanged at irradiation doses up to 500 kGy. Crosslinks in the crystal domains became evident at an energy level of 250 kGy, resulting in reduced crystallinity and crystal size of the (110) and (200) planes. The samples became stiff and brittle with increased irradiation dose, which seem to be more relevant to the amount of cross links than the crystal morphology changes.

• Journal of the Korean Ceramic Society
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• v.40 no.9
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• pp.849-854
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• 2003

Temperature dependent thermoelectric power (TEP) of La$_{2.1}$ Sr$_{1.9}$ Mn$_3$O$_{10}$ system has been studied in the temperature range 80-373 K. In the low temperature ferromagnetic regime, TEP (S) follows an expression of formS＝S$_{0}$ ＋S$_{1.5}$ T$^{1.5}$ ＋S$_4$T$^4$ over the wide range of temperature. The broad peak below the ferromagnetic transition and complicated temperature dependence of S may be understood on the basis of electron-magnon scattering as predicted for an itinerant ferromagnet. High temperature TEP data can be well fitted with Mott's small polaron hopping model.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.137-137
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• 2000

The surface collective modes of thin K films deposited on Al(111) have been investigated using frequency dependent photoyield measurements and momentum resolved inelastic electron scattering. Jellium based theoretical calculations have predicted a richer set of features in the thin films than for the surface of a semi-infinite solid because there are th interference between two interfaces (substrate-film and film-vacuum) and heavy damping on the substrate. The use of an optical probe and electron scattering has allowed us to draw a more complete picture of the dynamic screening in thin films. The number, dispersion, damping and optical activity of the collective modes of the thin films have been measured as a function of K film thickness. New overlayer-induced excitations are observed : At qII=0, they correspond to the antisymmetric slab mode and the multipole surface plasmon. At finite qII=0, these modes undergo a transition towards the K multipole and monopole surface plasmons. With increasing coverage, the overlayer excitations turn into the collective modes of semi-infinite K. For a consistent interpretation of photoyield and electron energy loss spectra it is crucial to account for the non-analytic dispersion of the overlayer modes at small parallel wave vectors and for the finite angular resolution of the detector. The observed dispersions confirm predictions based on the time-dependent density functional approach.

• Journal of Korean Vacuum Science & Technology
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• v.6 no.1
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• pp.12-15
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• 2002

The physical properties, including magneto-optical and transport ones, of Ni$_2$MnG$_2$ alloy in the martensitic and austenitic states were investigated. The dependence of the temperature coefficient of resistivity on temperature shows kinks at the structural and ferro-para magnetic transitions. Electron-magnon and electron-phonon scattering are analyzed to be the dominant scattering mechanisms of the Ni$_2$MnG$_2$ alloy in the martensitic and austenitic states, respectively. The experimental real parts of the off-diagonal components of the dielectric function present two sharp peaks, one at 1.9 eV and the other at 3.2 eV, and a broad shoulder at 3.5 eV, all are identified by the band-structure calculations. These peak positions are coincident with those in the corresponding optical-conductivity spectrum, which is thought to originate from the single-spin state in Ni$_2$MnG$_2$ alloy.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.169-174
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• 1996

In this paper, the electron transport characteristic in CF$_4$has been analysed over the E/N range 1~300(Td) by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The alteration of cross sections from the literature is avoided as much as possible in the analysis. The motion has been calculated to give swarm parameters for the electron drift velocity(W), diffusion coefficient(D$_{L}$), the ratio of the diffusion coefficient to the mobility(D$_{L}$/$\mu$), mean energy($\varepsilon$), the electron energy distribution function. The electron energy distribution function has been analysed in CF$_4$at E/N=50, 100 and 200(Td) for a case of the equilibrium region in the mean electron energy. The results of Boltzmann equation and Monte Carlo simulation have been compared with experimental data by Y. Nakamura and M. Hayashi.shi.

• Proceedings of the KIEE Conference
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• 2002.06a
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• pp.102-105
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• 2002

In this paper, the electron transport characteristics in $CF_4$ has been analysed over the E/N range 1${\sim}$300 [Td] by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, longitudinal diffusion coefficient, the ratio of the diffusion coefficient to the mobility, electron ionization and attachment coefficients, effective ionization coefficient, mean energy, collision frequency and the electron energy distribution function. The swarm parameter from the swarm study are expected to serve as a critical test of current theories of low energy electron scattering by atoms and molecules, in particular, as well as crucial information for quantitative simulations of weakly ionized plasmas.