• Title/Summary/Keyword: Electron energy loss spectroscopy

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Characterization of Rajath Bhasma and Evaluation of Its Toxicity in Zebrafish Embryos and Its Antimicrobial Activity

  • Kalimuthu, Kalishwaralal;Kim, Ji Min;Subburaman, Chandramohan;Kwon, Woo Young;Hwang, Sung Hyun;Jeong, Sehan;Jo, Min Geun;Kim, Hyung Joo;Park, Ki Soo
    • Journal of Microbiology and Biotechnology
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    • v.30 no.6
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    • pp.920-925
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    • 2020
  • In India, nanotechnology has been used in therapeutic applications for several millennia. One example of a traditional nanomedicine is Rajath Bhasma (also called calcined silver ash), which is used as an antimicrobial and for the treatment of various ailments and conditions such as memory loss, eye diseases, and dehydration. In this study, we aimed to characterize the physical composition and morphology of Rajath Bhasma and its suitability for use as a non-toxic antimicrobial agent. First, Rajath Bhasma was physically characterized via i) Fourier-transform infrared spectroscopy to analyze the surface functional groups, ii) scanning electron microscopy coupled with energy-dispersive X-ray spectroscopy to observe the morphology and elemental composition, and iii) X-ray diffraction to determine the crystalline phases. Thereafter, functional characterization was performed through toxicity screening using zebrafish embryos and through antimicrobial activity assessment against gram-positive (Staphylococcus epidermidis) and gram-negative (Escherichia coli) bacteria. Rajath Bhasma was found to harbor alkene, hydroxyl, aldehyde, and amide functional groups originating from biological components on its surface. The main component of Rajath Bhasma is silver, with particle size of 170-210 nm, and existing in the form of spherical aggregates with pure crystalline silver structures. Furthermore, Rajath Bhasma did not exert toxic effects on zebrafish embryos at concentrations below 5 ㎍/ml and exhibited effective antimicrobial activity against both gram-positive and gram-negative bacteria. The present results indicate that Rajath Bhasma is a potentially effective antimicrobial agent without toxicity when used at concentrations below 5 ㎍/ml.

ITZO 박막의 전자적 및 광학적 특성

  • Lee, Seon-Yeong;Denny, Yus Rama;Gang, Hui-Jae;Heo, Seong;Jeong, Jae-Gwan;Lee, Jae-Cheol;Chae, Hong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.324-324
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    • 2012
  • 투명전도체(Transparent Conducting Oxides: TCOs)는 일반적으로 면저항이 $103{\Omega}/sq$ 이하로 전기가 잘 통하며, 가시광선영역인 380~780 nm에서의 투과율이 80% 이상이고, 3.2eV 이상의 밴드갭을 가지는 재료로써, 전기전도도와 가시광선영역에서 투과성이 높아 전기적, 광학적 재료로 관심을 받아 다년간 연구대상이 되어오고 있다. 현재 가장 널리 사용되고 있는 투명전도체(Transparent Conducting Oxides: TCOs) 소재로는 Indium Tin Oxide (ITO)가 가장 각광받고 있지만, Indium의 가격상승과 박막의 열처리를 통해 저항이 증가하는 단점을 가지고 있어 이를 대체 할 새로운 소재 개발이 필요한 상황이다. 그러므로 투명전도체 소재 개발에 있어서 가장 중요한 연구과제는 Indium Tin Oxide(ITO)의 단점을 개선시키고 안정된 고농도의 In-Zn-Sn-O(ITZO) 박막을 성장시키는 것이다. 본 연구에서는 RF스퍼터링법에 의하여 Si wafer에 In-Zn-Sn-O(IZTO)를 $350{\AA}$ 만큼 증착시키고, 1시간 동안 $300^{\circ}C$, $350^{\circ}C$, $400^{\circ}C$로 각각 열처리 하였다. 박막의 전자적, 광학적 특성은 XPS(X-ray Photoelectron Spectroscopy), REELS(Reflection Electron Energy Loss Spectroscopy)를 이용하여 연구하였다. XPS측정결과, ITZO박막은 In-O, Sn-O and Zn-O의 결합을 가지고 있고, 박막의 열처리를 통해 $400^{\circ}C$에서 Zn2p의 피크가 가장 크게 나타나는 반면 In3d와 Sn3d는 열처리를 했을 때가 Room Temperature에서 보다 피크가 작아지는 것을 확인하였다. 이는 $400^{\circ}C$에서 Zn가 표면에 편석됨을 나타낸다. 그리고 REELS를 이용해 Ep=1500 eV에서의 밴드갭을 얻어보면, 밴드갭은 $3.25{\pm}0.05eV$로 온도에 크게 변화하지 않았다. 또한 QUEELS -Simulation에 의한 광학적 특성 분석 결과, 가시광선영역인 380nm~780nm에서의 투과율이 83%이상으로 투명전자소자로의 응용이 가능하다는 것을 보여주었다.

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Band alignment and optical properties of $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ gate dielectrics thin films on p-Si (100)

  • Tahir, D.;Kim, K.R.;Son, L.S.;Choi, E.H.;Oh, S.K.;Kang, H.J.;Heo, S.;Chung, J.G.;Lee, J.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.381-381
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    • 2010
  • $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility inachieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFET channel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric films on p-Si (100) were grown by atomic layer deposition method, for which the conduction band offsets, valence band offsets and band gapswere obtained by using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The band gap, valence and conduction band offset values for $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric thin film, grown on Si substrate were about 5.34, 2.35 and 1.87 eV respectively. This band alignment was similar to that of $ZrO_2$. In addition, The dielectric function (k, $\omega$), index of refraction n and the extinction coefficient k for the $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films were obtained from a quantitative analysis of REELS data by comparison to detailed dielectric response model calculations using the QUEELS-$\varepsilon$(k, $\omega$)-REELS software package. These optical properties are similar with $ZrO_2$ dielectric thin films.

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Study on volume reduction of radioactive perlite thermal insulation waste by heat treatment with potassium carbonate

  • Chou, Yi-Sin;Singh, Bhupendra;Chen, Yong-Song;Yen, Shi-Chern
    • Nuclear Engineering and Technology
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    • v.54 no.1
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    • pp.220-225
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    • 2022
  • Perlite is one of the major constituents of the radioactive thermal insulation waste (RTIW) originating from nuclear power plants and, for proper waste management, a significant reduction in its volume is required prior to disposal. In this work, the volume reduction of perlite is studied by high-temperature treatment method with using K2CO3 as a flux. The perlite is ground with 0-30 wt% K2CO3, and differential thermal analysis/thermogravimetric analysis is used to monitor the glass transition temperature (Tg) and weight loss. The Tg varied between ~772.2 and 837.1 ℃ with the minima at ~643.5 ℃ with the addition of ~10 wt% K2CO3. It is observed that compared to the pure perlite the volume reduction ratio (VRR) increases with the addition of K2CO3. The VRR of 11.20 is observed with 5 wt% K2CO3 at 700 ℃, as compared to VRR of 5.56 without K2CO3 at 700 ℃. The X-ray photoelectron spectroscopy and scanning electron microscopy are used to characterize perlite samples heat-treated without/with 5 wt% K2CO3 at 700 ℃. Moreover, the atomic absorption spectroscopy indicates that the proposed heat-treatment procedure is able to completely retain the radionuclides present in the perlite RTIW.

Silicide Formation of Atomic Layer Deposition Co Using Ti and Ru Capping Layer

  • Yoon, Jae-Hong;Lee, Han-Bo-Ram;Gu, Gil-Ho;Park, Chan-Gyung;Kim, Hyung-Jun
    • Korean Journal of Materials Research
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    • v.22 no.4
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    • pp.202-206
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    • 2012
  • $CoSi_2$ was formed through annealing of atomic layer deposition Co thin films. Co ALD was carried out using bis(N,N'-diisopropylacetamidinato) cobalt ($Co(iPr-AMD)_2$) as a precursor and $NH_3$ as a reactant; this reaction produced a highly conformal Co film with low resistivity ($50\;{\mu}{\Omega}cm$). To prevent oxygen contamination, $ex-situ$ sputtered Ti and $in-situ$ ALD Ru were used as capping layers, and the silicide formation prepared by rapid thermal annealing (RTA) was used for comparison. Ru ALD was carried out with (Dimethylcyclopendienyl)(Ethylcyclopentadienyl) Ruthenium ((DMPD)(EtCp)Ru) and $O_2$ as a precursor and reactant, respectively; the resulting material has good conformality of as much as 90% in structure of high aspect ratio. X-ray diffraction showed that $CoSi_2$ was in a poly-crystalline state and formed at over $800^{\circ}C$ of annealing temperature for both cases. To investigate the as-deposited and annealed sample with each capping layer, high resolution scanning transmission electron microscopy (STEM) was employed with electron energy loss spectroscopy (EELS). After annealing, in the case of the Ti capping layer, $CoSi_2$ about 40 nm thick was formed while the $SiO_x$ interlayer, which is the native oxide, became thinner due to oxygen scavenging property of Ti. Although Si diffusion toward the outside occurred in the Ru capping layer case, and the Ru layer was not as good as the sputtered Ti layer, in terms of the lack of scavenging oxygen, the Ru layer prepared by the ALD process, with high conformality, acted as a capping layer, resulting in the prevention of oxidation and the formation of $CoSi_2$.

Enhanced Electrical Conductivity of Gold Doped Graphene Films by Microwave Treatment

  • Kim, Yoo-Seok;Song, Woo-Seok;Cha, Myoung-Jun;Lee, Su-Il;Cho, Ju-Mi;Kim, Sung-Hwan;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.188-188
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    • 2012
  • Graphene, with its unique physical and structural properties, has recently become a proving ground for various physical phenomena, and is a promising candidate for a variety of electronic device and flexible display applications. Compared to indium tin oxide (ITO) electrodes, which have a typical sheet resistance of ${\sim}60{\Omega}$/sq and ~85% transmittance in the visible range, the chemical vapor deposition (CVD) synthesized graphene electrodes have a higher transmittance in the visible to IR region and are more robust under bending. Nevertheless, the lowest sheet resistance of the currently available CVD graphene electrodes is higher than that of ITO. In this study, we report a creative strategy, irradiation of microwave at room temperature under vacuum, for obtaining size-homogeneous gold nano-particle doping on graphene. The gold nano-particlization promoted by microwave irradiation was investigated by transmission electron microscopy, electron energy loss spectroscopy elemental mapping. These results clearly revealed that gold nanoparticle with ${\geq}30$ nm in mean size were decorated along the surface of the graphene after microwave irradiation. The fabrication high-performance transparent conducting film with optimized doping condition showed a sheet resistance of ${\geq}100{\Omega}$/sq. at ~90% transmittance. This approach advances the numerous applications of graphene films as transparent conducting electrodes.

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Electrical, Electronic Structure and Optical Properties of Undoped and Na-doped NiO Thin Films

  • Denny, Yus Rama;Lee, Kangil;Seo, Soonjoo;Oh, Suhk Kun;Kang, Hee Jae;Yang, Dong-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.193.1-193.1
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    • 2014
  • This study was to investigate the electronic structure and optical properties of Na doped into NiO thin film using XPS and REELS. The films were grown by electron beam evaporation with varying the annealing temperature. The relationship between the electrical characteristics with the local structure of NiO thin films was also discussed. The x-ray photoelectron results showed that the Ni 2p spectra for all films consist of Ni 2p3/2 which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The reflection electron energy loss spectroscopy spectra showed that the band gaps of the NiO thin films were slightly decreased with Na-doped into films. The Na-doped NiO showed relatively low resistivity compared to the undoped NiO thin films. In addition, the Na-doped NiO thin films deposited at room temperature showed the best properties, such as a p-type semiconducting with low electrical resistivity of $11.57{\Omega}.cm$ and high optical transmittance of ~80% in the visible light region. These results indicate that the Na doping followed by annealing process plays a crucial in enhancing the electrical and optical properties of NiO thin films. We believe that our results can be a good guide for those growing NiO thin films with the purpose of device applications, which require deposited at room temperature.

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Evaluation of Wear Performance of Corroded Materials in an 800℃ Molten Salt Environment (800℃ 용융염 환경에서 부식된 재료의 마모 성능 평가)

  • Yong Seok Choi;Kyeongryeol Park;Seongmin Kang;Unseong Kim;Kyungeun Jeong;Ji Ha Lee;Tae Woong Ha;Kyungjun Lee
    • Tribology and Lubricants
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    • v.40 no.3
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    • pp.97-102
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    • 2024
  • The next-generation Molten Salt Reactor is known for its high safety because it uses nuclear fuel dissolved in high-temperature molten salt, unlike traditional solid atomic fuel methods. However, the high-temperature molten salt causes severe corrosion in internal structural materials, threatening the reactor's safety. Therefore, it is crucial to investigate the high-temperature corrosion resistance and wear performance of materials used in reactors to ensure safety. In this study, the high-temperature corrosion resistances and wear performances of corrosion samples in a NaCl-MgCl2-KCl (20-40-40 [wt%]) molten salt are investigated to evaluate the applicability of economically viable stainless steels, 316SS and 304SS. Hastelloy C276 and a new alloy containing a small amount of Nb are used as reference samples for comparative analysis. The mass loss, mass loss rate per unit volume, and surface roughness of each sample are measured to understand the corrosion mechanisms. Scanning electron microscopy and energy-dispersive spectroscopy analyses are employed to analyze the corrosion mechanisms. Wear tests on the corroded samples are also conducted to assess the extent of corrosion. Based on the experimental results, we predict the lifespans of the materials and evaluate their suitability as candidate materials for molten salt reactors. The data obtained from the experiments provide a valuable database for structural materials that can enhance the stability of molten salt reactors and recommend high-temperature corrosion-resistant materials suitable for next-generation reactors.

Synthesis and Evaluation of Variable Temperature-Electrical Resistance Materials Coated on Metallic Bipolar Plates (온도 의존성 가변 저항 발열체로 표면 처리된 금속 분리판 제조 및 평가)

  • Jung, Hye-Mi;Noh, Jung-Hun;Im, Se-Joon;Lee, Jong Hyun;Ahn, Byung Ki;Um, Sukkee
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.73.1-73.1
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    • 2010
  • For the successful cold starting of a fuel cell engine, either internal of external heat supply must be made to overcome the formation of ice from water below the freezing point of water. In the present study, switchable vanadium oxide compounds as variable temperature-electrical resistance materials onto the surface of flat metallic bipolar plates have been prepared by a dip-coating technique via an aqueous sol-gel method. Subsequently, the chemical composition and micro-structure of the polycrystalline solid thin films were analyzed by X-ray diffraction, X-ray fluorescence spectroscopy, and field emission scanning electron microscopy. In addition, it was carefully measured electrical resistance hysteresis loop over a temperature range from $-20^{\circ}C$ to $80^{\circ}C$ using the four-point probe method. The experimental results revealed that the thin films was mainly composed of Karelianite $V_2O_3$ which acts as negative temperature coefficient materials. Also, it was found that thermal dissipation rate of the vanadium oxide thin films partially satisfy about 50% saving of the substantial amount of energy required for ice melting at $-20^{\circ}C$. Moreover, electrical resistances of the vanadium-based materials converge on an extremely small value similar to that of pure flat metallic bipolar plates at higher temperature, i.e. $T{\geq}40^{\circ}C$. As a consequence, experimental studies proved that it is possible to apply the variable temperature-electrical resistance material based on vanadium oxides for the cold starting enhancement of a fuel cell vehicle and minimize parasitic power loss and eliminate any necessity for external equipment for heat supply in freezing conditions.

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Incorporation of silver nanoparticles on the surface of orthodontic microimplants to achieve antimicrobial properties

  • Venugopal, Adith;Muthuchamy, Nallal;Tejani, Harsh;Anantha-Iyengar-Gopalan, Anantha-Iyengar-Gopalan;Lee, Kwang-Pill;Lee, Heon-Jin;Kyung, Hee Moon
    • The korean journal of orthodontics
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    • v.47 no.1
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    • pp.3-10
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    • 2017
  • Objective: Microbial aggregation around dental implants can lead to loss/loosening of the implants. This study was aimed at surface treating titanium microimplants with silver nanoparticles (AgNPs) to achieve antibacterial properties. Methods: AgNP-modified titanium microimplants (Ti-nAg) were prepared using two methods. The first method involved coating the microimplants with regular AgNPs (Ti-AgNP) and the second involved coating them with a AgNP-coated biopolymer (Ti-BP-AgNP). The topologies, microstructures, and chemical compositions of the surfaces of the Ti-nAg were characterized by scanning electron microscopy (SEM) equipped with energy-dispersive spectrometer (EDS) and X-ray photoelectron spectroscopy (XPS). Disk diffusion tests using Streptococcus mutans, Streptococcus sanguinis, and Aggregatibacter actinomycetemcomitans were performed to test the antibacterial activity of the Ti-nAg microimplants. Results: SEM revealed that only a meager amount of AgNPs was sparsely deposited on the Ti-AgNP surface with the first method, while a layer of AgNP-coated biopolymer extended along the Ti-BP-AgNP surface in the second method. The diameters of the coated nanoparticles were in the range of 10 to 30 nm. EDS revealed 1.05 atomic % of Ag on the surface of the Ti-AgNP and an astounding 21.2 atomic % on the surface of the Ti-BP-AgNP. XPS confirmed the metallic state of silver on the Ti-BP-AgNP surface. After 24 hours of incubation, clear zones of inhibition were seen around the Ti-BP-AgNP microimplants in all three test bacterial culture plates, whereas no antibacterial effect was observed with the Ti-AgNP microimplants. Conclusions: Titanium microimplants modified with Ti-BP-AgNP exhibit excellent antibacterial properties, making them a promising implantable biomaterial.