• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2001년도 학술대회 논문집 전문대학교육위원
• /
• pp.76-79
• /
• 2001

Energy distribution function in $SiH_4$ has been analysed over the E/N range $0.5{\sim}300Td$ and Pressure value 0.5, 1.0, 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, diffusion coefficient, electron ionization, mean energy and the electron energy distribution function. The electron energy distribution function has been analysed in $SiH_4$ at E/N=30, 50Td for a case of the equilibrium region in the mean electron energy and respective set of electron collision cross sections.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1998년도 하계학술대회 논문집 E
• /
• pp.1752-1754
• /
• 1998

Recently the research about electron transport characteristic and energy distribute function in mixture gases within Helium, has been used and developed widely as industrial quality improvement of extinguish characteristic, electrical dielectric strength ability of application of each species high voltage apparatus, gas plasma etching progress of work to use manufacture of semiconductor, thin film molding by CVD, insulation film to use ultra LSI, etc. This paper analyze electron transport characteristic in the range E/N $1{\sim}60$[Td], pressure $0.1{\sim}6.0$[Torr] by MCS. It is necessary to seek electron drift velocity, diffusion coefficient, lonization coefficients, characteristic energy, mean energy and electron energy distribution function as electron transport characteristic.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
• /
• pp.696-699
• /
• 1999

The electron transport coefficients in $SF_6+N_2$ gas is analysed in range of E/N values from 100~900(Td) by a Monte Carlo simulation and Boltzmann method, using a set of electron collision cross sections determined by the authors. The result of the Monte Carlo simulation such as electron drift velocity, ionization and electron attachment coefficients, longitudinal and transverse diffusion coefficients in nearly agreement with the respective experimental and theoretical for a range of E/N.

• 한국전기전자재료학회논문지
• /
• 제14권10호
• /
• pp.828-834
• /
• 2001

Zinc oxide (ZnO) films deposited on indium (In) films were post-annealed in a rapid thermal anealing (RTA) system. The ZnO/In films were RTA-treated in air or a vacuum ambient. The crystallographic properties and surface morphologies of the films were studied before and after the RTA by X-ray diffraction(XRD) and scanning electron microscopy (SEM), respectively. The resistivity variation of the films with RTA temperature and time was measured by the 4-point probe method. Auger electron spectroscopy (AES) was carried out to figure out the redistribution of indium atoms in the ZnO films. The resistivity of the ZnO/In films decreased to 2$\times$10$\^$-3/ Ωcm by diffusion of the In. The In diffusion into the ZnO films roughened the surface of ZnO films. The results of depth profile by AES showed a hump of In atoms around ZnO/In interface after the RTA at 800 $\^{C}$. The effects of temperature time and ambient during the RTA on the structural and electrical properties of the ZnO/In films were discussed.

• 한국진공학회지
• /
• 제19권5호
• /
• pp.391-396
• /
• 2010

실리콘 태양전지의 pn 접합 계면특성을 조사하기 위해서 p형 실리콘 기판 위에 전기로를 이용한 $POCl_3$ 공정을 통하여 n형의 불순물을 주입하여 pn 접합을 만들었다. n형 불순물의 확산되어 들어가는 공정시간이 길고 공정온도가 높을수록 면저항은 줄어들었다. n형 불순물의 주입이 많아질수록 pn 접합 계면에서의 전자친화도가 줄어들면서 면저항은 감소되었다. 면저항이 줄어든 이유는 pn 접합계면에서 전자홀쌍이 생성되면서 이동길이가 길어지고 재결합률이 감소하였기 때문이다. n형의 불순물 확산공정시간이 긴 태양전지 셀에서 F.F. 계수가 높게 나타났으며, 효율도 높게 나타났다.

• 대한기계학회논문집B
• /
• 제21권10호
• /
• pp.1326-1338
• /
• 1997

Electrical characteristics of soot particles in a LPG diffusion flame were studied for the control of soot particle coagulation. When a DC voltage was applied between two electrodes installed parallel to gas flow, ionic wind effect caused soot deposition on the cathode, implying that most of the soot particles were positively charged. Soot deposit on the cathode linearly increased and was saturated with respect to the strength of the applied voltage. The possibility of applying an AC voltage to enhance the particle coagulation was then investigated and the efficiency of the size control was checked with transmission electron microscope photographs. For the amplitude of 2 kV AC field, primary (spherical) soot particle size decreased from 30 ~ 40 nm to around 20 nm when the frequency of the applied AC voltage was 60 Hz and higher. Collisions between the soot particles in such a selected AC condition could lead to the formation of much bigger agglomerates of roughly 1-5 .mu.m in size.

• ETRI Journal
• /
• 제11권4호
• /
• pp.84-97
• /
• 1989

The influence of Zn, Si and Te diffusion on the interdiffusion in $GaAs-Ga_1_-xIN_xAs_1__yP_y$and InP$Ga_1__xIn_xAs_1__yP_y$ heterostructures was studied. The heterostructures were grown by liquid phase epitaxy, and the impurity diffusion into the heterostructures was carried out using metal compound or element sources. The extent of interdiffusion for both group III and V atoms was observed by depth profiling of matrix elements with secondary ion mass spectrometry and Auger electron spectroscopy. Selective enhancement of cation interdiffusion was observed by the concurrent Zn diffusion in both the GaAs based-and InP based-crystals. In contrast to the Zn diffusion, the Si diffusion in the GaAs based-crystal and the Te diffusion in the InP based-crystal enhanced both cation and anion interdiffusion to the same extent. A kick-out mechanism is proposed to explain the selective enhancement of the cation interdiffusion due to Zn, and a single vacancy mechanism is proposed for the interdiffusion due to Si and Te.

• Journal of Korean Vacuum Science & Technology
• /
• 제1권1호
• /
• pp.30-37
• /
• 1997

Interactions of Cu films with Si substrates separated by thin layers of molybdenum and molybdenum nitride were investigated in the viewpoint of diffusion barrier to copper. the diffusion barrier behavior of the layers was studied as functions of deposition and annealing conditions by cross-sectional transmission electron microscopy and Nomarski microscopy. the layers deposited at $N_2$ gas ratios of 0.4 and 0.5 exhibited good diffusion barrier behaviors up to $700^{\circ}C$, mainly due to the phase transformation of molybdenum to $\gamma$-Mo$_2$N phase. The increase in the N gas ratio in deposition elevates the lower limit of barrier failure temperature. Futhermore, amorphous molybdenum nitride films deposited at 20$0^{\circ}C$ and 30$0^{\circ}C$ did not fail, while the crystalline $\gamma$-Mo$_2$N films deposited at 40$0^{\circ}C$ and 50$0^{\circ}C$ showed signs of interlayer interactions between Cu and Si after annealing at 75$0^{\circ}C$ for 30 minutes. Therefore, the amorphous nature of the molybdenum nitride layer enhanced its ability to reduce Cu diffusion and its stability as a diffusion barrier at elevated temperatures.

• 전기의세계
• /
• 제17권2호
• /
• pp.16-26
• /
• 1968

Cds is possible to add excess donors and to compensate partially using other group metals as acceptors. The impurities can ble incorporated either during crysta growth or by diffusion into a bulkcrystal. The addition of rimpurities leads also to the production of vacancies in a manner depending on the atmosphere surrounding the crystal during growth, during the diffusion process or using bulk. Cds of the mentioned above affects spectral sensitivity, speed of response, the variation on photocurrent, electron life time, and decay of photoconductivity with temperature and with intensity of illumination. In the work to be deseribed, these properties have been studied between liquid nitrogen and room temperature. In addition, the electron trap distribution has been correlated with speed of response, variation of photocurrent with temperature in various atmosphere. Four major trapping levels have been observed, and their identification with impurity and vacancy levels is discussed. And also the effects of lattice imperfections on the photoconductive properties CdS were investigated in detail.

• 한국염색가공학회지
• /
• 제17권4호
• /
• pp.1-6
• /
• 2005

We studied the degree of variety of indigo for the electrochemical redox reaction in addition of reducing agent and the electrokinetic parameters. The electrokinetic parameters such asthe number of electron and the exchange rate constant were obtained by cyclic voltammetry. With increasing scan rate, the reduction currents of indigo were increased and the reduction potentials were shifted to the negative direction. As the results, the reduction processes of the indigo were proceeding to totally irreversible and diffusion controlled reaction. Also, exchange rate constant ($k^0$) and diffusion coefficient ($D_0$) of indigo were decreased by increasing concentration of reducing agent. We found that the less concentration, the more easily diffused and electron transferred and the product was more stable.