• 제목/요약/키워드: Electron Drift Velocity

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$SiH_4$ 가스의 에너지 분포함수 관한 연구 (Analysis of Energy Distribution Function in $SiH_4$ Gas)

  • 성낙진;김상남
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 학술대회 논문집 전문대학교육위원
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    • pp.76-79
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    • 2001
  • Energy distribution function in $SiH_4$ has been analysed over the E/N range $0.5{\sim}300Td$ and Pressure value 0.5, 1.0, 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, diffusion coefficient, electron ionization, mean energy and the electron energy distribution function. The electron energy distribution function has been analysed in $SiH_4$ at E/N=30, 50Td for a case of the equilibrium region in the mean electron energy and respective set of electron collision cross sections.

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MCS에 의한 Helium 기체 중의 전자수송특성 해석 (Analysis of electron transport characteristic in He gas by MCS)

  • 송병두;하성철;서상현;문기석;유회영;김상남
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 E
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    • pp.1752-1754
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    • 1998
  • Recently the research about electron transport characteristic and energy distribute function in mixture gases within Helium, has been used and developed widely as industrial quality improvement of extinguish characteristic, electrical dielectric strength ability of application of each species high voltage apparatus, gas plasma etching progress of work to use manufacture of semiconductor, thin film molding by CVD, insulation film to use ultra LSI, etc. This paper analyze electron transport characteristic in the range E/N $1{\sim}60$[Td], pressure $0.1{\sim}6.0$[Torr] by MCS. It is necessary to seek electron drift velocity, diffusion coefficient, lonization coefficients, characteristic energy, mean energy and electron energy distribution function as electron transport characteristic.

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MCS-BE에 의한 $SF_6+N_2$ 혼합기체의 전자수송특성 해석 (Analysis of electron transport properties in $SF_6+N_2$ mixtures gas used by MCS-BE)

  • 서상현;하성철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.696-699
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    • 1999
  • The electron transport coefficients in $SF_6+N_2$ gas is analysed in range of E/N values from 100~900(Td) by a Monte Carlo simulation and Boltzmann method, using a set of electron collision cross sections determined by the authors. The result of the Monte Carlo simulation such as electron drift velocity, ionization and electron attachment coefficients, longitudinal and transverse diffusion coefficients in nearly agreement with the respective experimental and theoretical for a range of E/N.

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$CF_4$ 기체의 MCS-BEq 알고리즘에 의한 전자에너지 분포함수 (Electron Energy Distribution Function in $CF_4$ Gas used by MCS-BE Algorithm)

  • 박재세;김상남;김일남
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 학술대회 논문집 전문대학교육위원
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    • pp.102-105
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    • 2002
  • In this paper, the electron transport characteristics in $CF_4$ has been analysed over the E/N range 1${\sim}$300 [Td] by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, longitudinal diffusion coefficient, the ratio of the diffusion coefficient to the mobility, electron ionization and attachment coefficients, effective ionization coefficient, mean energy, collision frequency and the electron energy distribution function. The swarm parameter from the swarm study are expected to serve as a critical test of current theories of low energy electron scattering by atoms and molecules, in particular, as well as crucial information for quantitative simulations of weakly ionized plasmas.

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$C_4F_6$-Ar혼합기체에서의 Plasma Discharge Simulation을 위한 $C_4F_6$ 초기단면적 결정 (Determination of the initial cross-sections for the $C_4F_6$ molecule from the electron drift velocity)

  • 이경엽;전병훈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1544-1545
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    • 2011
  • For quantitative understanding of gas discharge phenomena, we should know electron collision cross section. Processing plasma etching of semiconductor, and research are being used in the etching source $C_4F_6$ gas may be used by itself and mixed with other gases are also used. However, the molecular gas $C_4F_6$ study on the characteristics of the electron transport and the cross-sectional area of the decision is still lacking. Therefore, we understand the electron transport characteristics and analysed the electron transport coefficients. And to understand and interpret physical properties of the ionization coefficient ${\alpha}$/N, and the attachment coefficient ${\eta}$/N in $C_4F_6$ gas.

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$H_2$ + Ar 혼합기체의 전자수송계수에서의 전자충돌 단면적 (Electron Collision Cross Section of Electron Transport Coefficients in Hydrogen-Argon Mixtures)

  • 조두용;판티란;전병훈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1540-1541
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    • 2011
  • We calculated the electron transport coefficients in $H_2$+Ar gas calculated E/N values 0.01 ~ 1 Td by the Boltzmann equation method. This study gained the values of the electron swarm parameters such as the electron drift velocity and the transverse diffusion coefficients for $H_2$+Ar gas at a range of E/N. The transport coefficient W and Dt/u have been calculated in mixtures of 0.5% and 4% hydrogen in argon. All values were made at 293 K.

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$GeH_4$기체의 전자수송계수에 관한 연구 (A study on the electron transport coefficients in $GeH_4$ gas)

  • 류선미;전병훈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1404_1405
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    • 2009
  • For quantitative understanding of gas discharge phenomena, we should know electron collision cross section. $GeH_4$ is used in many applications with $Si_2H_6$ gas, such as amorphous alloy, a thin film of silicon and solar cell. Therefore, we understand the electron transport characteristics and analysed the electron transport coefficients, the electron drift velocity W, the longitudinal and transverse diffusion coefficient $ND_L$ and $ND_T$, and the ionization coefficient $\alpha$/N in $GeH_4$gas over the E/N range from 0.01 to 1000 Td by two-term approximation of the Boltzmann equation.

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Analysis of Electron Transport Coefficients in Binary Mixtures of TEOS Gas with Kr, Xe, He and Ne Gases for Using in Plasma Assisted Thin-film Deposition

  • Tuan, Do Anh
    • Journal of Electrical Engineering and Technology
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    • 제11권2호
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    • pp.455-462
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    • 2016
  • The electron transport coefficients in not only pure atoms and molecules but also in the binary gas mixtures are necessary, especially on understanding quantitatively plasma phenomena and ionized gases. Electron transport coefficients (electron drift velocity, density-normalized longitudinal diffusion coefficient, and density-normalized effective ionization coefficient) in binary mixtures of TEOS gas with buffer gases such as Kr, Xe, He, and Ne gases, therefore, was analyzed and calculated by a two-term approximation of the Boltzmann equation in the E/N range (ratio of the electric field E to the neutral number density N) of 0.1 - 1000 Td (1 Td = 10−17 V.cm2). These binary gas mixtures can be considered to use as the silicon sources in many industrial applications depending on mixture ratio and particular application of gas, especially on plasma assisted thin-film deposition.

Air에서의 전자수송계수 특성파악 (Analysis of electron transport coefficients in Air)

  • 서상현;하성철;전병훈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.181-184
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    • 2002
  • The electron transport coefficients in Air is analysed in range of E/N values from 100~1000(Td) by a MCS and BE method. This paper have calculated W, $ND_L$,$ ND_T$, Mean energy mixtures by $N_2+O_2$. The results gained that the values of the electron swarm parameters such as the electron drift velocity, longitudinal and transverse diffusion coefficients.

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$SiH_4$ + Ar 가스의 전자평균에너지 및 전자에너지분포함수 해석 (The Analysis of the Electron Mean Energy and Electron Energy Distribution Function in $SiH_4$ + Ar gas)

  • 이형윤;박명진;하성철
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 E
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    • pp.2341-2344
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    • 1999
  • In $SiH_4$ + Ar mixture gas contains 0.5% and 5% monosilane, this paper calculated electron swarm parameters in E/N has ratio 1$\sim$300(Td) and P : I (Torr) by MCS and Beq method. Electron swarm parameters showed a irregularity change in Ar mixed a little monosilane. It tends that the electron drift velocity is inversely proportional to E/N. It also represented characteristics that the transverse diffusion coefficient depends on E/N.

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