• 전기화학회지
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• 제5권1호
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• pp.17-20
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• 2002

다양한 조성의 CoFeNi합금이 chloride bath와 sulfate bath에서 전해도금 되어졌고, 합금의 도금 특성과 자기특성이 관찰되어졌다. CoFeNi합금 박막의 전해도금에 있어서 Fe조성의 증가는 chloride bath에서보다 sulfate bath에서 빠르게 증가하였다. 전류효율은 큰 변화가 보이지 않는 chloride bath와 달리 sulfate bath에서는 $750\%$에서 $50\%$로 큰 폭으로 감소하였다. Co, Fe, Ni조성이 $80\%,\;10\%,\;10\%$되는 CoFeNi합금이 이번 실험에서 가장 우수한 연자성 재료로 평가되었으며, 그때의 Coercivity는 3 Oe이고 높은 squareness값을 보였다

• 한국생산제조학회지
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• 제26권1호
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• pp.44-49
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• 2017

Titanium has been used in various fields due to its good corrosion and erosion resistance, and superior mechanical properties. The process for selective electro-deposition on a titanium surface using laser beam is proposed in this paper. The process consists of laser irradiation, electro-deposition, and ultrasonic cleaning. Laser irradiation can change the surface morphology of titanium. Through laser irradiation, the surface cleaning effect and a rough surface can be achieved. The surface roughness of titanium was measured according to the laser beam conditions. The characteristics of selective electro-deposition on titanium surface according to surface roughness are investigated by various analytical methods such as SEM, and EDS.

• 대한화학회지
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• 제59권5호
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• pp.423-428
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• 2015

(1S)-(+)-10-camphorsulfonic acid (CSA) and HCl were used together as a binary dopant in the electrodeposition of polyaniline (PAni). (+)-CSA and HCl were added in different mole ratios (9:1 and 6:4). (+)-CSA-doped and binary-doped PAni exhibited markedly different ultraviolet-visible and circular dichroism spectral characteristics due to differences in their conformations. Distinct helical structures are observed in the scanning electron microscopy images of (+)-CSA-doped PAni. The X-ray diffraction pattern of (+)-CSA-doped PAni exhibited remarkably higher crystallinity than that of HCl-doped PAni which is associated with the helical ordering along the polymer chains. The conformational changes due to the binary doping in chiral PAni had a significant effect on its chiroptical and electrochemical properties, morphology, and crystallinity, thus determined its conductivity.

• 한국기계가공학회지
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• 제18권2호
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• pp.38-43
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• 2019

Electrochemical etching is a popular process to apply metal patterning in various industries. In this study, the electrochemical etching using a patterned copper layer was proposed to fabricate multilayered structures. The process consists of electrodeposition, laser patterning, and electrochemical etching, and a repetition of this process enables the production of multilayered structures. In the fabrication of a multilayered structure, an etch factor that reflects the etched depth and pattern size should be considered. Hence, the etch factor in the electrochemical etching process using the copper layer was calculated. After the repetition process of electrochemical etching using copper layers, the surface characteristics of the workpiece were analyzed by EDS analysis and surface profilometer. As a result, multilayered structures with various shapes were successfully fabricated via electrochemical etching using copper layers.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2002년도 춘계학술발표회 초록집
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• pp.20-20
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• 2002

• 한국재료학회:학술대회논문집
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• 한국재료학회 2007년도 추계학술발표대회 및
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• pp.138.2-138.2
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• 2007

• 한국표면공학회지
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• 제10권3호
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• pp.3-11
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• 1977

3가크롬 鍍金法은 6가크롬 鍍金法의 諸 欠点을 克服할 수 있다는 事실이 알려져 外國에서는 오래 前 부터 工業的 실用化를 위한 硏究가 活潑하게 行하여 졌고, 이중 최근에 發表된 Alecra 3 process는 電着諸特性이 뛰어난 方法으로 裝飾크롬 鍍金 分野에 利用되고 있다고 한다. 本 硏究는 Alecra 3 process의 浴 組成中 개미산칼륨으로, 염화칼륨을 염화나트륨으로 大替한 浴의 電着諸特性을 調査하고 最適 염化크롬의 濃度와 錯化比를 함께 調査하여 다음과 간은 結果를 얻었다. (1) 外觀, 被覆性,均一電着性 및 平均 電析 速度 등은 염화크롬 濃度가 0.4 mol일때 가장 良好하였다. (2) 개미산나트륨 대 염화크롬의 mol比는 염화크롬이 0.4 mol일때 2~3이 比較的 良好한 電着諸特性을 보여 주었다. (3) 개미산나트륨 및 염화나트륨 含有한 鍍金浴의 電着諸特性은 Alecra 3 Process의 特性과 비슷하였다.

• 전기화학회지
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• 제10권2호
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• pp.94-103
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• 2007

반도체 소자의 고속화, 고집적화, 고신뢰성화에 대한 요구는 알루미늄 합금으로부터 구리로의 배선 물질의 변화를 유도하였다. 낮은 비저항과 높은 내열화성을 특징으로 하는 구리는 그 전기적, 재료적 특성이 알루미늄과 상이하여 배선 형성에 있어 새로운 주변 재료와 공법을 필요로 한다. 본 총설에서는 상감공정(damascene process)을 사용하는 다층 구리 배선 공정에 있어 핵심이 되는 구리 전해 도금(electrodeposition) 공정을 중심으로 확산 방지막(diffusion barrier) 및 도전층(seed layer), 바닥 차오름(bottom-up filling)을 위한 전해/무전해 도금용 유기 첨가제, 화학적 기계적 평탄화(chemical mechanical polishing) 및 표면 보호막(capping layer) 기술 등의 금속화 공정에 대한 개요와 개발 이슈를 소개하고 최근의 연구 결과를 통해 구리 배선 공정의 최신 연구 동향을 소개하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.232.1-232.1
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• 2014

The green displays are the human friendly displays, the nature friendly displays, and the economical displays. Electrochromic displays are low cost and environmental devices because they do have more choice of colours and use much less power. The elements of the electrochromic devices consist of at least two conductors, an electrochromic material and an electrolyte. The optical properties were obtained using the optical contrast between the transparency of the substrate and the coloured state of the electrochromic materials. These devices can be fully flexible and printable. Due to the characteristics of the high coloration efficiency and memory effects, the electrochromic devices have been used in various applications such as information displays, smart windows, light shutters and electronic papers. Among these technical fields switchable mirrors have been received much attention in the applicative point of view of various electronic devices production. We have developed a novel silver (Ag) deposition-based electrochromic device for the reversible electrodeposition (RED) system. The electrochromic device can switch between transparent states and mirror states in response to a change in the applied voltage. The dynamic range of transmittance percent (%) for the fabricated device is about 90% at 550 nm wavelength. Also, we successfully fabricated the large area RED display system using the parted electrochromic cells of the honey comb structure.

• Carbon letters
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• 제21권
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• pp.68-73
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• 2017

We have demonstrated the production of thin films containing multilayer graphene-coated copper nanoparticles (MGCNs) by a commercial electrodeposition method. The MGCNs were produced by electrical wire explosion, an easily applied technique for creating hybrid metal nanoparticles. The nanoparticles had average diameters of 10-120 nm and quasi-spherical morphologies. We made a complex-electrodeposited copper thin film (CETF) with a thickness of $4.8{\mu}m$ by adding 300 ppm MGCNs to the electrolyte solution and performing electrodeposition. We measured the electric properties and performed corrosion testing of the CETF. Raman spectroscopy was used to measure the bonding characteristics and estimate the number of layers in the graphene films. The resistivity of the bare-electrodeposited copper thin film (BETF) was $2.092{\times}10^{-6}{\Omega}{\cdot}cm$, and the resistivity of the CETF after the addition of 300 ppm MGCNs was decreased by 2% to ${\sim}2.049{\times}10^{-6}{\Omega}{\cdot}cm$. The corrosion resistance of the BETF was $9.306{\Omega}$, while that of the CETF was increased to 20.04 Ω. Therefore, the CETF with MGCNs can be used in interconnection circuits for printed circuit boards or semiconductor devices on the basis of its low resistivity and high corrosion resistance.