• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.285-286
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• 2005

Organic photovoltaic properties were studied in ZnPc/$C_{60}$ heterojunction structure by varying the organic layer thicknesses and exiton blocking layer(EBL). Current density-voltage characteristics of organic photovoltaic cells were measured using Keithley 236 source-measure unit, a 500W xenon lamp (ORIEL 66021) for a light source and Agilent 4294A impedance analyzer in the range of 40 Hz $\sim$ 1 MHz. From the analyses of current-voltage characteristics such as short-circuit current density, open-circuit voltage and power conversion efficiency, optimum thickness of the organic layer were obtained and frequency response such as electrical conductance.

• JSTS:Journal of Semiconductor Technology and Science
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• 제8권3호
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• pp.251-263
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• 2008

In this paper, we report an analytical modeling and 2-D Synopsys Sentaurus TCAD simulation of ion implanted silicon carbide MESFETs. The model has been developed to obtain the threshold voltage, drain-source current, intrinsic parameters such as, gate capacitance, drain-source resistance and transconductance considering different fabrication parameters such as ion dose, ion energy, ion range and annealing effect parameters. The model is useful in determining the ion implantation fabrication parameters from the optimization of the active implanted channel thickness for different ion doses resulting in the desired pinch off voltage needed for high drain current and high breakdown voltage. The drain current of approximately 10 A obtained from the analytical model agrees well with that of the Synopsys Sentaurus TCAD simulation and the breakdown voltage approximately 85 V obtained from the TCAD simulation agrees well with published experimental results. The gate-to-source capacitance and gate-to-drain capacitance, drain-source resistance and trans-conductance were studied to understand the device frequency response. Cut off and maximum frequencies of approximately 10 GHz and 29 GHz respectively were obtained from Sentaurus TCAD and verified by the Smith's chart.

• 조명전기설비학회논문지
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• 제27권5호
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• pp.74-80
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• 2013

This paper presents the transient behavior of the switching surge voltages generated by interruption of DC ground fault currents flowing through metal flexible conduits. All fault circuits consist of line parameters such as resistance, inductance, capacitance and conductance. The use of nonmagnetic metal conduits should be taken into account in order to reduce the inductance of battery charger distribution circuits. The frequency-dependent circuit parameters of metal flexible conduits were measured. The switching surge voltages generated at the ground fault circuit consisted of steel-galvanized alloy and aluminium conduits were investigated. As a result, the impedances of metal flexible conduits are significantly increased over the range of the frequency above 10 kHz and the switching surge voltages generated along aluminium flexible conduit are lower than those along steel-galvanized alloy conduit when DC fault current is interrupted.

• 한국전기전자재료학회논문지
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• 제28권4호
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• pp.218-221
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• 2015

Power MOSFETs (metal oxide semiconductor field effect transistor) operate as energy control semiconductor switches. In order to reduce energy loss of the device during switch-on state, it is essential to increase its conductance. In this study we have investigated a structure to reduce the on-resistance characteristics of the MOSFET. We have a proposed MOSFET structure of active cells region buried under the gate pad. The measurement are carried out with a EDS to analyze electrical characteristics, and the proposed MOSFET are compared with the conventional MOSFET. The result of proposed MOSFET was 1.68[${\Omega}$], showing 10% improvement compared to the conventional MOSFET at 700[V].

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.153-153
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• 2009

We investigated the dependence of the memory margin of the Cap-less memory cell on the strain of top silicon channel layer and also compared kink effect of strained Cap-less memory cell with the conventional Cap-less memory cell. For comparison of the characteristic of the memory margin of Cap-less memory cell on the strain channel layer, Cap-less transistors were fabricated on fully depleted strained silicon-on-insulator of 0.73-% tensile strain and conventional silicon-on-insulator substrate. The thickness of channel layer was fabricated as 40 nm to obtain optimal memory margin. We obtained the enhancement of 2.12 times in the memory margin of Cap-less memory cell on strained-silicon-on-insulator substrate, compared with a conventional SOI substrate. In particular, much higher D1 current of Cap-less memory cell was observed, resulted from a higher drain conductance of 2.65 times at the kink region, induced by the 1.7 times higher electron mobility in the strain channel than the conventional Cap-less memory cell at the effective field of 0.3MV/cm. Enhancement of memory margin supports the strained Cap-less memory cell can be promising substrate structures to improve the characteristics of Cap-less memory cell.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권5호
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• pp.497-503
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• 2015

It is essential to acquire an accurate and simple technique for extracting the interface trap density ($D_{it}$) in order to characterize the normally-off gate-recessed AlGaN/GaN hetero field-effect transistors (HFETs) because they can undergo interface trap generation induced by the etch damage in each interfacial layer provoking the degradation of device performance as well as serious instability. Here, the frequency-dependent capacitance-voltage (C-V) method (FDCM) is proposed as a simple and fast technique for extracting $D_{it}$ and demonstrated in normally-off gate-recessed AlGaN/GaN HFETs. The FDCM is found to be not only simpler than the conductance method along with the same precision, but also much useful for a simple C-V model for AlGaN/GaN HFETs because it identifies frequency-independent and bias-dependent capacitance components.

• 한국생물물리학회:학술대회논문집
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• 한국생물물리학회 2003년도 정기총회 및 학술발표회
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• pp.38-38
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• 2003

The electrical properties of neurons are produced by the coordinated activity of ion channels (Hille, 1992). $K^{+}$ channels play a key role in shaping action potentials and in determining neural firing patterns. Small conductance $Ca^{2+}$-activated $K^{+}$ (S $K_{Ca}$ ) channels are involved in modulating the slow component of afterhyperpolarization (AHP) (Kohler et al., 1996). Here we examine whether rat type 2 S $K_{Ca}$ (rSK2) channels can affect the shape of the action potential and the neural firing pattern, by overexpressing rat SK2 channels in Aplysia neuron R15. Our results show that rSK2 overexpression decreased the intraburst frequency and changed the regular bursting activity of neurons to an irregular bursting or beating pattern in R15, Furthermore, the overexpression of rSK2 channels increased AHP and reduced the duration of the action potential. Thus, our results suggest that ectopic S $K_{Ca}$ channels play an important role in regulating the filing pattern and the shape of the action potential.ntial.

• 센서학회지
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• 제10권4호
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• pp.222-231
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• 2001

$SnO_2$의 물성을 $Fe_2O_3$ 첨가량, 산소분압, CO 기체농도, 그리고 온도의 함수로서 관찰하였다. 시편은 후막인쇄 기법으로 알루미나 기판 위에 제조하였다. $700^{\circ}C$/6h 소성한 시편들의 $Fe_2O_3$첨가량에 따른 미세구조와 입자분포의 차이는 거의 없었다. $Fe_2O_3$를 첨가하지 않은 $SnO_2$의 전기적 성질은 소성온도가 낮은 경우와 산소분압이 낮은 경우에 전도성이 높게 측정되었다. $Fe_2O_3$를 첨가한 $SnO_2$의 전도성은 측정온도 증가로 증가하지만 $Fe_2O_3$ 첨가량 증가로 전도성은 감소하였다. 산소분압 의존성은 $Fe_2O_3$ 첨가로 감소하였다. CO 가스에 대한 기체 센서 특성 중 감도는 $350^{\circ}C$, 0.1 mol% $Fe_2O_3$를 첨가한 경우에 가장 높았고, 재현성 및 응답성도 양호하게 나타났다.

• 대한전자공학회논문지SD
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• 제47권10호
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• pp.14-22
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• 2010

기존의 n-type metal-oxide-semiconductor field effect transistor(NMOSFET)은 $n^+/p^{(+)}/n^+$ type의 이온 주입을 통하여 소스/채널/드레인 영역을 형성하게 된다. 30 nm 이하의 채널 길이를 갖는 초미세 소자를 제작함에 있어서 설계한 유효 채널 길이를 정확하게 얻기 위해서는 주입된 이온들을 완전히 activation하여 전류 수준을 향상시키면서도 diffusion을 최소화하기 위해 낮은 thermal budget을 갖도록 공정을 설계해야 한다. 실제 공정에서의 process margin을 완화할 수 있도록 오히려 p-type 채널을 형성하져 않으면서도 기존의 NMOSFET의 동작을 온전히 구현할 수 있는 junctionless(JL) MOSFET이 연구중이다. 본 논문에서는 3차원 소자 시뮬레이션을 통하여 silicon nanowire(SNW) 구조에 접목시킨 JL MOSFET을 최적 설계하고 그러한 조건의 소자에 대하여 conductance, maximum oscillation frequency($f_{max}$), current gain cut-off frequency($f_T$) 등의 기본적인 고주파 특성을 분석한다. 채널 길이는 30 nm이며 설계 변수는 채널 도핑 농도와 채널 SNW의 반지름이다. 최적 설계된 JL SNW NMOSFET에 대하여 동작 조건($V_{GS}$ = $V_{DS}$ = 1.0 V)에서 각각 367.5 GHz, 602.5 GHz의 $f_T$, $f_{max}$를 얻을 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.262.1-262.1
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• 2014

Lipid peroxidation induces functional deterioration of cell membrane and induces cell death in extreme cases. These phenomena are known to be related generally to the change of physical properties of lipid membrane such as decreased lipid order or increased water penetration. Even though the electric property of lipid membrane is important, there has been no report about the change of electric properties after lipid peroxidation. Herein, we demonstrate the molecular energy band change in red blood cell membrane through peroxidation by air-based atmospheric pressure DBD plasma treatment. Ion-induced secondary electron emission coefficient (${\gamma}$ value) was measured by using home-made gamma-focused ion beam (${\gamma}$-FIB) system and electron energy band was calculated based on the quantum mechanical Auger neutralization theory. The oxidized lipids showed higher gamma values and lower electron work functions, which implies the change of surface charging or electrical conductance. This result suggests that modified electrical properties should play a role in cell signaling under oxidative stress.