• Title/Summary/Keyword: Distribution uniformity

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Effect of a Reciprocating Paddle on the Electrodeposit Uniformity of Patterned Cathodes (왕복패들이 패턴화된 음극의 전착균일성에 미치는 영향)

  • Oh Young-joo;Chung Soon-hyo
    • Korean Journal of Materials Research
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    • v.14 no.3
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    • pp.196-202
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    • 2004
  • A numerical simulation based on the finite element method is used to investigate the effect of a reciprocal paddle on the uniformity of deposition rates at a patterned electrode. The calculated deposition rates agreed well with the measured values. The influences of the paddle velocity, the gap between cathodes and paddles, anode size and the distance between the anode and cathode have been studied. The optimum conditions on the paddle and geometric factors for electrodeposit uniformity could be obtained.

Research of Measurement and Evaluation of White Uniformity Considering Visual Angle on TFT-LCD (TFT-LCD에서 시야각을 고려한 White Uniformity 측정 및 평가에 대한 연구)

  • Chang, Sung-Ho;Seo, Sang-Won
    • Journal of the Ergonomics Society of Korea
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    • v.26 no.4
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    • pp.33-39
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    • 2007
  • In the full white pattern, white uniformity means the degree of uniform distribution of white color and luminance across the whole screen. Among the FPDs(Flat Panel Displays), the TFT-LCD has weak point of viewing angle. The viewing angle considering location and direction can cause different image quality of the TFT-LCD. Therefore, white uniformity of the TFT-LCD must consider viewing angle. Based on international standards, this study proposes an alternative that is realistic and ergonomic measurement of white uniformity of the TFT-LCD.

Theoretical Analysis of Secondary Current Distributions for Electrode with a Projection Part in Electroplating System (돌출부를 지닌 전극의 전기도금시스템에 대한 이론적 이차 전류분포 해석)

  • Sohn, Tai-Won;Ju, Jeh-Beck
    • Journal of the Korean Electrochemical Society
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    • v.12 no.4
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    • pp.317-323
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    • 2009
  • Theoretical calculations for the secondary current distributions for the electrode with a projection part in electroplating were performed. Two kinds of electrodes were considered. One is a electrode with the overall conducting surfaces(Case 1) and the other is an electrode in which only a projection part has a conducting surface(Case 2). The effects of applied potential, the ratio of ion exchange current to conductivity, $\xi$ and the aspect ratio on the current distribution were examined. The increase of applied current or the value of $\xi$ decreased the uniformity of current distribution. The small value of aspect ratio resulted the more uniform current distribution and Case 2 showed the better uniformity than Case 2. When this model was applied into an electrode with various projection parts, the local current distribution along the electrode surface were obtained successfully. In this case, the decrease of $\xi$ also increase the uniformity of current distribution as seen previously.

Overall Illuminance Uniformity of IRED Lighting in Nighttime CCTV

  • Sa-Gong, Geon;Park, Yung-Jun;Park, Jung-Je;Lee, Suho
    • Transactions on Electrical and Electronic Materials
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    • v.18 no.1
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    • pp.35-41
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    • 2017
  • This study looks at optimizinge light redistribution to improve the overall illuminance uniformity of commercial IRED modules. To obtain uniform illumination over a prescribed rectangular area, a freeform surface lens was evaluated using TracePro. The LED light overall illuminance uniformity regulated in KSC 7658 was verified using Relux software. Experimental test results showed 0.81 overall illuminance uniformity for rectangular light distribution of LED lights having a radiation angle of $80^{\circ}$. After fabricating prototype IRED lights based on these simulation results, illuminance performance was observed when used as actual IRED lighting with a nighttime CCTV system. Image observation photographs of the prototype $80^{\circ}$ rectangular IRED lights confirmed that object images can be seen clearly owing to high overall illuminance uniformity, and that dark regions of the CCTV screen were not shown.

Effect of a Suspended Overhead Sprayer with Sector Formed Injection Nozzles on Spraying Uniformity (두상관수장치의 부채꼴분사노즐 설치위치가 살수균일성에 미치는 영향)

  • 김명규;정태상;민영봉
    • Journal of Bio-Environment Control
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    • v.8 no.4
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    • pp.223-231
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    • 1999
  • The one of basic functional conditions of suspended overhead sprayer, which is openly made use of irrigating on bedding plants in greenhouse, is to be kept the growing uniformity of bedding plants by making uniformly the spraying irrigation depending on the distribution of sprayed water. This study was performed to find out the optimum position of sector formed injection nozzle which is placed from the top of plant 0 the tip of the nozzle to keep spraying uniformity. The test of spraying distribution using a overhead sprayer, which was installed in a row of sector formed injection nozzles, was performed The measuring factor to represent spraying distribution was the water weight filled in each cup when the overhead sprayer was moving across the upside of the cups which were placed directly under the nozzles on keeping the distance from nozzle tip. The test results were as following , The standard mr of weights of each cup filled with spraying water was lower values at Position far from more than 60cm under nozzle tip. The driving speed variation of sprayer was not effected on spraying uniformity but the spraying water weight was inversely proportioned to the speed. To make best spraying uniformity, it was represented that the tip of the nozzle is positioned to keep the distance which the top of plants is placed at the second cross point of each injection sector of nozzles.

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Experimental Study on Mixing Efficiency of Exhaust Gas and Reductant According to SCR Mixer Shape (SCR 믹서형상에 따른 배기가스와 환원제 혼합 효율에 관한 실험적 연구)

  • Choe, Munseok
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.22 no.3
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    • pp.74-79
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    • 2021
  • This study examined the mixing efficiency of exhaust gas and urea according to the mixer shape in the SCR system. For the experiment, an SCR simulation system was manufactured, and a uniformity detector was attached to the catalyst location to measure the uniformity. The experiment was conducted by setting the exhaust-gas flow rate, temperature, mixer type, and catalyst distance as variables. The experimental results confirmed the swirl angle analysis, urea number distribution, and uniformity. The swirl angle experiment of Models A and B confirmed that the swirl angle of Model A was formed approximately 7 to 8 degrees higher over the entire RPM range. When there was no mixer in the SCR system, the urea and water were concentrated to one side. Mixer Model A showed an even distribution overall, and Model B showed a slightly concentrated tendency at the beginning but then showed a stable distribution of urea. The mixing efficiency of 90%, which was the uniformity target, could be satisfied in Model A and Model B. In particular, Model A showed excellent results that satisfied 90% efficiency at 10 cm of the catalyst position.

Geometric Modeling of Thin-film Thickness Profile for the OLED Evaporation Process (유기 증착 공정을 위한 박막 형상 모델링 EL)

  • 이응기
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1444-1447
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    • 2004
  • For the OLED evaporation process, thin film thickness uniformity is of great practical importance. In order to achieve the better thickness uniformity, geometric simulation of film thickness distribution profile is required. In this paper, a geometric modeling algorithm is introduced for process simulation of full-color OLED evaporating system. The physical fact of the evaporation process is modeled mathematically. Based on the developed method, the uniformity of the organic layer thickness can be successfully controlled.

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Velocity and Friction Force Distribution in Rotary CMP Equipment (회전형 CMP장비의 속도 및 마찰력 분포 해석)

  • Kim, Hyeong Jae;Jeong, Hae Do;Lee, Eung Suk;Sin, Yeong Jae
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.5
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    • pp.39-39
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    • 2003
  • As the design rules in semiconductor manufacturing process become more and more stringent, the higher degree of planarization of device surface is required for a following lithography process. Also, it is great challenge for chemical mechanical polishing to achieve global planarization of 12” wafer or beyond. To meet such requirements, it is essential to understand the CMP equipment and process itself. In this paper, authors suggest the velocity distribution on the wafer, direction of friction force and the uniformity of velocity distribution of conventional rotary CMP equipment in an analytical method for an intuitive understanding of variation of kinematic variables. To this end, a novel dimensionless variable defined as “kinematic number” is derived. Also, it is shown that the kinematic number could consistently express the velocity distribution and other kinematic characteristics of rotary CMP equipment.

Velocity and Friction Force Distribution in Rotary CMP Equipment (회전형 CMP장비의 속도 및 마찰력 분포 해석)

  • 김형재;정해도;이응숙;신영재
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.5
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    • pp.29-38
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    • 2003
  • As the design rules in semiconductor manufacturing process become more and more stringent, the higher degree of planarization of device surface is required for a following lithography process. Also, it is great challenge for chemical mechanical polishing to achieve global planarization of 12” wafer or beyond. To meet such requirements, it is essential to understand the CMP equipment and process itself. In this paper, authors suggest the velocity distribution on the wafer, direction of friction force and the uniformity of velocity distribution of conventional rotary CMP equipment in an analytical method for an intuitive understanding of variation of kinematic variables. To this end, a novel dimensionless variable defined as “kinematic number” is derived. Also, it is shown that the kinematic number could consistently express the velocity distribution and other kinematic characteristics of rotary CMP equipment.

Analysis of the relationship between operational condition and temperature distribution in a small incinerator (소형 소각로에서 운전조건과 온도분포 사이의 관계 분석)

  • Kim, Sung-Joon;Park, Jong-Hwan;Chun, Bong-Jun
    • Journal of Industrial Technology
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    • v.20 no.B
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    • pp.63-70
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    • 2000
  • One aims to find out how the operation condition of secondary inlet angle effects the temperature distribution inside a small incinerator. A finite volume commercial code, PHONICS, is used to simulate the temperature field in an incinerator. The computational grid system is constructed by Multi-Block technique. The governing equations based on the curvilinear coordinates are used. Numerical experiments are done with the five variations of secondary air inlet. The temperature distribution is quantified by the statistical deviation of temperature in an incinerator. The computational analysis says that the certain angle of secondary air inlet could improve the uniformity of temperature distribution in an incinerator.

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