• Title/Summary/Keyword: Discharge flow

Search Result 2,063, Processing Time 0.041 seconds

'Clinical Observation on the 290 cases of Cerebrovascular Accident' (뇌졸중환자(腦卒中患者) 290례(例)에 대(對)한 임상(臨床) 고찰(考察) (III))

  • Kang, Kwan-Ho;Jun, Chan-Yong;Park, Chong-Hyeong
    • The Journal of Korean Medicine
    • /
    • v.18 no.2
    • /
    • pp.223-244
    • /
    • 1997
  • Clinical observation was done on 290 cases of patients who were diagnosed as CVA with brain CT, TCD, MRI scan and clinical observation. They were hospitalized in the oriental medical hospital of Kyung-Won University from 1st January to 31st December in 1996. 1. The cases were classified into the following kinds : cerebral infarction, cerebral hemorrhage, and transient ischemic attack. The most case of them was the cerebr진 infarction. 2. There is no significant difference in the frequency of strokes in male and female. And the frequency of strokes was highest in the aged over 50. 3. In cerebral infarction the most frequent lesion was the territory of middle cerebral artery, and in cerebral hemorrhage the most frequent lesion was the basal ganglia. 4. The most ordinary preceding disease was hypertension, and the next was diabetes. 5. The rate of recurrence was high in cerebral infarction. 6. The frequency of strokes seems to have no relation to the season. 7. The cerebral infarction occurred usually in resting and sleeping, and the cerebral hemorrhage in acting. 8. The course of entering hospital, most patients visited this hospital as soon as CVA occurred. And the half of patient visited this hospital within 2 days after CVA attack. 9. In the cases of patients who were unconscious at the admission, the prognosis was worse than that of the alert patients. 10. The common symptoms were motor disability and verbal disturbance. 11. The average duration of hospitalization was 27.4 days, and in case of cerebral hemorrhage the duration was prolonged. 12. The average time to start physical therapy was 13.3rd day after stroke in cerebral infarction and it was 19.9th day after stroke in cerebral hemorrhage. 13. The common complications were urinary tract infection, pneumonia, myocardial infarction and so on. 15. At the time of entering hospital, in most cases the blood pressure was high, but blood pressure was well controlled at the time of discharge. 16. Generally reported, hypercholesterolemia and hypertriglyceridemia are usually found in cerebral infarction. But in this study, they were found more frequently in cerebral hemorrhage than in infarction. 17, In the most cases, western and oriental medical treatments were given simultaneously. 18. In acute or subacute stage, the methods of smoothening the flow of KI(順氣), dispelling phlegm(祛痰), clearing away heat(淸熱) or purgation(瀉下) were frequently used. And in recovering stage, the methods of replenishing KI(補氣), tonifying the blood(補血) or tranquilization(安神) were frequently used.

  • PDF

Sensitivity Analysis of Runoff-Quality Parameters in the Urban Basin (도시 배수유역의 유출-수질 특성인자의 민감도 분석)

  • Lee, Jong-Tae;Gang, Tae-Ho
    • Journal of Korea Water Resources Association
    • /
    • v.30 no.1
    • /
    • pp.83-93
    • /
    • 1997
  • The purpose of the study is to analyze the sensitivity of the parameters that affect the runoff and water quality in the studied drainage basins. SWMM model is applied to the four drainage basins located at Namgazwa and Sanbon in Seoul and Gray Haven and Kings Creek in the USA. first of all, the optimum values of the parameters which have least simulation error to the observed data, are detected by iteration procedure. These are used as the standard values which are compared against the procedure. These are used as the standard values which are compared against the varied parameter values. In order to catch the effectiveness of the parameters to the computing result, the parameters are changed step by setp, and the results are compared to the standard results in flowerate and quality of the sewer. The study indicates that the discharge is greatly affected by the types of runoff surface, i.e., impervious area remarkably affects the peak flow and runoff volume while the surface storage affects the runoff volume at mild sloped basins. In addition, the major parameters affecting the pollution concentrations and loadings are the contaminant accumulation coefficient per unit area per time and the continuous dry weather days. Furthermore, the factors that affect the water quality during the initial rainfall period are the rainfall intensity, transport capacity coefficient and its power coefficient. Consequently, in order to simulate the runoff-water quality, it is needed to evaluate previous data in the research performed for the studied basins. To accurately estimated from the tributary areas and the rational computation methods of the pollutants calculation should be introduced.

  • PDF

Treatment of highly concentrated organic wastewater by high efficiency $UV/TiO_{2}$ photocatalytic system (고효율 자외선/광촉매 시스템을 이용만 고농도 유기성 폐수처리)

  • Kim, Jung-Kon;Jung, Hyo-Ki;Son, Joo-Young;Kim, Si-Wouk
    • KSBB Journal
    • /
    • v.23 no.1
    • /
    • pp.83-89
    • /
    • 2008
  • Food wastewater derived from the three-stage methane fermentation system developed in this lab contained high concentration organic substances. The organic wastewater should be treated through advanced wastewater treatment system to satisfy the "Permissible Pollutant Discharge Standard of Korea". In order to treat the organic wastewater efficiently, several optimum operation conditions of a modified $UV/TiO_{2}$ photocatalytic system have been investigated. In the first process, wastewater was pre-treated with $FeCl_{3}$. The optimum pH and coagulant concentration were 4.0 and 2000mg/L, respectively. Through this process, 52.6% of CODcr was removed. The second process was $UV-TiO_{2}$ photocatalytic reaction. The optimum operation conditions for the system were as follows: UV lamp wavelength, 254 nm; wastewater temperature, $40^{\circ}C$; pH 8.0; and air flow rate, 40L/min, respectively. Through the above two combined processes, 69.7% of T-N and 70.9% of CODcr contained in the wastewater were removed.

Characteristic of Partial Oxidation of Methane and Ni Catalyst Reforming using GlidArc Plasma (GlidArc 플라즈마를 이용한 메탄 부분산화 및 Ni 촉매 개질 특성)

  • Kim, Seong-Cheon;Chun, Young-Nam
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.30 no.12
    • /
    • pp.1268-1272
    • /
    • 2008
  • Low temperature plasma applied with partial oxidation is a technique to produce synthesis gas from methane. Low temperature plasma reformer has superior miniaturization and start-up characteristics to reformers using steam reforming or CO$_2$ reforming. In this research, a low temperature plasma reformer using GlidArc discharge was proposed. Reforming characteristics for each of the following variables were studied: gas components ratio (O$_2$/CH$_4$), the amount of steam, comparison of reaction on nickle and iron catalysts and the amount of CO$_2$. The optimum conditions for hydrogen production from methane was found. The maximum Hydrogen concentration of 41.1% was obtained under the following in this condition: O$_2$/C ratio of 0.64, total gas flow of 14.2 L/min, catalyst reactor temperature of 672$^{\circ}C$, the amount of steam was 0.8, reformer energy density of 1.1 kJ/L with Ni catalyst in the catalyst reactor. At this point, the methane conversion rate, hydrogen selectivity and reformer thermal efficiency were 66%, 93% and 35.2%, respectively.

Development of Automatic Nutrient-Solution Mixing System Using a Low-Cost and Precise Liquid Metering Device (액제 정밀계량 장치를 이용한 양액 자동조제 시스템 개발)

  • 이규철;류관희;이정훈;김기영;황호준
    • Journal of Biosystems Engineering
    • /
    • v.22 no.4
    • /
    • pp.469-478
    • /
    • 1997
  • This study was conducted to develop an automatic nutrient-solution mixing system for small-scale sewers. The nutrient-solution mixing system consisted of a low-cost and precise metering device and data acquisition & control system with a personal computer. and, the metering device was composed of three parts those were supply pumps, metering cylinders and venturi tube. The system controlled electric conductivity(EC) and pH of nutrient-solution based on the time-based feedback control method with the information about temperature, EC, and pH of the nutrient-solution. The performance of the nutrient-solution mixing system was evaluated through the control of EC and pH while compared with those of commercial system. Also an experimental cultivation of tomato was conducted to verify and to improve the developed system. Results of this study were as follows. 1. The correlation coefficient of meteing device between the flow rate and operating time was 0.9999, and the linear reuession equation computed was y=21.759x, where y is the discharge($g$) and x is the operating time(s). 2. Calculated errors for the developed metering device and two commercial pump were $\pm$0.3% $\pm$2.45% and $\pm$1.38 % FS error respectively. 3. An automatic nutrient-solution mixing system based on a low-cost and precise metering device was developed. 4. The full scale errors of the developed system in controlling EC and pH at 23$\pm$1$^{\circ}C$ were $\pm$0.05mS/cm and $\pm$0.2, respectively 5. When using the commercial system, the controlled values of EC and pH of the 500 $\ell$ of water were 1.29 mS/cm and 6.1 pH for the setting points of 1.4 mS/cm and 6.0 pH respectively at 23$pm1^{\circ}C$. 6. The developed nutrient-solution control system showed $\pm$0.05 ms/cm of deviation from the setting EC value over the experimental cultivation period. 7. The deviation from the average values of Ca and Mg mass content in the several nutrient-solution were 0.5% and 1.8% respectively.

  • PDF

Formation and Characteristics of the Fluorocarbonated SiOF Film by $O_2$/FTES-Helicon Plasma CVD Method

  • Kyoung-Suk Oh;Min-Sung Kang;Chi-Kyu Choi;Seok-Min Yun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 1998.02a
    • /
    • pp.77-77
    • /
    • 1998
  • Present silicon dioxide (SiOz) 떠m as intennetal dielectridIMD) layers will result in high parasitic c capacitance and crosstalk interference in 비gh density devices. Low dielectric materials such as f f1uorina뼈 silicon oxide(SiOF) and f1uoropolymer IMD layers have been tried to s이ve this problem. I In the SiOF ftlm, as fluorine concentration increases the dielectric constant of t뼈 film decreases but i it becomes unstable and wa않r absorptivity increases. The dielectric constant above 3.0 is obtain어 i in these ftlms. Fluoropolymers such as polyte$\sigma$따luoroethylene(PTFE) are known as low dielectric c constant (>2.0) materials. However, their $\alpha$)Or thermal stability and low adhesive fa$\pi$e have h hindered 야1리ru뚱 as IMD ma따"ials. 1 The concept of a plasma processing a찌Jaratus with 비gh density plasma at low pressure has r received much attention for deposition because films made in these plasma reactors have many a advantages such as go여 film quality and gap filling profile. High ion flux with low ion energy in m the high density plasma make the low contamination and go어 $\sigma$'Oss피lked ftlm. Especially the h helicon plasma reactor have attractive features for ftlm deposition 야~au똥 of i앙 high density plasma p production compared with other conventional type plasma soun:es. I In this pa야Jr, we present the results on the low dielectric constant fluorocarbonated-SiOF film d밑JOsited on p-Si(loo) 5 inch silicon substrates with 00% of 0dFTES gas mixture and 20% of Ar g gas in a helicon plasma reactor. High density 띠asma is generated in the conventional helicon p plasma soun:e with Nagoya type ill antenna, 5-15 MHz and 1 kW RF power, 700 Gauss of m magnetic field, and 1.5 mTorr of pressure. The electron density and temperature of the 0dFTES d discharge are measUI벼 by Langmuir probe. The relative density of radicals are measured by optic허 e emission spe따'Oscopy(OES). Chemical bonding structure 3I피 atomic concentration 따'C characterized u using fourier transform infrared(FTIR) s야3띠"Oscopy and X -ray photonelectron spl:’따'Oscopy (XPS). D Dielectric constant is measured using a metal insulator semiconductor (MIS;AVO.4 $\mu$ m thick f fIlmlp-SD s$\sigma$ucture. A chemical stoichiome$\sigma$y of 야Ie fluorocarbina$textsc{k}$영-SiOF film 따~si야영 at room temperature, which t the flow rate of Oz and FTES gas is Isccm and 6sccm, res야~tvely, is form려 야Ie SiouFo.36Co.14. A d dielec$\sigma$ic constant of this fIlm is 2.8, but the s$\alpha$'!Cimen at annealed 5OOt: is obtain려 3.24, and the s stepcoverage in the 0.4 $\mu$ m and 0.5 $\mu$ m pattern 킹'C above 92% and 91% without void, res야~tively. res야~tively.

  • PDF

Development of 80 kW RF Thermal Plasma Torch System for Mass Production and Research of Si Nano-Powder Manufacturing Process (양산용 80 kW급 RF Plasma Torch System 개발 및 Si 나노분말 제조 공정 연구)

  • Song, Seok-Kyun;Son, Byungkoo;Kim, Byunghoon;Lee, Moonwon;Sin, Myungsun;Choi, Sunyong;Lee, Kyu-Hang;Kim, Seong-In
    • Journal of the Korean Vacuum Society
    • /
    • v.22 no.2
    • /
    • pp.66-78
    • /
    • 2013
  • In order to develop of 80 kW RF plasma torch system, we achieved three-dimensional simulations for the extraction of more information as temperature in torch and fluid behavior analysis, etc. The position of powder injection tube, the plasma discharge characteristics with various input current and various length of ceramic tube, and the plasma temperature characteristics with process gas flow rate such those was simulated. RF thermal plasma torch designed by simulation was manufactured that was measured to the maximum of 89.3 kW power. The mass production using developed 80 kW RF thermal plasma torch system were investigated by characteristics manufactured of Si nano powder. The mass-production level of Si nano-powder was average of 539 g/hr and high yield rate of 71.6%, respectively. The particle size distribution $D_{99}/D_{50}$ of manufacturing nano-powder was investigated to 1.98 as a good uniform.

Investigation on the Variation of Discharge Coefficients Following Bifurcation Angle Changes (방수로 분류부 분류각 변화에 따른 유량계수 변화 검토)

  • Rhee, Dong-Sop;Kim, Chang-Wan
    • Proceedings of the Korea Water Resources Association Conference
    • /
    • 2007.05a
    • /
    • pp.926-929
    • /
    • 2007
  • 방수로는 홍수 피해 경감을 사용되는 구조적 대책으로 최근 국내에서 널리 계획되고 있다. 이러한 방수로는 보통 횡월류위어 등으로 대표되는 유입부 구조물을 통하여 하천 본류와 연결되지만, 평상시에도 본류의 유량을 일부 분담하는 형태로 설계되는 젖은 하도(wet channel) 형태의 방수로는 별도의 유입부 구조물을 설치하지 않고 바로 본류에 연결되는 것이 일반적이다. 유입부 구조물을 통해 연결되는 방수로의 특성은 유입부 구조물의 수리학적인 특성에 의해서 많이 좌우된다. 이에 반해 젖은 하도 형태로 본류에서 바로 분기되는 방수로는 그 특성이 방수로의 폭(W), 방수로 분류각$(\theta)$등에 의해서 많이 좌우되며, 만약 설계된 방수로의 횡단면 형상이 사다리꼴 또는 직사각형 단면을 따른다면 이러한 흐름은 "제한 영마루고 횡월류위어 흐름(restricted zero-height side weir flow)"으로 분류할 수 있다. 이러한 조건에서의 흐름은 일반적인 횡월류위어 흐름과 많이 다른 것으로 알려져 있다. 본 연구에서는 이러한 방수로 폭 및 분류각을 변화시켜 방수로 분류 조건을 다양하게 구현하여 실험을 수행하였으며, 특히 분류각 변화에 따른 유량계수의 변화를 분석, 검토하였다. 또한 측정된 방류량을 기준으로 산정된 유량계수를 기존 연구자들이 제시한 영마루고(zero-height) 횡월류위어 유량계수 산정식에 의해 산정된 결과와 비교하여 분석하였다. 분석결과 분류각이 90도인 경우 본류 프루드수의 증가에 따라 유량계수가 점차 감소하였으나, 분류각이 90도 보다 작은 경우에는 본류 프루드수가 증가함에 따라 유량계수가 점차 증가하는 것으로 나타났다. 이러한 한계를 만족시킬 입체 영상) 입체영상은 영화에서 시작되었으나, 20c후반기에 들어서면서 애니메이션 분야와 모바일, 광고 패널, 텔레비전등의 매체를 이용한 입체 영상의 개발로 인하여 특정 분야에 한정 시킬 수 없으므로 영상으로 칭한다. 입체 영상은 21c에 들어서면서 영상매체의 한 분야로 급부상하고 있다. 1900년 무렵부터 연구된 입체영화(3-Dimensional motion Picture)는 In여 년이 지난 지금 대중화를 눈앞에 두고 있다. 국내에서는 놀이 동산이나 박물관등에서 흔히 볼 수 있다. 하지만 앞으로는 HDW등의 대중화로 화질의 발전을 이룬 텔레비전 분야 등에서 실용화 될 전망이다. 국제적인 흐름과 함께 국내에서도 입체 영화에 대한 연구가 활성화 되어 영상산업의 한 주류로서 대두되고 있다. 이러한 상황에서 입체영상에 대한 이해와 콘텐츠(Contents)의 개발은 기술적인 진보에 발맞추어 준비되어야 한다. 본 논문은 이러한 기술적인 계보에 발맞춘 영상 콘텐츠 개발에 박차를 가하고자 앞으로의 발전분야에 대한 기술적인 면과 기법적인 면을 제시하여 기술만 앞서고 내용은 수입하는 수입국이기 보다는 미리 준비하여 비전문가나 타국의 기술에 선점 당하지 않는 분야로 성장할 수 있는 진보적인 영상 인들의 관심과 지속적인 연구를 독려하고자 한다.시민의 휴식 및 여가선용 공간으로 활용하기 위한 사업의 기초자료로 활용되며 이미 설계검토가 시작되었다. 본 연구결과는 유수지 및 저수지의 환경개선 사업의 선두적인 성공사례로 국내 타 지역의 유사한 사업에 있어 벤치마킹을 할 수 있는 훌륭한 사례가 될 것이다.요 생산이 증가하자 군신의 변별(辨別)과 사치를 이유로 강력하게 규제하여 백

  • PDF

Performance of Beam Extractions for the KSTAR Neutral Beam Injector

  • Chang, D.H.;Jeong, S.H.;Kim, T.S.;Lee, K.W.;In, S.R.;Jin, J.T.;Chang, D.S.;Oh, B.H.;Bae, Y.S.;Kim, J.S.;Cho, W.;Park, H.T.;Park, Y.M.;Yang, H.L.
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.02a
    • /
    • pp.240-240
    • /
    • 2011
  • The first neutral beam injector (NBI-1) has been developed for the Korea Superconducting Tokamak Advanced Research (KSTAR) tokamak. A first long pulse ion source (LPIS-1) has been installed on the NBI-1 for an auxiliary heating and current drive of KSTAR core plasmas. Performance of ion and neutral beam extractions in the LPIS-1 was investigated initially on the KSTAR NBI-1 system, prior to the neutral beam injection into the main plasmas. The ion source consists of a JAEA magnetic bucket plasma generator with multi-pole cusp fields and a set of KAERI prototype-III tetrode accelerators with circular apertures. The inner volume of plasma generator and accelerator column in the LPIS-1 is approximately 123 liters. Final design requirements for the ion source were a 120 kV/ 65 A deuterium beam and a 300 s pulse length. The extraction of ion beams was initiated by the formation of arc plasmas in the LPIS-1, called as an arc-beam extraction method. A stable ion beam extraction of LPIS-1 has been achieved up to an 100 kV/42 A for a 4 s pulse length and an 80 kV/25 A for a 14 s pulse length. Optimum beam perveance of 1.21 microperv has been found at an accelerating voltage of 80 kV. Neutralization efficiency has been measured by using a water flow calorimetry (WFC) method of calorimeter and an operation of bending magnet. The full-energy species of ion beams have been detected by using the diagnostic method of optical multichannel analyzer (OMA). An arc efficiency of the LPIS was 0.6~1.1 A/kW depending on the operating conditions of arc discharge.

  • PDF

Research on the Multi-electrode Plasma Discharge for the Large Area PECVD Processing

  • Lee, Yun-Seong;You, Dae-Ho;Seol, You-Bin
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.478-478
    • /
    • 2012
  • Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

  • PDF