• Title/Summary/Keyword: Discharge Pressure

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Photolytic Characteristics of TiO2 Treated by Atmospheric Pressure Dielectric Barrier Discharge (대기압 유전체배리어 방전으로 표면처리된 TiO2 분말의 광분해 특성)

  • Kang, Jeong A;Kim, Yoon Kee
    • Korean Journal of Materials Research
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    • v.26 no.8
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    • pp.406-411
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    • 2016
  • In order to reuse the photocatalyst and enhance the photolysis efficiency, we have used atmospheric pressure dielectric barrier discharge (APDBD) to clean and activate $TiO_2$ powder. The photocatalytic activity of the $TiO_2$ powder before and after APDBD treatment was evaluated by the degradation of methylene blue (MB) in aqueous solution. The apparent reaction rate constant of photolysis of the first sample of reused $TiO_2$ cleaned by APDBD improved to a level up to 0.32h-1 higher than the 30 % value of the initial $TiO_2$ powder. As the number of photolysis reactions and APDBD cleanings increased, the apparent rate constants gradually decreased; however, the fourth photolysis reaction still showed a value that was greater than 10% of the initial value. In addition, APDBD treatment enhanced the process by which $TiO_2$ effectively adsorbed MB at every photolysis stage.

Water Repellent Finish of Polyester Fabric Using Glow Discharge Treatment (글로우방전을 이용한 폴리에스테르 직물의 투습방수성 개질)

  • 김태년
    • Journal of the Korean Society of Clothing and Textiles
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    • v.25 no.1
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    • pp.154-161
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    • 2001
  • We have treated polyester fabric with $CF_4,\;C_2F_6,\;SF_6\;and\;C_3F_6$ glow discharge plasmas to develop functional fabrics which preserve moisture transportation and water proofing nature. Modified properties were evaluated by water vapor permeation rate and breakthrough water pressure. The change of surface morphology was observed by SEM. Fiber interstice of the plasma treated fabric was calculated as $0.32{\mu}{\textrm}{m}$, and this value was sufficiently ideal as water repellent material. The moisture transportation of ${CF_4}-treated$ fabric was good as much as untreated fabric, and those of $C_2$F(sub)6-treated, SF(sub)6-treated fabrics were reduced by 1~3%, and that of ${C_3F_6}-treated$ fabric was reduced by 15%. The best treatment condition were 0.06 torr 120 seconds in $CF_4$, 0.05 torr 30 seconds in $SF_6$, 0.08~0.15 torr 90 seconds in $SF_6$ and 0.1 torr 45 seconds in $C_3F_6$ respectively. The grade of moisture transportation effect was $CF_4>C_2F_6>SF_6>>C_3F_6$, and water proofing effect was $C_2F_6{\approx}CF_4>C_3F_6>SF_6$. It was observed by SEM that the thin film was formed on the surface of the treated substrate by the fluorocarbon plasma treatment.

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A Study on Developement of CuN/Cu/CuN Electrode Material for PDP (PDP용 CuN/Cu/CuN 전극재료의 개발에 관한 연구)

  • Cho, J.S.;Park, C.H.;Sung, Y.M.;Jeong, S.S.;Seok, B.Y.;Ryu, J.Y.;Kim, J.H.
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1572-1575
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    • 1996
  • A new type $Cu_{x}N/Cu/Cu_{x}N$ thin film electrode material with high adhesion to glass was developed by the dc reactive planar magnetron sputtering system for the PDP(Plasma Display Panel). The adhesive force of the $Cu_{x}N$ thin film was in the range of $20{\sim}40(N)$ under the conditions of the $N_2$ partial pressure of 15%, discharge current of 70mA, discharge voltage of 450V and substrate bias voltage of -100V. The adhesive force was depended on the $N_2$ partial pressure, discharge current and substrate bias voltage.

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A Development of the Low Energy Large Aperture Electron Beam Generator (저에너지 대면적 전자빔 발생장치 개발(II))

  • Woo, Sung-Hun;Lee, Kwang-Sik;Lee, Dong-In;Cho, Chu-Hyun;Choi, Young-Wook;Lee, Hong-Sik;Abroyan, M.
    • Proceedings of the KIEE Conference
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    • 1998.07e
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    • pp.1767-1769
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    • 1998
  • We have established a pulsed electron beam generation system with an energy of 200[keV], pulse repetition rate of 200[Hz], and several tens of [${\mu}s$] pulse width. The system is characterized by a cold cathode that is simpler than the hot cathode. Target object does not need to be scanned because of large aperture electron beam of 300[$cm^2$]. Electron source is secondary electrons that are generated when the ions from the glow discharge collide on the cathode surface. In this paper, the discharge current characteristics are investigated experimentally as a function of He gas pressure in order to obtain stable glow discharge. And computer simulations are carried out as a preliminary study for the development of low energy large aperture electron beam generator. The variation of electon beam current is investigated as a function of rising time of high voltage when 20[kV] potential is applied in 20[mTorr] pressure.

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The Electrical and Optical Properties of Xe Flat Plasma Light Source (제논 (Xe) 평판형 플라즈마 광원의 전기적 및 광학적 특성 연구)

  • Choi, Yong-Sung;Moon, Jong-Dae;Lee, Kyung-Sup;Lee, Sang-Heon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.05a
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    • pp.86-90
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    • 2006
  • Discharge of the flat lamp lighting source research are requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the f1at lamp lighting source to understand property of lighting source is very important. Distance of discharge electrode is 5.5mm and width is 16.5mm, we have measured electron temperature and electron density measured with single Langmuir probe in flat lamp. We have tested the discharge from 100 Torr to 300 Torr pressure. The pulse is rectangular pulse with frequency 20kHz and duty ratio 20%. In result, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

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A Measurements of Radio-Frequency Induction Discharge Plasma using probe method (고주파 유도방전 플라즈마의 푸로우브법에 의한 계측)

  • Park, Sung-Gun;Park, Sang-Yun;Ha, Chang-Ho;Park, Won-Zoo;Lee, Kwang-Sik;Lee, Dong-In
    • Proceedings of the KIEE Conference
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    • 1997.07e
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    • pp.1657-1659
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    • 1997
  • Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

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A study on the characteristics of arc discharge and radiated electromagnetic wave in liquid nitrogen (액체질소중에 있어서 아크방전 및 방사 전자파의 특성에 관한 연구)

  • Shin, Dong-Hwa;Park, Kwang-Seo;Ju, Jae-Hyun;Choi, Byung-Ju;Kim, Ki-Chai;Lee, Kwang-Sik;Lee, Dong-In
    • Proceedings of the KIEE Conference
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    • 1997.07e
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    • pp.1669-1671
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    • 1997
  • Liquid nitrogen has many adventages. It is cheaper than other cooling medium. It is easy to obtain high purity. It's utilized with easy. In future, liquid nitrogen is able to be accepted cooling medium for the superconducting and cryogenic applicated equipments. Cryogenic liquid may be atmospheric pressure state because thermoinsulation is ineffective, airtight decreasing by long time using and bubble occured by flowing current. If it is to be atmospheric pressure state, the electrical insulation strength is dropped and processed partial discharge, finally breakdown. Processing of breakdown has anticipated by measuring radiated-electromagnetic wave which is happened in time of breakdown. There is a measurement of radiated electromagnetic wave as a method that proceeding breakdown is anticipated. In this paper, radiated electromagnetic wave was measured in arc discharge by above conditions as a basic experiment.

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Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method (플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착)

  • Yun, Sang-Min;Yang, Sung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.411-414
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    • 2009
  • It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.

Charge and Discharge Characteristics of Microencapsulated Hydrogen Storage Alloy Electrodes for Secondary Batteries (마이크로캡슐화한 축전지용 수소저장합금 전극의 충·방전 특성)

  • CHOI, Seong-Soo;CHOI, Byung-Jin;YE, Byung-Joon;KIM, Dai-Ryong
    • Transactions of the Korean hydrogen and new energy society
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    • v.3 no.2
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    • pp.45-54
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    • 1992
  • An applicability microencapsulation, using electroless copper plating, of hydrogen storage alloy powder as an anode material for nickel-hydrogen secondary batteries was investigated. Alloys employed were $LaNi_{4.7}Al_{0.3}$ and $MmNi_{4.5}Al_{0.5}$(Mm=mischmetal) which have an appropriate equilibrium pressure and capacity. The microencapsulation of the alloy powder was found to accelerate initial activation of electrodes and to increase capacity which is about 285mAh/g for $LaNi_{4.7}Al_{0.3}$. In addition, other charge and discharge characteristics, such as polarization and flatness of charge and discharge potential, were improved due to the role of copper layer as a microcurrent collector and an oxidation barrier of the alloy powder. $MmNi_{4.5}Al_{0.5}$ alloy showed lower capacity than $LaNi_{4.7}Al_{0.3}$ because of higher equilibrium pressure. Cyclic characteristics of both alloys were somewhat poor because of mainly shedding and partial oxidation of alloy powder during the cycling. However, it was considered that the microencapsulation method is effective to improve the performances of the hydrogen storage alloy electrodes.

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Anti-corrosion Properties of SiOxCy(-H) thin Films Synthesized and Oxidized by Atmospheric Pressure Dielectric Barrier Discharge (대기압 유전체배리어방전으로 합성 및 산화 처리된 SiOxCy(-H) 박막의 부식방지 특성)

  • Kim, Gi-Taek;Kim, Yoon Kee
    • Journal of the Korean institute of surface engineering
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    • v.53 no.5
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    • pp.201-206
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    • 2020
  • A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO2-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a precursor for the SiOxCy(-H) synthesis, and He gas was used for stabilizing APDBD. Oxygen permeability was evaluated by forming an oxidized SiOxCy(-H) thin film on a PET film. When the single-layer oxidized SiOxCy(-H) film was coated on the PET, the oxygen gas permeability decreased by 46% compared with bare PET. In case of three-layer oxidized SiOxCy(-H) film, the oxygen gas permeability decreased by 73%. The oxygen permeability was affected by the thickness of the SiO2-like layer formed by oxidation treatment rather than the thickness of the SiOxCy(-H) film. The excellent corrosion resistance was demonstrated by coating an oxidized SiOxCy(-H) thin film on the silver-coated aluminum PCB for light emitting diode (LED).