Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
권호 표지

A Measurements of Radio-Frequency Induction Discharge Plasma using probe method

고주파 유도방전 플라즈마의 푸로우브법에 의한 계측

  • Park, Sung-Gun (School of Electrical and Electronic Engineering, Yeungnam University) ;
  • Park, Sang-Yun (School of Electrical and Electronic Engineering, Yeungnam University) ;
  • Ha, Chang-Ho (School of Electrical and Electronic Engineering, Yeungnam University) ;
  • Park, Won-Zoo (School of Electrical and Electronic Engineering, Yeungnam University) ;
  • Lee, Kwang-Sik (School of Electrical and Electronic Engineering, Yeungnam University) ;
  • Lee, Dong-In (School of Electrical and Electronic Engineering, Yeungnam University)
  • 박성근 (영남대학교 전기전자 공학부) ;
  • 박상윤 (영남대학교 전기전자 공학부) ;
  • 하장호 (영남대학교 전기전자 공학부) ;
  • 박원주 (영남대학교 전기전자 공학부) ;
  • 이광식 (영남대학교 전기전자 공학부) ;
  • 이동인 (영남대학교 전기전자 공학부)
  • Published : 1997.07.21
Download PDF
⟨ Previous Next ⟩

Abstract

Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

Keywords