• Title/Summary/Keyword: Direct-writing process

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Micro patterning of conductor line by laser induced forward transfer(LIFT) (LIFT 방법에 의한 전도성 미세 패터닝 공정 연구)

  • 이제훈;한유희
    • Laser Solutions
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    • v.2 no.3
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    • pp.52-61
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    • 1999
  • The laser induced forward transfer(LIFT) technique employs a pulsed laser to transfer parts of a thin metal film from an optically transparent target onto an arbitrary substrate in close proximity to the metal film on the target. In this work, a two-step method, the combination of LIFT process, in which a Au film deposited on the $Al_2$O$_3$ substrate by Nd:YAG laser and subsequent Au electroless metal plating on the by LIFT process generated Au seed, was presented. The influence of laser parameters, wavelength, laser power, film thickness and overlap ratio of pulse tracks, on the shapes of deposit and conductor line after electroless plating is experimentally studied. As a results, the threshold power densities for ablation, deposition and metallization were determined and comparison of threshold value between the wave length 1064nm and the second harmonic generated 532nm. In odor to determine a possible application in the electronic industry, a smallest conduct spot size, line width and isolated line space were generated.

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Effect of polymer substrates on nano scale hot embossing (나노 사이즈 hot embossing 공정시 폴리머의 영향)

  • Lee, Jin-Hyung;Kim, Yang-sun;Park, Jin-goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.71-71
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    • 2003
  • Hot embossing has been widely accepted as an alternative to photolithography in generating patterns on polymeric substrates. The optimization of embossing process should be accomplished based on polymer substrate materials. In this paper, the effect of polymer substrates on nano scale hot embossing process was studied. Silicon molds with nano size patterns were fabricated by e-beam direct writing. Molds were coated with self-assembled monolayer (SAM) of (1, 1, 2.2H -perfluorooctyl)-trichlorosilane to reduce the stiction between mold and substrates. For an embossing, pressure of 55, 75 bur, embossing time of 5 min and temperature of above transition temperature were peformed. Polymethylmethacrylates (PMMA) with different molecular weights of 450,000 and 950,000, MR-I 8010 polymer (Micro Resist Technology) and polyaliphatic imide copolymer were applied for hot embossing process development in nano size. These polymers were spun coated on the Si wafer with the thickness between 150 and 200 nm. The nano size patterns obtained after hot embossing were observed and compared based on the polymer properties by scanning electron microscopy (SEM). The imprinting uniformity dependent on the Pattern density and size was investigated. Four polymers have been evaluated for the nanoimprint By optimizing the process parameters, the four polymers lead to uniform imprint and good pattern profiles. A reduction in the friction for smooth surfaces during demoulding is possible by polymer selection.

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Microfabrication of Micro-Conductive patterns on Insulating Substrate by Electroless Nickel Plating (무전해 니켈 도금을 이용한 절연기판상의 미세전도성 패턴 제조)

  • Lee, Bong-Gu;Moon, Jun Hee
    • Korean Journal of Metals and Materials
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    • v.48 no.1
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    • pp.90-100
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    • 2010
  • Micro-conductive patterns were microfabricated on an insulating substrate ($SiO_2$) surface by a selective electroless nickel plating process in order to investigate the formation of seed layers. To fabricate micro-conductive patterns, a thin layer of metal (Cu.Cr) was deposited in the desired micropattern using laser-induced forward transfer (LIFT). and above this layer, a second layer was plated by selective electroless plating. The LIFT process. which was carried out in multi-scan mode, was used to fabricate micro-conductive patterns via electroless nickel plating. This method helps to improve the deposition process for forming seed patterns on the insulating substrate surface and the electrical conductivity of the resulting patterns. This study analyzes the effect of seed pattern formation by LIFT and key parameters in electroless nickel plating during micro-conductive pattern fabrication. The effects of the process variables on the cross-sectional shape and surface quality of the deposited patterns are examined using field emission scanning electron microscopy (FE-SEM) and an optical microscope.

A Study on Electron-beam Lithography Simulation for Resist Surface Roughness Prediction (Resist 표면 거칠기 예측을 위한 전자빔 리소그라피 시뮬레이션에 관한 연구)

  • Kim, Hak;Han, Chang-Ho;Lee, Ki-Yong;Lee, Woo-Jin;Chun, Kuk-Jin
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.45-48
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    • 2002
  • This paper discusses the surface roughness of negative chemically amplified resists, SAL601 exposed by I-beam direct writing. system. Surface roughness, as measured by atomic force microscopy, have been simulated and compared to experimental results. Molecular-scale simulator predicts the roughness dependence on material properties and process conditions. A chemical amplification is made to occur in the resists during PEB process. Monte-Carlo and exposure simulations are used as the same program as before. However, molecular-scale PEB simulation has been remodeled using a two-dimensional molecular lattice representation of the polymer matrix. Changes in surface roughness are shown to correlate with the dose of exposure and tile baking time of PEB process. The result of simulation has a similar tendency with that of experiment.

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Laser Auto Focus Using Non-Touch Sensor (비접촉 센서를 이용한 레이저 자동 포커싱)

  • 장정원;김재구;신보성;장원석;최지연
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.280-283
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    • 2003
  • In this paper, there was finding laser beam focal length using the camera at the work with laser preprocess. A process have some similarity that the laser direct writing was condition of unused other light source in order to a partical object of working substrate, so we worked finding focal length using yellow light. As we found focal lengths from three points of substrate edges, The focal length of all substrates was able to be computed by calculating a plane equation using these three point. Also we make a device and software that can automatically perform all of the processes.

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A Study of Substrate Surface Treatment and Metal Pattern Formation using Inkjet Printing Technology (잉크젯 프린팅 기술을 이용한 기판 표면처리와 금속 패턴 형성에 관한 연구)

  • Jo, Yong-Min;Park, Sung-Jun
    • Journal of ILASS-Korea
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    • v.17 no.1
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    • pp.20-26
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    • 2012
  • Inkjet printing is one of the direct writing technologies and is able to form a pattern onto substrate by dispensing droplets in desired position. Also, by inkjet technology manufacturing time and production costs can be reduced, and procedures can be more efficient. To form a metal pattern, it must be harmonized with conductive nano ink, printing process, sintering, and surface treatment. In this study, micro patterning of conductive line has been investigated using the piezoelectric printhead driven by a bipolar voltage signal is used to dispense $20-40{\mu}m$ diameter droplets and silver nano ink which consists of 50 nm silver particles. In addition, hydrophobic treatment of surface, overlap printing techniques, and sintering conditions with changing temperature and times to achieve higher conductivity.

Characteristics of Nanolithography Process on Polymer Thin-film using Near-field Scanning Optical Microscope (근접장현미경을 이용한 폴리머박막 나노리쏘그라피 공정의 특성분석)

  • 권상진;김필규;장원석;정성호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.590-595
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    • 2004
  • The shape and size variations of the nanopatterns produced on a positive photoresist using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture( $P_{in}$ ), scan speed of the piezo stage(V), repeated scanning over the same pattern, and operation modes of the NSOM(DC and AC modes). The pattern size remained almost the same for equal linear energy density. Pattern size decreased for lower laser beam power and greater scan speed, leading to a minimum pattern width of around 50nm at $P_{in}$ =1.2$\mu$W and V=12$\mu$m/. Direct writing of an arbitrary pattern with a line width of about 150nm was demonstrated to verify the feasibility of this technique for nanomask fabrication. Application on high-density data storage using azopolymer is discussed at the end.

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A Study on the Iconological Approach of the Korean Traditional Space Design - Focusing on Regional Prototype and Creative Fantasy - (한국 전통공간디자인의 도상해석학적 접근에 관한 연구 - 지역적 원형과 창조적 환상의 개념을 중심으로 -)

  • Park, Kyung-Ae
    • Korean Institute of Interior Design Journal
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    • v.17 no.6
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    • pp.120-127
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    • 2008
  • Korean space design image is a kind of writing as well as one of the sign that dissembles itself as a direct transcript of what it represents. Moreover it is pictorial representation and notions such as mental and perceptual imaginary. Significance of Iconology lies in how we transform image and the imagination that produces it into power of trust and respect. From this point of view, the process of this study is illustrated as follows: At first, this study search out concept of archetype, collective unconsciousness and collective representation that found principles on basic theory for interpretation of korean space icon. Secondly, it mentions theoretical background of iconological contents and structure. And it clarifies Iconology as a method that is applicable logic for Korean space design. Finally, as an analysis of korean space design, this study analyse in three steps that are pre-iconological description, iconological analysis, iconological interpretation each in terms of modernization at regional korean space design. In the step of the pre-iconological description, it describe visual representative style based on era and place. In the step of the iconological analysis, the typical structure is classified in status, vernacular, ethnic, traditional. In the step of the iconological interpretation, connotation is categorized into allegory, multivalence, potential. Through this process, this study suggest that iconology is an appropriate analysis system of Korean space design images that represent symbols combined with our collective emotion.

Design and Fabrication of a Micro-Heat Pipe with High-Aspect-Ratio Microchannels (고세장비 미세채널 기반의 마이크로 히트파이프 설계 및 제조)

  • Oh, Kwang-Hwan;Lee, Min-Kyu;Jeong, Sung-Ho
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.9 s.186
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    • pp.164-173
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    • 2006
  • The cooling capacity of a micro-heat pipe is mainly governed by the magnitude of capillary pressure induced in the wick structure. For microchannel wicks, a higher capillary pressure is achievable for narrower and deeper channels. In this study, a metallic micro-heat pipe adopting high-aspect-ratio microchannel wicks is fabricated. Micromachining of high-aspect-ratio microchannels is done using the laser-induced wet etching technique in which a focused laser beam irradiates the workpiece placed in a liquid etchant along a desired channel pattern. Because of the direct writing characteristic of the laser-induced wet etching method, no mask is necessary and the fabrication procedure is relatively simple. Deep microchannels of an aspect ratio close to 10 can be readily fabricated with little heat damage of the workpiece. The laser-induced wet etching process for the fabrication of high-aspect-ratio microchannels in 0.5mm thick stainless steel foil is presented in detail. The shape and size variations of microchannels with respect to the process variables, such as laser power, scanning speed, number of scans, and etchant concentration are closely examined. Also, the fabrication of a flat micro-heat pipe based on the high-aspect-ratio microchannels is demonstrated.

Development of Statistical Model for Line Width Estimation in Laser Micro Material Processing Using Optical Sensor (레이저 미세 가공 공정에서 광센서를 이용한 선폭 예측을 위한 통계적 모델의 개발)

  • Park Young Whan;Rhee Sehun
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.7 s.172
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    • pp.27-37
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    • 2005
  • Direct writing technology on the silicon wafer surface is used to reduce the size of the chip as the miniature trend in electronic circuit. In order to improve the productivity and efficiency, the real time quality estimation is very important in each semiconductor process. In laser marking, marking quality is determined by readability which is dependant on the contrast of surface, the line width, and the melting depth. Many researchers have tried to find theoretical and numerical estimation models fur groove geometry. However, these models are limited to be applied to the real system. In this study, the estimation system for the line width during the laser marking was proposed by process monitoring method. The light intensity emitted by plasma which is produced when irradiating the laser to the silicon wafer was measured using the optical sensor. Because the laser marking is too fast to measure with external sensor, we build up the coaxial monitoring system. Analysis for the correlation between the acquired signals and the line width according to the change of laser power was carried out. Also, we developed the models enabling the estimation of line width of the laser marking through the statistical regression models and may see that their estimating performances were excellent.