• 제목/요약/키워드: Diffusion Length

검색결과 409건 처리시간 0.026초

한국 유의 일본 전파와 변천에 관한 연구 (A Study on the Diffusion and Change of the Korean Hip-length Jacket)

  • 김미자
    • 복식
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    • 제51권2호
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    • pp.193-203
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    • 2001
  • The hip-length jacket(유) worn by the Korean from the ancient times is tole prototype of the contemporary jacket. Hip-length jacket was transferred to Japan and worn by all the people beyond the class. From 12C, the King and the high class people wore the clothing influenced by Tang(唐) country but the common people continuously wore the hip-length jacket. Currently the hip-length jacket is worn by the merchant and is used as the clothing of the celebration. The hip-length jacket has not been much changed in terms of the form.

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CIGS 태양전지의 소수캐리어 확산 거리에 대한 새로운 측정 방안 연구 (Rapid and Accurate Measurement of Diffusion Length of Minority Carriers of CIGS Solar Cells)

  • 이돈환;김영수;모찬빈;남정규;이동호;박성찬;김병준;김동섭
    • Current Photovoltaic Research
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    • 제2권2호
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    • pp.59-62
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    • 2014
  • Minority carrier diffusion length is one of the most important parameters of solar cells, especially for short circuit current density (Jsc). In this report, we proposed the calculating method of the minority carrier diffusion length ($L_n$) in CIGS solar cells through biased quantum efficiency (QE). To verify this method's reliability, we chose two CIGS samples which have different grain size and calculated $L_n$ for each sample. First of all, we calculated out that $L_n$ was 56nm and 97nm for small and large grain sized-cell through this method, respectively. Second, we found out the large grain sized-cell has about 7 times lower defect density than the small grain sized-cell using drive level capacitance profiling (DLCP) method. Consequently, we confirmed that $L_n$ was mainly affected by the micro-structure and defect density of CIGS layer, and could explain the cause of Jsc difference between two samples having same band gap.

확산길이에 따른 수동식 유기용제 시료채취기의 시료채취성능에 관한 연구 (Sampling Efficiency of Organic Vapor Passive Samplers by Diffusive Length)

  • 이병규;장재길;정지연
    • 한국환경보건학회지
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    • 제35권6호
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    • pp.500-509
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    • 2009
  • Passive samplers have been used for many years for the sampling of organic vapors in work environment atmospheres. Currently, all passive samplers used in domestic occupational monitoring are foreign products. This study was performed to evaluate variable parameters for the development of passive organic samplers, which include the geometry of the device and diffusive length for the sampler design. Four prototype diffusive lengths; A-1(4.5 mm), A-2(7.0 mm), A-3(9.5 mm), A-4(12.0 mm) were tested for adsorption performances to a chemical mixture (benzene, toluene, trichloroethylene, and n-hexane) according to the US-OSHA's evaluation protocol. A dynamic vapor exposure chamber developed and verified by related research was used for this study. The results of study are as follows. The results in terms of sampling rate and recommended sampling time test indicate that the most suitable model was A-3 (9.5 mm diffusive lengths on both sides) for passive sampler design in time weighted average (TWA) assessment. Sampling rates of this A-3 model were 45.8, 41.5, 41.4, and 40.3 ml/min for benzene, toluene, trichloroethylene, and n-hexane, respectively. The A-3 models were tested on reverse diffusion and conditions of low humidity air (35% RH) and low concentrations (0.2 times of TLV). These conditions had no affect on the diffusion capacity of samplers. In conclusion, the most suitable design parameters of passive sampler are: 1) Geometry and structure - 25 mm diameter and 490 $mm^2$ cross sectional area of diffusion face with cylindrical form of two-sided opposite diffusion direction; 2) Diffusive length - 9.5 mm in both faces; 3) Amount of adsorbent - 300 mg of coconut shell charcoal; 4) Wind screen - using nylon net filters (11 ${\mu}m$ pore size).

텅스텐 실리사이드 듀얼 폴리게이트 구조에서 CMOS 트랜지스터에 미치는 플로린 효과 (Fluorine Effects on CMOS Transistors in WSix-Dual Poly Gate Structure)

  • 최득성;정승현;최강식
    • 전자공학회논문지
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    • 제51권3호
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    • pp.177-184
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    • 2014
  • 화학기상증착의 텅스텐 실리사이드 듀얼 폴리 게이트 구조에서 플로린이 게이트 산화막에 미치는 영향을 전기적 물리적 측정 방법을 사용하여 연구하였다. 플로린을 많이 함유한 텅스텐 실리사이드 NMOS 트랜지스터에서 채널길이가 감소함에 따라 게이트 산화막 두께는 감소하여 트랜지스터의 롤업(roll-off) 특성이 심화된다. 이는 게이트 재 산화막 열처리 공정에 의해 수직방향으로의 플로린 확산과 더불어 수평방향인 게이트 측면 산화막으로의 플로린 확산에 기인한다. 채널길이가 짧아질수록 플로린의 측면방향 확산거리가 작아져 수평방향 플로린 확산이 증가하고 그 결과 게이트 산화막의 두께는 감소하게 된다. 반면에 PMOS 트랜지스터에서는 P형 폴리를 만들기 위한 높은 농도의 붕소가 플로린의 게이트 산화막으로의 확산을 억제하여 채널길이에 따른 산화막 두께 변화 특성이 보이지 않는다.

n-Alkanols가 소의 대뇌피질로부터 분리한 Synaptosomal Plasma Membrane Vesicles의 측방확산운동 범위와 속도에 미치는 영향 (The Effect of n-Alkanols on the Lateral Diffusion of Synaptosomal Plasma Membrane Vesicles Isolated from Bovine Cerebral Cortex)

  • 정인교;강정숙;윤일
    • 대한약리학회지
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    • 제29권1호
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    • pp.157-163
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    • 1993
  • n-Alkanols의 분자적 약리작용기전 탐구에 기초자료를 제공하기 위하여 소의 신선한 대뇌피질로부터 분리한 synaptosomal plasma membrane vesicles (SPMV) 지질 이중층의 측방확산운동에 미치는 n-alkanols의 영향을 형광 probe법으로 검색하였다. n-Alkanols는 SPMV 지질 이중층의 측방확산운동 범위와 속도를 농도 의존적으로 증가시켰고 1-nonanol까지는 탄소수가 두개 증가될 때마다 그 효력은 약 10배 가량 증가되었으나 탄소수 10개인 1-decanol의 효력은 오히려 감소되는 경향을 나타내었다.

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쪽거리 차원을 통한 다공질규소의 미세구조 분석 (An analysis of the porous silicon microstructure by using fractal dimension)

  • 김영유;홍사용;이춘우;류지욱;이기환;최봉수
    • 한국결정성장학회지
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    • 제9권3호
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    • pp.334-338
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    • 1999
  • p형 단결정 규소 웨이퍼를 불화수소 용액속에서 전류밀도와 양극반응 시간을 변화시켜 다공질규소를 제작하고, 그 질량을 측정한 후 이 값으로부터 다공도와 쪽거리(fractal) 차원을 계산하였다. 그 결과 양극반응 시간이 일정한 경우 다공도는 전류밀도에 비례하였다. 그리고 전류밀도가 일정한 경우 여러 양극반응 시간의 데이터로부터 얻은 쪽거리 차원은 일정하였다. 또한 쪽거리 차원은 불화수소의 농도 증가에 따라 감소하였다. 이같은 실험결과를 퍼짐한계침전(diffusion limited depostion) 모형으로 계산된 2차원 컴퓨터 시늉내기(simulation) 결과와 비교 분석하였다. 시늉내기 결과 다공도는 퍼짐거리에 비례하였으며, 쪽거리 차원은 퍼짐거리와 반비례하였다. 이때 퍼짐거리는 전류밀도에 비례하고 불화수소의 농도에 반비례하는 물리량이므로 정성적으로 실험결과와 일치하였다. 그러나 쪽거리 차원이 증가함에 따라 다공도가 감소되는 결과는 실험결과와 상반되었다.

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PC1D를 이용한 cast poly-Si 태양전지의 최적화 (An Optimization of Cast poly-Si solar cell using a PC1O Simulator)

  • 이수은;이인;유창완;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.553-556
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    • 1999
  • This paper presents a proper condition to achieve above 19 % conversion efficiency using PC1D simulator. Cast poly-Si wafers with resistivity of 1 $\Omega$-cm and thickness of 250 ${\mu}{\textrm}{m}$ were used as a starting material. Various efficiency influencing parameters such as rear surface recombination velocity and minority carrier diffusion length in the base region, front surface recombination velocity, junction depth and doping concentration in the Emitter layer, BSF thickness and doping concentration were investigated. Optimized cell parameters were given as rear surface recombination of 1000 cm/s, minority carrier diffusion length in the base region 200 ${\mu}{\textrm}{m}$, front surface recombination velocity 100 cnt/s, sheet resistivity of emitter layer 100 $\Omega$/$\square$, BSF thickness 5 ${\mu}{\textrm}{m}$, doping concentration 5$\times$10$^{19}$ cm$^3$ . Among the investigated variables, we learn that a diffusion length of base layer acts as a key factor to achieve conversion efficiency higher than 19 %. Further details of simulation parameters and their effects to cell characteristics are discussed in this paper.

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Diffusion Controlled Alkylation of Aromatic Compounds in Cation-Exchanged ZSM-5 Zeolites

  • Chon, Hak-Ze;Lee, Kyung-Yul;Park, Dong-Ho;Ahn, Byoung-Joon
    • Bulletin of the Korean Chemical Society
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    • 제12권6호
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    • pp.625-628
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    • 1991
  • Using uniform flat plate-like samples of ZSM-5 zeolites, diffusion coefficients were measured volumetrically for the diffusion of xylene, ethyltoluene and diethylbenzene by direct measurement of sorption rate. Toluene disproportionation over H(100)-, K(72)-and Cs(82)-ZSM-5 at 773 K and toluene methylation, toluene ethylation and ethylbenzene ethylation over Cs(75)-ZSM-5 at 623 K were carried out. The selective formation of para xylene during the toluene disproportionation, presumably due to the increased tortuosity over Cs-ZSM-5, could be explained by smaller diffusion coefficient in Cs-ZSM-5 than in K-and H-ZSM-5. The para selectivity increased in the order; toluene methylation < toluene ethylation < ethylbenzene ethylation. As the chain length of the alkyl substituent in dialkylbenzenes is increased, the para selectivity of the products was improved. It may be attributed to the differences in the ratios of diffusion coefficient of para products to that of ortho ones. Diffusion coefficient of m-xylene was about 1 order of magnitude smaller than that of o-xylene.

좁은 채널 내의 대향분류 메탄-공기 비예혼합 화염의 거동 특성 (Behavioral Characteristics of the Non-Premixed Methane-Air Flame Oppositely Injected in a Narrow Channel)

  • 윤영민;이민정;조상문;김남일
    • 대한기계학회논문집B
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    • 제33권4호
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    • pp.264-271
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    • 2009
  • Characteristics of a counter flowing diffusion flame, which is formulated by an oppositely-injected methane-jet flow in a narrow channel of a uniform air flow. The location of the flame fronts and the flame lengths were compared by changing the flow rates of fuel. To distinguish the effects of the narrow channel on the diffusion flame, a numerical simulation for an ideal two-dimensional flame was conducted. Overall trends of the flame behavior were similar in both numerical and experimental results. With the increase of the ratio of jet velocity to air velocity flame front moved farther upstream. It is thought that the flow re-direction in the channel suppresses fuel momentum more significantly due to the higher temperature and increased viscosity of burned gas. Actual flames in a narrow channel suffer heat loss to the ambient and it has finite length of diffusion flame in contrast to the numerical results of infinite flame length. Thus a convective heat loss was additionally employed in numerical simulation and closer results were obtained. These results can be used as basic data in development of a small combustor of a nonpremixed flame.

비소 고상확산방법을 이용한 MOSFET SOI FinFET 소자 제작 (Fabrication of SOI FinFET devices using Aresnic solid-phase-diffusion)

  • 조원주;구현모;이우현;구상모;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.133-134
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    • 2006
  • A simple doping method to fabricate a very thin channel body of the n-type fin field-effect-transistor (FinFET) with a 20 nm gate length by solid-phase-diffusion (SPD) process is presented. Using As-doped spin-on-glass as a diffusion source of arsenic and the rapid thermal annealing, the n-type source-drain extensions with a three-dimensional structure of the FinFET devices were doped. The junction properties of arsenic doped regions were investigated by using the $n^+$-p junction diodes which showed excellent electrical characteristics. Single channel and multi-channel n-type FinFET devices with a gate length of 20-100 nm was fabricated by As-SPD and revealed superior device scalability.

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