• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1483-1485
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• 2009

Silicon dioxide ($SiO_2$) thin films were deposited using a modified DBD called a "pin-to-plate-type DBD" in order to generate high-density plasmas with a gas mixture of PDMS/$O_2$. The effect of the gas mixture on the physical and chemical properties of $SiO_2$ deposited by the pin-to-plate-type DBD with the mixture of PDMS/$O_2$ was investigated.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1527-1529
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• 2000

본 연구는 펄스 정전 응력법을 이용하여 공간전하분포를 교류전압 하에서 측정을 하였다. 이와 동시에 교류 고전압에서의 방전발생과 방전패턴의 변화를 측정하고, 공간전하분포와 방전과의 상관관계를 분석하였다. 교류 전압에서의 공간전하는 교류 한 주기를 18$^{\circ}$ 간격으로 등분하여 각 위상에서 그 분포를 측정하였으며, 공간전하분포와 방전패턴 사이의 관계를 분석하였다 실험 결과 유전체 장벽 방전이 많이 일어나는 위상에서의 공간전하분포 역시 크게 변하는 것을 볼 수 있었다. 이러한 사실을 통해 공간전하분포 특성이 유전체 장벽 방전 특성의 연구에 있어서 중요한 부분임을 알 수 있다.

• Proceedings of the KSME Conference
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• 2004.04a
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• pp.1255-1260
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• 2004

Decomposition of ozone at room temperature was investigated comparatively with commercial monolithic ozone decomposition catalyst (ODC, $MnO_2$) and monolithic photo catalyst ($TiO_2$). The effects of residence time, UV (ultraviolet) light dependence and ozone concentration on the conversion was presented. UV ray was irradiated using BLB (black light blue) lamp ($315{\sim}400$ nm), supplied with a constant intensity in the reactor. The concentration of ozone in the square-shape reactor can be controlled by combining the DBD (dielectric barrier discharge) reactor with an AC high voltage supply system. The catalytic performance, in presence of UV irradiation did not show significant changes for $MnO_2$ catalyst. $TiO_2$ catalyst was the different case, which showed higher decomposition activity in presence of UV irradiation. Deactivation of catalyst detected by real-time ozone monitor for 120 hours with a constant inlet ozone concentration.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.171-171
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• 2011

Atmospheric pressure- plasma enhanced chemical vapor deposition(AP-PECVD)Processes are recognized as promising and cost effective methods for wide-area coating on sheets of steel, glass, polymeric web, etc. In this study, $SiO_xC_y$ thin films were deposited by using AP-PECVD with a dielectric barrier discharge(DBD). The characteristic of $SiO_xC_y$ thin films were investigated as afunction of the HMDSO/O2/He flow rate. And the moisture permeability of $SiO_xC_y$ thin films was studied. The $SiO_xC_y$ thin films were characterized by the Fourier-transformed Infrared(FT-IR) spectroscopy and also investigated by X-ray photo electron spectroscopy(XPS), Auger Electron Spectroscopy(AES). The moisture permeability of $SiO_xC_y$ thin films was investigated by $H_2O$ permeability tester Detailed experimental results will be demonstrated through th present work.

• Journal of Industrial and Engineering Chemistry
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• v.68
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• pp.372-379
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• 2018

The improvement of $NO_x$ reduction by $Ag/{\gamma}-Al_2O_3$ with a hydrocarbon ($n-C_7H_6$) in the early state was investigated in a packed-bed dielectric barrier discharge plasma reactor. The results revealed that the combination of plasma with the catalyst enhanced $NO_x$ reduction efficiency at low operating temperatures, depending on the temperature and specific input energy. To sum up, the poor performance of the catalytic $NO_x$ reduction at low temperatures in the early stage before reaching thermochemical steady state can be greatly compensated for by using the atmospheric-pressure plasma generated in the catalyst bed.

• Journal of the Semiconductor & Display Technology
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• v.8 no.2
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• pp.15-21
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• 2009

Atmospheric pressure plasma equipment was successfully applied to the flip chip BGA manufacturing process to improve the uniformity of flux printing process. The problem was characterized as shrinkage of the printed flux layer due to insufficient surface energy of the flip chip BGA substrate. To improve the hydrophilic characteristics of the flip chip BGA substrate, remote DBD type atmospheric pressure plasma equipment was developed and adapted to the flux print process. The equipment enhanced the surface energy of the substrate to reasonable level and made the flux be distributed over the entire flip chip BGA substrate uniformly. This research was the first adaptation of the atmospheric pressure plasma equipment to the flip chip BGA manufacturing process and a lot of possible applications are supposed to be extended to other PCB manufacturing processes such as organic cleaning, etc.

• Journal of the Korean Vacuum Society
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• v.16 no.5
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• pp.330-337
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• 2007

Influence of glass dielectric property (dielectric constant K, dielectric loss) on the external electrode fluorescent lamps of the dielectric barrier discharge has been investigated with 4-different glasses. Conventional borosilicate glass tubes with $K=5.6{\sim}5.9$ and tan ${\delta}=5.0{\times}10^{-3}{\sim}6.0{\times}10^{-3}$ and aluminosilicate glass tubes with high K=6.6 and low tan ${\delta}=1{\times}10^{-4}$ and soda-lime glass tribes with K=7.7 and tan ${\delta}=1.37{\times}10^{-2}$ have been compared. The high value of dielectric constant K makes the capacitance of external electrode fluorescent lamps intensity and enhances the discharge efficiency. The dielectric loss of tan ${\delta}$ shows the factor of power consumption in the external electrode to induce heats and to be weak in pinhole stability. The aluminosilicate glass tubes of high K and low tan ${\delta}$ have been enhanced by $14{\sim}18%$ in luminance and efficiency in comparison with the conventional borosilicate glass tubes and the aluminosilicate external electrode fluorescent lamps are strong against the pinhole formation. Soda-lime glass tubes with high K and high tan ${\delta}$ are a little favorable in luminance and efficiency and they are very weak in pinhole occurrence.

• Applied Chemistry for Engineering
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• v.25 no.5
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• pp.455-462
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• 2014

This work investigated the hydrophobic coating of silicate yellow phosphor powder in the form of divalent europium-activated strontium orthosilicate ($Sr_2SiO_4:Eu^{2+}$) by using an atmospheric pressure dielectric barrier discharge (DBD) plasma with argon as a carrier and hexamethyldisiloxane (HMDSO), toluene and n-hexane as precursors. After the plasma treatment of the phosphor powder, the lattice structure of orthosilicate was not altered, as confirmed by an X-ray diffractometer. The coated phosphor powder was characterized by scanning electron microscopy, fluorescence spectrophotometry and contact angle analysis (CAA). The CAA of the phosphor powder coated with the HMDSO precursor revealed that the water contact angle increased from $21.3^{\circ}$ to $139.5^{\circ}$ (max. $148.7^{\circ}$) and the glycerol contact angle from $55^{\circ}$ to $143.5^{\circ}$ (max. $145.3^{\circ}$) as a result of the hydrophobic coating, which indicated that hydrophobic layers were successfully formed on the phosphor powder surfaces. Further surface characterizations were performed by Fourier transform infrared spectroscopy and X-ray photoelectron spectrometry, which also evidenced the formation of hydrophobic coating layers. The phosphor coated with HMDSO exhibited a photoluminescence (PL) enhancement, but the use of toluene or n-hexane somewhat decreased the PL intensity. The results of this work suggest that the DBD plasma may be a viable method for the preparation of hydrophobic coating layer on phosphor powder.

• Korean Chemical Engineering Research
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• v.51 no.2
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• pp.214-220
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• 2013

Hydrophobic coating on a silicate-based yellow phosphor ($Sr_2SiO_4:Eu^{2+}$) was carried out by using hexamethyldisiloxane (HMDSO) precursor in an atmospheric pressure dielectric barrier discharge plasma reactor, eventually to improve the long-term stability and reliability of the phosphor. The phosphor powder samples were characterized by a scanning electron microscope (SEM), a transmission electron microscope (TEM), a fluorescence spectrophotometer and a contact angle analyzer. After the coating was prepared, the contact angle of the phosphor powder increased to $133.0^{\circ}$ for water and to $140.5^{\circ}$ for glycerol, indicating that a hydrophobic layer was formed on its surface. The phosphor coated with HMDSO exhibited photoluminescence enhancement up to 7.8%. The SEM and TEM images of the phosphor powder revealed that the plasma coating led to a morphological change from grain-like structure to smooth surface with 31~46 nm thick hydrophobic layer. The light emitting diode (3528 1 chip LED) fabricated with the coated phosphor showed a substantial enhancement in the reliability under a special test condition at $85^{\circ}C$ and 85% relative humidity for 1,000 h (85/85 testing). The plasma-mediated method proposed in this work may be applicable to the formation of 3-dimensional coating layer on irregular-shaped phosphor powder, thereby improving the reliability.

• Journal of Energy Engineering
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• v.15 no.1 s.45
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• pp.52-59
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• 2006

This paper examined the conversion of methane to hydrogen and other higher hydrocarbons using dielectric barrier discharge with AC pulse power. Two metal electrodes of a coaxial-type plasma reactor were separated by gas gap and an alumina tube. The inner electrode was located inside the alumina tube. The alumina tube was located inside the stainless steel tube, which was used as the outer electrode. Effect of feed gas composition (methane, oxygen, argon, water and helium), flow rate, applied frequency, input volt-age on methane conversion and product distribution were studied. The major products of plasma chemical reactions were ethylene, ethane, propane, buthane, hydrogen, carbon monoxide and carbon dioxide. The increment of applied voltage and the usage of inert gas as the background (helium and argon) enhanced the selectivity of hydrocarbons and methane conversion. The addition of water in the feed stream enhanced the conversion of methane and yield of hydrogen. Higher voltage leads to higher yield of $C_2H_6,\;C_3H_8,\;C_4H_{10}$ and yield or $C_2H_2\;and\;C_2H_4$ appeared highly in lower voltage.