Time-Dependent Dielectric Breakdown Characteristics of Thin $SiO_2$ Films and Their Correlation to Defects in the Oxide
(얇은 산화막의 TDDB 특성과 막내의 결함과의 상관성)
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- Proceedings of the KIEE Conference
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- 1988.11a
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- pp.147-150
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- 1988