• Title/Summary/Keyword: Deposition time

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Deposition of Polydisperse Particles in a Falkner-Skan Wedge Flow (포크너-스캔 경계층유동에서의 다분산 입자부착에 대한 연구)

  • 조장호;황정호;최만수
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.9
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    • pp.2342-2352
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    • 1995
  • Deposition of flame-synthesized silica particles onto a target is utilized in optical fiber preform fabrication processes. The particles are convected and deposited onto the target. Falkner-Skan wedge flow was chosen as the particle laden flow. Typically the particles are polydisperse in size and follow a lognormal size distribution. Brownian diffusion, thermophoresis, and coagulation of the particles were considered and effects of these phenomena on particle deposition were studied. A moment model was developed in order to predict the particle number density and the particle size distribution simultaneously. Particle deposition with various wedge configurations was examined for conditions selected for a typical VAD process. When coagulation was considered, mean particle size and its standard deviation increased and particle number density decreased, compared to the case without coagulation. These results proved the fact that coagulation effect expands particle size distribution. The results were discussed with characteristics of thermal and diffusion boundary layers. As the boundary layers grow in thickness, overall temperature and concentration gradients decrease, resulting in decrease of deposition rate and increase of particle residence time in the flow and thus coagulation effect.

Effects of Chemical Vapor Deposition Parameters on The Hardness and the Structural Characteristics of TiN Film (TiN피막의 경도 및 구조적 특성에 미치는 화학증착 조건의 영향)

  • Shin, Jong-Hoon;Lee, Seong-Rae;Baek, Young-Hyun
    • Journal of the Korean institute of surface engineering
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    • v.20 no.3
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    • pp.106-117
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    • 1987
  • The microhardness and the structural characteristics of the chemically vapor deposited TiN film on the 430 stainless steel substrate have been investigated with various deposition parameters such as the deposition time, the total flow rate, the flow rate ratio $(H_2/N_2)$, and the deposition temperature. The most important factor to affect the microhardness of the TiN film in this study was the denseness of the structure in connection with the degree of the lattice strain. The relationship between the lattice parameter changes and the grain size variation under all deposition conditions generally followed the grain boundary relaxation model. The (111) preferred orientation prevailed in the early stage of the deposition conditions, however, the (200) preferred orientation was developed in the later stage. The surface morphology at optimum conditions displayed a dense diamond shaped structure and the microhardness of the films was high (1700-2400Hv) regardless of the type of the substrates used.

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Preparation and Characterization of Blue Thin Film Phosphors by Pulsed Laser Deposition (PLD(Pulsed Laser Deposition)를 이용한 청색 박막 형광체의 제조 및 특성분석)

  • Cho, Sang-Ho;Jung, Yu-Sun;Kwak, Jung-Ho;Sohn, Kee-Sun
    • Journal of the Korean Ceramic Society
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    • v.43 no.12 s.295
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    • pp.852-858
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    • 2006
  • It is well known that $BaMgAl_{10}O_{17}:Eu^{2+}$ (BAM) and $CaMgSi_2O_6:Eu^{2+}$ (CMS) are a highly efficient blue phosphor. However, these phosphors in the form of thin films have not yet been realized clue to technical difficulties. We prepared thin film type BAM and CMS phosphors on quartz glass substrate using a pulsed laser deposition technique. The luminescent and structural properties of thin film phosphors were monitored as a function of key processing parameters such as oxygen partial pressure inside the deposition chamber, deposition time, laser energy density and the type of post-deposition treatments used. Even though we could not obtain single homogenous phases, thin films with large homogenous areas and a high photoluminescence could be produced by optimizing these processing parameters.

Preparation and Characterization of a Layered Organic-inorganic Composite by the Electrophoretic Deposition of Plate-shaped Al2O3 Particles and Electrophoretic Resin (전기영동적층법을 통한 판상 알루미나 입자와 전기영동 수지의 배향 유무기 복합체 제조 및 물성평가)

  • Park, Hee Jeong;Lim, Hyung Mi;Choi, Sung-Churl;Kim, Younghee
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.460-465
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    • 2013
  • Plate-shaped inorganic particles are coated onto a stainless steel substrate by the electrophoretic deposition of a precursor slurry which includes the inorganic particles of $Al_2O_3$ and polymer resin in mixed solvents to mimic the abalone shell structure, which is a composite of plate-shaped inorganic particles and organic interlayer binding materials with a layered orientation. The process parameters of the electrophoretic deposition include the voltage, coating time, and conductivity of the substrate. In addition, the suspension parameters are the particle size, concentration, viscosity, conductivity, and stability. We prepared an organic-inorganic composite coating with a high inorganic solid content by arraying the plate-shaped $Al_2O_3$ particles and electrophoretic resin via an electrophoretic deposition method. We analyzed the effect of the slurry composition and the electrophoretic deposition process parameters on the physical, mechanical and thermal properties of the coating layer, i.e., the thickness, density, particle orientation, Young's modulus and thermogravimetric analysis results.

Deposition of a-SiN:H by PECVD (PECVD에 의한 질화 실리콘 박막의 증착)

  • Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.11 no.11
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    • pp.2095-2099
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    • 2007
  • In this paper, the optimum amorphous silicon nitride thin film is deposited using plasma enhanced chemical vapor deposition(PECVD). Amorphous silicon nitride is deposited using $SiH_4$ and $NH_3$ gas. At this time, electrical and optical characteristics of amorphous silicon nitride and deposition rate are changed under deposition condition such as $SiH_4$, $NH_3$ and $N_2$ gas flow rate, chamber pressure, rf power and substrate temperature. From the experimental results, we can estimate that the deposition condition makes a good electrical characteristic of amorphous silicon nitride thin film.

A Time-Series Analysis of the Erosion and Deposition around Halmi-island, Baramarae (안면도 바람아래 할미섬 주변의 시계열적 침식·퇴적환경 변화 분석)

  • Yu, Jae Jin;Kim, Jang-soo;JANG, Dong-Ho
    • Journal of The Geomorphological Association of Korea
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    • v.23 no.1
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    • pp.47-60
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    • 2016
  • In this study, datum points measurement have been collected and then weather data have been analyzed to figure out erosion and deposition environmental change around Halmi-island, Baramarae. First of all, it was difficult to analyze geomorphological change which is caused by climate change because of quite short term of collection period of data. However, differences in spatial distribution of erosion and deposition have locally been shown. In all season, the wind is blowing in north and north-west direction mostly except in summer which is shifted to south direction. However, since its ratio which are above 5m/s is much lower than the north and north-west wind, its effect on geomorphological process is very tiny. In order to look at a tendency of erosion and deposition environmental change around Baramarae Halmi-island, the periphery of Halmi-island was classified to east and west part, then accumulated erosion and deposition values have been calculated. As a result, generally, the datum points are located in the west part which are mostly depositional sites. On the other hand, the datum points are located in east part showed the dominant erosion patterns.

Study on the Atomic Layer Deposition System and Process of the MgO Thin Layer for the Thin Film Encapsulation of OLED (OLED의 Thin Film Encapsulation을 위한 MgO 박막의 원자층 증착 장치 및 공정에 관한 연구)

  • Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.22-26
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    • 2021
  • Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al2O3 and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al2O3/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP2 precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.

Investigation of Thermo-mechanical Characteristics for Remanufacturing of a ATC Part using a DED Process (DED 공정을 이용한 ATC 부품의 재제조를 위한 열-기계 특성 고찰)

  • K. K. Lee;D. G. Ahn
    • Transactions of Materials Processing
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    • v.33 no.4
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    • pp.277-284
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    • 2024
  • Interest in remanufacturing of part has significantly increased to reduce used material and energy together. The directed energy deposition (DED) process has widely applied to remanufacturing of the part. An excessive residual stress takes place in the vicinity of the deposited region by the DED process due to rapid heating and rapid cooling (RHRC) phenomenon. The excessive residual stress decreases the reliability of the remanufactured part. Therefore, thermo-mechanical analysis for the remanufacturing of the part is needed to investigate heat transfer and residual stress characteristics in the vicinity of the deposited region. The thermo-mechanical analysis of a large volume deposition is significantly difficult to perform due to the requirement of a long computation time and a large computer memory. The goal of this paper is to investigate thermo-mechanical characteristics for remanufacturing of the ATC part using a DED process. The methodology of the thermo-mechanical analysis for a large volume deposition is proposed. From the results of analysis, heat transfer and residual stress characteristics during deposition and cooling stages are investigated. In addition, the proper deposition strategy from the viewpoint of the residual stress is discussed.

Solar Cell Efficiency Improvement using a Pre-deposition Temperature Optimization in The Solar Cell Doping Process (도핑 공정에서의 Pre-deposition 온도 최적화를 이용한 Solar Cell 효율 개선)

  • Choi, Sung-Jin;Yoo, Jin-Su;Yoo, Kwon-Jong;Han, Kyu-Min;Kwon, Jun-Young;Lee, Hi-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.244-244
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    • 2010
  • Doping process of crystalline silicon solar cell process is very important which is as influential on efficiency of solar. Doping process consists of pre -deposition and diffusion. Each of these processes is important in the process temperature and process time. Through these process conditions variable, p-n junction depth can be controled to low and high. In this paper, we studied a optimized doping pre-deposition temperature for high solar cell efficiency. Using a $200{\mu}m$ thickness multi-crystalline silicon wafer, fixed conditions are texture condition, sheet resistance($50\;{\Omega}/sq$), ARC thickness(80nm), metal formation condition and edge isolation condition. The three variable conditions of pre-deposition temperature are $790^{\circ}C$, $805^{\circ}C$ and $820^{\circ}C$. In the $790^{\circ}C$ pre-deposition temperature, we achieved a best solar cell efficiency of 16.2%. Through this experiment result, we find a high efficiency condition in a low pre-deposition temperature than the high pre-deposition temperature. We optimized a pre-deposition temperature for high solar cell efficiency.

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Effect of Electrolysis Conditions on Hard Chromium Deposition from Trivalent Chromium Bath (경질용 3가 크롬전착에 미치는 전해조건의 영향)

  • Kim, Dae-Young;Park, Sang-Eon;Kim, Man;Kwon, Sik-Chul;Choi, Ju-Won;Choi, Yong
    • Journal of the Korean institute of surface engineering
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    • v.36 no.2
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    • pp.155-160
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    • 2003
  • The effect of the temperature, current density and deposit time on hard chromium deposition in trivalent chromium bath was investigated. Cathode current efficiency increased with increasing current density. Increasing bath temperature from $20^{\circ}C$ to $50^{\circ}C$, chromium deposits were produced in higher current density and the maximum current efficiency was increased. At the plating conditions of $40^{\circ}C$, $30A/dm\m^2$, the deposition thickness increased in proportion to increasing electrolysis time The rate is$ 90\mu\textrm{m}$/hrs. for 2 hours. Microhardness of chromium deposits increased with increasing bath temperature and decreasing current density, and it was constant with electrolysis time. All of bath conditions, microstructure of chromium deposits has nodular structure with some cracking pattern and nodule size increased with increasing deposit thickness.