• Title/Summary/Keyword: Deposition index

Search Result 289, Processing Time 0.03 seconds

Measuring Method of Planar Displacement Referring to The Double Linear Patterns (이중화된 패턴을 참조하는 평면 변위 측정 방법)

  • Park, Sung Jun;Jung, Kwang Suk
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.16 no.7
    • /
    • pp.4405-4410
    • /
    • 2015
  • Two-dimensional displacements are obtained from the sandwiched patterns, which superpose two linearly-periodic patterns orthogonally, respectively. The transparent top pattern is identified by deflection of the laser beam due to a difference of refractivity and the opaque bottom pattern is identified by deviation of the beam intensity due to a difference of reflectance. In the sample setup, the top pattern made up of build-up film is manufactured by UV laser machining and the bottom pattern is manufactured by ultra-precision trench machining and deposition for aluminum plate. The proposed decoding method is verified experimentally using the $10{\mu}m$ equally spaced sample patterns and the devised optical system. The Korea Academia-Industrial cooperation Society.

Room temperature deposition of SiN thin film using pulsed $SiH_4-N_2$ plasma and the effect of duty ratio on refractive index (펄스드 $SiH_4-N_2$ 플라즈마를 이용한 SiN 박막의 상온 증착과 굴절률에의 Duty ratio 영향)

  • Kwon, Sang-Hee;Kim, Byung-Whan;Woo, Hyung-Su;Lee, Hyung-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2009.06a
    • /
    • pp.25-26
    • /
    • 2009
  • Pulsed-PECVD를 이용하여 상온에서 실리콘 나이트라이드(SiN) 박막을 증착하였다. 본 연구에서는, 60-100%의 duty ratio 변화에 따른 굴절률을 살펴보고, 굴절률에 대한 이온에너지의 영향을 분석했다. RF 소스파워는 900W로 고정하였고 $SiH_4-N_2$를 이용하였다. 이온에너지에 대한 정보는 non-invasive 이온 분석기를 이용하여 수집하였다. 측정된 이온에너지 변수는 high ion energy, low ion energy, high ion energy flux, low ion energy flux이며, 이를 이용해 또 다른 변수인 ion energy flux ratio를 계산하였다. Duty ratio의 감소에 따라 굴절률은 일반적으로 감소하였다. 또한 duty ratio의 감소에 따라 high ion energy는 증가하였다. 한편, 60-80%에서 굴절률은 이온에너지 flux의 비에 강한 의존성을 보였으며, 60%를 제외한 모든 duty ratio 구간에서 굴절률은 Nl에 강하게 영향을 알고 있는 것으로 유추되었다. 굴절률은 1.508와 1.714 사이에서 변화하였다.

  • PDF

A Study on the Prevalence of Obesity and the Related Factors Among High School Girls (인문계와 실업계 여고생의 비만실태와 관련요인에 관한연구)

  • 유영순
    • Journal of the Korean Home Economics Association
    • /
    • v.32 no.3
    • /
    • pp.185-196
    • /
    • 1994
  • The prevalence of obesity by measuring the amount of body fat and its related factors were investigated in 315 high school girls living in Seoul. Average body fat amount and body fat percentage measured by the body impedance analysis were 14.2$\pm$5.2kg and 25.9$\pm$7.0% respectively. Mean body mass index(BMI) was 2.1$\pm$2.7kg/m2 and 6.7% of the subjects showed over 25kg/m2 Correlative analysis reveal that the body fat percentage was significantly correlated to both relative body weight and BMI(r=0.66, P<0.01, r=0.68, P<0.01) Relative body weight of the subjects showed positive correlation to those of their mother and father. It was shown that many students skipped breakfast often and did not have a pleasant meal with enough time. There was no relationship between adiposity and dietary nutrient or energy intake. When subgroups of the subjects attending a non-vocational high school and those attending a vocational or technical school were compared obesity was more prevalent in the former. Therefore the burden caused by preparing the university entrance examination seems to play an important role in fat deposition.

  • PDF

A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry (Ellipsometry를 이용한 Low-k SiOCH 박막의 유전특성에 관한 연구)

  • Yi, In-Hwan;Hwang, Chang-Su;Kim, Hong-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.21 no.12
    • /
    • pp.1083-1089
    • /
    • 2008
  • We studied the dielectric characteristics of low-k SiOCH thin films by Ellipsometry. The SiOCH thin films were prepared by deposition of BTMSM precursors on p-Si wafer by CCP-PECVD method. The nano-porous structural organic/inorganic hybrid-type of SiOCH thin films correlated directly to the formation of low dielectrics close to pore(k=1). The structural groups including highly dense pores in SiOCH thin films originated the anisotropic geometry type of network structure directing to complex refractive characteristics of SiOCH single layer on the p-Si wafer. The linearly polarized beam of Xe-ramp in the range from 190 nm to 2100 nm introduced to the surface of SiOCH thin film, and the reflected beam was Elliptically polarized by complex refractive coefficients of SiOCH dipole groups. The amplitude variation $\Psi$ and phase variation $\Delta$ of the relative reflective coefficients between perpendicular and parallel components to the incident plane were measured by Ellipsometry. The complex optical constants n and k as well as the dielectric constant and thickness of SiOCH thin films were driven by the measured value of $\Psi$ and $\Delta$.

GROUNDWATER RECHARGE ESTIMATION USING ARCGIS-CHLORIDE MASS BALANCE APPROACH

  • Lee Ju Young;Krishinamurshy Ganeshi
    • Water Engineering Research
    • /
    • v.6 no.1
    • /
    • pp.31-38
    • /
    • 2005
  • Groundwater recharge is defined in an addition of water to groundwater reservoir. Recently, many people have been moving to the Edwards aquifer and urban and agricultural industry have been expending. Hydrologists and water planning managers concern about insufficient groundwater amounts and irrigation water price variability. In this paper, I focus on estimates of local recharge volumes and quantify preferential flow through GIS technique. Chloride Mass Balance (CMB) and hydrochemical components have been widely applied to recharge rate and evaluate flow paths. The CMB method is based on relationship between wet-dry chloride deposition data and Rainfall data. These data are manipulated using ArcGIS. Especially, hydrochemical concentration distribution is good index for groundwater residence times or flow paths such as $[Mg^{2+}]/[Ca^{2+}],[Cl]$ and log$([Ca^{2+}]+[Mg^{2+}])/[Na^+]$. Well information such as hydrological-hydrochemical data are imported into ArcGIS and manipulated by interpolation techniques. For each potentiometric surface and water quality, point data are converted to spatial data through each Kriging and Inverse Distance Weighted (IDW) techniques.

  • PDF

Dielectric and Passivation-Related Properties of Pecvd PSG (PECVD PSG의 유전 및 보호막특성에 관한 연구)

  • 유현규;강영일
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.22 no.2
    • /
    • pp.90-96
    • /
    • 1985
  • The properties of plasma-enhanced CVD phosphorous silicate glass (PECVD PSG) for passivation layer are studied . Phosphorous contentration was analyzed with X-ray fluores-cence. As a result, PECVD PSG has a limiting phosphors concentration of about 8 mole%. Curves relating to etcll rate, infrared absorption ratio, and sheet resistivity were adapted to monitor phosphorous concentration indirectly Dielectric properties, step coverage, crack resistance, and gettering effect are discussed in both of atmospheric pressure CVD (APCVO) and PECVD oxide. PECVD SiO2 film have density of about 2.4 g/㎤ at deposition rate of 450$\AA$/min, refractive index of about 1.53, and breakdown at fields of II-13 MV/cm. Crack resistance of PECVD oxide is greater than APCVD oxide. PECVD PSG films contained with 2 mole % phosphorous show good step coverage and gettering ability. The obtained results show more advantages in PECVD PSG than in APCVD PSG for device passivation.

  • PDF

A thin film condition of material for AR and HR coating by the DC/RF Magnetron Sputter (DC/RF Magnetron Sputter를 이용한 무반사 및 고반사 박막증착)

  • Yang, Jin-Seok;Jo, Woon-Jo;Lee, Cheon;Kim, Dong-Woo;Shinn, Chun-Kyo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.04a
    • /
    • pp.206-209
    • /
    • 2003
  • The purpose of AR and HR coating is acquire the very low reflection rate and the high reflection rate through the deposition of a thin film using the refraction ofmaterial. Basically if the high refractive material and the low refractive material are chosen and the condition for the experiment is determined, then we solve theproject with the optical design and multi thin film coating. First of all, we choose $SiO_2$for the low refractive material and $TiO_2$ for the high refractive material and apply Sputtering System easy to control the refraction rate and excellent in reconstruction to the equipment of thin film multiplication. For the control of the refraction rate and growth rate we modify RF Power and the ratio of Gas(Ar:O2), And we use Ellipsometer for estimation and analysis of the refraction rate and growth rate and AFM&SEM for the analysis of surface and component.

  • PDF

Change the Properties of Amorphous Carbon Hardmask Film Prepared with the Variation of Process Parameters in Plasma Enhanced Chemical Vapor Depostion Systems

  • Kim, Seok Hwan;Yeo, Sanghak;Yang, Jaeyoung;Park, Keunoh;Hur, Gieung;Lee, Jaeho;Lee, Jaichan
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.381.2-381.2
    • /
    • 2014
  • In this study the amorphous carbon films were deposited by PECVD at the substrate temperature range of 250 to $600^{\circ}C$, and the process conditions of higher and lower precursor flow rate, respectively. The temperature was a main parameter to control the density and mirco-structures of carbon films, and their's properties depended with the process temperatrue are changed by controlling precursor flow rate. The precursor feeding rate affect on the plasma ion density and a deposition reactivity. This change of film properties was obtained the instrinsic stress, FT-IR & Raman analysis, refractive index (RI) and ext. coef. (k) measured by ellipsometer. In the process conditions of lower and higher flow rate of precursor it had a different intrinsic stress as a function of the substrate temperature.

  • PDF

OBSERV ATION OF MICRO-STRUCTURE AND OPTICAL PROPERTISE OF TITANIUM DIOXIDE THIN FILMS USING OPTICAL MMEHODS

  • Kim, S.Y.;Kim, H.J.
    • Journal of the Korean institute of surface engineering
    • /
    • v.29 no.6
    • /
    • pp.788-796
    • /
    • 1996
  • $TiO_2$ films prepared by RF magnetron sputtering, electron beam evaporation, ion assisted deposition (IAD) and sol-gel method are prepared on c-Si substrate and vitreous silica substrate respectively. From the transmission spectra of $TiO_2$ films on vitreous silica substrate in the spectral region from 190 nm to 900 nm, k($\lambda$) of $TiO_2$ is obtained. Using k($\lambda$) in the interband transition region the coefficients of the quantum mechanical dispersion relation of an amorphous $TiO_2$ and hence n($\lambda$) including the optically opaque region of above fundamental transition energy are obtained. The spectroscopic ellipsometry spectra of $TiO_2$ films in the spectral region of 1.5-5.0eV are model analyzed to get the film packing density variation versus i) substrate material, ii) film thickness and iii) film growth technique. The complex refractive index change of these $TiO_2$ films versus water condensation is also studied. Film micro-structures by SE modelling results are compared with those by atomic force microscopy images and X-ray diffraction data.

  • PDF

The fabrication and characterization of composite $ZnS-SiO_2$ optical films (혼합 $ZnS-SiO_2$ 광학 박막의 제작 및 특성분석)

  • 성창민;이경진;류태욱;정종영;김석원;한성홍
    • Korean Journal of Optics and Photonics
    • /
    • v.9 no.2
    • /
    • pp.70-75
    • /
    • 1998
  • The ZnS-SiO$_2$ composite films were fabricated by codeposition from two independent sources. The optical properties and microstructures of these composite films were investigated. The refractive indices of the composite films were compared those by Drude's fomula and showed a good agreement. it showed that microstructures of composite films are an armorphous. But microstructures of composite films with ion assisted deposition are changed from an armorphous to crystalline with increasing Zn mole fractions. We designed and fabricated a single layer antireflection coating on the crystalline silicon substrate using the refractive index of the composite films.

  • PDF