• 제목/요약/키워드: Density of states

검색결과 553건 처리시간 0.022초

InSe 단일층의 vacancy 결함 특성 연구

  • 이서윤
    • EDISON SW 활용 경진대회 논문집
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    • 제6회(2017년)
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    • pp.468-472
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    • 2017
  • 2차원 InSe 단일층에 존재할 수 있는 vacancy defect인 In vacancy, Se vacancy의 원자구조 및 전자구조 특성을 제일원리계산을 이용해 살펴보았다. InSe $5{\times}5$ supercell을 이용하였으며 total energy를 구해 어떤 구조가 가장 안정한지 찾았다. Relax된 결함구조들을 clean InSe와 비교하여 어떤 변화가 있었는지 특징을 분석하였다. 이러한 intrinsic 결함들이 각각 어떤 구조로 relaxation되는지 살펴보고 clean InSe와 비교해보았다. 또한 각 결함구조의 density of states (DOS), projected density of states (PDOS)와 band structure를 clean InSe와 비교해봄으로써 defect state가 어떻게 나타나는지를 찾아보았다.

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First-Principles Study of the Three Polymorphs of Crystalline 1,1-Diamino-2,2-dinitrotheylene

  • Wu, Qiong;Zhu, Weihua;Xiao, Heming
    • Bulletin of the Korean Chemical Society
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    • 제34권8호
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    • pp.2281-2285
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    • 2013
  • The electronic structure, optical spectra, and thermodynamic properties of the three FOX-7 polymorphs (${\alpha}$, ${\beta}$, and ${\gamma}$) have been studied systematically using density functional theory. The LDA (CA-PZ) and generalized gradient approximation (GGA) (PW91) functions were used to relax the three FOX-7 phases without any constraint. Their density of states and partial density of states were calculated and analyzed. The band gaps for the three phases were calculated and the sequence of their sensitivity was presented. Their absorption coefficients were computed and compared. The thermodynamic functions including enthalpy (H), entropy (S), free energy (G), and heat capacity ($C_p$) for the three phases were evaluated.

DV-Xα 클러스터 계산법에 의한 Fe4N의 전자상태계산 (Electronic States Calculation of Fe4N by DV-Xα cluster calculation)

  • 송동원;이인섭;배동수
    • 한국재료학회지
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    • 제12권1호
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    • pp.44-47
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    • 2002
  • DV(Discrete Variation)-X${\alpha}$ cluster calculation was employed to calculate the electronic states of ${\gamma}'- Fe_4N$ which was one of iron nitride phases synthesized from plasma ion nitriding to improve surface hardness and wear resistance. The result of calculated electron density of states for Fe was similar to the result of band calculation. The cluster used for calculation of electronic states of ${\gamma}'-Fe_4N$ was based on $Fe_{14}N$ cluster which comprises 15 atoms. Finally the electronic states of ${\gamma}'- Fe_4N$ such as net-charge, band order, energy level, electron wave-function, and contour map for electron density were derived by the calculation.

Analysis of Deep-Trap States in GaN/InGaN Ultraviolet Light-Emitting Diodes after Electrical Stress

  • Jeong, Seonghoon;Kim, Hyunsoo;Lee, Sung-Nam
    • Journal of the Korean Physical Society
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    • 제73권12호
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    • pp.1879-1883
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    • 2018
  • We analyzed the deep-trap states of GaN/InGaN ultraviolet light-emitting diodes (UV LEDs) before and after electrical stress. After electrical stress, the light output power dropped by 5.5%, and the forward leakage current was increased. The optical degradation mechanism could be explained based on the space-charge-limited conduction (SCLC) theory. Specifically, for the reference UV LED (before stress), two sets of deep-level states which were located 0.26 and 0.52 eV below the conduction band edge were present, one with a density of $2.41{\times}10^{16}$ and the other with a density of $3.91{\times}10^{16}cm^{-3}$. However, after maximum electrical stress, three sets of deep-level states, with respective densities of $1.82{\times}10^{16}$, $2.32{\times}10^{16}cm^{-3}$, $5.31{\times}10^{16}cm^{-3}$ were found to locate at 0.21, 0.24, and 0.50 eV below the conduction band. This finding shows that the SCLC theory is useful for understanding the degradation mechanism associated with defect generation in UV LEDs.

Examination of the Impact of Substituting Germanium for Bismuth on the Energy Density and Electrical Conductivity of the Se60Ge40-xBix Alloy

  • Kareem Ali Jasim;Haider Sahi Hussein;Shaymaa Hashim Aneed;Ebtisam Mohammed Taqi Salman
    • 한국재료학회지
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    • 제34권6호
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    • pp.267-274
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    • 2024
  • In this study, four different samples of Se60Ge40-xBix chalcogenides glasses were synthesized by heating the melt for 18 h in vacuum Pyrex ampoules (under a 10-4 Torre vacuum), each with a different concentration (x = 0, 10, 15, and 20) of high purity starting materials. The results of direct current (DC) electrical conductivity measurements against a 1,000/T plot for all chalcogenide samples revealed two linear areas at medium and high temperatures, each with a different slope and with different activation energies (E1 and E2). In other words, these samples contain two electrical conduction mechanisms: a localized conduction at middle temperatures and extended conduction at high temperatures. The results showed the local and extended state parameters changed due to the effective partial substitution of germanium by bismuth. The density of extended states N(Eext) and localized states N(Eloc) as a function of bismuth concentration was used to gauge this effect. While the density of the localized states decreased from 1.6 × 1014 to 4.2 × 1012 (ev-1 cm-3) as the bismuth concentration increased from 0 to 15, the density of the extended states generally increased from 3.552 × 1021 to 5.86 × 1021 (ev-1 cm-3), indicating a reduction in the mullet's randomness. This makes these alloys more widely useful in electronic applications due to the decrease in the cost of manufacturing.

상태밀도와 overlap integral이 실리콘내 전자의 임팩트이온화율에 미치는 영향 (Influence of the density of states and overlap integral on impact ionization rate for silicon)

  • 정학기;유창관;이종인
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 1999년도 춘계종합학술대회
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    • pp.394-397
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    • 1999
  • 임팩트이온화는 고전계하에서 고에너지를 지닌 캐리어간 산란으로써 전자전송해석에 필수적인 요소이다. 그러나 포물선 또는 비포물선 E-k관계는 고에너지에서 실제 밴드구조와 매우 상이한 결과를 나타내므로 임팩트이온화에 대한 정화한 모델은 풀밴드 E-k관계와 페르미의 황금법칙을 이용하여 제시하고 있다. 본 연구에서는 풀밴드를 이용하여 실리콘 임팩트이온화율에 영향을 미치는 상태밀도와 에너지밴드구조 관계, overlap integral의 에너지에 대한 변화를 조사 분석하였다. 실리콘의 에너지밴드구조를 구하기 위하여 경험적 의사포텐셜방법을 사용하였으며 상태밀도를 구하기 위하여 사면체방법을 사용하였다. 또한 임팩트이온화율을 구하기 위하여 페르미의 황금법칙들 사용하였다. 결과적으로 상태밀도는 에너지증가에 따라 단조 증가하는 임팩트이온화율과 달리 에너지밴드구조에 따라 변화하였다. 그러나 overlap integral은 에너지증가에 따라 큰 값을 갖는 분포가 증가함으로써 임팩트이온화율에 직접 영향을 미치는 것을 알 수 있었다.

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Methodology for Describing Different Phase States of Molecular Nitrogen

  • Cho, Haeng Muk;Kudryavtsev, I.N.;Kramskoy, A.V.
    • 에너지공학
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    • 제23권4호
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    • pp.215-222
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    • 2014
  • A theory-based methodology for describing the thermodynamic properties of molecular nitrogen is presented. The results obtained indicate a successful application of a fully consistent statistical method for the description of a molecular system in different phase states. The method employs a density of states equation for solid nitrogen and a perturbation potential for gaseous and liquid nitrogen. The main characteristics of the calculation method include the need for a minimal number of initial data and the absence of fitting parameters. The adequacy of the physical model that is the basis for the method allows a description of existing experimental data and the peculiarities of the thermodynamic properties.

195Pt NMR Study of the Influence of Nation Ionomer on the Enhanced Local Density of States at the Surface of Carbon-Supported pt Catalysts

  • Han, Kee-Sung;Lee, Moo-Hee
    • 한국자기공명학회논문지
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    • 제13권2호
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    • pp.135-142
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    • 2009
  • $^{195}Pt$ NMR measurements were performed to deduce the variation of local density of states at the Fermi energy ($E_F$-LDOS) at the surface of carbonsupported Pt catalysts due to the addition of $Nafion^{(R)}$ ionomer in the metalelectrode-assembly for fuel cells. The results showed that the EF-LDOS at the surface of Pt particles was enhanced by the addition of $Nafion^{(R)}$ ionomers whereas it was uninfluenced in the inner (bulk) part of the Pt particles. This suggests that the effects of ionomers on the electronic states of the Pt particle surface are related to the electrochemical activity of the catalysts.

Annealing Effects on Ultra thin MOS Capacitors

  • Ng, Alvin Chi-hai;Xu, Jun;Xu, J.B.;Cheung, W.Y.
    • E2M - 전기 전자와 첨단 소재
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    • 제16권9호
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    • pp.62.1-62
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    • 2003
  • Silicon oxide with thickness lee than 9 nm is fabricated by tube furnace oxidation. Nitrogen is added to dilute the oxidation rate. Aluminum dots with radius of 0.05 cm are deposited on the oixde. High frequency capacitance-voltage(HF C-V), conductance-voltage(G-V) and current-voltage(I-V) characteristics are measured. Annealing under nitrogen atmosphere is carried out with different time and at different temperature. Densities of the interface states before and after annealing are compared. After annealing, a decrease in density of the interface states is found. Experiments show that 45$0^{\circ}C$ annealing for 30 minutes has the lowest density of the interface states.

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Inverted Staggered-Type 비정질 실리콘 박막트랜지스터의 수치적 분석 (Numerical Analysis of Inverted Staggered-Type Hydrogenated Amorphous Silicon Thin Film Transistor)

  • 오창호;박진석;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1990년도 추계학술대회 논문집 학회본부
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    • pp.93-96
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    • 1990
  • The characteristics of an inverted staggered-type hydrogenated amorphous silicon thin film transistor has been analyzed by employing numerical simulation. The field effect mobility and threshold voltage are characterized as a function of density of deep and tail states and lattice temperature. It has been found that the density of deep states plays an important role of determining the threshold voltage, while the field effect mobility are very sensitive to the slope of band tail states. Also, the numerically temperature dependence of field effect mobility and threshold voltage has been in good agreements with the experimental results.

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