• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.1010-1014
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• 2004

High quality GaN layer and $In_xGa_{1-x}N$ alloy were obtained on (0001)sapphire substrate using ammonia$(NH_3)$ and dimethylhydrazine$(DMH_y)$ as a nitrogen source by gas source molecular hem epitaxy(GSMBE) respectively. As a result, RHEED is used to investigate the relaxation processes which take place during the growth of GaN and $In_xGa_{1-x}N$. The full Width at half maximum of the x-ray diffraction(FWHM) rocking curve measured from Plane of GaN has exhibitted as narrow as 8 arcmin. Photoluminescence measurement of GaN and $In_xGa_{1-x}N$ were investigated at room temperature, where the intensity of the band edge emission is much stronger than that of deep level emission. In content of $In_xGa_{1-x}N$ epitaxial layer according to growth condition was investigated.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.422-422
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• 2008

본 연구에서, 금 촉매가 4nm 증착된 GaN/$Al_2O_3$ 기판위에 nanowire와 nanowall과 같은 ZnO 나노구조물을 화학기상증착법을 이용하여 합성시켰다. 합성된 ZnO 나노구조물의 형상은 성장시간과 성장온도 조작을 통하여 제어하였다. 합성된 ZnO 나노구조물의 협상을 관찰하기 위해, 전계방출 주사전자현미경을 측정하였다. ZnO 나노구조물은 성장 온도가 $1000^{\circ}C$에서 $1100^{\circ}C$로 증가함에 따라 불균일한 막, nanowire, nanowall 형태로 형상이 점차적으로 변하였으며, 또한 각각의 성장온도에서 성장 시간이 증가함에 따라 나노와이어의 성장이 두드러지게 나타났다. 또한 합성된 ZnO 나노구조물의 결정성과 광학특성을 X-ray diffraction pattern과 상온 photoluminescence spectrum을 이용하여 각각 분석하였다. 이룰 통하여 합성된 ZnO 나노구조물은 wurzite 결정구조를 가지며, 380nm 영역에서 near band edge emission 에 의한 발광 peak와 500~550nm 영역에서 deep level emission에 의한 발광 peak이 나타나는 것을 확인하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.131-133
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• 2012

The photoluminescence (PT) properties of Al-doped ZnO thin films grown by the sol-gel dip-coating method have been investigated. At 12 K, nine distinct PL peaks were observed at 2.037, 2.592, 2.832, 3.027, 3.177, 3.216, 3.260, 3.303, and 3.354 eV. The deep-level emissions (2.037, 2.592, 2.832, and 3.027 eV) were attributed to native defects. The near-band-edge (NBE) emission peaks at 3.354, 3.303, 3.260, 3.216, and 3.177 eV were attributed to the emission of the neutral-donor-bound excitons (D0X), two-electron satellite (TES), free-to-neutral-acceptors (e,A0), donor-acceptor pairs (DAP), and second-order longitudinal optical (2LO) phonon replicas of the TES (TES-2LO), respectively. According to Haynes' empirical rule, we calculated the energy of a free exciton (FX) to be 3.374 eV. The thermal activation energy for D0X in the nanocrystalline ZnO thin film was found to be ~25 meV, corresponding to the thermal dissociation energy required for D0X transitions.

• Korean Journal of Materials Research
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• v.12 no.1
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• pp.54-57
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• 2002

We have grown undoped $In_ xGa_{1-x}N,\; In_xGa_{1-x}N:Si\;and\;In_{0.1}Ga_{0.9}N:Zn$ thin films by MOCVD at temperature between 880 and $710^{\circ}C which endows various In composition in the epilayer from 0.07 to 0.22 as examined using X-ray diffraction, optical absorption(OA), photocurrent (PC) and photoluminescence (PL). The In molar fraction estimated from PL results is higher than that from the OA, PC, and X-ray data for $X{\le}0.22$, which may be caused by phase separation. However, the In molar fraction estimated by X-ray diffraction, OA, PC and PL for $In_xGa_{1-x}N:Si$ does not show discrepancy. With the appropriate Zn doping in undoped $In_{0.1}Ga_{0.9}N$, the emission peak is shifted from 3.15 eV which originates from the band edge emission peak to 2.65 eV which resulted from the conduction band to acceptor transition due to a deep acceptor level.

• Journal of the Korean Vacuum Society
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• v.2 no.3
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• pp.294-298
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• 1993

CuGaSe2 단결정을 고순도(99.9999%)의 Cu, Se 원소를 화학조성비로 칭량한 후 Se을 3mole% 과잉으로 첨가하여 합성된 ingot를 사용하여 iodine(99.9999%)을 수송매체로 한 화학수송법으로 성장시켰다. 성장된 단결정은 검정색을 띠고 있었으며, 10K에서 optical energy gap이 1.755eV로 주어졌다. Ar-ion laser로 여기시켜 측정한 photoluminescence(PL) 스펙트럼으로부터 1.667eV, 1.085eV, 1.025eV에 위치한 세 개의 PL peak를 얻었다. Thermally stimulated current(TSC) 측정에서 0.660eV, 0.720eV의 deep donor level을 관측하였으며, PL peak intensity의 thermal quenching으로 구한 activation energy는 0.010eV이었다. CuGaSe2 단결정에서 PL mechanism은 edge emission 및 donor-acceptor pair recombination임을 규명했다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.574-577
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• 2001

GaN thin films on sapphire were grown by rf magnetron sputtering with ZnO buffer layer. The dependence of GaN film quality on ZnO buffer layer was investigated by X-ray diffraction(XRD). The improved film quality has been obtained by using thin ZnO buffer layer. Using Auger electron spectroscopy(AES), it was observed that the annealing process improved the GaN film quality. The surface roughness according to the annealing temperatures(700, 900, 1100$^{\circ}C$) were investigated by AFM(atomic force microscopy) and it was confirmed that the crystallization was improved by increasing the annealing temperature. Photoluminescence at 8K shows a near-band-edge peak at 3.2eV with no deep level emission.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.224-227
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• 2001

ZnO buffer layers were used to grow ZnO films on c-plane sapphire substrates. The role of ZnO buffer layers in the growth of ZnO thin films on sapphire substrates was investigated by scanning electron microscopy, X-ray diffraction, and Photolumminescence(PL) measurements. At the optimized ZnO buffer layer thickness of 100 $\AA$, FWHM of $\theta$ -rocking curve of ZnO thin films was minimized to 0.73 degrees and room temperature PL spectra showed that deep level emission was not hardly seen. The optimization of the ZnO buffer layer thickness resulted in improvements of the surface morphology and crystalline quality of ZnO thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.5
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• pp.365-370
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• 2000

Schottky contacts on n-In$\_$0.53//Ga$\_$0.47//As have been made by metal deposition on substrates cooled to a temperature of 77K. The current-voltage and capacitance-voltage characteristics showed that the Schottky diodes formed at low temperature had a much improved barrier height compared to those formed at room temperature. The Schottky barrier height ø$\_$B/ was found to be increased from 0.2eV to 0.6eV with Ag metal. The saturation current density of the low temperature diode was about 4 orders smaller than for the room temperature diode. A current transport mechanism dominated by thermionic emission over the barrier for the low temperature diode was found from current-voltage-temperature measurement. Deep level transient spectroscopy studies exhibited a bulk electron trap at E$\_$c/-0.23eV. The low temperature process appears to reduce metal induced surface damage and may form an MIS (metal-insulator-semiconductor)-like structure at the interface.

• Korean Journal of Remote Sensing
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• v.35 no.6_2
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• pp.1053-1065
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• 2019

Land use statistics calculation is very informative data as the activity data for calculating exact carbon absorption and emission in post-2020. To effective interpretation by land use category, This study classify automatically image interpretation by land use category applying forest aerial photography (FAP) to deep learning model and calculate national unit statistics. Dataset (DS) applied deep learning is divided into training dataset (training DS) and test dataset (test DS) by extracting image of FAP based national forest resource inventory permanent sample plot location. Training DS give label to image by definition of land use category and learn and verify deep learning model. When verified deep learning model, training accuracy of model is highest at epoch 1,500 with about 89%. As a result of applying the trained deep learning model to test DS, interpretation classification accuracy of image label was about 90%. When the estimating area of classification by category using sampling method and compare to national statistics, consistency also very high, so it judged that it is enough to be used for activity data of national GHG (Greenhouse Gas) inventory report of LULUCF sector in the future.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.337-337
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• 2013

ZnO seed layers were deposited on a quartz substrate using the sol-gel method, and B-doped ZnO (BZO) nanorods with different B concentrations ranging from 0 to 2.5 at.% were grown on the ZnO seed layers by the hydrothermal method. The structural, optical, electrical propertiesof the ZnO and BZO nanorods were investigated using field-emission scanning electron microscopy, X-ray diffraction (XRD), photoluminescence (PL), ultraviolet-visible spectroscopy, and hall effect. The ZnO and BZO nanorods grew well aligned on the surface of the quartz substrates. From the XRD data, it can be seen that the B doping is responsible for the distortion of the ZnO lattice. The PL spectra show near-band-edge emission and deep-level emission, and they also show that B doping significantly affects the PL properties of ZnO nanorods. The optical band gaps are changed by B doping, and thus the Urbach energy value changed with the optical band gap of the ZnO nanorods. From the hall measurements, it can be observed that the values of electrical resistivity, carrier concentration, and mobility are changed by B doping.