• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.466-467
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• 2005

Al doped zinc oxide films (ZnO:Al) were deposited on glass substrate by RF magnetron sputtering from a ZnO target mixed with 2 wt% $Al_2O_3$. The as-deposited ZnO:Al films were rapid-thermal annealed. Electrical properties and structural evolution of the films, as annealed by rapid thermal process (RTP), were studied and compared with the films annealed by conventional annealing process. RTP, the (002) peak intensity increases and the electrical resistivity decreases by 20%, after RT annealing. The effects of RT annealing on the structural evolution and electrical properties of RF sputtered films were further discussed and compared also with the films deposited by DC magnetron sputtering.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.376-377
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• 2006

This paper presents the characteristics of Ta-N thin film strain gauges that are suitable for harsh environemts, which were deposited on thermally oxidized Si substrates by DC reactive magnetronsputtering in an argon-nitrogen atmosphere (Ar-$N_2$ (4 ~ 16 %)). These films were annealed for 1 hr in $2{\times}10^{-6}$ Torr in a vacuum furnace with temperatures that ranged from 500 - $1000^{\circ}C$. The optimized deposition and annealing conditions of the Ta-N thin film strain gauges were determined using 8 % $N_2$ gas flow ratio and annealing at $900^{\circ}C$ for 1 hr. Under optimum formation conditions, the Ta-N thin film strain gauges obtained a high electrical resistivity, ${\rho}\;=\;768.93\;{\mu}{\Omega}{\cdot}cm$, a low temperature coefficient of resistance, $TCR\;=\;-84\;ppm/^{\circ}C$ and a high temporal stability with a good longitudinal gauge factor, GF=4.12. The fabricated Ta-N thin film strain gauges are expected to be used inmicromachined pressure sensors and load cells that are operable under harsh environments.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.36-37
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• 2006

Titanium oxy-nitride ($TiN_O_y$) thin films were deposited on $SiO_2$/Si substrates using reactive dc magnetron sputtering, and were then annealed at various temperatures in air ambient to incorporate oxygen into the films. The effect of annealing temperature on the structural and electrical properties of the films was investigated. The grain size of the films decreases with increasing annealing temperature. On the other hand, crystallinity of the films is independent of annealing temperature in air ambient. Resistivity of the films increases remarkably as an annealing temperature increases and temperature coefficience of resistance (TCR) of the films varies from a positive value to a negative value. The films annealed at $350^{\circ}C$ for 30 min exhibited a near-zero TCR value of approximately -5 ppm/K. The decrease of the grain size with increasing annealing temperature was attributed to an increase of oxygen concentration incorporated into the films during anncaling treatment.

• Journal of the Korean institute of surface engineering
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• v.27 no.5
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• pp.253-260
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• 1994

Ta-N films were reactively sputter deposited by dc magnetron sputtering from a Ta target with a various Ar-N, gas ratio. Electrical resistivity of pure Ta film was 150$\mu$$\Omega$cm and decreased initially with nitrogen addition, and then increased to a value of 220$\mu$$\Omega$-cm~260$\mu$$\Omega$-cm at 9%~23% nitrogen partial flow. Rutherford backscattering spectrometry(RBS) and Auger electron spectroscopy (AES) analysis show that nitrogen content in the film is increased with the nitrogen partial flow. The film contains 58at.% nitrogen at 36% nitrogen partial flow. Both the phase and the microstructure of the as-deposisted films were investigated by x-ray diffractometry(XRD) adn transmission electron microscopy (TEM) at various nitrogen content. The phase of pure Ta film is identified as $\beta$-Ta with a 200$\AA$~300$\AA$ grain size. The phase of Ta film is changed to bcc-Ta as small amount of nitrogen is added. Crystalline Ta2N film was deposited at 24at.% nitrogen content. Amorphous phase is formed over a range of nitrogen content from about 33at.% to 35at.% while crystalline fcc-TaN is observed to form at 39at.%~48at.% nitrogen content.

• Journal of the Korean institute of surface engineering
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• v.40 no.4
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• pp.165-169
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• 2007

Compared to conventional Indium Tin Oxide (ITO) film deposition methods, cesium (Cs) assisted sputtering offers higher film characteristics in terms of electrical, mechanical and optical properties. However, it showed highly non-linear characteristics between process input factors and equipment responses. Therefore, to maximize film quality, optimization of manufacturing process is essential and process characterization is the first step for process optimization. For this, we designed 2 level design of experiment (DOE) to analyze ITO film characteristics including film thickness, resistivity and transmittance. DC power, pressure, carrier flow, Cs temperature and substrate temperature were selected for process input variables. Through statistical effect analysis methods, relation between three types of ITO film characteristics and five kinds of process inputs are successfully characterized and eventually, it can be used to optimize Cs assisted sputtering processes for various types of film deposition.

• Proceedings of the KSR Conference
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• 2009.05b
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• pp.641-646
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• 2009

Concrete tracks are superior to ballast tracks in the aspect of durability, maintenance and safety. However, deteriorated stiffness of railroad bed and settlement of soft ground induced by trapped or seepage water lead to problems in safety of train operation. In this research, characteristic stiffness of concrete tracks, which is determined from FRACTAL (Flexural-Rigidity Assessment of Concrete Tracks by Antisymmetric Lamb Waves) technique, was employed as an index of track displacement. The characteristic stiffness is defined using Poisson's ratio, moment of inertia and stiffness ratio of subgrade to slab. To verify validity and reliability of the proposed characteristic stiffness, experimental and theoretical researches were performed. Feasibility of the characteristic stiffness based on FRACTAL technique was proved at a real concrete track for Korean high-speed trains. Validity of the FRACTAL technique was also verified by comparing the results of impulse-response tests performed at the same measurement array and the results of SASW tests and DC resistivity survey performed at a shoulder nearby the track.

• Journal of Magnetics
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• v.10 no.3
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• pp.128-132
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• 2005

We report optical ab-plane properties of the layered sodium cobaltate, $Na_xCoO_2$ for x = 0.35 and 0.75. Two samples show metallic behaviors according to dc resistivity transport. Overall temperature dependent optical conductivities of both samples are very similar to those of the high temperature superconducting underdoped cuprates. We found that the optical scattering rate of x = 0.75 sample, which is in a Curie-Weiss metallic phase, varies linearly (non-Fermi liquid) with frequency and temperature while that of x = 0.35 sample, which is in a paramagnetic metallic phase, varies quadratically (Fermi liquid) with frequency and temperature. Both x = 0.35 and 0.75 samples have an onset of scattering around $600\;cm^{-1}$ which can be attributed to the interaction of charge carriers with a bosonic collective mode in a system.

• Journal of the Korean institute of surface engineering
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• v.52 no.3
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• pp.145-149
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• 2019

Transparent and conductive ZnO/Ag/SnO2 (ZAS) tri-layer films were deposited onto glass substrates at room temperature by using radio frequency (RF) and direct current (DC) magnetron sputtering. The thickness values of the ZnO and $SnO_2$ thin films were kept constant at 50 nm and the value for Ag interlayer was varied as 5, 10, 15, and 20 nm. In the XRD pattern the diffraction peaks were identified as the (002) and (103) planes of ZnO, while the (111), (200), (220), and (311) planes could be attributed to the Ag interlayer. The optical transmittance and electrical resistivity were dependent on the thickness of the Ag interlayer. The ZAS films with a 10 nm thick Ag interlayer exhibited a higher figure of merit than the other ZAS films prepared in this study. From the observed results, a ZAS film with a 10 nm thick Ag interlayer was believed to be an alternative transparent electrode candidate for various opto-electrical devices.

• Journal of the Korean earth science society
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• v.30 no.6
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• pp.699-708
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• 2009

Recently as the interest in the development of domestic ore deposits has increased, we can easily find some studies on exploration geophysics-based ore-deposit survey in literature. Based on the fact that mineralized zone are generally more conductive than surrounding media, electrical resistivity survey among several geophysical surveys has been applied to investigate metallic ore deposits. Most of them are grounded on 2-D survey. However, 2-D inversion may lead to some misinterpretation for 3-D geological structures. In this study, we investigate the feasibility of the 3-D electrical resistivity survey to 3-D vein-type ore deposits. We first simulate 2-D dipole-dipole survey data for survey lines normal to the strike and 3-D pole-pole survey data, and then perform 3-D inversion. For 3-D ore-body structures, we assume a width-varying dyke, a wedge-shaped, and a fault model. The 3-D inversion results are compared to 2-D inversion results. By comparing 3-D inversion results for 2-D dipole-dipole survey data to 3-D inversion results for 3-D pole-pole survey data, we could note that the 2-D dipole-dipole survey data yield better inversion results than the 3-D pole-pole data, which is due to the main characteristic of the pole-pole array. From these results, we are convinced that if we have certain information on the direction of the strike, it would be desirable to apply 2-D dipole-diple survey for the survey lines normal to the strike. However, in most cases, we do not have any information on the direction of the strike, because we already developed the ore deposit with the outcrops and the remaining ore deposits are buried under the surface. In that case, performing 3-D pole-pole electrical resistivity survey would be a reasonable choice to obtain more accurate interpretation on ore body structure in spite of low resolution of pole-pole array.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.255-262
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• 2011

This paper has relatively high technical standard and experimental skill. The fabrication of TCO film with high transparency, low resistance and low chromaticity require exact control of several competing factors. This paper has resolved these problems reasonably well, thus recommended for publication. Indium tin oxide(ITO) thin films were by D.C. magnetron roll-to-roll sputter system utilizing ITO and $SiO_2$ targets of ITO and $SiO_2$. In this experiment, the effect of D.C. power, winding speed, and oxygen flow rate on electrical and optical properties of ITO thin films were investigated from the view point of sheet resistance, transmittance, and chromaticity($b^*$). The deposition of $SiO_2$ was performed with RF power of 400W, Ar gas of 50 sccm and the deposition of ITO, DC power of 600W, Ar gas of 50 sccm, $O^2$ gas of 0.2 sccm, and winding speed of 0.56m/min. High quality ITO thin films without $SiO_2$ layer had chromaticity of 2.87, sheet resistivity of 400 ohm/square, and transmittance of 88% and $SiO_2$-doped ITO Thin film with chromaticity of 2.01, sheet resistivity of 709 ohm/square, and transmittance of more than 90% were obtained. As a result, $SiO_2$ was coated on PET before deposition of ITO, their chromaticity($b^*$) and transmittance were better than previous results of ITO films. These results show that coating of $SiO_2$ induced arising chromaticity($b^*$) and transmittance. If the thickness of $SiO_2$ is controlled, sheet resistance value of ITO film will be expected to be better for touch screen. A four point probe and spectrophotometer are used to investigate the properties of ITO thin films.