• Title/Summary/Keyword: CuSnNiSi

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Formation of Sn-Cu Solder Bump by Electroplating for Flip Chip (플립칩용 Sn-Cu 전해도금 솔더 범프의 형성 연구)

  • 정석원;강경인;정재필;주운홍
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.4
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    • pp.39-46
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    • 2003
  • Sn-Cu eutectic solder bump was fabricated by electroplating for flip chip and its characteristics were studied. A Si-wafer was used as a substrate and the UBM(Under Bump Metallization) of Al(400 nm)/Cu(300 nm)/Ni(400 nm)/Au(20 nm) was coated sequentially from the substrate to the top by an electron beam evaporator. The experimental results showed that the plating ratio of the Sn-Cu increased from 0.25 to 2.7 $\mu\textrm{m}$/min with the current density of 1 to 8 A/d$\m^2$. In this range of current density the plated Sn-Cu maintains its composition nearly constant level as Sn-0.9∼1.4 wt%/Cu. The solder bump of typical mushroom shape with its stem diameter of 120 $\mu\textrm{m}$ was formed through plating at 5 A/d$\m^2$ for 2 hrs. The mushroom bump changed its shape to the spherical type of 140 $\mu\textrm{m}$ diameter by air reflow at $260^{\circ}C$. The homogeneity of chemical composition for the solder bump was examined, and Sn content in the mushroom bump appears to be uneven. However, the Sn distributed more uniformly through an air reflow.

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Distribution and Characterization of Heavy Metals in Human Kidney Cortex and Kidney Medulla (인체 신장피질과 신장수질에서 중금속류의 분포 및 특성)

  • 유영찬;이상기;양자열;김기욱;이수연;정규혁
    • YAKHAK HOEJI
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    • v.45 no.5
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    • pp.460-467
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    • 2001
  • Heavy metals, such as Al, As, Cd, Cr Cu, Fe, Hg, Mn, Mo, Ni, Pb, Se, Si, Sn, V and Zn, were analysed on kidney cortex and medulla of Korean obtained from 154 forensic medical autopsy cadavers. Heavy metals were analysed by inductively coupled plasma atomic emission spectrometry In kidney cortex, the concentrations of Al, Cd, Cu, Mn, Mo, Pb, Se, Si and Zn were significantly higher than in the kidney medulla (Cd, Cu, Mn, Mo, Zn : p<0.01, AA, Pb, Se, Si : p<0.05). No significant local differences were found between kidney cortex and kidney medulla in the concentrations of As, Cr Fe, Hg, Ni, Sn and V. In kidney cortex and kidney medulla, Cd concentrations correlated positively with age, but Mn concentrations correlated negatively with age. A significantly positive correlation between Cd and Zn, Cd and Cu, Zn and Cu, Al and Si, Se and As was found in kidney cortex and kidney medulla. A significantly positive correlation between Hg and Se was only observed in kidney cortex. These results indicate that the distribution of hazardous heavy metals is similar to that of essential elements in the tissues.

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Study on the Characteristics of Electroplated Solder: Comparison of Sn-Cu and Sn-Pb Bumps (무연 도금 솔더의 특성 연구: Sn-Cu 및 Sn-Pb 범프의 비교)

  • 정석원;정재필
    • Journal of the Korean institute of surface engineering
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    • v.36 no.5
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    • pp.386-392
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    • 2003
  • The electroplating process for a solder bump which can be applied for a flip chip was studied. Si-wafer was used for an experimental substrate, and the substrate were coated with UBM (Under Bump Metallization) of Al(400 nm)/Cu(300 nm)Ni(400 nm)/Au(20 nm) subsequently. The compositions of the bump were Sn-Cu and eutectic Sn-Pb, and characteristics of two bumps were compared. Experimental results showed that the electroplated thickness of the solders were increased with time, and the increasing rates were TEX>$0.45 <\mu\textrm{m}$/min for the Sn-Cu and $ 0.35\mu\textrm{m}$/min for the Sn-Pb. In the case of Sn-Cu, electroplating rate increased from 0.25 to $2.7\mu\textrm{m}$/min with increasing current density from 1 to 8.5 $A/dm^2$. In the case of Sn-Pb the rate increased until the current density became $4 A/dm^2$, and after that current density the rate maintains constant value of $0.62\mu\textrm{m}$/min. The electro plated bumps were air reflowed to form spherical bumps, and their bonded shear strengths were evaluated. The shear strength reached at the reflow time of 10 sec, and the strength was of 113 gf for Sn-Cu and 120 gf for Sn-Pb.

A Study on the Industrial Economic-Importance Index of Minerals in Korea (한국의 광물자원 산업적 경제중요도 지수 산정 연구)

  • Yujeong Kim
    • Resources Recycling
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    • v.32 no.1
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    • pp.60-66
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    • 2023
  • As supply chain management becomes a key factor in the sustainable growth of the industry, securing minerals at the national or corporate level is becoming important. Depending on the industrial structure, the economic status of each minerals is different and the supply risk is different In this study, to examine the economic status of minerals, an index that can quantify the Industrial Economic Importance by minerals was developed and calculated by reflecting the demand structure and cost weight of each industry. As a result, Li, Al, Cu, Si, Co, Ni, etc. were evaluated as having high industrial importance in Korea. In addition, by industry, Al, Cu, Zn, and Pb for primary metal manufacturing, general machinery, assembly metals,Sn, Ba, Ti, Si and Ga for precision equipment, Si and Ga for semiconductors, and Li, Ni, Co, Si, etc. for electronic components had high industrial importance. Such as Europe and the United States, in order to select Critical-minerals, Korea will need to analyze the economic impact on the domestic industry as well as the risks of supply chain by minerals.

The Fluxless Wetting Properties of UBM-Coated Si-Wafer to the Pb-Free Solders (UBM이 단면 증착된 Si-Wafer에 대한 Pb-free 솔더의 무플럭스 젖음 특성)

  • 홍순민;박재용;김문일;정재필;강춘식
    • Journal of Welding and Joining
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    • v.18 no.6
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    • pp.74-82
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    • 2000
  • The fluxless wetting properties of UBM-coated Si-wafer to the binary lead-free solders(Sn-Ag, Sn-Sb, Sjn-In, Sn0Bi) were estimated by wetting balance method. With the new wettability indices from the wetting curves of one side coated specimen, the wetting property estimation of UBM-coated Si-wafer was possible. For UBM of Si-chip, Au/Cu/Cr UBm was better than au/Ni/TI in the point of wetting time/ At general reflow process temperature, the wettability of high melting point solders(Sn-Sb, Sn-Ag) was better than that of low melting point one(Sn-Bi, Sn-In). The contact angle of the one side coated Si-plate to the solder could be calculated from the force balance equation by measuring the static state force and the tilt angle.

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A Study on the Characteristics of Sn-Ag-X Solder Joint (Sn-Ag-X계 무연솔더 접합부의 미세조직 및 전단강도에 관한 연구)

  • 김문일;문준권;정재필
    • Journal of Welding and Joining
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    • v.20 no.2
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    • pp.77-81
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    • 2002
  • Many kinds of Pb-free solder have been investigated because of the environmental concerns. Sn-Ag-Cu system is well blown as most competitive Pb-free solder. However, since Sn-Ag-Cu system has relatively high melting point compared to Sn-Pb eutectic, it may a limitation, the some application. In this study, Bi and In contained solder of $Sn_3Ag_8Bi_5In$ which has relatively lower melting point, $188~204^{\circ}C$, was investigated. $Sn_3Ag_8Bi_5In$ solder ball of $500\mu\textrm{m}$ diameter was set on the Ni/Cu/Cr-UBM and reflow soldered in the range of $220~240^{\circ}C$ for 5~15s. The maximum shear strength of the solder ball was around 170mN by reflowing at $240^{\circ}C$ for 10s. Intermetallic compound formed on the UBM of Si-wafer was analysed by SEM(scanning electron microscope) and XRD(X-ray diffractometer).

A Study on the Wetting Properties of UBM-coated Si-wafer (UBM(Under Bump Metallurgy)이 단면 증착된 Si-wafer의 젖음성에 관한 연구)

  • 홍순민;박재용;박창배;정재필;강춘식
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.2
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    • pp.55-62
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    • 2000
  • The wetting balance test was performed in an attempt to estimate the wetting properties of the UBM-coated Si-wafer on one side to the Sn-Pb solder. The wetting curves of the one and both side-coated UBM layers had the similar shape and the parameters characterizing the curve shape showed the similar transition tendency to the temperature. The wetting property estimation was possible with the new wettability indices from the wetting curves of one side-coated specimen; $F_{min}$, $F_{s}t_{s}$ and $t_s$. For UBM of Si-chip, Au/Cu/Cr UBM was better than Au/Ni/Ti in the point of wetting time. The contact angle of the one side coated Si-plate to the Sn-Pb solder could be calculated from the force balance equation by measuring the static state force and the tilt angle.

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Reliability of Sn-Ag-Cu Solder Joint on ENEPIG Surface Finish: 1. Effects of thickness and roughness of electroless Ni-P deposit (ENEPIG 표면처리에서의 Sn-Ag-Cu 솔더조인트 신뢰성: 1. 무전해 Ni-P도금의 두께와 표면거칠기의 영향)

  • Huh, Seok-Hwan;Lee, Ji-Hye;Ham, Suk-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.3
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    • pp.43-50
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    • 2014
  • By the trends of electronic package to be smaller, thinner and more integrative, the reliability of interconnection between Si chip and printed circuit board is required. This paper reports on a study of high speed shear energy of Sn-4.0wt%Ag-0.5wt%Cu (SAC405) solder joints with different the thicknesses of electroless Ni-P deposit. A high speed shear testing of solder joints was conducted to find a relationship between the thickness of Ni-P deposit and the brittle fracture in electroless Ni-P deposit/SAC405 solder. A focused ion beam (FIB) was used to polish the cross sections to reveal details of the microstructure of the fractured pad surface with and without $HNO_3$ vapor treatment. The high speed shear energy of SAC405 solder joint with $1{\mu}m$ Ni-P deposit was found to be lower without $HNO_3$ vapor, compared to those of over $3{\mu}m$ Ni-P deposit. This could be due to the edge of solder resist in $1{\mu}m$ Ni-P deposit, which provides a fracture location for the weakened shear energy of solder joints and brittle fracture in high speed shear test. With $HNO_3$ vapor, the brittle fracture mode in high speed shear test decreased with increasing the thickness of Ni-P deposit. Then the roughness (Ra) of Ni-P deposits decreased with increasing its thickness. Thus, this gives the evidence that the decrease in roughness of Ni-P deposit for Eelectroless Ni/ Electroless Pd/ Immersion Au (ENEPIG) surface play a critical role for improving the robustness of SAC405 solder joint.

Manufactures of dental casting Co-Cr-Mo based alloys in addition to Sn, Cu and analysis of infrared thermal image for melting process of its alloys (Sn 및 Cu를 첨가한 치과 주조용 Co-Cr-Mo계 합금제조 및 용해과정 분석)

  • Kang, Hoo-Won;Park, Young-Sik;Hwang, In;Lee, Chang-Ho;Heo, Yong;Won, Yong-Gwan
    • Journal of Technologic Dentistry
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    • v.36 no.3
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    • pp.141-147
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    • 2014
  • Purpose: Dental casting #Gr I (Co-25Cr-5Mo-3Sn-1Mn-1Si), #Gr II (Co-25Cr-5Mo-5Cu-1Mn -1Si) and #Gr III (Co-25Cr-5Mo-3Sn-5Cu-1Mn-1Si) master alloys of granule type were manufactured the same as manufacturing processes for dental casting Ni-Cr and Co-Cr-Mo based alloys of ingot type. These alloys were analyzed melting processes with heating time of high frequency induction centrifugal casting machine using infrared thermal image analyzer. Methods: These alloys were manufactured such as; alloy design, the first master alloy manufatured using vacuum arc casting machine, melting metal setting in crucible, melting in VIM, pouring in the mold of bar type, cutting the gate and runner bar and polishing. These alloys were put about 30g/charge in the ceramic crucible of high frequency induction centrifugal casting machine and heat, Infrared thermal image analyzer indicated alloys in the crucible were set and operated. Results: The melting temperatures of these alloys measuring infrared thermal image analyzer were decreased in comparison with remanium$^{(R)}$ GM 800+, vera PDI$^{TM}$, Biosil$^{(R)}$ f, WISIL$^{(R)}$ M type V, Ticonium 2000 alloys of ingot type and vera PDS$^{TM}$(Aabadent, USA), Regalloy alloys of shot type. Conclusion: Co-Cr-Mo based alloy in addition to Sn(#Gr I alloy) were decreased the melting temperature with heating time of high frequency induction centrifugal casting machine using infrared thermal image analyzer.

Flip Chip Process on the Local Stiffness-variant Stretchable Substrate for Stretchable Electronic Packages (신축성 전자패키지용 강성도 국부변환 신축기판에서의 플립칩 공정)

  • Park, Donghyeun;Oh, Tae Sung
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.155-161
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    • 2018
  • A Si chip with the Cu/Au bumps of $100-{\mu}m$ diameter was flip-chip bonded using different anisotropic conductive adhesives (ACAs) onto the local stiffness-variant stretchable substrate consisting of polydimethylsiloxane (PDMS) and flexible printed circuit board (FPCB). The average contact resistances of the flip-chip joints processed with ACAs containing different conductive particles were evaluated and compared. The specimen, which was flip-chip bonded using the ACA with Au-coated polymer balls as conductive particles, exhibited a contact resistance of $43.2m{\Omega}$. The contact resistance of the Si chip, which was flip-chip processed with the ACA containing SnBi solder particles, was measured as $36.2m{\Omega}$, On the contrary, an electric open occurred for the sample bonded using the ACA with Ni particles, which was attributed to the formation of flip-chip joints without any entrapped Ni particles because of the least amount of Ni particles in the ACA.