• Title/Summary/Keyword: Cross Sectional Property

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IR Absorption Property in Nano-thick Nickel Silicides (나노급 두께 니켈실리사이드의 적외선 흡수 특성)

  • Yoon, Ki-Jeong;Han, Jeung-Jo;Song, Oh-Sung
    • Korean Journal of Materials Research
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    • v.17 no.6
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    • pp.323-330
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    • 2007
  • We fabricated thermaly evaporated 10 nmNi/(poly)Si films to investigate the energy saving property of silicides formed by rapid thermal annealing (RTA) at the temperature of $300{\sim}1200^{\circ}C$ for 40 seconds. Moreover, we fabricated $10{\sim}50$ nm-thick ITO/Si films with a rf-sputter as reference films. A four-point tester was used to investigate the sheet resistance. A transmission electron microscope (TEM) and an X-ray diffractometer were used for the determination of cross sectional microstructure and phase changes. A UV-VISNIR and FT-IR (Fourier transform infrared rays spectroscopy) were employed for near-IR and middle-IR absorbance. Through TEM analysis, we confirmed $20{\sim}70nm-thick$ silicide layers formed on the single and polycrystalline silicon substrates. Nickel silicides and ITO films on the single silicon substrates showed almost similar absorbance in near-IR region, while nickel silicides on polycrystalline silicon substrate showed superior absorbance above 850 nm near-IR region to ITO films. Nickel silicide on polycrystalline substrate also showed better absorbance in middle IR region than ITO. Our result implies that nano-thick nickel silicides may have exellent absorbing capacity in near-IR and middle-IR region.

Dependence on Dopant of Ni-silicide for Nano CMOS Device (Nano CMOS소자를 위한 Ni-silicide의 Dopant 의존성 분석)

  • 배미숙;지희환;이헌진;오순영;윤장근;황빈봉;왕진석;이희덕
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.11
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    • pp.1-8
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    • 2003
  • In this paper, the dependence of silicide properties such as sheet resistance and cross-sectional profile on the dopants for source/drain and gate has been characterized. There was little difference of sheet resistance among the dopants such as As, P, BF$_2$ and B$_{11}$ just a(ter formation of NiSi using RTP (Rapid Thermal Process). However, the silicide properties showed strong dependence on the dopants when thermal treatment was applied after silicidation. BF$_2$ implanted silicon showed the most stable property, while As implanted one showed the worst. The main reason of the excellent property of BF$_2$ sample is believed to be tile retardation of hi diffusion by the flourine. Therefore, retardation of Ni diffusion is highly desirable for high performance Ni-silicide technology.y.

IR Absorption Property in Nano-thick Ir-inserted Nickel Silicides (이리듐이 첨가된 니켈실리사이드의 적외선 흡수 특성)

  • Yoon, Kijeong;Song, Ohsung;Han, Jeungjo
    • Korean Journal of Metals and Materials
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    • v.46 no.11
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    • pp.755-761
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    • 2008
  • We fabricated thermally evaporated 10 nm-Ni/1 nm-Ir/(poly)Si films to investigate the energy saving property of silicides formed by rapid thermal annealing (RTA) at the temperature range of $300{\sim}1200^{\circ}C$ for 40 seconds. Moreover, we fabricated 100 nm-thick ITO/(poly)Si films with an rf-sputter as references. A transmission electron microscope (TEM) and an X-ray diffractometer were used to determine cross-sectional microstructure and phase changes. A UV-VIS-NIR and FT-IR (Fourier transform infrared spectroscopy) were employed for near-IR and middle-IR absorbance. Through TEM analysis, we confirmed 20~65 nm-thick silicide layers formed on the single and polycrystalline silicon substrates. Ir-inserted nickel silicide on single crystalline substrate showed almost the same absorbance in near IR region as well as ITO, but Ir-inserted nickel silicide on polycrystalline substrate, which had the uniform absorbance in specific region, showed better absorbance in near IR region than ITO. The Ir-inserted nickel silicide on polycrystalline substrate particularly showed better absorbance in middle IR region than ITO. The results imply that nano-thick Ir-inserted nickel silicides may have excellent absorbing capacity in near-IR and middle-IR region.

Developing Traffic Accident Models Using Panel Data (Focused on the 50 intersections in Cheongju) (패널자료를 이용한 교통사고모형 개발 (청주시 교차로 50개 지점을 대상으로))

  • Kim, Jun-Yong;Na, Hui;Park, Min-Gyu;Park, Byeong-Ho
    • Journal of Korean Society of Transportation
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    • v.29 no.4
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    • pp.95-101
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    • 2011
  • This study proposes the accident estimation model developed based on the time-series cross-sectional data at 50 intersections in Cheongju. The data were collected repeatedly and accumulated from 2004 to 2007. This study focused on deriving the optimal among the various models including TSCSREG(Time Series Cross Section Regression). Four different models utilizing various elements affecting accidents were developed. Through a statistical test, it was found that the t values of independent variables of the fixed effect models were less than those of the random effect models. Two variables were then found to be positive to the accidents: the number of crosswalks at an intersection and the number of intersections.

Traffic Accident Analysis of Link Sections Using Panel Data in the Case of Cheongju Arterial Roads (패널자료를 이용한 가로구간 교통사고분석 - 청주시 간선도로를 사례로 -)

  • Kim, Jun-Young;Na, Hee;Park, Byung-Ho
    • Journal of the Korean Society of Safety
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    • v.27 no.3
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    • pp.141-146
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    • 2012
  • This study deals with the accident model using panel data which are composed of time series data of 2005 through 2007 and cross sectional data of link sections in Cheongju. Panel data are repeatedly collected over time from the same sample. The purpose of the study is to develop the traffic accident model using the above panel data. In pursuing the above, this study gives particular attentions to deriving the optimal models among various models including TSCSREG (Time Series Cross Section Regression). The main results are as follows. First, 8 panel data models which explained the various effects of accidents were developed. Second, $R^2$ values of fixed effect models were analyzed to be higher than those of random effect models. Finally, such the variables as the sum of the number of crosswalk on intersections and sum of the number of intersections were analyzed to be positive to the accidents.

Structural Optimum Design of Composite Rotor Blade (복합재 로터 블레이드의 구조 최적설계)

  • Park, Jung-Jin;Lee, Min-Woo;Bae, Jae-Sung;Lee, Soo-Yong;Kim, Seok-Woo
    • Journal of Aerospace System Engineering
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    • v.1 no.3
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    • pp.26-31
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    • 2007
  • This paper addresses a method for structural optimum design of composite rotor blade. The basic model of a composite helicopter main rotor blade is designed and its parameters determining the structural/dynamic properties are studied. Through the investigation of flap/lag/torsional stiffness, the structural properties of the model are analyzed. In this study, helicopter rotor blades are analyzed by using VABS. The computer program VABS (Variational Asymptotic Beam Section Analysis) uses the variational asymptotic method to split a three-dimensional nonlinear elasticity problem into a two dimensional cross-sectional analysis and a one-dimensional nonlinear beam problem. This is accomplished by taking advantage of certain small parameters inherent to beam-like structures. In addition, the rotational stability of the blade is estimated by the frequency diagram from FE analysis(MSC.Patran/Nastran) to understand its vibrational property. From the result, design parameters to determine and optimize the properties of the model are presented.

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Study on the Evaluation for the Property of Mo-Si Multilayers (Mo/Si 다층박막의 특성 평가에 관한 연구)

  • 허성민;김형준;이동현;이승윤;이영태
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.2
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    • pp.15-18
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    • 2001
  • The Mo/si multilayer for EUV lithography was deposited using magnetron sputtering system. The multilayers were characterized using the cross-sectional transmission electron microscope (TEM) and low/high angle X-ray diffraction (XRD). The microstructure of Mo and Si was highly textured structure and amorphous, respectively. The well-defined low angle XRD peaks implies a well-defined multilayer structure. The interfacial layer of Mo-on-Si was thicker than Si-on-Mo interfacial layer.

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C-axis Orientation and Growth Structure of AIN Thin Films on $SiO_2$/Si Substrates Deposited by Reactive RF Magnetron Sputtering

  • Joo, Han-Yong;Lee, Jae-Bin;Kim, Hyeong-Joon
    • The Korean Journal of Ceramics
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    • v.3 no.4
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    • pp.257-262
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    • 1997
  • Aluminum nitride(AIN) thin films were deposited on SiO$_2$/Si substrates by reactive sputtering for the application of SAW devices. The major deposition parameters such as pressure, nitrogen fraction, rf power, substrate distance were changed to find out the optimal condition for c-axis oriented thin films on an amorphous substrate. The effects of deposition parameters on the crystal structure, residual stress, and growth morphology of thin films were characterized by XRD, SEM, and TEM. The FWHM of (002) rocking curve of the films deposited at the proper condition was lower than 2.2$^{\circ}$(C=0.93$^{\circ}$). Cross-sectional TEM showed that self-aligned structure was developed just after slightly random growth at the initial stage. The frequency characteristics of test device fabricated from AIN thin films confirmed their piezoelectric property and applicability for SAW devices.

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Characterization of Stitched Multiaxial Warp Knit Fabric Composites and Channel Beam Manufacturing (Stitched 다축경편 복합재료의 기계적 특성 및 U 빔 성형)

  • 변준형;이상관;엄문광;김태원;배성우;하동호
    • Proceedings of the Korean Society For Composite Materials Conference
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    • 2002.10a
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    • pp.280-283
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    • 2002
  • In the manufacturing of large scale composite structures, the cost-effective processing and the enhancement of structural performance are critical. One of the most effective ways for this purpose is to use stitched multiaxial warp knitted (MWK) perform in the resin transfer molding process. This study reports the effect of stitching on the mechanical properties of MWK composites, and the feasibility processing of the thick U-beam structure utilizing the stitched preforms. Permeability of the preform, viscosity and cure property of the epoxy resin have been measured. The results of resin flow analysis has been used in determining the gate/vent locations of the RTM mold. Cross-sectional observation of the channel beam prototype demonstrated that the resin impregnation was almost complete, except for some surrounding area of stitched yarns.

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Varification of Phase Defect Correctability of Nano-structured Multilayer for EUV Reflection

  • Lee, Seung-Yoon;Kim, Tae-Geun;Jinho Ahn
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.40-45
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    • 2003
  • Ru interfacial layer was inserted into Mo-on-Si interface to enhance the extreme ultra-violet (EUV) reflective multilayer properties. The stacking status and optical properties are analyzed using cross-sectional transmission electron microscope (TEM), and reflectometer. About 1.5% of maximum reflectivity can be acquired as predicted in optical simulation, which is thought to be originated from the diffusion inhibition property. Phase defect correctability of the multilayer can be enhanced by the insertion of Ru barrier layer.