• 한국표면공학회지
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• 제39권6호
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• pp.268-275
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• 2006

In this study, effect of sputtering on the plasma-nitriding substrate and before PVD coating on the microstucture, microhardness, surface roughness and the adhesion strength of CrZrN thin films were investigated. Experimental results showed that this sputtering process not only removed surface compound layer which formed during a plasma nitriding process but also induced an alteration of the surface of plasma nitrided substrate in terms of microhardness distribution, surface roughness. This in turn affected the adhesion strength of PVD coatings. After sputtering, microhardness distribution showed general decrease and the surface roughness became increased slightly. The critical shear stress measured from the scratch test on the CrZrN coatings showed an approximately 1.4 times increase in the adhesion strength through the sputtering prior to the coating and this could be attributed to a complete removal of compound layer from the plasma nitrided surface and to an increase in the surface roughness after sputtering.

• 한국표면공학회지
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• 제39권1호
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• pp.1-8
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• 2006

In this study, effect of sputtering after plasma nitriding and before PVD coating on the microstucture, microhardness, surface roughness and the adhesion strength of CrN thin films were investigated. Experimental results showed that this sputtering process not only removed surface compound layer which formed during a plasma nitriding process but also induced an alteration of the surface of plasma nitrided substrate in terms of microhardness distribution and surface roughness, which in turn affected the adhesion strength of PVD coatings. After sputtering, microhardness distribution showed general decrease and the surface roughness became increased slightly. The critical shear stress measured from the scratch test on the CrN coatings showed an approximately twice increase in the binding strength through the sputtering prior to the coating and this could be attributed to a complete removal of compound layer from the plasma nitrided surface and to an increase in the surface roughness after sputtering.

• 한국해양공학회지
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• 제32권6호
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• pp.502-510
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• 2018

In order to accumulate data to lower the friction coefficient of a press mold, tribological tests were performed before and after coating SM45C with a PVC/PO film and plasma coating (CrN, concept). The ultrasonic nanocrystal surface modification (UNSM)-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those of untreated materials. A comparison of the weight change before and after the tribological test with the CrN and the concept coating material and that of the untreated material showed that the wear loss of the concept coating material and P-UNSM treated material (that is, the UNSM treated material treated with the concept coating) showed a tendency to decrease by approximately 55-75%. Concept 100N had a lower friction coefficient of about 0.6, and P-UNSM-30-100N showed almost the same curve as concept 100N and had a low coefficient of friction of about 0.6. The concept multilayer coating had a thickness of $5.32{\mu}m$. In the beginning, the coefficient of friction decreased because of the plasma coating, but it started to increase from about 250-300 s. After about 350 s, the coefficient of friction tended to approach the friction coefficient of the SM45C base metal. The SGV-280F film-attached test specimen was slightly pushed back and forth, but the SM45C base material was not exposed due to abrasion. The friction coefficient was 0.22, which was the lowest, and the tribological property was the best in this study.

• 한국표면공학회지
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• 제46권4호
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• pp.168-174
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• 2013

In this study, low-cost, high-speed deposition, excellent processability, high mechanical strength and electrical conductivity, chemical stability and corrosion resistance of stainless steel to meet the obsessive-compulsive (0.1 mm or less) were selected CrN thin film. new price reduction to sputter deposition causes - the possibility of sublimation source for inductively coupled plasma Cr rods were attempts by DC bias. 0.6 Pa Ar inductively coupled plasmas of 2.4 MHz, 500 W, keeping Cr Rod DC bias power 30 W (900 V, 0.02 A) is applied, $N_2$ flow rate of 0.5, 1.0, 1.5 sccm by varying the characteristics of were analyzed. $N_2$ flow rate increases, decreases and $Cr_2N$, CrN was found to increase. In addition to corrosion resistance and contact resistance, corrosion resistance, electrical conductivity was evaluated. corrosion current density than $N_2$ 0 sccm was sure to rise in all, $N_2$ 1 sccm at $4.390{\times}10^{-7}$ (at 0.6 V) $A{\cdot}cm^{-2}$, respectively. electrical conductivity process results when $N_2$ 1 sccm 28.8 $m{\Omega}/cm^2$ with the lowest value of the contact resistance was confirmed that came out. The OES (SQ-2000) and QMS (CPM-300) using a reactive deposition process to add $N_2$ to maintain a uniform deposition rate was confirmed that.

• 한국세라믹학회지
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• 제45권3호
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• pp.161-166
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• 2008

The multi-films of a metallic film and a transparent conducting oxide (TCO, indium-tin oxide, ITO) film were formed on the stainless steel 316 and 304 plates by a sputtering method and an E-beam method and then the external metallic region of the stainless steel bipolar plates was converted into the metal nitride films through an annealing process. The multi-film formed on the stainless steel bipolar plates showed the XRD patterns of the typical indium-tin oxide, the metallic phase and the metal substrate and the external nitride film. The XRD pattern of the thin film on the bipolar plates modified showed two metal nitride phases of CrN and $Cr_2N$ compound. Surface microstructural morphology of the multi-film deposited bipolar plates was observed by AFM and FE-SEM. The metal nitride film formed on the stainless steel bipolar plates represented a microstructural morphology of fine columnar grains with 10 nm diameter and 60nm length in FE-SEM images. The electrical resistivity of the stainless steel bipolar plates modified was evaluated.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.186-186
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• 2013

종래의 흑연 위주 연료전지 분리판 개발되어 최근 고분자 전해질 막 연료전지가 높은 전력, 낮은 배기 가스 배출, 낮은 작동 온도로 자동차 산업에서 상당한 주목을 받고 있다. 요구사항은 높은 전기 전도도, 높은 내식성, 낮은 가스 투과성, 낮은 무게, 쉬운 가공, 낮은 제조비용이다. Thin film Cr 장비로 저항가열 furnace, sputter 등이 사용된다. 연료전지 분리판의 고전도도, 내부식성 보호막의 고속 증착을 위한 새로운 증착원으로 스퍼터 - 승화형 소스의 가능성을 유도 결합 플라즈마에 금속 봉을 직류 바이어스 함으로써 시도하였다. 유도 결합 플라즈마를 이용하여 승화증착 시스템을 사용하여 OES (SQ-2000)와 QMS (CPM-300)를 사용하여 $N_2$ flow에 따른 유도 결합 플라즈마를 이용한 스퍼터-승화증착 시스템을 사용 하여도 균일한 공정을 하는 것을 확인 하였다. 5 mTorr의 Ar 유도 결합 플라즈마를 2.4 MHz, 500 W로 유지하면서 직류 바이어스 전력을 30 W (900 V, 0.02 A) 인가하고, $N_2$의 유량을 0.5, 1.0, 1.5 SCCM로 변화를 주어 특성을 분석하였다. MID (Multiple Ion Detection) mode에서 유도결합 플라즈마를 이용한 스퍼터-승화 증착 장비를 사용하여 CrN thin flim 성장시켰고, deposition rate은 44.8 nm/min으로 얻을 수 있었다. 또한 $N_2$의 유량이 증가할 수록 bias voltage가 증가하는 것을 확인 할 수 있었다. OES time acquisition을 이용한 공정 분석에서는 $N_2$ 유량을 off 하였을 때 Ar, Cr의 중성 intensity peak이 상승하였고, 시간 경과에 따라 sublimation에 의한 영향이 없는 것을 확인 할 수가 있었다. XRD data에서는 질소 유량이 증가함에 따라 $Cr_2N$이 감소하고, CrN이 증가하는 것을 확인할 수가 있었다. 결정배향성과 Morphology는 다결정 재료의 경도에 영향을 주는 인자이다. CrN 결정 구조의 경우는 (200)면이 경도가 제일 높은데 (200)면에서 성장한 것을 확인 할 수 있었다. 잔류가스 분석 결과로는 일정한 Ar의 유량을 흘렸을 때 $N_2$의 변화량이 비례적인 경향이 보이는 것을 확인 할수 있었다. 또한 $N_2$가 흐르면서도 유도 결합 플라즈마를 이용한 스퍼터-승화 증착 시스템을 사용하면 일정한 공정을 하는 것을 확인 할 수 있었다. 질소의 분압이 유량에 따라서 $3.0{\times}10^{-10}$ Torr에서 $1.65{\times}10^{-9} $Torr까지 일정한 비율로 증가한다. 즉, 이 시스템으로 양산장비 설계를 하여도 가능 하다는 것을 말해준다.

• 한국자기학회지
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• 제13권1호
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• pp.6-14
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• 2003

열처리 온도에 따라 접합유리와의 화학적 반응이 Fe-Hf-N/SiO$_2$, 및 Fe-Hf-N/Cr/SiO$_2$ 박막의 물리적, 자기적 특성에 미치는 영향을 고찰하였다. 접합유리와 반응된 Fe-Hf-N/SiO$_2$ 박막의 연자기 특설은 온도가 증가함에 따라 크게 떨어졌으며, $600^{\circ}C$에서 포화자화값은 1 kG, 보자력이 27 Oe, 10MHz에서의 유효투자율이 70로 자기적 특성이 급격히 열화되었다. 이는 접합유리와의 화학적 반응에 의해 Fe-Hf-N 박막이 H$_{f}$ O$_2$, Fe$_3$O$_4$ 등으로 산화되기 때문인 것으로 나타났다. Fe-Hf-N/Cr/SiO$_2$ 박막의 경우, $600^{\circ}C$에서 포화자화값 13.5kG, 보자력은 4Oe, 10 MHz에서의 유효 투자율이 700으로 Fe-Hf-N/SiO$_2$ 박막보다 연자기 특성 열화가 덜 일어났다. 이는 Fe-Hf-N/Cr/SiO$_2$ 박막의 Cr 층이 Fe-Hf-N 박막의 산화를 억제하여. 일부에서만 HfO$_2$가 생성되고 나머지는 원래의 $\alpha$-Fe상을 유지하기 때문인 것으로 나타났다.

• 전자공학회논문지D
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• 제35D권11호
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• pp.46-54
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• 1998

직선 또는 필라멘트 모양의 NiCr 박막 히터 및 Bi-Sb 박막 열전퇴(thermopile)로 구성되는 평면형 Bi-Sb 다중접합 열전변환기를 제작하고, 10 Hz에서부터 10 ㎑까지의 교류 입력신호에 대한 변환기의 교류-직류 변환 특성을 논의하였다. 변환기의 열감도를 증가시키고 또한 교류-직류 변환오차를 감소시키기 위하여, NiCr 히터 및 Bi-Sb 열전퇴의 고온 접합부를 열차단막 역할을 하는 Si₃N₄/SiO₂/Si₃N₄ 다이아프램위에 각각 형성하였고, 열전퇴의 저온 접합부는 방열판 역할을 하는 실리콘 림(rim)에 의해 지지되는 Si₃N₄/SiO₂/Si₃N₄ 박막위에 형성하였다. 단일 bifilar NiCr 히터가 내장된 변환기의 열감도는 공기 및 진공중에서 각각 약 14.0 ㎷/㎽ 및 54.0 ㎷/㎽였고, 교류-직류 전압 및 전류 변환 오차범위는 공기중에서 각각 약 ±0.60 ppm 및 ±0.11 ppm이었다. 변환기의 교류-직류 변환 정확도가 상용 3차원 구조의 다중접합 열전변환기의 것보다 훨씬 더 높게 개선되었으나, 시간에 따른 출력 열기전력의 변화는 비교적 높게 나타났다.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2008년도 하계학술대회 논문집
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• pp.646-648
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• 2008

The multi-films of a metallic film and a transparent conducting oxide (TCO, indium-tin oxide, ITO) film were formed on the stainless steel 316 and 304 plates by a sputtering method and an E-beam method and then the external metallic region of the stainless steel bipolar plates was converted into the metal nitride films through an annealing process. The multi-film formed on the stainless steel bipolar plates showed the XRD patterns of the typical indium-tin oxide, the metallic phase and the metal substrate and the external nitride film. The XRD pattern of the thin film on the bipolar plates modified showed two metal nitride phases of CrN and $Cr_2N$ compound. Surface microstructural morphology of the multi-film deposited bipolar plates was observed by AFM and FE-SEM. The electrical resistivity of the stainless steel bipolar plates modified was evaluated.

• Journal of Advanced Marine Engineering and Technology
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• 제32권8호
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• pp.1178-1184
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• 2008

In this study, techniques of ion implantation were used in order to improve the characteristics of metal materials such as the oxidation and wear resistant. In particular it is necessary to develope their oxidation and wear resistant that could be used in severe environmental conditions. There are mainly two elementary technologies including ion implantation and/or thin film coating. Ion implantation method was performed for surface modification. As a result, it was found that some ion implantations methods such as Nb, high-temperature Nb ion implantation and Nb+C combined implantation are somewhat effective for improving the oxidation resistance of TiAl alloy. Furthermore, the fluorine PBII treatment is more effective for improving the oxidation resistance of the TiAl alloy with three-dimensional shapes. The implantation of boron ion into thin film of TiN was also effective for improving the properties of materials like high temperature wear resistance. TiCrN film was applied to the actual seal ring for steam turbines, and it was observed that its sliding property showed a successfully good performance.