• Title/Summary/Keyword: Cr-Si type

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Study on the effect of silicon content on matrix of hypo-eutectic Cr alloyed cast iron (아공정(亞共晶)Cr 주철(鑄鐵)의 기지조직(基地組織)에 미치는 Si의 영향(影響))

  • Kim, Sug-Won;Lee, Oh-Yeon;Kim, Dong-Keon
    • Journal of Korea Foundry Society
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    • v.4 no.2
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    • pp.96-101
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    • 1984
  • The morphologies of eutectic cell formed during solidification affect on the mechanical properties in high Cr cast iron. In order to investigate the influence of Si on the structure, five kinds of specimen containing 16.42% Cr with varying amount of Si (0.51%, 1.17%, 2.22%, 2.71%, 3.56%) were poured into shell mould preheated $330^{\circ}C$ at $1510^{\circ}C$. The effect of Si on matrix in hypo-eutctic Cr cast iron (2.48% C, 16.42%) were studied through its mechanical tests and observation of microstructure using of metallurgical microscope, EPMA, SEM and Image analyzer systematically. The results obtained from the above studies are as follows: 1. Because of ${\Delta}T$ decreasing with increasing Si content, the morpologies of colony change into uniform bar-type carbide from plate-type ones, moreover eutectic colony size (Ew) becomes narrow and spacing of carbide wider. 2. As Si content increases, the amount of carbides also increases and most of Cr were dissolved in carbides while Si in matrix. 3. The hardness, tensile strength and wear resistance were increasing while impact value decreased with increasing Si content. 4. In fracture section, small amount of dimple pattern was observed in less than 1.17% Si but more than 2.22% Si river pattern was presented.

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Manufactures of dental casting Co-Cr-Mo based alloys in addition to Sn, Cu and analysis of infrared thermal image for melting process of its alloys (Sn 및 Cu를 첨가한 치과 주조용 Co-Cr-Mo계 합금제조 및 용해과정 분석)

  • Kang, Hoo-Won;Park, Young-Sik;Hwang, In;Lee, Chang-Ho;Heo, Yong;Won, Yong-Gwan
    • Journal of Technologic Dentistry
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    • v.36 no.3
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    • pp.141-147
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    • 2014
  • Purpose: Dental casting #Gr I (Co-25Cr-5Mo-3Sn-1Mn-1Si), #Gr II (Co-25Cr-5Mo-5Cu-1Mn -1Si) and #Gr III (Co-25Cr-5Mo-3Sn-5Cu-1Mn-1Si) master alloys of granule type were manufactured the same as manufacturing processes for dental casting Ni-Cr and Co-Cr-Mo based alloys of ingot type. These alloys were analyzed melting processes with heating time of high frequency induction centrifugal casting machine using infrared thermal image analyzer. Methods: These alloys were manufactured such as; alloy design, the first master alloy manufatured using vacuum arc casting machine, melting metal setting in crucible, melting in VIM, pouring in the mold of bar type, cutting the gate and runner bar and polishing. These alloys were put about 30g/charge in the ceramic crucible of high frequency induction centrifugal casting machine and heat, Infrared thermal image analyzer indicated alloys in the crucible were set and operated. Results: The melting temperatures of these alloys measuring infrared thermal image analyzer were decreased in comparison with remanium$^{(R)}$ GM 800+, vera PDI$^{TM}$, Biosil$^{(R)}$ f, WISIL$^{(R)}$ M type V, Ticonium 2000 alloys of ingot type and vera PDS$^{TM}$(Aabadent, USA), Regalloy alloys of shot type. Conclusion: Co-Cr-Mo based alloy in addition to Sn(#Gr I alloy) were decreased the melting temperature with heating time of high frequency induction centrifugal casting machine using infrared thermal image analyzer.

Microstructure and tribological properties of CrZr-Si-N films synthesized by unbalanced magnetron sputtering with Cr-Zr-Si segment target (Unbalanced magnetron sputtering과 Segment target을 활용한 CrZr-Si-N 박막의 미세구조와 마모특성)

  • Kim, Dong-Jun;Ra, Jeong-Hyeon;Kim, Seong-Min;Lee, Sang-Yul;Lee, Sang-Yong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.113-114
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    • 2012
  • 본 연구는 segment target을 사용하여 unbalanced magnetron sputtering을 활용하여 고 CrZr-Si-N 박막을 합성하고 박막의 미세구조 및 마모 특성을 연구하는데 그 목적이 있다. 박막의 Si 함량을 조절하기 위하여 각 segment target은 Cr,Zr을 일정vol% 유지하며 Si vol%만 변화하여 설계하였다. Si 함량별로 제작된 마모실험 시편의 미세구조는 XRD, FE-SEM, AFM, TEM을 통하여 분석하였으며, ball on disk type의 마모 시험기를 통해 그 마모 특성을 분석하였으며,

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Study of the Effects of Fe94Si5Cr1-Rubber Absorbers with Sheet-Thickness (Fe94Si5Cr1을 이용한 Sheet 두께에 따른 전파흡수특성 연구)

  • Kim, Moon-Suk;Min, Eui-Hong;Koh, Jae-Gui
    • Journal of the Korean Magnetics Society
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    • v.19 no.2
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    • pp.62-66
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    • 2009
  • The soft magnetic FeSiCr were processed the ball-mill for 30 hours and the shape of FeSiCr particles was changed from sphere to flake type, which was observed using scanning electron microscope. The complex permittivity and permeability spectra and reflection loss of FeSiCr-rubber composite was measured using Network Analyzer in order to investigate the relationship between the microwave absorption and the material constants. The matching frequency shifted toward lower frequency range with microwave absorber thickness, and microwave absorber with FeSiCr-rubber composite showed a maxium reflection loss of -8.3 dB at 1.86 GHz for a 1.3 mm thickness.

Microstructures and Electrochemical Properties of Si-M (M : Cr, Ni) as Alloy Anode for Li Secondary Batteries (리튬이차전지용 Si-M (M : Cr, Ni) 합금 음극의 미세구조와 전기화학적 특성)

  • Lee, Sung-Hyun;Sung, Jewook;Kim, Sung-Soo
    • Journal of the Korean Electrochemical Society
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    • v.18 no.2
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    • pp.68-74
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    • 2015
  • To compare the microstructure and electrochemical properties between two binary alloys (Cr-Si, Ni-Si), two composition of binary alloys with the same capacity were selected using phase-diagram and prepared by matrix-stabilization method to suppress the volume expansion of Si by inactive-matrix. Master alloys were made by Arc-melting followed by fine structured ribbon sample preparation by Rapid Solidification Process (RSP, Melt-spinning method) under the same conditions. Also powder samples were produced by wet grinding for X-Ray Diffraction (XRD) and electrochemical measurements. As predicted from the phase diagram, only active-Si and inactive-matrix ($CrSi_2$, $NiSi_2$) were detected. The results of Scanning Electron Microscope (SEM) and Transmission Electron Microscopy - Energy Dispersive X-ray Spectroscopy (TEM-EDS) show that Cr-Si alloy has finer microstructure than Ni-Si alloy, which was also predictable through phase diagram. The electrochemical properties related to microstructure were evaluated by coin type full- and half-cells. Separately, self-designed test-cells were used to measure the volume expansion of Si during reaction. Volume expansion of Cr-Si alloy electrode with finer microstructure was suppressed significantly and improved in cycle capability, in comparison Ni-Si alloy with coarse microstructure. From these, we could infer the correlation of microstructure, volume expansion and electrochemical degradation and these properties might be predicted by phase diagram.

Improvement of the Low-speed Friction Characteristics of a Bent-Axis Type Hydraulic Piston Pump (사축식 유압 피스톤 펌프의 저속 마찰 특성 개선)

  • Hong Yeh-Sun;Lee Sang-Yul;Kim Chi-Bung;Kim Sung-Hoon;Rhim Hyeon-Sik;Kim Sung-Dae
    • Transactions of The Korea Fluid Power Systems Society
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    • v.1 no.3
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    • pp.7-13
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    • 2004
  • The hydraulic pump for a Electro-hydrostatic Actuator for aircrafts should be able to quickly feed large volume of oil into hydraulic cylinder in order to reduce the response time. On the other hand, it should be also able to precisely dispense small amount of oil by low-speed operation so that the steady state position control error of the EHA can be accurately compensated. This paper is focused on the investigation how the plasma coating surface treatment of cylinder barrel with CrSiN can contribute to the reduction of low-speed friction torque of a bent-axis type piston pump. The results showed that the reduction of the friction torque was not remarkable, but that the anti-wear characteristics of the CrSiN-coated cylinder barrel were much better that those of the original one.

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Structural and electrical properties of the NiCr thin film resistors deposited at various temperatures on $SiO_2$/Si substrate

  • Phuong, Nguyen Mai;Cuong, Nguyen Duy;Kim, Dong-Jin;Kang, Byoung-Don;Kim, Chang-Soo;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.337-338
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    • 2006
  • The 200 nm thick-NiCr films grew on $SiO_2$/Si substrates at various deposition temperatures by a dc magnetron co-sputtering technique were characterized for the variation of film texture. The resistivity of the films decreases with increasing deposition temperature and temperature coefficient of electrical resistance (TCR) varies from negative value to a positive one with increasing deposition temperature. The NiCr films deposited at $300^{\circ}C$ exhibit 4 ppm/K being near zero TCR, resulting in TCR suitable for $\pi$-type attenuator applications.

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Effect of Annealing Conditions on Properties of Ni-Cr Thin Film Resistor (Ni-Cr 박막 저항의 특성에 미치는 열처리 조건의 영향)

  • 류승목;명성재;구본급;강병돈;류제천;김동진
    • Journal of the Microelectronics and Packaging Society
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    • v.11 no.1
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    • pp.37-42
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    • 2004
  • In the electronic components and devices fabrication, thin film resistors with low TCR (temperature coefficient of resistance) and high precision have been used over 3 ㎓ microwave in recent years. Ni-Cr alloys thin films resistors is one of the most commonly used resistive materials because they have low TCR and highly stable resistance. In this work, we fabricated thin film resistors using Evanohm alloys target(72Ni-20Cr-3Al-4Mn-Si) of S-type with excellent resistors properties by RF-sputtering. Also we reported the best annealing condition of thin film resistors for microwave to observe microstructure and electronic properties of thin film according to annealing conditions($200^{\circ}C$, $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$)

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Effect of Annealing Conditions on Properties of Ni-Cr Thin Film Resistor (Ni-Cr 박막 저항의 특성에 미치는 열처리 조건의 영향)

  • Ryu Sung-Rok;Myung Sung-Jea;Koo Bon-Keup;Kang Beong-Don;Ryu Jei-Chun;Kim Dong-Jin
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2003.11a
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    • pp.145-150
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    • 2003
  • In the electronic components and devices fabrication, thin film resistors with low TCR(temperature coefficient of resistance) and high precision have been used over 3 GHz microwave in recent years. Ni-Cr alloys thin films resistors is one of the most commonly used resistive materials because it has low TCR and highly stable resistance. In this work, we fabricated thin film resistors using Evanohm alloys target(72Ni-20Cr-3Al-4Mn-Si) of s-type with excellent resistors properties by RF-sputtering. Also we reported best annealing conditions of thin film resistors for microwave to observe microstructure and electronic properties of thin film according to annealing conditions$(200^{\circ}C,\;300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C)$.

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Thickness Dependence of the Electrical Properties in NiCr Thin Film Resistors Annealed in a Vacuum Ambient for π - type Attenuator Applications

  • Phuong Nguyen Mai;Lee Won-Jae;Yoon Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.712-716
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    • 2006
  • NiCr thin films prepared on $SiO_2/Si$ substrates at room temperature by magnetron co-sputtering technique and then annealed in a vacuum ambient $(3{\times}10^{-6}\;Torr)\;at\;400^{\circ}C$. The grain size and crystallinity of the films increased with film thickness. The resistivity of the films slightly decreases as the film thickness increases, Temperature coefficient resistance (TCR) exhibits positive values irrespective of film thickness and TCR in the range of 50 to 400 nm thickness shows suitable values for the application of 10 dB in ${\pi}-type$ attenuators.