• 제목/요약/키워드: Copper Substrate

검색결과 426건 처리시간 0.026초

Electroless Copper Plating For Metallization of Electronic Devices

  • Lee Jae-Ho
    • 마이크로전자및패키징학회지
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    • 제11권4호
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    • pp.75-80
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    • 2004
  • In copper metallization, resistivity of copper seed layer is very important. Conventionally MOCVD has been used for this purpose however electroless copper plating is simple process and the resistivity of copper deposit is less than that of copper prepared by MOCVD. In this study electroless copper plating was conducted on different substrate to find optimum conditions of electroless copper plating for electronic applications. To find optimum conditions, the effects and selectivity of activation method on several substrates were investigated. The effects of copper bath composition on morphology were investigated. The effects of pH and stabilizer on deposition rate were also investigated. The optimum pH of the bath was 12 with addition of stabilizer. The resistivity of copper was decreased with addition of stabilizer and alter heat treatment.

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Optimization of Thermal Performance in Nano-Pore Silicon-Based LED Module for High Power Applications

  • Chuluunbaatar, Zorigt;Kim, Nam-Young
    • International Journal of Internet, Broadcasting and Communication
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    • 제7권2호
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    • pp.161-167
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    • 2015
  • The performance of high power LEDs highly depends on the junction temperature. Operating at high junction temperature causes elevation of the overall thermal resistance which causes degradation of light intensity and lifetime. Thus, appropriate thermal management is critical for LED packaging. The main goal of this research is to improve thermal resistance by optimizing and comparing nano-pore silicon-based thermal substrate to insulated metal substrate and direct bonded copper thermal substrate. The thermal resistance of the packages are evaluated using computation fluid dynamic approach for 1 W single chip LED module.

저온소성 기판과 Cu와의 동시소성에 미치는 CuO의 첨가효과 (The Influence of CuO on Bonding Behaviors of Low-Firing-Substrate and Cu Conductor)

  • 박정현;이상진
    • 한국세라믹학회지
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    • 제31권4호
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    • pp.381-388
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    • 1994
  • A new process which co-fires the low-firing-substrate and copper conductor was studied to achieve good bond strength and low sheet resistance of conductor. Cupric oxide is used as the precursor of conductive material in the new method and the firing atmosphere of the new process is changed sequently in air H2N2. The addition of cupric oxide and variations of firing atmosphere permited complete binder-burnout in comparison with the conventional method and contributed to the improvement of resistance and bonding behaviors. The potimum conditions of this experiment to obtain the satisfactory resistance and bond strength are as follows (binder-burnout temperature in air; 55$0^{\circ}C$, reducing temperature in H2; 40$0^{\circ}C$ for 30 min, ratio of copper and cupric oxide; 60:40~30:70 wt%). The bonding mechanism between the substrate and metal was explained by metal diffusion layer in the interface and the bond strength mainly depended on the stress caused by the difference of shrinkage and thermal expansion coefficient between the substrate and metal.

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Copper Electrode Material using Copper Formate-Bicarbonate Complex for Printed Electronics

  • Hwang, Jaeeun;Kim, Sinhee;Ayag, Kevin Ray;Kim, Hongdoo
    • Bulletin of the Korean Chemical Society
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    • 제35권1호
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    • pp.147-150
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    • 2014
  • Copper ink has been prepared by mixing copper(II) formate and 2-ethyl-1-hexylammonium bicarbonate (EHABC) to overcome some weak points such as aggregation and degradation of copper nano-type ink. Ink was coated on glass substrate and calcined at $110^{\circ}C$ to $150^{\circ}C$ to generate electrically conductive copper film under two different atmospheres such as nitrogen gas and gaseous mixture of formic acid and methanol. The lowest resistivity of $1.88{\mu}{\Omega}{\cdot}cm$ of copper film was obtained at $150^{\circ}C$ in gaseous formic acid condition. The long-term resistivity shows to increase from $1.88{\mu}{\Omega}{\cdot}cm$ to $2.61{\mu}{\Omega}{\cdot}cm$ after one month.

구리 전기 도금에 Thiourea가 미치는 효과 (Effect of Thiourea on the Copper Electrodeposition)

  • 이주열;임성봉;황양진;이규환
    • 한국표면공학회지
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    • 제43권6호
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    • pp.289-296
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    • 2010
  • The effect of organic additives, thiourea (TU), on the copper electroplated layer of large rectangular size was investigated through physical and various electrochemical techniques. It was found that TU had strong adsorption characteristics on the Ni substrate and affected the initial electroplating process by inducing surface reaction instead of mass transfer in the bulk solution. TU additives had its critical micelle concentration at 200 ppm in copper sulphate solution and showed abrupt change in morphological and electrochemical impedance spectroscopic results around this concentration, which could be related with the destruction of adsorption structure of TU-Cu(I) complex formed at the Ni substrate surface. By conducting a commercial electroplating simulation, when TU additives was included at cmc in the plating solution, it acted as a depolarizer for copper electrodeposition and was effective to reduce the unevenness of copper deposits between centre and edge region at high current densities of 10 ASD.

Study on the heat transfer properties of raw and ground graphene coating on the copper plate

  • Lee, Sin-Il;Tanshen, Md.R.;Lee, Kwang-Sung;Munkhshur, Myekhlai;Jeong, Hyo-Min;Chung, Han-Shik
    • 동력기계공학회지
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    • 제17권5호
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    • pp.78-85
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    • 2013
  • A high thermal conductivity material, namely graphene is treated by planetary ball milling machine to transport the heat by increasing the temperature. Experiments were performed to assess the heat transfer enhancement benefits of coating the bottom wall of copper substrate with graphene. It is well known that the graphene is unable to disperse into base fluid without any treatment, which is due to the several reasons such as attachment of hydrophobic surface, agglomeration and impurity. To further improve the dispersibility and thermal characteristics, planetary ball milling approach is used to grind the raw samples at optimized condition. The results are examined by transmission electron microscopy, x-ray diffraction, Raman spectrometer, UV-spectrometer, thermal conductivity and thermal imager. Thermal conductivity measurements of structures are taken to support the explanation of heat transfer properties of different samples. As a result, it is found that the planetary ball milling approach is effective for improvement of both the dispersion and heat carriers of carbon based material. Indeed, the heat transfer of the ground graphene coated substrate was higher than that of the copper substrate with raw graphene.

Copper Electroplating on Mg Alloy in Pyrophosphate Solution

  • Van Phuong, Nguyen;Moon, Sungmo
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.124.1-124.1
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    • 2016
  • In this work, uniform thickness and good adhesion of electrodeposited copper layer were achieved on AZ91 Mg alloy in alkaline noncyanide copper solution containing pyrophosphate ion by employing appropriate zincate pretreatment. Without zincate pretreatment, the electrodeposited copper layer on AZ91 Mg alloy was porous and showed poor adhesion which was explained by small number of nucleation sites of copper due to rapid dissolution of the magnesium substrate in the pyrophosphate solution. The zincate pretreatment was found as one of the most important steps that can form a conducting layer to cover AZ91 surface which decreased the dissolution rate of AZ91 Mg alloy about 40 times in the copper pyrophosphate solution. Electrodeposited copper layer on AZ91 Mg alloy after an appropriate zincate pretreatment showed good adhesion and uniform thickness with bright surface appearance, independent of the deposition time but the surface roughness of the electrodeposited copper layer increased with increasing Cu deposition time.

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용액 교반이 미세 패턴 내 무전해 구리 도금에 미치는 영향 (The Effect of Solution Agitation on the Electroless Cu Deposition Within Nano-patterns)

  • 이주열;김만;김덕진
    • 한국표면공학회지
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    • 제41권1호
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    • pp.23-27
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    • 2008
  • The effect of solution agitation on the copper electroless deposition process of ULSI (ultra large scale integration) interconnections was investigated by using physical, electrochemical and electrical techniques. It was found that proper solution agitation was effective to obtain superconformal copper configuration within the trenches of $130{\sim}80nm$ width. The transition of open potential during electroless deposition process showed that solution agitation induced compact structure of copper deposits by suppressing mass transfer of cuprous ions toward substrate. Also, the specific resistivity of copper layers was lowered by increasing agitation speed, which made the deposited copper particles smaller. Considering both copper deposit configuration and electric property, around 500 rpm of solution agitation was the most suitable for the homogeneous electroless copper filling within the ultra-fine patterns.

Interconnecting Nanomaterials for Flexible Substrate and Direct Writing Process

  • 좌용호
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.58.1-58.1
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    • 2012
  • Direct write technologies provide flexible and economic means to manufacture low-cost large-area electronics. In this regard inkjet printing has frequently been used for the fabrication of electronic devices. Full advantage of this method, which is capable of reliable direct patterning with line and space dimensions in the 10 to 100 um regime, is only made with all-solution based processing. Among these printable electronic materials, silver and copper nanoparticles have been used as interconnecting materials. Specially, solutions of organic-encapsulated silver and copper nanoparticles may be printed and subsequently annealed to form low-resistance conductor patterns. In this talk, we describe novel processes for forming silver nanoplates and copper ion complex which have unique properties, and discuss the optimization of the printing/annealing processes to demonstrate plastic-compatible low-resistance conductors. By optimizing both the interconnecting materials and the surface treatments of substrate, it is possible to produce particles that anneal at low-temperatures (< $200^{\circ}C$) to form continuous films having low resistivity and appropriate work function for formation of rectifying contacts.

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신규 제작법을 이용한 Copper Phthalocyanine 전자사진 감광체의 개발과 Dark Decay와 Photoinjection Efficiency에 관한 연구 (A Preparation of Copper Phthalocyanine Photoreceptor by an Aqueous Coating Method and Study of Dark Decay and Photoinjection Efficiency)

  • 이상남
    • 한국인쇄학회지
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    • 제11권1호
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    • pp.103-122
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    • 1993
  • A cause and counterplan of the increase in dark decay rate of$\varepsilon$-CuPc/PVCz photoreceptor which is consist of the carrier generation layer (CGL) of$\varepsilon$type copper phthalocyanine ($\varepsilon$-CuPc) thin film by an aqueous coating method and the carrier transport layer (CTL) of polyvinylcarbazol (PVCz) by spin coating, are studied in this paper. Electrochemical deposition of CGL was accompanied by an increase in work function of the aluminium substrate during the processes and the enhanced work function 5.3 eV rose above the ionization potential 5.16 eV of $\varepsilon$-CuPc. This resulted in the increased injection of holes from substrate into CGL and a fast dark decay rate. Improved photoreceptor, an electron-transport $\varepsilon$-CuPc/TNF photoreceptor, led to lowing of dark decay rate and increasing of photosensitivity. The carrier generation efficiency (ηg), carrier injection efficiency (ηi) and xerographic gain (G) of the $\varepsilon$-CuPc/TNF photoreceptor were obtained by XTOF method and PIDC.

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