• 드라이브 ㆍ 컨트롤
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• 제20권3호
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• pp.1-8
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• 2023

The purpose of this study was to investigate and compare the impact of engine load on the emission characteristics of excavator engines, with the aim of improving the method for calculating the emission inventory of construction machinery. The engine load in excavators is directly correlated with the operational workload, and variations in the load factor (LF) can significantly influence the emission inventory. Thus, on-board diagnostic (OBD) data from an excavator at a construction site were systematically collected to measure engine output and emissions. The results revealed discernible differences in emissions based on engine load, even when the average excavator engine performance remained constant. This highlights the significant influence of the type and characteristics of the work being carried out on emission characteristics. Making realistic adjustments to the LF used in emission calculation formulas emerges as a crucial strategy for environmental improvement. Moreover, the analysis of the effects of engine load on emissions from excavators provides valuable insights for enhancing environmental protection measures.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.105-105
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• 2009

$ZrO_2$ is one of the most attractive high dielectric constant (high-k) materials. As integrated circuit device dimensions continue to be scaled down, high-k materials have been studied more to resolve the problems for replacing the EY31conventional $SiO_2$. $ZrO_2$ has many favorable properties as a high dielectric constant (k= 20~25), wide band gap (5~7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2/Si$ structure. In order to get fine-line patterns, plasma etching has been studied more in the fabrication of ultra large-scale integrated circuits. The relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Due to the easy control of ion energy and flux, low ownership and simple structure of the inductively coupled plasma (ICP), we chose it for high-density plasma in our study. And the $BCl_3$ included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compound In this study, the surface kinetic properties of $ZrO_2$ thin film was investigated in function of Ch addition to $BCl_3/Ar$ gas mixture ratio, RF power and DC-bias power based on substrate temperature. The figure 1 showed the etch rate of $ZrO_2$ thin film as function of gas mixing ratio of $Cl_2/BCl_3/Ar$ dependent on temperature. The chemical state of film was investigated using x-ray photoelectron spectroscopy (XPS). The characteristics of the plasma were estimated using optical emission spectroscopy (OES). Auger electron spectroscopy (AES) was used for elemental analysis of etched surface.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.67-67
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• 2009

Due to the scaling down of the dielectrics thickness, the leakage currents arising from electron tunneling through the dielectrics has become the major technical barrier. Thus, much works has focused on the development of high k dielectrics in both cases of memories and CMOS fields. Among the high-k materials, $Al_2O_3$ considered as good candidate has been attracting much attentions, which own some good properties as high dielectric constant k value (~9), a high bandgap (~2eV) and elevated crystallization temperature, etc. Due to the easy control of ion energy and flux, low ownership and simple structure of the inductively coupled plasma (ICP), we chose it for high-density plasma in our study. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of BClxOy compound. In this study, the etch characteristic of ALD deposited $Al_2O_3$ thin film was investigated in $BCl_3/N_2$ plasma. The experiment were performed by comparing etch rates and selectivity of $Al_2O_3$ over $SiO_2$ as functions of the input plasma parameters such as gas mixing ratio, DC-bias voltage and RF power and process pressure. The maximum etch rate was obtained under 15 mTorr process perssure, 700 W RF power, $BCl_3$(6 sccm)/$N_2$(14 sccm) plasma, and the highest etch selectivity was 1.9. We used the x-ray photoelectron spectroscopy (XPS) to investigate the chemical reactions on the etched surface. The Auger electron spectroscopy (AES) was used for elemental analysis of etched surface.

• 설비공학논문집
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• 제13권3호
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• pp.153-159
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• 2001

A system simulation program was developed for a multi-type inverter heat pump. Electronic expansion valve(EEV) was used to extend the capacity modulating range of the heat pump as expansion device. The program was also developed to calculate actual system performance with the building load variation with climate during a year. The performance variation of a multi-type hat pump with two EEV and an inverter compressor was simulated with compressor speed, capacity, and flow area of the EEV. As a result, the optimum operating frequency of the compressor and openings of the expansion device were decided at a given load. As compressor speed increased, he capacity of heat pump increased, the capacity of heat pump increased. Therefore flow area of EEV should be adjusted to have wide openness. Thus the coefficient of performance(COP) of the heat pump decreased due to increasement of compressor power input. The maximum COP point at a given load was decided according to the compressor speed. And under the given specific compressor speed and the load, the optimum openings point of EEV was also decided. Although the total load of indoor units was constant, the operating frequency increased as the fraction of load in a room increased. Finally ad the compressor power input increased, the coefficient of performance decreased.

• 한국전기전자재료학회논문지
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• 제11권10호
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• pp.826-832
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• 1998

In this study the thin films with the structure of Si+SiO$_2$+TiN are made by RF supttering method. TiN, which has small diffusion coefficient and low resistivity, is evaporated between SiO$_2$ and Al layers. It investigates the V-R characteristics depending on the thickness of SiO$_2$ which is used as insulation layer and researches its effects on voltage stability of thin film and varistor. These films show very small resistance valus in negative(-) voltage and large and large value in positive voltage band, and with the increase of voltage, resistance value is rapidly reduced and the satisfactory characteristic of varistor is shown at +1[V]. It is found that resistance value of TiN thin film is small and also TiN thin film has more current than the thin film which is not evaporated by TiN thin film. When Al electrode is evaporated of SiO$_2$ thin film, spiking occurs, but the spiking can be prevented with evaporation of TiN between SiO$_2$ and Al layers and this thin films in made easily because of its good attachment. With the increase of voltage, the resistance is changed into non-linear pattern and the bidirectional varistor characteristic is shown and then its theory can be verified by this experiment. Accordingly, when TiN is evaporated of Si Wafer(n-100), it obtains better voltage-resistance than thin film which is not evaporated and also when varistor character is used electrically to automatic control element such as elimination of flame, power distribution arrestor and constant voltage compensation, satisfactory reproducibilities are expected.

• 공업화학
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• 제23권6호
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• pp.608-613
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• 2012

유전체 배리어 방전 플라즈마를 모사 농산물 저장시설($1.0m^3$)의 에틸렌 제거에 적용하였다. 에틸렌이 포함된 공기를 플라즈마 반응기에 유입시켜 처리한 후 다시 농산물 저장시설로 재순환하는 방식으로 시험을 수행하였다. 주요 운전변수는 방전전력, 순환기체 유량, 초기 에틸렌 농도 및 처리시간이었다. 에틸렌의 분해속도는 주로 방전전력과 처리시간에 의해 결정되었다. 다른 조건을 일정하게 유지한 상태에서 플라즈마 반응기 후단에 이산화망간 오존분해 촉매를 설치했을 경우 오존분해 촉매가 없을 때 보다 에틸렌 제거속도가 더 빨랐는데, 이 결과는 플라즈마 반응기에서 배출되는 오존이 농산물 저장시설에 유입 축적되어 에틸렌을 추가적으로 분해했기 때문이다. 에틸렌 초기 농도 50 ppm을 기준으로 하면 이를 완전히 분해하기 위한 에너지 요구량은 약 60 kJ이었다.

• 대한의용생체공학회:의공학회지
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• 제24권4호
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• pp.319-328
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• 2003

본 논문은 광역학적 암치료를 위한 광원장치의 개발로서 반도체 다이오드 레이저를 이용한 의료용 레이저 시스템의 개발이 목적이다. 광역학적 암 치료에서 이상적인 광원장치는 초점크기를 조절할 수 있으면서 발산하지 않는 균일한 빛과 특정 파장대의 안정성을 갖는 것이다. 본 연구에서는 이러한 점을 고려하여 635nm 파장대의 다이오드 공진기를 이용하였으며, 개발된 레이저 시스템은 제어장치를 사용하여 정교하고 안정적인 출력을 가지도록 하였으며, 시스템은 사용자의 편리성을 고려하여 소형화하였다. 다이오드 레이저시스템의 펄스 형태의 발진모드에서는 초기의 돌입전류에 의해 공진기를 파손시킬 수 있으므로 본 연구에서는 이러한 현상을 회로적으로 보완하여 msec 단위로 on/off 할 경우에도 공진기에 전혀 손상을 입히지 않도록 설계를 하였다. 임상의가 편리하게 방사시간을 설정하고, 연속출력. 펄스. 버스트 펄스, 슈퍼펄스를 방사할 수 있도록 고안하여. 다양한 암조직의 상태에 따라 치료할 수 있도록 구현하였다. 실험결과 레이저의 출력은 입력전류와 시간에 따라 10mW에서 300mW 까지 선형적으로 증가함을 보였다. 개발된 광역학적 레이저 시스템은 고속제어가 가능하고 정 전류 제어와 효과적인 냉각 제어를 통해 안정적으로 정확하게 출력할 수 있었다.

• 디지털융복합연구
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• 제12권4호
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• pp.311-318
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• 2014

본 논문은 의료영상시스템, 공장자동화 시스템에서 핵심기술인 정확한 검사와 계측을 위하여 보다 선명하고 안정정인 환경을 제공하기 위한 조명으로 고휘도 LED를 이용한 조명광원의 제어기를 개발하였다. 고휘도 LED 전용드라이버를 장착하여 정전류 방식으로 안정된 전원을 공급하도록 설계하고, 32비트 ARM 프로세서 코어를 사용하여 화상처리 시 필수적인 요소인 광량을 256단계로 나누어 리모트 컨트롤 및 외부 인터페이스가 가능하도록 하여 볼륨의 저항 값 오차로 인하여 발생되는 밝기 값의 부정확을 방지하고 디지털화함으로써 빛의 재현성을 개선하였다. 아나로그 전원에 비하여 조광 범위가 넓고 낮은 레벨에서도 조광이 가능하도록 설계 하였으며 또한 RS-485 통신기능을 추가하여 외부장치로부터 데이터를 받아 사용자가 광량조절 및 ON/OFF 제어가 가능하도록 개발 하였다.

• Journal of Electrical Engineering and Technology
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• 제4권2호
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• pp.219-228
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• 2009

The growing application and the numerous qualities of induction motors (1M) in industrial processes that require high security and reliability levels has led to the development of multiple methods for early fault detection. However, various faults can occur, such as stator short-circuits and rotor failures. Traditionally the diagnosis machine is done through a sinusoidal power supply, in the present paper we study experimentally the effects of the rotor failures, such as broken rotor bars in function of the ac supplying, the load and show the impact of the converter from diagnosis of the machine. The technique diagnosis used is based on the spectral analysis of stator currents or stator voltages respectively according to the types of induction motor ac supplying. So, four different ac supplying are considered: ${\odot}$ the IM is directly by the balanced three-phase network voltage source, ${\odot}$ the IM is fed by a sinusoidal current source given the controlled by hysteresis, ${\odot}$ the IM is fed (in open loop) by a scalar control imposing through ratio V/f=constant, ${\odot}$ the IM is controlled through a vector control using space vector pulse width modulation (SVPWM) technique inverter with an outer speed loop.

• Smart Structures and Systems
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• 제19권6호
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• pp.665-678
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• 2017

In this paper the tuned mass-damper-inerter (TMDI) is considered for passive vibration control and energy harvesting in harmonically excited structures. The TMDI couples the classical tuned mass-damper (TMD) with a grounded inerter: a two-terminal linear device resisting the relative acceleration of its terminals by a constant of proportionality termed inertance. In this manner, the TMD is endowed with additional inertia, beyond the one offered by the attached mass, without any substantial increase to the overall weight. Closed-form analytical expressions for optimal TMDI parameters, stiffness and damping, given attached mass and inertance are derived by application of Den Hartog's tuning approach to suppress the response amplitude of force and base-acceleration excited single-degree-of-freedom structures. It is analytically shown that the TMDI is more effective from a same mass/weight TMD to suppress vibrations close to the natural frequency of the uncontrolled structure, while it is more robust to detuning effects. Moreover, it is shown that the mass amplification effect of the inerter achieves significant weight reduction for a target/predefined level of vibration suppression in a performance-based oriented design approach compared to the classical TMD. Lastly, the potential of using the TMDI for energy harvesting is explored by substituting the dissipative damper with an electromagnetic motor and assuming that the inertance can vary through the use of a flywheel-based inerter device. It is analytically shown that by reducing the inertance, treated as a mass/inertia-related design parameter not considered in conventional TMD-based energy harvesters, the available power for electric generation increases for fixed attached mass/weight, electromechanical damping, and stiffness properties.