• Title/Summary/Keyword: Conduction band minimum

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Band Alignment at CdS/wide-band-gap Cu(In,Ga)Se2 Hetero-junction by using PES/IPES

  • Kong, Sok-Hyun;Kima, Kyung-Hwan
    • Transactions on Electrical and Electronic Materials
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    • v.6 no.5
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    • pp.229-232
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    • 2005
  • Direct characterization of band alignment at chemical bath deposition $(CBD)-CdS/Cu_{0.93}(In_{1-x}Ga_x)Se_2$ has been carried out by photoemission spectroscopy (PES) and inverse photoemission spectroscopy (IPES). Ar ion beam etching at the condition of the low ion kinetic energy of 400 eV yields a removal of surface contamination as well as successful development of intrinsic feature of each layer and the interfaces. Especially interior regions of the wide gap CIGS layers with a band gap of $1.4\~1.6\;eV$ were successfully exposed. IPES spectra revealed that conduction band offset (CBO) at the interface region over the wide gap CIGS of x = 0.60 and 0.75 was negative, where the conduction band minimum of CdS was lower than that of CIGS. It was also observed that an energy spacing between conduction band minimum (CBM) of CdS layer and valance band maximum (VBM) of $Cu_{0.93}(In_{0.25}Ga_{0.75})Se_2$ layer at interface region was no wider than that of the interface over the $Cu_{0.93}(In_{0.60}Ga_{0.40})Se_2$ layer.

Symmetry of GaAsN Conduction-band Minimum: Resonant Raman Scattering Study (GaAsN 전도띠 바닥의 대칭성: 공명라만산란연구)

  • Seong M.J.
    • Journal of the Korean Vacuum Society
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    • v.15 no.2
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    • pp.162-167
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    • 2006
  • The symmetry of the conduction-band minimum of $GaAs_{1-x}N_{x}$ is probed by performing resonant Raman scattering (RRS) on thin layers of $GaAs_{1-x}N_{x}(x{\leq}0.7)$ epitaxially grown on Ge substrates. Strong resonance enhancement of the LO(longitudinal optical)-phonon Raman intensity is observed with excitation energies near the $E_0$ as well as $E_+$ transitions, However, in contrast to the distinct LO-phonon line-width resonance enhancement and activation of various X and L zone-boundary phonons brought about slightly below and near the $E_+$ transition, respectively, we have not observed any resonant LO-phonon line-width broadening or activation of sharp zone-boundary phonons near the $E_0$ transition. The observed RRS results reveal that the conduction-band minimum of GaAsN predominantly consists of the delocalized GaAs bulk-like states of ${\Gamma}$ symmetry.

Influence of Fast Neutron Irradiation on the Electrical and Optical Properties of Li Doped ZnSnO Thin Film Transistor (Li 도핑된 ZnSnO 박막 트랜지스터의 전기 및 광학적 특성에 대한 고속 중성자 조사의 영향)

  • Cho, In-Hwan;Kim, Chan-Joong;Jun, Byung-Hyuk
    • Korean Journal of Materials Research
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    • v.30 no.3
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    • pp.117-122
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    • 2020
  • The effects of fast neutron irradiation on the electrical and optical properties of Li (3 at%) doped ZnSnO (ZTO) thin films fabricated using a sol-gel process are investigated. From the results of Li-ZTO TFT characteristics according to change of neutron irradiation time, the saturation mobility is found to increase and threshold voltage values shift to a negative direction from 1,000 s neutron irradiation time. X-ray photoelectron spectroscopy analysis of the O 1s core level shows that the relative area of oxygen vacancies is almost unchanged with different irradiation times. From the results of band alignment, it is confirmed that, due to the increase of electron carrier concentration, the Fermi level (EF) of the sample irradiated for 1,000 s is located at the position closest to the conduction band minimum. The increase in electron concentration is considered by looking at the shallow band edge state under the conduction band edge formed by fast neutron irradiation of more than 1,000 s.

Ultrathin-body MOSFET의 leakage current와 관련한 SiGe alloy substrate의 특성 평가

  • Lee, Dong-Heon;Gang, Yeong-Ho
    • Proceeding of EDISON Challenge
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    • 2014.03a
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    • pp.415-419
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    • 2014
  • 나노스케일 MOSFET에서 leakage current는 중요한 이슈로서 $Si_{1-x}Ge_x$ alloy를 substrate로 사용할 경우 leakage current에 어떤 영향을 미칠 것인지 시뮬레이션을 통하여 알아보았다. $Si_{1-x}Ge_x$ alloy에서 Ge의 비율이 증가할수록 유효질량이 작아졌으나 conduction band minimum의 위치는 Si에 비해 상승하였다. 이로 인해 tunneling 확률이 증가하여 $Si_{1-x}Ge_x$ alloy를 substrate로 사용할 경우 leakage current를 더욱 증가시키게 되었다.

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Tunable doping sites and the impacts in photocatalysis of W-N codoped anatase TiO2

  • Choe, Hui-Chae;Sin, Dong-Bin;Yeo, Byeong-Cheol;Song, Tae-Seop;Han, Sang-Su;Park, No-Jeong;Kim, Seung-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.246-246
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    • 2016
  • Tungsten-nitrogen (W-N) co-doping has been known to enhance the photocatalytic activity of anatase titania nanoparticles by utilizing visible light. The doping effects are, however, largely dependent on calcination or annealing conditions, and thus, the massive production of quality-controlled photocatalysts still remains a challenge. Using density functional theory (DFT) thermodynamics and time-dependent DFT (TDDFT) computations, we investigate the atomic structures of N doping and W-N co-doping in anatase titania, as well as the effect of the thermal processing conditions. We find that W and N dopants predominantly constitute two complex structures: an N interstitial site near a Ti vacancy in the triple charge state and the simultaneous substitutions of Ti by W and the nearest O by N. The latter case induces highly localized shallow in-gap levels near the conduction band minimum (CBM) and the valence band maximum (VBM), whereas the defect complex yielded deep levels (1.9 eV above the VBM). Electronic structures suggest that substitutions of Ti by W and the nearest O by N improves the photocatalytic activity of anatase by band gap narrowing, while defective structure degrades the activity by an in-gap state-assisted electron-hole recombination, which explains the experimentally observed deep level-related photon absorption. Through the real-time propagation of TDDFT (rtp-TDDFT), we demonstrate that the presence of defective structure attracts excited electrons from the conduction band to a localized in-gap state within a much shorter time than the flat band lifetime of titania. Based on these results, we suggest that calcination under N-rich and O-poor conditions is desirable to eliminate the deep-level states to improve photocatalysis.

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A Comparison Study on Quantum Dots Light Emitting Diodes Using SnO2 and TiO2 Nanoparticles as Solution Processed Double Electron Transport Layers (용액공정 기반 SnO2와 TiO2를 이중 전자수송층으로 적용한 양자점 전계 발광소자의 특성비교 연구)

  • Shin, Seungchul;Kim, Suhyeon;Jang, Seunghun;Kim, Jiwan
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.3
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    • pp.69-72
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    • 2020
  • In this study, the inverted structured electroluminescence (EL) devices were fabricated with double electron transport layers (ETLs). The conduction band minimum (CBM) of TiO2 NPs is lower than SnO2 NPs. Therefore, it is expected that inserting TiO2 NPs between the SnO2 layer and the emission layer (EML) will reduce the energy barrier and transport electrons smoothly. The quantum dot light emitting diodes (QLEDs) with double ETLs showed the enhanced emission characteristics than those with only SnO2 layer.

Thermally Assisted Carrier Transfer and Field-induced Tunneling in a Mg-doped GaN Thin Film (Mg가 첨가된 GaN 박막에서 캐리어 전이의 열적도움과 전계유도된 터러링 현상)

  • Chung, Sang-Geun;Kim, Yoon-Kyeom;Shin, Hyun-Gil
    • Korean Journal of Materials Research
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    • v.12 no.6
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    • pp.431-435
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    • 2002
  • The dark current and photocurrent(PC) spectrum of Mg-doped GaN thin film were investigated with various bias voltages and temperatures. At high temperature and small bias, the dark current is dominated by holes thermally activated from an acceptor level Al located at about 0.16 eV above the valence band maximum $(E_v)$, The PC peak originates from the electron transition from deep level A2 located at about 0.34 eV above the $E_v$ to the conduction band minimum $(E_ C)$. However, at a large bias voltage, holes thermally activated from A2 to Al experience the field-in-duces tunneling to form one-dimensional defect band at Al, which determines the dark current. The PC peak associated with the transition from Al to $E_ C$ is also observed at large bias voltages owing to the extended recombination lifetime of holes by the tunneling. In the near infrared region, a strong PC peak at 1.20 eV appears due to the hole transition from deep donor/acceptor level to the valence band.

Temperature-dependent DC Characteristics of Homojunction InGaAs vertical Fin TFETs (동종 접합 InGaAs 수직형 Fin TFET의 온도 의존 DC 특성에 대한 연구)

  • Baek, Ji-Min;Kim, Dae-Hyun
    • Journal of Sensor Science and Technology
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    • v.29 no.4
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    • pp.275-278
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    • 2020
  • In this study, we evaluated the temperature-dependent characteristics of homojunction InGaAs vertical Fin-shaped Tunnel Field-Effect Transistors (Fin TFETs), which were fabricated using a novel nano-fin patterning technique in which the Au electroplating and the high-temperature InGaAs dry-etching processes were combined. The fabricated homojunction InGaAs vertical Fin TFETs, with a fin width and gate length of 60 nm and 100 nm, respectively, exhibited excellent device characteristics, such as a minimum subthreshold swing of 80 mV/decade for drain voltage (VDS) = 0.3 V at 300 K. We also analyzed the temperature-dependent characteristics of the fabricated TFETs and confirmed that the on-state characteristics were insensitive to temperature variations. From 77 K to 300 K, the subthreshold swing at gate voltage (VGS) = threshold voltage (VT), and it was constant at 115 mV/decade, thereby indicating that the conduction mechanism through band-to-band tunneling influenced the on-state characteristics of the devices.

Monte carlo analysis of InAlGaAs/InGaAs HBT (InAlGaAs/InGaAs HBT의 Monte carlo 해석)

  • 황성범;김용규;송정근
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.405-408
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    • 1998
  • Due to the large conduction band discontinuity between emitter base, OmGaAs HBT has an advantge to enable the hot electrons to inject into the base. In this paper, InAlGaAs/InGaAs HBT with the various emitter junction gradings and the modified collectors are simulated and analyzed by HMC(hybrid monte carlo) simulator in order to find a optimal structure for the shortest transit time. A minium base transit time (.tau.$_{b}$ ) of 0.21 ps was obtained for HBT with the grading layer, which is parabolically graded from x=1.0 to x=0.5. The minimum collector transit time (.tau.$_{c}$ ) of 0.31ps was found when the collector was modified by inserting p$^{[-10]}$ and p$^{+}$ layers. Thus HBT in combination with the emitter grading and the modified collector layer showed the cut-off frequency (f$_{T}$) of 183GHz.z.z.

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Band alignments in Al-doped GaInAsSb/GaSb heterojunctions (Al이 도핑된 GaInAsSb/GaSb의 경계면에서의 밴드정렬)

  • Shim, Kyurhee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.6
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    • pp.225-231
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    • 2016
  • The valence band maximum (VBM) and conduction band minimum (CBM) of Al-doped GaInAsSb alloys substrated on GaSb are calculated by using an analytic approximation based on the tight binding method. The relative positions of the VBM and CBM between Al-GaInASSb and GaSb determine band alignement type, valence band offset (VBO) and conductin band offset (CBO) for the heterojunctions. In this study, aluminium doping is assumed to be substituted in the cation site and limited up to 20 % because it can easily oxidize and degrade materials. It is found that the Al-doped alloys exhibit type-II band alignments over the entire composition range and make the band gaps increase, whereas the VBO and CBO decrease. The decreasing rate of VBO is higher than that of CBO, which implies the Al components play a decisive role in controlling electrons at the interface. The Al-dopled GaInAsSb alloy has a direct band gap induced by $E({\Gamma})$ with a considerable distance from the E(L) and E(X), however, $E({\Gamma})$ approaches to E(L) and E(X) in the high Sb concentration (Sb > 0.7-0.8) which might affect the electron mobility and degrade the optical quality.