• Korea-Australia Rheology Journal
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• v.20 no.3
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• pp.97-107
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• 2008

This article presents an overview of current research activities that center on colloidal crystals resulting from self-assembly of surface-charged nanoparticles. It is organized into three parts: the first part discusses characterization of colloidal structures, the second part describes colloidal stability from the rheological aspects of colloidal crystals suspended in medium, and the third part highlights polymerized colloidal crystals as a promising application. Finally, we briefly discuss the directions of future research in this area.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.24 no.1
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• pp.48-73
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• 1998

Colloid refers to dispersed particles of solid or liquid having diameters of $10^{-5}$ to $10^{-7}$cm, among which colloidal silver is produced by electrolysis. Colloidal silver of various concentrations according to charge and time were formed, antimicrobial activity of colloidal silver was measured. And, the optimum conditions for emulsion were determined by changing the concentration of coloidal silver. Also, the stability of the emulsion was measured by zeta potential and chroma meter by applying colloidal silver to creams(W/S, O/W, MLV)

• Applied Chemistry for Engineering
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• v.31 no.1
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• pp.61-66
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• 2020

In this study, the effect of characteristics of colloidal silica, which was used as an additive in the compression/coating catalyst process, on activities and thermal stabilities of the catalysts was investigated. The shape, size, specific surface area and porosity, and composition of four different types of colloidal silica materials were analyzed, and the NOx conversion of V₂O₅/TiO₂ catalyst prepared by these colloidal silica were studied. Properties of the catalysts prepared by colloidal silica depend on the nature of the colloidal silica used, in particular the alkaline substances such as Na in the silica were evaluated to be directly effect on the deNOx conversion of the catalyst. In addition, higher silica contents in the colloidal silica were found to improve the deNOx activity and thermal stability of the catalyst.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.25 no.4 s.34
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• pp.75-95
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• 1999

A colloid refers to dispersed particles of a solid or liquid having the diameter of about $10^{-5}-10^{-7}cm$. Such colloidal silver is produced by electrolysis. In this paper, colloidal silvers of various concentrations according to charge amount and time are produced, and their anti-microbial activities are measured. And optimum conditions for emulsion are measured by varying the concentration of colloidal silvers. Further, stability of the emulsion is measured with a Zeta potential, chrome meter by applying colloidal silvers to creams (W/Si, O/W, MLV).

• Proceedings of the SCSK Conference
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• 1999.10a
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• pp.75-95
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• 1999

A colloid refers to dispersed particles of a solid or liquid having the diameter of about $10^{-5}$ - $10^{-7}$. Such colloidal silver is produced by electrolysis. In this paper. colloidal silvers of various concentrations according to charge amount and time are produced, and their anti-microbial activities are measured. And optimum conditions for emulsion are measured by varying the concentration of colloidal silvers. Further, stability of the emulsion is measured with a Zeta potential. chrome meter by applying colloidal silvers to creams (W/Si. O/W, MLV).

• Journal of the Korean Ceramic Society
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• v.44 no.2 s.297
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• pp.98-102
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• 2007

The stability of slurry and removal rate during recycling of colloidal silica slurry was evaluated in silicon wafer polishing. The particle size distribution, pH, and zeta potential were measured to investigate the stability of colloidal silica. Large particles appeared as recycling time increased while average size of slurry did not change. Large particles were identified by EDS(energy dispersive spectrometer) as foreign substances from pad or abraded silicon flakes during polishing. As the recycling time increased, pH of slurry decreased and removal rate of silicon reduced but zeta potential decreased inversely. Hence, it could be mentioned that decrease of removal rate is related to consumption of $OH^-$ ions during recycling. Attention should be given to the control of pH of slurry during polishing.

• Korean Journal of Soil Science and Fertilizer
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• v.24 no.2
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• pp.95-101
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• 1991

The results of relationships between colloidal stability and soil pH on three Hawaii's volcanic ash soils developed under the three different rainfall conditions can be summarized as follows: 1. The Hilo soil only revealed the increase of colloidal stability by becoming for from Z.P.C point to either side of pH. 2. Hilo and Kawaihae soils, however, showed the increase of colloidal stability only in the higher pH range than their Z.P.C. 3. $P_2O_5$ drying procers decreased colloidal stability kof these soils because of so called irreversible drying characteristics of amorphous materials and the decrement was in order of: Akaka>Hilo>Kawaihae expressing positive correlation with content of amorphous materials in them. 4. The difference of colloidal stability curves among three soils can easily be interpreted by DLVO theory considering 0.1N-HCl amount added to decrease their soil pH, respectively. The addition of large amount of 0.1N-HCl into Akaka and Kawaihae soils did not effectively develop the positive charge but resulted in the shrink of diffuse double layer thickness inducing large attraction forces among soil particles.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.3
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• pp.272-277
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• 2004

The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5％ acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

• Clean Technology
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• v.12 no.1
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• pp.45-51
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• 2006

Colloidal Liquid Aphrons(CLAs) were prepared from different solvents such as nonpolar hydrocarbons, alcohols, and amines. Water-soluble surfactant and oil-soluble surfactant were used in this study. The effect of PVR (phase volume ratio) and concentration of extractant on the stability of CLA was investigated. The stability of CLA was affected by PVR. As PVR was increased, the stability of CLA was decreased.

• Clean Technology
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• v.7 no.4
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• pp.291-297
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• 2001

In this study, the stability of concentrated colloidal liquid aphrons (CLAs) containing Aliquat 336 was measured. CLAs in the continuous phase are stabilized by water-soluble surfactant and oil-soluble surfactant. To compare the stability of CLAs, half-life was introduced. According to the change of state of solution, the rate of break-up of concentrated CLAs changed rigorously at critical coagulation concentration. Critical coagulation concentration was measured with changing pH. The effects of ionic strength and concentration of Sodium Dodecyl Benzene Sulfonate (SDBS) on the stability of concentrated CLAs in the continuous phase were also investigated.