• Title/Summary/Keyword: Cleaning solution

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The Deposition of Tear Protein according to Soft Lens Materials and The Cleaning Efficacy of Multi-purpose Solution according to the Surfactant Types (소프트렌즈 재질 별 누액단백질 침착 및 계면활성제 종류에 따른 다목적용액의 세척효율)

  • Park, Mijung;Kwon, Young Dae;Lee, Wang Jae;Kim, So Ra
    • Journal of Korean Ophthalmic Optics Society
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    • v.19 no.2
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    • pp.179-188
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    • 2014
  • Purpose: The present study was aimed to investigate the cleaning efficacy of multi-purpose solutions containing different types and content of surfactants and their effect on the visible light transmittance of soft lens. Methods: Soft lenses made of different materials (etafilcon A and hilafilcon B) were deposited tear proteins by using the artificial tear and then compared the resulting cleaning efficacy and visible light transmittance after cleaning the lens with 6 types of multi-purpose solutions containing different content of surfactants. Results: The cleaning efficacy of multi-purpose solutions was variously shown as approximately 23~43% according to the active concentration of surfactants and surface tension in multi-purpose solution when etafilcon A lens cleaned with rubbing. The highest cleaning efficacy was detected when cleaned with the multi-purpose solution containing hydrogen peroxide besides surfactant however, the amount of remaining protein was still high on the lens. After washed with multi-purpose solution, the visible light transmittance of lens was in 89.8 to 90.8%. The amount of protein deposited on hilafilcon B lens was very small compared with it on etafilcon A lens even though it was incubated in artificial tears for 7 days, which showed 5~10% of protein amount in etafilcon A lens and the decrease of visible light transmittance was also not significant. In case of rubbing with multi-purpose solution, the cleaning efficacy on hilafilcon B lens was in 45.4 to 67.4% however, the order of cleaning efficacy of multi-purpose solution was different from it on etafilcon A lens. The visible light transmittance of hilafilcon B lens has been restored to the level of new lens. Conclusions: From the result, it is concluded that the appropriate multi-purpose solution should be selected according to the lens material and the amount of protein deposit on the basis of understanding surfactants and active principle for proper care of protein deposit on soft lens and the cleaning with rubbing is more efficient for lens care regardless of manufacturer's guideline.

The Effect of Proteases on Contamination Removal (프로테아제의 오염 세정 효과)

  • Kim, Ju-Hye;Gwon, Mi-Yeon
    • Proceedings of the Korean Society of Dyers and Finishers Conference
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    • 2008.04a
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    • pp.181-183
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    • 2008
  • Four different subtilisins of protease were investigated to see their effects on the cleaning activity. The cleaning solution was formulated with various non-ionic surfactants and other additives such as propylene glycol, triethanolamine, pH balancer etc. to evaluate their effect on enzyme activity as well. Evaluation of formulated cleaning solution was carried under K0120 using pre-soiled textiles from EMPA. The results showed that the cleaning activity on soil removal was not severly influenced by surfactant but the enzyme mostly. In addition, the activity of enzymes was not much affected by the type of surfactants as long as the surfactants were non-ionic. Liquinase among the four enzymes used in this study showed the best performance on soil removal, especially blood stain.

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A study on Chemical Cleaning of Copper Corrosion Product in cooling system (냉각계통의 구리 부식 생성물의 화학세정에 관한 연구)

  • Lee, Han-Chul;Lee, Chang-Woo;Hyun, Seong-Ho
    • Journal of Korean Society of Water and Wastewater
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    • v.13 no.1
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    • pp.140-145
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    • 1999
  • This study was carried out a investigate the effect of chemical cleaning of corrosion product in cooling system made of copper and copper alloy as basic material and used cooling water as pure water. We studied chemical cleaning condition that minimizes the influence on basic material by means of EDTA solution so as to eliminate the slurry in cooling system. As a result, we found that the main components of sludge in cooling system produced by corrosion of copper were $Cu_2O$, CuO, Cu, and Fe. The optimum condition of chemical cleaning was 400 ppm EDTA solution at $60^{\circ}C$.

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The Influence of Cyclic Treatments with H₂O₂ and HF Solutions on the Roughness of Silicon Surface

  • 이혜영;이충훈;전형탁;정동운
    • Bulletin of the Korean Chemical Society
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    • v.18 no.7
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    • pp.737-740
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    • 1997
  • The influence of cyclic treatments with H2O2/DIW (1 : 10) and HF/DIW (1 : 100) on the roughness of silicon surface in the wet chemical processing was investigated by atomic force microscopy (AFM). During the step of the SC-1 cleaning, there is a large increase in roughness on the silicon surface which will result in the poor gate oxide breakdown properties. The roughness of the silicon wafer after the SC-1 cleaning step was reduced by cyclic treatments of hydrogen peroxide solution and hydrofluoric acid solution instead of HF-only cleaning. AFM images after each step clearly illustrated that the average roughness of silicon surface after three times treatments with H2O2 and HF solutions was reduced by 10 times compared with that after the SC-1 cleaning step.

Effect of buffing on particle removal in post-Cu CMP cleaning (구리 CMP 후 연마입자 제거에 버프 세정의 효과)

  • Kim, Young-Min;Cho, Han-Chul;Jeong, Hae-Do
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1880-1884
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    • 2008
  • Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-steop CMP consists of Cu CMP and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the buffing is performed various conditions as a cleaning process. The buffing process combined mechanical cleaning by friction between a wafer and a buffing pad and chemical cleaning by buffing solution consists of tetramethyl ammonium hydroxide (TMAH)/benzotriazole(BTA).

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The Simultaneous absorption of SOX-NOX using aqueous ammonia solution (암모니아수용액을 이용한 SOX-NOX 동시 흡수에 관한 연구)

  • Kim, Jae-Gang;Lee, Ju-Yeol;Park, Byung-Hyun;Choi, Jin-Sik
    • Journal of the Korean Applied Science and Technology
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    • v.32 no.3
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    • pp.372-376
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    • 2015
  • The experiment was performed using the cleaning precipitator To investigate the absorption efficiency of the $SO_X/NO_X$ of the aqueous ammonia solution. Concentration of the cleaning liquid is 0.1, 0.5, and 1.0% with increasing absorption efficiency has improved. However, the reaction shown only a difference in time. Absorption efficiency has improved in accordance with the gas residence time. When the direction of the same gas and the cleaning liquid is determined that there is the effect of increasing the residence time. The relative impact of $SO_X$ and $NO_X$ is this likely to react slower than $SO_X/NO_X$. The yield is determined to require adjustment of the cleaning dust collector according to the concentration of the next gas.

Post Ru CMP Cleaning for Alumina Particle Removal

  • Prasad, Y. Nagendra;Kwon, Tae-Young;Kim, In-Kwon;Park, Jin-Goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.34.2-34.2
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    • 2011
  • The demand for Ru has been increasing in the electronic, chemical and semiconductor industry. Chemical mechanical planarization (CMP) is one of the fabrication processes for electrode formation and barrier layer removal. The abrasive particles can be easily contaminated on the top surface during the CMP process. This can induce adverse effects on subsequent patterning and film deposition processes. In this study, a post Ru CMP cleaning solution was formulated by using sodium periodate as an etchant and citric acid to modify the zeta potential of alumina particles and Ru surfaces. Ru film (150 nm thickness) was deposited on tetraethylorthosilicate (TEOS) films by the atomic layer deposition method. Ru wafers were cut into $2.0{\times}2.0$ cm pieces for the surface analysis and used for estimating PRE. A laser zeta potential analyzer (LEZA-600, Otsuka Electronics Co., Japan) was used to obtain the zeta potentials of alumina particles and the Ru surface. A contact angle analyzer (Phoenix 300, SEO, Korea) was used to measure the contact angle of the Ru surface. The adhesion force between an alumina particle and Ru wafer surface was measured by an atomic force microscope (AFM, XE-100, Park Systems, Korea). In a solution with citric acid, the zeta potential of the alumina surface was changed to a negative value due to the adsorption of negative citrate ions. However, the hydrous Ru oxide, which has positive surface charge, could be formed on Ru surface in citric acid solution at pH 6 and 8. At pH 6 and 8, relatively low particle removal efficiency was observed in citric acid solution due to the attractive force between the Ru surface and particles. At pH 10, the lowest adhesion force and highest cleaning efficiency were measured due to the repulsive force between the contaminated alumina particle and the Ru surface. The highest PRE was achieved in citric acid solution with NaIO4 below 0.01 M at pH 10.

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The Actual Management State of Trial Contact Lenses and Lens Care Products in Local Optical Shops (안경원의 시험착용 콘택트렌즈 및 관리용품 관리 실태)

  • Park, Mijung;Lee, Unjung;Kim, So Ra
    • Journal of Korean Ophthalmic Optics Society
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    • v.16 no.4
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    • pp.391-401
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    • 2011
  • Purpose: In the present study, the actual management state of trial contact lenses and lens care products in local optical shops was surveyed and analyzed to reduce the risk of lens complication possibly induced by neglecting lens care. Methods: The feeling of contact lens wearers during the wear of trial contact lenses was surveyed. Futhermore, the actual management state of trial contact lenses such as cosmetic lens and RGP lens and lens care products was also investigated by surveying opticians who trade contact lenses in local optical shops. Results: It was found that consumers trusted the sanitary conditions of the lens since trial cosmetic contact lens and RGP lens were cleaned before and after trails by over 98% of opticians in local optical shops. For trial cosmetic lens, cleaning with normal saline, multipurpose solution for soft lens and combination of saline and multipurpose solution were 38.5%, 40.5% and 21%, respectively, before trials. After trials, cosmetic lenses were cleaned with normal saline, multipurpose solution for soft lens and a combination of saline and multipurpose solution were 13%, 75%, and 12%, respectively. On the other hand, cleaning with normal saline, multipurpose solution for RGP lens and combination of saline and multipurpose solution were 28.5%, 38.5% and 33%, respectively, before trying trial RGP lens. After trials, RGP lenses were cleaned with normal saline, multipurpose solution for RGP lens and a combination of saline and multipurpose solution were 2.5%, 70%, and 27.5%, respectively, indicating that relatively many opticians followed the lens cleaning regimen. In local optical shops, the cleaning trial cosmetic lens was mainly conducted at every 10 days or a month and the washing cycle of cosmetic lens case was in a month or 2~3 months. The cleaning interval of trial RGP lens was primarily in a month or 2~3 months. For those lens cases, more than 75% of opticians washed them with a surfactant and then rinsed with cold water. The storing periods of lens care products were primarily in a week for saline and in a month and 2~3 months indicating that storing period of lens care products was relatively well-kept in local optical shops. Conclusions: It is thought that the concern about any microbial infection is not that high since trial contact lenses and lens care products were generally well-managed by opticians in local optical shops from the results above. However, better public eye health and better public confidence in opticians may be possible if further strengthen in avoidance of lens cleaning with saline, keep of cleaning cycles within 2 weeks and rinsing of lens cases with hot water happens.

Dissolution Characteristics of Copper Oxide in Gas-liquid Hybrid Atmospheric Pressure Plasma Reactor Using Organic Acid Solution

  • Kwon, Heoung Su;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.33 no.2
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    • pp.229-233
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    • 2022
  • In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.

Optimization of chemical cleaning of discarded reverse osmosis membranes for reuse

  • Jung, Minsu;Yaqub, Muhammad;Lee, Wontae
    • Membrane and Water Treatment
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    • v.12 no.1
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    • pp.1-9
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    • 2021
  • This study optimized the chemical cleaning process of discarded RO membranes for reuse in less demanding separation processes. The effect of physicochemical parameters, including the temperature, cleaning time, pH of the cleaning solution, and addition of additives, on the cleaning process was investigated. The membrane performance was evaluated by testing the flux recovery rate and salt rejection before and after the cleaning process. High temperatures (45-50 ℃) resulted in a better flux recovery rate of 71% with more than 80% salt rejection. Equal time for acid and base cleaning 3-3 h presented a 72.43% flux recovery rate with salt rejection above 85%. During acid and base cleaning, the best results were achieved at pH values of 3.0 and 12.0, respectively. Moreover, 0.05% concentration of ethylenediaminetetraacetic acid presented 72.3% flux recovery, while 69.2% flux was achieved using sodium dodecyl sulfate with a concentration of 0.5%; both showed >80% salt rejection, indicating no damage to the active layer of the membrane. Conversely, 0.5% concentration of sodium percarbonate showed 83.1% flux recovery and 0.005% concentration of sodium hypochlorite presented 85.2% flux recovery, while a high concentration of these chemicals resulted in oxidation of the membrane that caused a reduction in salt rejection.